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    • 15. 发明申请
    • Measuring plasma uniformity in-situ at wafer level
    • 在晶圆级原位测量等离子体均匀性
    • US20040021094A1
    • 2004-02-05
    • US10258606
    • 2003-06-02
    • Wayne L JohnsonMaolin Long
    • H01J037/30H01J037/244
    • H01J37/32935
    • An apparatus and method for measuring plasma uniformity and RF uniformity within a plasma chamber. A measurement device is provided within the plasma chamber, where the measurement device includes an electrically conductive surrogate wafer (10) including a planar end wall (12) that is exposed to plasma within the plasma chamber and a printed circuit substrate (20) positioned within the surrogate wafer. The end wall has an aperture (18), and the printed circuit substrate has an ion current collector (26) aligned with the aperture in the end wall. The ion current collector preferably extends within the aperture in the end wall, and the ion current collector has an exposed planar surface that is coplanar with an outer surface of the planar end wall. The device measures ion current flux using the ion current collector, and tramsmits data from the ion current collector to a receiver located outside of the plasma chamber. The data from the ion current collectors is transmitted using an optical transmitter (50) mounted on the printed circuit substrate and connected to the ion current collector by an electronic circuit element (58).
    • 一种用于测量等离子体室内的等离子体均匀性和RF均匀性的装置和方法。 测量装置设置在等离子体室内,其中测量装置包括导电代用晶片(10),该导电代用晶片(10)包括暴露于等离子体室内的等离子体的平面端壁(12)和位于等离子体室内的印刷电路基板(20) 替代晶片。 端壁具有孔(18),并且印刷电路基板具有与端壁中的孔对准的离子集电器(26)。 离子集电体优选地在端壁中的孔内延伸,并且离子集电器具有与平面端壁的外表面共面的暴露平面。 该装置使用离子集电器测量离子电流通量,并将数据从离子集电器传送到位于等离子体室外部的接收器。 来自离子集电体的数据使用安装在印刷电路基板上的光发送器(50)传送,并通过电子电路元件(58)与离子集电体连接。