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11. 发明授权

US5420331A Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same 失效
公开(公告)号：US5420331A
公开(公告)日：1995-05-30
申请号：US223115
申请日：1994-04-05
申请人： Yuji Ueda , Naoki Takeyama , Hiromi Ueki , Takehiro Kusumoto
发明人： Yuji Ueda , Naoki Takeyama , Hiromi Ueki , Takehiro Kusumoto
IPC分类号： C07C68/06 , C07C69/96 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： C07C69/96 , G03F7/0045 , Y10S430/106 , Y10S430/11 , Y10S430/121 , Y10S430/122
摘要： This invention provides a process for producing a cyclic carbonate compound represented by the following formula (5): ##STR1## or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.

12. 发明授权

US5397679A Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same 失效
标题翻译：环状碳酸酯化合物，其制造方法和使用其的正性光致抗蚀剂组合物
公开(公告)号：US5397679A
公开(公告)日：1995-03-14
申请号：US44482
申请日：1993-04-09
申请人： Yuji Ueda , Naoki Takeyama , Hiromi Ueki , Takehiro Kusumoto
发明人： Yuji Ueda , Naoki Takeyama , Hiromi Ueki , Takehiro Kusumoto
IPC分类号： C07C68/06 , C07C69/96 , G03F7/004 , G03F7/039 , H01L21/027 , G03C1/492
CPC分类号： C07C69/96 , G03F7/0045 , Y10S430/106 , Y10S430/11 , Y10S430/121 , Y10S430/122
摘要： This invention provides a process for producing a cyclic carbonate compound represented by the following formula (5): ##STR1## or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.
摘要翻译：本发明提供一种制备由下式（5）表示的环状碳酸酯化合物的方法：作为化学放大型正性光致抗蚀剂中使用的溶解抑制剂，以及阳离子包含所述环状碳酸酯化合物，碱溶性树脂和光致酸性前体的光致抗蚀剂组合物。该组合物提供了在分辨率，轮廓，灵敏度等性能方面优异的正性光致抗蚀剂。

13. 发明授权

US5362598A Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye 失效
标题翻译：醌基二氮化物光刻胶组合物，含有碱溶性树脂和紫外线吸收染料
公开(公告)号：US5362598A
公开(公告)日：1994-11-08
申请号：US132230
申请日：1993-10-06
申请人： Naoki Takeyama , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa
发明人： Naoki Takeyama , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa
IPC分类号： G03F7/09 , G03F7/023 , G03C1/61
CPC分类号： G03F7/091
摘要： A photoresist composition which comprises a compound of the general formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different and represent a hydrogen atom, a hydroxyl group, --OCOR.sub.4, --O--R.sub.5, --OSi(R.sub.6).sub.3, a halogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted phenyl group or an optionally substituted aralkyl group; R.sub.4, R.sub.5 and R.sub.6 represent an optionally substituted lower alkyl group or an optionally substituted phenyl group; X and Y are the same or different and represent --CN, --COOR.sub.7, --CONR.sub.8 R.sub.9, ##STR2## R.sub.7 represents an alkyl group; R.sub.8 and R.sub.9 are the same or different and represent a hydrogen atom, an optionally substituted alkyl or phenyl group; R.sub.10 represents a hydrogen atom, an optionally substituted alkyl group or a hydroxyl group; and a is a number of 1 to 2, which is suitable for forming fine patterns having high resolution on a substrate having high reflectance.
摘要翻译：一种光致抗蚀剂组合物，其包含以下通式的化合物：其中R 1，R 2和R 3相同或不同，表示氢原子，羟基，-OCOR 4，-O-R 5，-OSi（ R6）3，卤素原子，任选取代的烷基，任选取代的烯基，任选取代的苯基或任选取代的芳烷基; R4，R5和R6表示任选取代的低级烷基或任意取代的苯基; X和Y相同或不同，表示-CN，-COOR 7，-CONR 8 R 9，R 7表示烷基; R8和R9相同或不同，表示氢原子，任意取代的烷基或苯基; R 10表示氢原子，任选取代的烷基或羟基; a为1〜2，适合于在高反射率的基板上形成分辨率高的精细图案。

14. 发明授权

US5198323A Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component 失效
标题翻译：含有碱可溶性树脂，1,2-二酮双环化合物和抗高温组分的耐腐蚀组合物
公开(公告)号：US5198323A
公开(公告)日：1993-03-30
申请号：US694372
申请日：1991-04-30
申请人： Teijiro Kitao , Masaru Matsuoka , Ryotaro Hanawa , Yasunori Uetani , Naoki Takeyama , Takeshi Hioki , Hiroshi Takagaki
发明人： Teijiro Kitao , Masaru Matsuoka , Ryotaro Hanawa , Yasunori Uetani , Naoki Takeyama , Takeshi Hioki , Hiroshi Takagaki
IPC分类号： G03F7/022 , G03F7/09
CPC分类号： G03F7/0226 , G03F7/091 , Y10S430/116 , Y10S430/121 , Y10S430/123
摘要： A resist composition comprising an alkali-soluble resin, a 1,2-quinone diazide compound and a compound of the general formula (I): ##STR1## wherein Z is an oxygen or sulfur atom or a group of the formula: >N--R.sub.4 in which R.sub.4 is a hydrogen atom or an alkyl group; R.sub.1, R.sub.2 and R.sub.3 are the same or different and independently a hydrogen atom, a substituted or unsubstituted alkyl group, a halogen atom, a hydroxyl group, a cyano group or a group of the formula: --OCOR" in which R" is a substituted or unsubstituted alkyl group; and X and Y are independently a cyano group or a group of the formula: ##STR2## --COOR or --CONHR' in R is an alkyl group and R' is a hydrogen atom or an aryl group, which is suitable for the formation of very fine patterns on a substrate having a high reflectance.

15. 发明授权

US5985511A Photoresist composition 失效
标题翻译：光刻胶组成
公开(公告)号：US5985511A
公开(公告)日：1999-11-16
申请号：US764126
申请日：1996-12-12
申请人： Yuko Yako , Naoki Takeyama , Kenji Takahashi
发明人： Yuko Yako , Naoki Takeyama , Kenji Takahashi
IPC分类号： G03F7/004 , G03F7/023 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/121 , Y10S430/125
摘要： A positive photoresist composition having excellent various performances (e.g. resolution, resistance to time delay effect, profile), small PEB dependence as well as excellent sensitivity, film retention and coatability, which comprises a polyvinylphenol resin whose phenolic hydroxyl group is partially protected; a sulfonate of a N-hydroxyimide compound as an acid generator; an amine compound; and an electron donor having a redox potential of not more than 1.7 eV is provided.
摘要翻译：具有优异的各种性能（例如分辨率，耐时间延迟效应，轮廓），PEB依赖性小以及优异的灵敏度，膜保留性和涂布性的正性光致抗蚀剂组合物，其包含酚羟基被部分保护的聚乙烯基苯酚树脂; 作为酸发生剂的N-羟基酰亚胺化合物的磺酸盐; 胺化合物; 并且提供氧化还原电位不超过1.7eV的电子给体。

16. 发明授权

US5800966A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US5800966A
公开(公告)日：1998-09-01
申请号：US44487
申请日：1993-04-09
申请人： Yuji Ueda , Naoki Takeyama , Hiromi Ueki , Takehiro Kusumoto
发明人： Yuji Ueda , Naoki Takeyama , Hiromi Ueki , Takehiro Kusumoto
IPC分类号： G03F7/004 , G03F7/023 , G03C1/725
CPC分类号： G03F7/0045 , G03F7/0236
摘要： This invention provides a positive photoresist composition comprising an alkali-soluble resin, a dissolution inhibitor and a photo-induced acid precursor, wherein said alkali-soluble resin is obtainable through a condensation reaction of a compound represented by the general formula (I): ##STR1## wherein R.sub.1 to R.sub.9 each represent hydrogen atom, halogen atom, alkyl group, alkenyl group, --OH group or the like, provided that at least one of R.sub.1 to R.sub.9 is --OH group and at least two hydrogen atoms are attached to the o- or p-position of the --OH group, and an aldehyde. This positive photoresist composition is excellent in performances such as resolution, profile, sensitivity, etc.
摘要翻译：本发明提供一种正型光致抗蚀剂组合物，其包含碱溶性树脂，溶解抑制剂和光诱导酸前体，其中所述碱溶性树脂可通过通式（I）表示的化合物的缩合反应获得：其中，R 1〜R 9分别表示氢原子，卤素原子，烷基，链烯基，-OH基等，但如果R 1〜R 9中的至少一个为-OH基且至少2个氢原子为连接到-OH基团的邻位或对位，和醛。该正性光致抗蚀剂组合物的分辨率，外形，灵敏度等性能优异。

17. 发明授权

US5585218A Photoresist composition containing alkyletherified polyvinylphenol 失效
标题翻译：含有烷基醚化聚乙烯基苯酚的光刻胶组合物
公开(公告)号：US5585218A
公开(公告)日：1996-12-17
申请号：US249237
申请日：1994-05-25
申请人： Yuko Nakano , Naoki Takeyama , Yuji Ueda , Takehiro Kusumoto , Hiromi Oka
发明人： Yuko Nakano , Naoki Takeyama , Yuji Ueda , Takehiro Kusumoto , Hiromi Oka
IPC分类号： G03F7/004 , G03C1/73
CPC分类号： G03F7/0045 , Y10S430/121 , Y10S430/122 , Y10S430/125
摘要： A negative or positive photoresist composition which comprises an alkali soluble resin containing at least one resin selected from the group consisting of a partially alkyletherified polyvinylphenol and a partially alkyletherified hydrogenated polyvinylphenol, a photo-induced acid precursor containing at least a kind of sulfonic acid ester of N-hydroxyimide compounds and crosslinking agent or dissolution inhibitor, and this photoresist composition is excellent in various properties such as heat resistance, film thickness retention, coating property, profile and the like, and further exhibits high sensitivity and high resolution when far ultraviolet rays including excimer laser is used as the light source. It also hardly cause a scam during the developing process.
摘要翻译：一种负性或正性光致抗蚀剂组合物，其包含含有至少一种选自部分烷基醚化的聚乙烯基苯酚和部分烷基醚化的氢化聚乙烯基苯酚的碱溶性树脂，光致酸性前体，其含有至少一种磺酸酯 N-羟基酰亚胺化合物和交联剂或溶解抑制剂，该光致抗蚀剂组合物在耐热性，膜厚保持性，涂布性，轮廓等各种性能方面优异，并且当远紫外线包括准分子激光器被用作光源。在开发过程中也不会造成骗局。

18. 发明授权

US06656660B1 Resist composition 有权
标题翻译：抗蚀组成
公开(公告)号：US06656660B1
公开(公告)日：2003-12-02
申请号：US09492389
申请日：2000-01-27
申请人： Fumiyoshi Urano , Hirotoshi Fujie , Naoki Takeyama , Koji Ichikawa
发明人： Fumiyoshi Urano , Hirotoshi Fujie , Naoki Takeyama , Koji Ichikawa
IPC分类号： G03C700
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106
摘要： A resist composition comprising (a) at least two kinds of polymers which become alkali-soluble by the action of an acid, (b) as a photoacid generator, a combination of an alkylsulfonyl diazomethane compound and a triarylsulfonium arylsulfonate compound or a diaryliodonium arylsulfonate compound, and (c) a solvent is excellent as a chemically amplified resist composition to give excellent pattern shape and very fine line-and-space, particularly when exposed to lights having a wavelength of 300 nm or less.
摘要翻译：抗蚀剂组合物，其包含（a）至少两种通过酸作为碱溶性的聚合物，（b）作为光酸产生剂，烷基磺酰基重氮甲烷化合物和三芳基锍芳基磺酸盐化合物或二芳基碘鎓芳基磺酸盐化合物的组合，和（c）作为化学增幅抗蚀剂组合物的溶剂是优异的，具有优异的图案形状和非常细的线间距，特别是当暴露于波长为300nm以下的光时。

19. 发明授权

US06329119B1 Negative type resist composition 有权
标题翻译：负型抗蚀剂组合物
公开(公告)号：US06329119B1
公开(公告)日：2001-12-11
申请号：US09559646
申请日：2000-04-28
申请人： Masumi Suetsugu , Takehiro Kusumoto , Naoki Takeyama , Masanori Shinada
发明人： Masumi Suetsugu , Takehiro Kusumoto , Naoki Takeyama , Masanori Shinada
IPC分类号： G03F7004
CPC分类号： G03F7/038 , C08F8/30 , C08F12/26 , C08F293/005 , C08F297/02 , C08F297/026 , C08L53/00 , G03F7/0045 , Y10S430/122 , C08F12/24 , C08L2666/02
摘要： A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability: is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I) wherein, A represents bivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group, sulfide group, or disulfide group, X represents nitrogen atom or C(NH2), and R1 and R2 independently represent hydrogen or alkyl.
摘要翻译：提供负型抗蚀剂组合物，提供优异的分辨率，令人满意的轮廓和出色的工艺稳定性：适用于使用深紫外线的曝光; 并且包含碱溶性树脂，酸产生剂，交联剂和由下式（I）表示的碱性化合物，其中A表示可以任选地被亚氨基，硫醚基或二硫键中断的二价脂族烃残基，X表示氮原子或C（NH 2），并且R 1和R 2独立地表示氢或烷基。

20. 发明授权

US5965748A Succinimide derivative, process for production and use thereof 失效
标题翻译：琥珀酰亚胺衍生物，其制备方法和用途
公开(公告)号：US5965748A
公开(公告)日：1999-10-12
申请号：US54476
申请日：1998-04-03
申请人： Akira Kamabuchi , Naoki Takeyama , Jun Tomioka , Haruyoshi Osaki
发明人： Akira Kamabuchi , Naoki Takeyama , Jun Tomioka , Haruyoshi Osaki
IPC分类号： C07D207/46
CPC分类号： C07D207/46 , Y02P20/55
摘要： N-(10-camphorsulfonyloxy)-succinimide represented by the formula (I): ##STR1## is provided, which can be produced by reacting N-hydroxysuccinimide with 10-camphorsulfonic acid, a salt thereof or a halide thereof. Using the compound as an acid generating agent, a resist composition can be obtained by including an alkali-soluble resin having a protective group removable by the action of an acid; and the resist composition is excellent in heat resistance, ratio of residual film thickness after developing, uniformity of film thickness, profile, photospeed and resolution and is improved in the time delay effect and attachment of pattern.
摘要翻译：提供由式（I）表示的N-（10-樟脑磺酰氧基） - 琥珀酰亚胺，其可以通过N-羟基琥珀酰亚胺与10-樟脑磺酸，其盐或其卤化物反应制备。使用该化合物作为酸发生剂，可以通过包括具有通过酸的作用除去的保护基的碱溶性树脂来获得抗蚀剂组合物; 并且抗蚀剂组合物具有优异的耐热性，显影后的残留膜厚度的比例，膜厚度的均匀性，轮廓，感光度和分辨率，并且在时间延迟效应和图案的附着方面得到改善。

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