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1. 发明申请

WO2010135453A3 QUANTUM EFFICIENCY MEASUREMENT SYSTEM AND METHODS OF USE 审中-公开
公开(公告)号：WO2010135453A3
公开(公告)日：2010-11-25
申请号：PCT/US2010/035445
申请日：2010-05-19
申请人： NEWPORT CORPORATION , CIOCAN, Razvan , DONOHUE, John , FELDMAN, Arkady , LI, Zhuoyun
发明人： CIOCAN, Razvan , DONOHUE, John , FELDMAN, Arkady , LI, Zhuoyun
IPC分类号： H01L31/18 , H01L31/042 , H01L21/66
摘要： A system for measuring a characteristic of a solar cell is disclosed and includes a light source irradiating an optical signal having a spectral range from about 100nm to about 3000nm, a wavelength selector configured to selectively narrow the spectral range of the optical signal, a beam splitter, a reference detector in optical communication with the beam splitter and configured to measure a characteristic of the optical signal, a specimen irradiated with the optical signal, a reflectance detector in optical communication with the specimen via the beam splitter and configured to measure an optical characteristic of the optical signal reflected by the specimen, a multiplexer in communication with at least one of the reference detector, specimen, and reflectance detector, and a processor in communication with at least one of the reference detector, specimen, and reflectance detector via the multiplexer and configured to calculate at least one characteristic of the specimen.

2. 发明申请

WO2003058687A1 METHOD OF DETECTING, IDENTIFYING AND CORRECTING PROCESS PERFORMANCE 审中-公开
标题翻译：检测，识别和校正过程性能的方法
公开(公告)号：WO2003058687A1
公开(公告)日：2003-07-17
申请号：PCT/US2002/038990
申请日：2002-12-31
申请人： TOKYO ELECTRON LIMITED , DONOHUE, John , YUE, Hongyu
发明人： DONOHUE, John , YUE, Hongyu
IPC分类号： H01L21/00
CPC分类号： H01J37/32935 , G05B19/41875 , G05B2219/32018 , G05B2219/32201 , H01L22/20 , Y02P90/14 , Y02P90/22
摘要： A method for material processing utilizing a material processing system (1) to perform a process. The method performs a process, measures a scan of data, and transforms the data scan into a signature including at least one spatial component. The scan of data can include a process performance parameter (14) such as an etch rate, an etch selectivity, a deposition rate, a film property, etc. A relationship can be determined between the measured signature and a set of at least one controllable process parameter (12) using multivariate analysis, and this relationship can be utilized to improve the scan of data corresponding to a process performance parameter. For example, utilizing this relationship to minimize the spatial components of the scan of data can affect an improvement in the process uniformity.
摘要翻译：一种利用材料处理系统（1）进行处理的材料处理方法。该方法执行处理，测量数据的扫描，以及将数据扫描变换成包括至少一个空间分量的签名。数据的扫描可以包括诸如蚀刻速率，蚀刻选择性，沉积速率，膜性质等的工艺性能参数（14）。可以在所测量的标记和至少一个可控的过程参数（12）使用多变量分析，并且可以利用该关系来改进对应于过程性能参数的数据的扫描。例如，利用这种关系来最小化数据扫描的空间分量可以影响过程均匀性的改善。

3. 发明申请

WO2003058699A1 METHOD OF FAULT DETECTION FOR MATERIAL PROCESS SYSTEM 审中-公开
标题翻译：材料过程系统故障检测方法
公开(公告)号：WO2003058699A1
公开(公告)日：2003-07-17
申请号：PCT/US2002/038989
申请日：2002-12-31
申请人： TOKYO ELECTRON LIMITED , DONOHUE, John , YUE, Hongyu
发明人： DONOHUE, John , YUE, Hongyu
IPC分类号： H01L21/306
CPC分类号： H01L21/67265 , G05B23/0229 , H01J37/32935 , H01L21/31116 , H01L21/67253 , H01L21/67288 , H01L22/20
摘要： A method for material processing utilizing a material processing system to perform a process. The method performs a process (510), measures a scan of data (520), and transforms the data scan (530) into a signature (540) including at least one spatial component. The scan of data (530) can include a process performance parameter such as an etch rate, an etch selectivity, a deposition rate, a film property, etc. The signature (540) can be stored (550), and compared with either a previously acquired signature or with an ideal signature (560). If at least one spatial component substantially deivates from the reference spatial component, then a process fault has potentially occurred. If the cumulative deviation of all spatial components or a select group of components substantially deviates from a reference set of spatial components, then a process fault has potentially occurred.
摘要翻译：一种利用材料处理系统进行处理的材料处理方法。该方法执行处理（510），测量数据的扫描（520），并将数据扫描（530）转换成包括至少一个空间分量的签名（540）。数据扫描（530）可以包括诸如蚀刻速率，蚀刻选择性，沉积速率，膜性质等的工艺性能参数。可以存储（550）签名（540），并与以前获得的签名或理想签名（560）。如果至少一个空间分量基本上与参考空间分量相关，则可能发生过程故障。如果所有空间分量或选择组的组合的累积偏差基本上偏离参考空间分量集合，则可能发生过程故障。

4. 发明申请

WO2010135453A2 QUANTUM EFFICIENCY MEASUREMENT SYSTEM AND METHODS OF USE 审中-公开
标题翻译：量子效率测量系统及其使用方法
公开(公告)号：WO2010135453A2
公开(公告)日：2010-11-25
申请号：PCT/US2010035445
申请日：2010-05-19
申请人： NEWPORT CORP , CIOCAN RAZVAN , DONOHUE JOHN , FELDMAN ARKADY , LI ZHUOYUN
发明人： CIOCAN RAZVAN , DONOHUE JOHN , FELDMAN ARKADY , LI ZHUOYUN
IPC分类号： H01L31/18 , H01L21/66 , H01L31/042
CPC分类号： G01N21/33 , G01N21/31 , H02S50/10 , Y02E10/52
摘要： A system for measuring a characteristic of a solar cell is disclosed and includes a light source irradiating an optical signal having a spectral range from about 100nm to about 3000nm, a wavelength selector configured to selectively narrow the spectral range of the optical signal, a beam splitter, a reference detector in optical communication with the beam splitter and configured to measure a characteristic of the optical signal, a specimen irradiated with the optical signal, a reflectance detector in optical communication with the specimen via the beam splitter and configured to measure an optical characteristic of the optical signal reflected by the specimen, a multiplexer in communication with at least one of the reference detector, specimen, and reflectance detector, and a processor in communication with at least one of the reference detector, specimen, and reflectance detector via the multiplexer and configured to calculate at least one characteristic of the specimen.
摘要翻译：公开了一种用于测量太阳能电池的特性的系统，其包括：光源，其照射具有约100nm至约3000nm的光谱范围的光信号;波长选择器，用于选择性地缩小光信号的光谱范围;分束器，与分束器光学通信的参考检测器，其被配置为测量光信号的特性，照射光信号的样本，经由分束器与样本光学通信的反射检测器，并且被配置为测量光学特性由检体反射的光信号，与参考检测器，样本和反射检测器中的至少一个通信的多路复用器，以及经由多路复用器与参考检测器，样本和反射检测器中的至少一个通信的处理器并且被配置为计算所述样本的至少一个特性。

5. 发明申请

WO2003083911A1 A SYSTEM AND METHOD FOR DETERMINING THE STATE OF A FILM IN A PLASMA REACTOR USING AN ELECTRICAL PROPERTY 审中-公开
标题翻译：用于确定使用电气性能的等离子体反应器中的膜的状态的系统和方法
公开(公告)号：WO2003083911A1
公开(公告)日：2003-10-09
申请号：PCT/US2003/008679
申请日：2003-03-28
申请人： TOKYO ELECTRON LIMITED , DONOHUE, John
发明人： DONOHUE, John
IPC分类号： H01L21/00
CPC分类号： H01J37/32082 , H01J37/32935
摘要： The present invention describes a system and method for monitoring a material film within a plasma processing device. The plasma processing device comprises a plasma reactor formed by a reactor wall and an electrode, a RF generator to couple electrical energy to the electrode, an impedance match network to maximize the transfer of electrical energy from the RF generator to the plasma through the electrode, and an electrical measurement device for measuring an electrical property of the plasma processing device. The present invention further provides a method of monitoring the state of the wall film comprising the steps of energizing the electrode by coupling electrical energy from the RF generator through the impedance match network to the electrode and forming a plasma, measuring an electrical property between the RF generator and the electrode, and determining a state of the film on the reactor wall, wherein the determining includes correlating an electrical property with the state of the wall film. In addition, the present invention provides a method for determining a time for scheduling at least one of a cleaning process and a maintenance process for the plasma reactor when the state of the film exceeds a threshold value.
摘要翻译：本发明描述了一种用于监测等离子体处理装置内的材料膜的系统和方法。等离子体处理装置包括由反应器壁和电极形成的等离子体反应器，将电能耦合到电极的RF发生器，阻抗匹配网络，以最大化通过电极从RF发生器到等离子体的电能传递，以及用于测量等离子体处理装置的电性能的电气测量装置。本发明还提供一种监测壁膜状态的方法，包括以下步骤：通过将来自RF发生器的电能通过阻抗匹配网络耦合到电极并形成等离子体来激发电极，测量RF 发电机和电极，以及确定反应器壁上的膜的状态，其中确定包括将电性能与壁膜的状态相关联。此外，本发明提供了一种当薄膜的状态超过阈值时，确定用于调度等离子体电抗器的清洁处理和维护处理中的至少一个的时间的方法。

6. 发明授权

US656016A Ball-bearing sheave. 失效
标题翻译：球轴承。
公开(公告)号：US656016A
公开(公告)日：1900-08-14
申请号：US1900016253
申请日：1900-05-11
申请人： DONOHUE JOHN T
发明人： DONOHUE JOHN T
CPC分类号： F16C13/006

7. 发明授权

US2535051A Adjustable centering gauge 失效
标题翻译：可调式定中心
公开(公告)号：US2535051A
公开(公告)日：1950-12-26
申请号：US70836746
申请日：1946-11-07
申请人： DONOHUE JOHN F
发明人： DONOHUE JOHN F
IPC分类号： G01B5/252
CPC分类号： G01B5/252

8. 发明授权

US1094136A Hinge. 失效
公开(公告)号：US1094136A
公开(公告)日：1914-04-21
申请号：US1913764814
申请日：1913-05-01
申请人： DONOHUE JOHN H
发明人： DONOHUE JOHN H
CPC分类号： E05D7/0415 , Y10T16/5324

9. 发明授权

US851225A Picking-cam for looms. 失效
标题翻译：摄影机。
公开(公告)号：US851225A
公开(公告)日：1907-04-23
申请号：US1905280103
申请日：1905-09-25
申请人： JAMES EASTHAM , DONOHUE JOHN F
发明人： DONOHUE JOHN F
CPC分类号： D03D49/24

10. 发明授权

US2462075A T square gauge 失效
标题翻译： T平方尺
公开(公告)号：US2462075A
公开(公告)日：1949-02-22
申请号：US70836646
申请日：1946-11-07
申请人： DONOHUE JOHN F
发明人： DONOHUE JOHN F
IPC分类号： G01B3/56
CPC分类号： G01B3/566

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