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    • 14. 发明授权
    • Method and system for composing a query for a database and traversing the database
    • 用于组合数据库查询并遍历数据库的方法和系统
    • US07401095B2
    • 2008-07-15
    • US11246341
    • 2005-10-07
    • Victor ChanFen WangMark W. Hubbard
    • Victor ChanFen WangMark W. Hubbard
    • G06F17/00
    • G06F17/30433G06F17/30477Y10S706/922Y10S707/99933Y10S707/99934Y10S707/99935Y10S707/99936Y10S707/99943Y10S707/99945
    • A system and method of composing a query object for application against a database is provided. The method composes a selection clause for the query. Next, a criteria clause for the query is generated, with the criteria clause comprising input criteria related to the query, additional criteria specified against the query, and generated criteria based on a joint relationship. Next a source clause utilizing elements in the database accessed by the query is generated. A database traversal system and method is provided. The method identifies all tables directly accessible by each table and creates a data structure comprising an entry for each table. The entry comprises an identification field for each table and a link field identifying all tables directly accessible by each table. The data structure is traversed and an optimum path of the traversal paths utilizing data obtained from traversing the data structure is identified.
    • 提供了一种组合用于数据库应用的查询对象的系统和方法。 该方法为查询组成一个选择子句。 接下来,生成查询的条件子句,其中条件子句包括与查询相关的输入条件,针对查询指定的附加条件以及基于联合关系生成的条件。 接下来,生成一个使用查询访问的数据库中的元素的源子句。 提供了数据库遍历系统和方法。 该方法识别每个表可以直接访问的所有表,并创建一个包含每个表的条目的数据结构。 条目包括每个表的标识字段和标识由每个表可直接访问的所有表的链接字段。 遍历数据结构,并且识别遍历数据结构获得的数据的遍历路径的最佳路径。
    • 18. 发明申请
    • Method of applying stresses to PFET and NFET transistor channels for improved performance
    • 向PFET和NFET晶体管通道施加应力以提高性能的方法
    • US20070122982A1
    • 2007-05-31
    • US11657154
    • 2007-01-24
    • Victor ChanYong LeeHaining Yang
    • Victor ChanYong LeeHaining Yang
    • H01L21/8234
    • H01L29/7843H01L21/823807H01L29/665
    • A method is provided for fabricating a semiconductor device structure. In such method a p-type field effect transistor (PFET) and an n-type field effect transistor (NFET), each of the NFET and the PFET having a conduction channel disposed in a single-crystal semiconductor region of a substrate. A stressed film having a compressive stress at a first magnitude can be formed to overlie the PFET and the NFET. Desirably, a mask is formed to cover the PFET while exposing the NFET, after which, desirably, a portion of the stressed film overlying the NFET is subjected to ion implantation, while the mask protects another portion of the stressed film overlying the PFET from the ion implantation. The substrate can then be annealed, whereby, desirably, the compressive stress of the implanted portion of the stressed film is much reduced from the first magnitude by the annealing. In such way, the implanted portion of the stressed film overlying the NFET desirably imparts one of a much reduced magnitude compressive stress, a zero stress and a tensile stress to the conduction channel of the NFET. Another portion of the stressed film can continue to impart the compressive stress at the first magnitude to the conduction channel of the PFET.
    • 提供了制造半导体器件结构的方法。 在这种方法中,p型场效应晶体管(PFET)和n型场效应晶体管(NFET),NFET和PFET中的每一个具有设置在基板的单晶半导体区域中的导电沟道。 可以形成具有第一大小的压应力的应力膜覆盖在PFET和NFET上。 期望地,形成掩模以在暴露NFET的同时覆盖PFET,之后理想地,覆盖NFET的应力膜的一部分经受离子注入,而掩模保护覆盖PFET的应力膜的另一部分与 离子注入。 然后可以对衬底进行退火,因此期望地,应力膜的注入部分的压缩应力通过退火从第一量级大大降低。 以这种方式,覆盖NFET的应力膜的注入部分期望地将大大减小的压缩应力,零应力和拉伸应力中的一个施加到NFET的传导通道。 应力膜的另一部分可以继续将第一大小的压应力赋予PFET的传导通道。
    • 19. 发明申请
    • MECHANICAL STRESS CHARACTERIZATION IN SEMICONDUCTOR DEVICE
    • 半导体器件中的机械应力特性
    • US20070056380A1
    • 2007-03-15
    • US11162295
    • 2005-09-06
    • Victor ChanKhee Lim
    • Victor ChanKhee Lim
    • G01B7/16
    • G01R31/2648
    • Methods of characterizing a mechanical stress level in a stressed layer of a transistor and a mechanical stress characterizing test structure are disclosed. In one embodiment, the test structure includes a first test transistor including a first stress level; and at least one second test transistor having a substantially different second stress level. A testing circuit can then be used to characterize the mechanical stress level by comparing performance of the first test transistor and the at least one second test transistor. The type of test structure depends on the integration scheme used. In one embodiment, at least one second test transistor is provided with a substantially neutral stress level and/or an opposite stress level from the first stress level. The substantially neutral stress level may be provided by either rotating the transistor, removing the stressed layer causing the stress level or de-stressing the stressed layer causing the stress layer.
    • 公开了在晶体管的应力层中表征机械应力水平的方法和机械应力表征测试结构。 在一个实施例中,测试结构包括包括第一应力水平的第一测试晶体管; 以及至少一个具有基本上不同的第二应力水平的第二测试晶体管。 然后可以通过比较第一测试晶体管和至少一个第二测试晶体管的性能来测试电路来表征机械应力水平。 测试结构的类型取决于所使用的集成方案。 在一个实施例中,至少一个第二测试晶体管具有基本上中性的应力水平和/或与第一应力水平相反的应力水平。 基本中性的应力水平可以通过旋转晶体管来提供,去除施加应力的应力层,或者使应力层的应力层解除应力层。