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11. 发明授权

US07705298B2 System and method to determine focus parameters during an electron beam inspection 有权
标题翻译：在电子束检查期间确定焦点参数的系统和方法
公开(公告)号：US07705298B2
公开(公告)日：2010-04-27
申请号：US11939530
申请日：2007-11-13
申请人： Xuedong Liu , Zhonghua Dong , Wei Fang , Zhong-Wei Chen
发明人： Xuedong Liu , Zhonghua Dong , Wei Fang , Zhong-Wei Chen
IPC分类号： H01J37/28 , H01J37/21 , H01J3/14
CPC分类号： H01J37/28 , H01J37/21 , H01J2237/14 , H01J2237/216 , H01J2237/2817
摘要： This invention relates to apparatus and method to fast determine focus parameters in one pre-scan during an e-beam inspection practice. More specifically, embodiments of the present invention provide an apparatus and method that provide accurate focus tuning after primary focusing has been done.
摘要翻译：本发明涉及在电子束检查实践期间快速确定一次预扫描中的焦点参数的装置和方法。更具体地，本发明的实施例提供了一种在进行主要聚焦之后提供精确聚焦调谐的装置和方法。

12. 发明授权

US06392231B1 Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method 有权
公开(公告)号：US06392231B1
公开(公告)日：2002-05-21
申请号：US09513306
申请日：2000-02-25
申请人： Zhong-Wei Chen
发明人： Zhong-Wei Chen
IPC分类号： H01J37141
CPC分类号： H01J37/28 , H01J37/141 , H01J2237/04756 , H01J2237/1035
摘要： A swinging objective retarding immersion lens system and method therefore which provide a low voltage electron beam with high beam current, relatively high spatial resolution, a relative large scan field, and high signal collection efficiency. The objective lens includes a magnetic lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, an electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen; a deflection system including a plurality of deflection units situated along the beam axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the magnetic lens; and a annular detection unit with a relatively small aperture, located underneath the primary beam define aperture, to capture secondary electron (SE) and backscattered electrons (BSE).

13. 发明申请

US20090315444A1 THERMAL FIELD EMISSION CATHODE 有权
标题翻译：热场发射阴极
公开(公告)号：US20090315444A1
公开(公告)日：2009-12-24
申请号：US12145036
申请日：2008-06-24
申请人： Zhong-Wei Chen , Juying Dou
发明人： Zhong-Wei Chen , Juying Dou
IPC分类号： H01J19/24
CPC分类号： H01J37/063 , H01J1/16 , H01J3/027 , H01J37/065 , H01J2237/06316 , H01J2237/06375
摘要： A thermal field emission cathode which is employed in an electron microscope, a critical dimension examine tool, an electron beam lithograph machine, an electron beam tester and other electron beam related systems as an electron source is disclosed. Embodiments disclose changing coating shape, coating position and shorten emitter length to extend the lifetime of the field emission cathode.
摘要翻译：公开了一种在电子显微镜中使用的热场发射阴极，临界尺寸检查工具，电子束光刻机，电子束测试仪和其他电子束相关系统作为电子源。实施例公开了改变涂层形状，涂层位置和缩短发射极长度以延长场致发射阴极的寿命。

14. 发明授权

US07335879B2 System and method for sample charge control 有权
标题翻译：样品充电控制系统和方法
公开(公告)号：US07335879B2
公开(公告)日：2008-02-26
申请号：US11203674
申请日：2005-08-12
申请人： Zhong-Wei Chen
发明人： Zhong-Wei Chen
IPC分类号： G01N23/00
CPC分类号： H01J37/026 , G01R31/307 , H01J2237/0044 , H01J2237/0048 , H01J2237/2817
摘要： A system and method for characterizing and charging a sample. The system includes a vacuum chamber, a first apparatus in the vacuum chamber and configured to characterize a sample, and a second apparatus in the vacuum chamber and configured to charge the sample. The second apparatus includes an electron gun configured to provide an electron beam to the sample and including an emission cathode biased to a first voltage relative to a reference voltage, a sample holder configured to support the sample, and a mesh located between the electron gun and the sample holder. Additionally, the second apparatus includes a first voltage supply configured to bias the mesh to a second voltage relative to the sample holder, and a second voltage supply configured to bias the sample holder to a third voltage relative to the reference voltage.
摘要翻译：用于表征和充电样品的系统和方法。该系统包括真空室，真空室中的第一装置，并且构造成表征样品;以及第二装置，其被配置成对样品充电。第二装置包括电子枪，其构造成向样品提供电子束，并且包括相对于参考电压偏置到第一电压的发射阴极，被配置为支撑样品的样品保持器，以及位于电子枪和样品架。另外，第二装置包括配置成相对于样品架保持器将网状物偏压到第二电压的第一电压源，以及配置为将样品架保持器相对于参考电压偏置到第三电压的第二电压源。

15. 发明申请

US20080006771A1 ELECTRON BEAM APPARATUS TO COLLECT SIDE-VIEW AND/OR PLANE-VIEW IMAGE WITH IN-LENS SECTIONAL DETECTOR 有权
标题翻译：用电子束装置收集侧视图和/或平面视图与内窥镜部分检测器
公开(公告)号：US20080006771A1
公开(公告)日：2008-01-10
申请号：US11755705
申请日：2007-05-30
申请人： Chi-Hua Tseng , Zhong-Wei Chen , Xuedong Liu
发明人： Chi-Hua Tseng , Zhong-Wei Chen , Xuedong Liu
IPC分类号： G01N23/00
CPC分类号： G01N23/225 , H01J37/244 , H01J37/28 , H01J2237/24465 , H01J2237/2449
摘要： An electron beam apparatus and method are presented for collecting side-view and plane-view SEM imagery. The electron beam apparatus includes an electron source, some intermediate lenses if needed, an objective lens and an in-lens sectional detector. The electron source will provide an electron beam. The intermediate lenses focus the electron beam further. The objective lens is a combination of an immersion magnetic lens and a retarding electrostatic lens focuses the electron beam onto the specimen surface. The in-lens detector will be divided into two or more sections to collect secondary electrons emanating from the specimen with different azimuth and polar angle so that side-view SEM imagery can be obtained.
摘要翻译：提出了一种用于收集侧视图和平面视图SEM图像的电子束装置和方法。电子束装置包括电子源，如果需要的话，一些中间透镜，物镜和透镜内部分检测器。电子源将提供电子束。中间透镜进一步聚焦电子束。物镜是浸没式磁透镜和阻滞静电透镜的组合，将电子束聚焦在样品表面上。镜片内检测器将被分为两个或多个部分，以收集具有不同方位角和极角的样品发出的二次电子，从而可以获得侧视SEM图像。

16. 发明申请

US20060038126A1 System and method for sample charge control 有权
标题翻译：样品充电控制系统和方法
公开(公告)号：US20060038126A1
公开(公告)日：2006-02-23
申请号：US11203674
申请日：2005-08-12
申请人： Zhong-Wei Chen
发明人： Zhong-Wei Chen
IPC分类号： G21K7/00
CPC分类号： H01J37/026 , G01R31/307 , H01J2237/0044 , H01J2237/0048 , H01J2237/2817
摘要： A system and method for characterizing and charging a sample. The system includes a vacuum chamber, a first apparatus in the vacuum chamber and configured to characterize a sample, and a second apparatus in the vacuum chamber and configured to charge the sample. The second apparatus includes an electron gun configured to provide an electron beam to the sample and including an emission cathode biased to a first voltage relative to a reference voltage, a sample holder configured to support the sample, and a mesh located between the electron gun and the sample holder. Additionally, the second apparatus includes a first voltage supply configured to bias the mesh to a second voltage relative to the sample holder, and a second voltage supply configured to bias the sample holder to a third voltage relative to the reference voltage.
摘要翻译：用于表征和充电样品的系统和方法。该系统包括真空室，真空室中的第一装置，并且构造成表征样品;以及第二装置，其被配置成对样品充电。第二装置包括电子枪，其构造成向样品提供电子束，并且包括相对于参考电压偏置到第一电压的发射阴极，被配置为支撑样品的样品保持器，以及位于电子枪和样品架。另外，第二装置包括配置成相对于样品架保持器将网状物偏压到第二电压的第一电压源，以及配置为将样品架保持器相对于参考电压偏置到第三电压的第二电压源。

17. 发明授权

US5717204A Inspecting optical masks with electron beam microscopy 失效
标题翻译：用电子束显微镜检查光学掩模
公开(公告)号：US5717204A
公开(公告)日：1998-02-10
申请号：US606854
申请日：1996-02-26
申请人： Dan Meisburger , Alan D. Brodie , Zhong-Wei Chen , Jack Y. Jau
发明人： Dan Meisburger , Alan D. Brodie , Zhong-Wei Chen , Jack Y. Jau
IPC分类号： H01J37/28 , H01J37/30 , H01J37/26
CPC分类号： H01J37/28 , H01J37/3005 , H01J2237/2817
摘要： An apparatus scans an electron beam across an optical phase shift mask and automatically inspects the mask to determine the features of the phase shift mask and classification of defects. An electron beam is directed at the surface of a mask for scanning that mask and detectors are provided to measure the secondary and backscattered charged particles from the surface of the mask. The mask is mounted on an x - y stage to provide it with at least one degree of freedom while the mask is being scanned by the electron beam. By analysis of various waveform features in each of the secondary and backscatter electron waveforms obtained from a phase shift mask, various physical features of the mask can be detected, as well as their size and position determined. The thickness of chromium layers can also be determined. In the inspection configuration, there is also a comparison technique for comparing the pattern on the substrate with a second pattern for error detection.
摘要翻译：一种装置通过光学相移掩模扫描电子束，并自动检查掩模以确定相移掩模的特征和缺陷的分类。电子束指向掩模的表面以扫描该掩模，并且提供检测器以从掩模的表面测量次级和背散射带电粒子。掩模安装在x-y平台上，以在掩模被电子束扫描时提供至少一个自由度。通过分析从相移掩模获得的每个次要和反向散射电子波形中的各种波形特征，可以检测掩模的各种物理特征以及它们的尺寸和位置。也可以确定铬层的厚度。在检查配置中，还存在用于比较衬底上的图案与用于错误检测的第二图案的比较技术。

18. 发明授权

US08218284B2 Apparatus for increasing electric conductivity to a semiconductor wafer substrate when exposure to electron beam 有权
标题翻译：用于在暴露于电子束时增加对半导体晶片衬底的导电性的装置
公开(公告)号：US08218284B2
公开(公告)日：2012-07-10
申请号：US12179560
申请日：2008-07-24
申请人： Zhong-Wei Chen , Yi Xiang Wang , Juying Dou
发明人： Zhong-Wei Chen , Yi Xiang Wang , Juying Dou
IPC分类号： H01L21/683 , B23B31/28
CPC分类号： H01J37/026 , B82Y10/00 , B82Y40/00 , H01J37/20 , H01J37/3174 , H01J2237/0044 , H01J2237/2817 , Y10T279/17923 , Y10T279/23
摘要： An apparatus for increasing electric conductivity to a wafer substrate when exposures to electron beam irradiation is disclosed. More specifically, a more free mechanical contact between a wafer and electric contact pins (within an electrostatic chuck) is provided to significantly reduce the scratch and damage on the wafer backside.
摘要翻译：公开了当暴露于电子束照射时增加晶片衬底的导电性的装置。更具体地，提供晶片和电接触销（在静电卡盘内）之间更自由的机械接触，以显着减少晶片背面的划痕和损伤。

19. 发明授权

US08022609B2 Thermal field emission cathode 有权
标题翻译：热场发射阴极
公开(公告)号：US08022609B2
公开(公告)日：2011-09-20
申请号：US12145036
申请日：2008-06-24
申请人： Zhong-Wei Chen , Juying Dou
发明人： Zhong-Wei Chen , Juying Dou
IPC分类号： H01J1/14 , H01J19/08
CPC分类号： H01J37/063 , H01J1/16 , H01J3/027 , H01J37/065 , H01J2237/06316 , H01J2237/06375
摘要： A thermal field emission cathode which is employed in an electron microscope, a critical dimension examine tool, an electron beam lithograph machine, an electron beam tester and other electron beam related systems as an electron source is disclosed. Embodiments disclose changing coating shape, coating position and shorten emitter length to extend the lifetime of the field emission cathode.
摘要翻译：公开了一种在电子显微镜中使用的热场发射阴极，临界尺寸检查工具，电子束光刻机，电子束测试仪和其他电子束相关系统作为电子源。实施例公开了改变涂层形状，涂层位置和缩短发射极长度以延长场致发射阴极的寿命。

20. 发明授权

US07705301B2 Electron beam apparatus to collect side-view and/or plane-view image with in-lens sectional detector 有权
标题翻译：用透镜截面检测器收集侧视图和/或平面视图图像的电子束装置
公开(公告)号：US07705301B2
公开(公告)日：2010-04-27
申请号：US11755705
申请日：2007-05-30
申请人： Chi-Hua Tseng , Zhong-Wei Chen , Xuedong Liu
发明人： Chi-Hua Tseng , Zhong-Wei Chen , Xuedong Liu
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： G01N23/225 , H01J37/244 , H01J37/28 , H01J2237/24465 , H01J2237/2449
摘要： An electron beam apparatus and method are presented for collecting side-view and plane-view SEM imagery. The electron beam apparatus includes an electron source, some intermediate lenses if needed, an objective lens and an in-lens sectional detector. The electron source will provide an electron beam. The intermediate lenses focus the electron beam further. The objective lens is a combination of an immersion magnetic lens and a retarding electrostatic lens focuses the electron beam onto the specimen surface. The in-lens detector will be divided into two or more sections to collect secondary electrons emanating from the specimen with different azimuth and polar angle so that side-view SEM imagery can be obtained.
摘要翻译：提出了一种用于收集侧视图和平面视图SEM图像的电子束装置和方法。电子束装置包括电子源，如果需要的话，一些中间透镜，物镜和透镜内部分检测器。电子源将提供电子束。中间透镜进一步聚焦电子束。物镜是浸没式磁透镜和阻滞静电透镜的组合，将电子束聚焦在样品表面上。镜片内检测器将被分为两个或多个部分，以收集具有不同方位角和极角的样品发出的二次电子，从而可以获得侧视SEM图像。

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