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11. 发明申请

US20110215675A1 Piezoelectric Oscillator and Ultrasonic Motor 有权
标题翻译：压电振荡器和超声波电机
公开(公告)号：US20110215675A1
公开(公告)日：2011-09-08
申请号：US13108292
申请日：2011-05-16
申请人： Hiroshi Asano
发明人： Hiroshi Asano
IPC分类号： H02N2/16
CPC分类号： H02N2/166
摘要： A piezoelectric oscillator that generates a travelling wave using two B (1, n) mode (n is a natural number) standing waves that are out of phase with each other by 90°. On a lower surface of an oscillating body, (4/3)n piezoelectric elements are provided in order to generate an n-wave travelling wave by combining the two B (1, n) mode standing waves that are out of phase with each other by 90°. When a wavelength of the travelling wave is given by λ, each of the piezoelectric elements has a dimension in a circumferential direction occupying a central angle corresponding to (1/2)λθ, and a plurality of piezoelectric elements are spaced apart from each other at intervals each occupies a central angle corresponding to (1/4)λθ.
摘要翻译：使用彼此相差90°的两个B（1，n）模式（n为自然数）的驻波产生行波的压电振荡器。在振荡体的下表面上，设置（4/3）n个压电元件，以便通过组合彼此不同相的两个B（1，n）模式驻波来产生n波行波 90°。当行波的波长由λ给出时，每个压电元件的圆周方向的尺寸占据对应于（1/2）λ＆thetas的中心角;并且多个压电元件彼此间隔开间隔每个占据对应于（1/4）λ＆thetas的中心角。

12. 发明申请

US20100214329A1 PLASMA DISPLAY DEVICE 审中-公开
标题翻译：等离子体显示设备
公开(公告)号：US20100214329A1
公开(公告)日：2010-08-26
申请号：US12598312
申请日：2009-04-14
申请人： Mitsuhiro Murata , Yusuke Fukui , Toshikazu Wakabayashi , Hiroshi Asano
发明人： Mitsuhiro Murata , Yusuke Fukui , Toshikazu Wakabayashi , Hiroshi Asano
IPC分类号： G09G5/10 , G09G3/28
CPC分类号： H01J11/12 , G09G3/2927 , G09G3/2965 , G09G2310/066 , H01J11/40
摘要： The protective layer of the plasma display device is formed of a base protective layer and a particle layer. The base protective layer is a thin film of magnesium oxide containing at least one of magnesium oxide, strontium oxide, calcium oxide, and barium oxide. The particle layer is formed in a manner that magnesium-oxide single-crystal particles, which have a structure surrounded by the specified two-type orientation face formed of (100) and (111) faces or the specified three-type orientation face formed of (100), (110), and (111) faces, are stuck to the base protective layer. The panel driving circuit drives the panel in a manner that one field period is formed of a first subfield group having a plurality of subfields and a second subfield group having a plurality of subfields temporally disposed after the first subfield group. Each subfield of the first subfield group has initializing period Ti, address period Tw for forming wall charge to generate a sustain discharge, and sustain period Ts. On the other hand, each subfield of the second subfield group has address period Tw for erasing wall discharge necessary for generating a sustain discharge and sustain period Ts.
摘要翻译：等离子体显示装置的保护层由基底保护层和颗粒层形成。基底保护层是包含氧化镁，氧化锶，氧化钙和氧化钡中的至少一种的氧化镁的薄膜。以由（100）和（111）所形成的规定的两个取向面包围的结构的镁氧化物单晶粒子或由（100）和（111）形成的规定的三取向面形成的氧化镁单晶粒子形成为粒子层，（100），（110）和（111）面粘合到基底保护层上。面板驱动电路以一个场周期由具有多个子场的第一子场组和具有时间上设置在第一子场组之后的多个子场的第二子场组形成的方式驱动面板。第一子场组的每个子场具有初始化周期Ti，用于形成壁电荷以产生维持放电的寻址时段Tw和维持周期Ts。另一方面，第二子场组的每个子场具有用于消除用于产生维持放电和维持周期Ts所需的壁放电的寻址周期Tw。

13. 发明申请

US20100118015A1 PLASMA DISPLAY DEVICE 审中-公开
标题翻译：等离子体显示设备
公开(公告)号：US20100118015A1
公开(公告)日：2010-05-13
申请号：US12597967
申请日：2009-04-14
申请人： Mitsuhiro Murata , Takuji Tsujita , Toshikazu Wakabayashi , Hiroshi Asano , Masaharu Terauchi
发明人： Mitsuhiro Murata , Takuji Tsujita , Toshikazu Wakabayashi , Hiroshi Asano , Masaharu Terauchi
IPC分类号： G09G3/28 , G09G5/00
CPC分类号： H01J11/40 , G09G3/2935 , G09G3/2965 , G09G2310/0216 , G09G2310/0218 , H01J11/12
摘要： Protective layer of a plasma display panel has base protective layer and particle layer. Base protective layer is formed of a thin film of metal oxide containing at least one of magnesium oxide, strontium oxide, calcium oxide, and barium oxide. Particle layer is formed by sticking, to base protective layer, single crystal particles of magnesium oxide where the peak at 200 to 300 nm is two or more times that at 300 to 550 nm in a cathode luminescence emission spectrum. The panel driving circuit causes initializing discharge for producing wall charge in the first subfield, of a plurality of subfields, causes address discharge for erasing wall charge in address periods of the plurality of subfields, and drives the panel.
摘要翻译：等离子体显示面板的保护层具有基底保护层和颗粒层。基底保护层由包含氧化镁，氧化锶，氧化钙和氧化钡中的至少一种的金属氧化物的薄膜形成。在阴极发光光谱中，在200〜300nm的峰值为300〜550nm的两倍以上的氧化镁的单晶粒子的基底保护层上形成粒子层。面板驱动电路使得在多个子场中产生第一子场中的壁电荷的初始化放电，在多个子场的寻址周期中引起用于擦除壁电荷的寻址放电，并驱动该面板。

14. 发明申请

US20090127500A1 POLISHING COMPOSITION 审中-公开
标题翻译：抛光组合物
公开(公告)号：US20090127500A1
公开(公告)日：2009-05-21
申请号：US12065423
申请日：2006-09-01
申请人： Tatsuhiko Hirano , Hiroshi Asano , Katsunobu Hori
发明人： Tatsuhiko Hirano , Hiroshi Asano , Katsunobu Hori
IPC分类号： C09K13/00
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1463
摘要： A polishing composition contains a triazole having a 6-membered ring skeleton, a water soluble polymer, an oxidant, and abrasive grains. The triazole has a hydrophobic functional group in the 6-membered ring skeleton. The content of the triazole in the polishing composition is 3 g/L or less. The pH of the polishing composition is 7 or more. The polishing composition is suitably used in polishing for forming wiring of a semiconductor device.
摘要翻译：抛光组合物含有具有6元环骨架的三唑，水溶性聚合物，氧化剂和磨料颗粒。三唑在6元环骨架中具有疏水官能团。研磨用组合物中的三唑的含量为3g / L以下。抛光组合物的pH为7以上。抛光组合物适合用于形成半导体器件的布线的抛光。

15. 发明授权

US07186297B2 Wafer holding apparatus 有权
标题翻译：晶圆保持装置
公开(公告)号：US07186297B2
公开(公告)日：2007-03-06
申请号：US10450654
申请日：2001-12-13
申请人： Hiroshi Asano
发明人： Hiroshi Asano
IPC分类号： H01L21/302
CPC分类号： H01L21/6835 , H01L21/67259 , H01L21/68 , H01L21/68707
摘要： The invention provides a wafer holding apparatus which enables ascertainment of gripping and presence/absence of a wafer through use of single detection means.The apparatus has drive means (2) having a pressing element (8) which advances or recedes in a longitudinal direction; and detection means (9) for detecting advancement/receding of the pressing element (8). When the detection means (9) has detected that the pressing element (8) has advanced to and come to a halt at a predetermined position, the wafer is determined to be properly held. When the detection means (9) has detected that the pressing element (8) has advanced in excess of the predetermined position, the wafer is determined not to be present on the wafer holding apparatus.
摘要翻译：本发明提供一种通过使用单个检测装置能够确定晶片的夹持和存在/不存在的晶片保持装置。该装置具有驱动装置（2），该驱动装置具有沿纵向前进或后退的按压元件（8）以及用于检测按压元件（8）的前进/后退的检测装置（9）。当检测装置（9）检测到按压元件（8）前进到预定位置并停止时，确定晶片被适当地保持。当检测装置（9）检测到按压元件（8）超过预定位置时，确定晶片不存在于晶片保持装置上。

16. 外观设计

USD513457S1 Chair 有权
公开(公告)号：USD513457S1
公开(公告)日：2006-01-10
申请号：US29223899
申请日：2005-02-22
申请人： Hiroshi Asano , Masaru Takahashi
设计人： Hiroshi Asano , Masaru Takahashi

17. 发明授权

US06440186B1 Polishing composition and polishing method employing it 有权
标题翻译：抛光组合物和抛光方法
公开(公告)号：US06440186B1
公开(公告)日：2002-08-27
申请号：US09928996
申请日：2001-08-15
申请人： Kenji Sakai , Hiroshi Asano , Tadahiro Kitamura , Katsuyoshi Ina
发明人： Kenji Sakai , Hiroshi Asano , Tadahiro Kitamura , Katsuyoshi Ina
IPC分类号： C09G102
CPC分类号： C09K3/1463 , C09G1/02 , C09K3/1409 , C23F3/06
摘要： A polishing composition comprising: (a) an abrasives (b) a compound to form a chelate with copper ions (c) a compound to provide a protective layer-forming function to a copper layer, (d) hydrogen peroxide, and (e) water, wherein the abrasive of component (a) has a primary particle size within a range of from 50 to 120 nm.
摘要翻译：一种抛光组合物，包括：（a）研磨剂（b）与铜离子形成螯合物的化合物（c）向铜层提供保护层形成功能的化合物，（d）过氧化氢，和（e）水，其中组分（a）的研磨剂的初级粒度在50至120nm的范围内。

18. 发明授权

US4940450A Power transmission system using toothed belt of engine for vehicle 失效
标题翻译：动力传动系统采用车辆发动机齿带
公开(公告)号：US4940450A
公开(公告)日：1990-07-10
申请号：US313968
申请日：1989-02-17
申请人： Noriyuki Miyamura , Seizo Iwasa , Hiroshi Asano , Isamu Nagai , Hayato Hamada , Shuji Sasaki , Takeshi Kinoshita , Masaru Sui
发明人： Noriyuki Miyamura , Seizo Iwasa , Hiroshi Asano , Isamu Nagai , Hayato Hamada , Shuji Sasaki , Takeshi Kinoshita , Masaru Sui
IPC分类号： F01L1/02 , F02B67/06 , F16H7/02
CPC分类号： F16H7/023 , F01L1/02 , F01L1/024 , F02B67/06 , F01L2001/0535 , F02B2275/06 , F02B2275/20
摘要： A power transmission system transmits rotative power from a driver pulley to a driven pulley through a toothed belt. The tooth tips (27b) and/or tooth bottoms (27c) of teeth of at least the driven pulley (10) lie in a plane including a central axis l.sub.2 of rotation of the driven pulley and are inclined with respect to the central axis l.sub.2. When the toothed belt (14) is operated to transmit the rotative power, the position where teeth of the pulley (10) and teeth of the toothed belt (14) start meshing with each other is progressively displaced, thus lowering the level of impact sounds produced when the teeth mesh with each other.
摘要翻译： PCT No.PCT / JP88 / 00563 Sec。 371日期：1989年2月17日 102（e）日期1989年2月17日PCT Filed 1988年6月13日PCT Pub。出版物WO88 / 10384 日期为1988年12月29日。动力传动系统通过齿形带将旋转动力从驾驶者皮带轮传递到从动皮带轮。至少从动带轮（10）的齿的齿尖（27b）和/或齿底（27c）位于包括从动带轮的旋转中心轴线122并且相对于中心轴线12倾斜的平面。当齿形带（14）被操作以传递旋转动力时，滑轮（10）的齿和齿形带（14）的齿彼此开始啮合的位置逐渐移位，从而降低冲击声的水平当牙齿互相啮合时产生。

19. 发明授权

US4484999A Electrolytic electrodes having high durability 失效
标题翻译：电解电极具有高耐久性
公开(公告)号：US4484999A
公开(公告)日：1984-11-27
申请号：US521764
申请日：1983-08-09
申请人： Hiroshi Asano , Takayuki Shimamune , Hideo Nitta , Ryuta Hirayama
发明人： Hiroshi Asano , Takayuki Shimamune , Hideo Nitta , Ryuta Hirayama
IPC分类号： C25B11/06 , C25B11/04 , C25B11/08 , C25B11/10
CPC分类号： C25B11/0478
摘要： An electrolytic electrode which exhibits high durability when used in electrolysis in which the generation of oxygen is involved and a process for the production of same. The electrolytic electrode comprises (a) an electrode substrate of an electrically-conductive metal; (b) an electrode coating of an electrode active substance; and (c) an intermediate layer provided between the electrode substrate and the electrode coating, said intermediate layer comprising a mixed oxide of (i) an oxide of Ti and/or Sn having a valence number of 4 and (ii) an oxide of Ta and/or Nb having a valence number of 5.
摘要翻译：在涉及氧的产生的电解中使用的耐久性高的电解电极及其制造方法。电解电极包括（a）导电金属的电极基板; （b）电极活性物质的电极涂层; 和（c）设置在电极基板和电极涂层之间的中间层，所述中间层包含（i）Ti和/或Sn的价数为4的氧化物和（ii）Ta的氧化物的混合氧化物和/或价数为5的Nb。

20. 发明申请

US20130324015A1 POLISHING COMPOSITION 有权
标题翻译：抛光组合物
公开(公告)号：US20130324015A1
公开(公告)日：2013-12-05
申请号：US14000319
申请日：2012-02-20
申请人： Hiroshi Asano , Kazusei Tamai , Yasunori Okada
发明人： Hiroshi Asano , Kazusei Tamai , Yasunori Okada
IPC分类号： B24B37/04 , C09G1/02
CPC分类号： B24B37/044 , C09G1/02 , C09K3/1463 , H01L21/02024
摘要： Provided is a polishing composition containing at least aluminum oxide abrasive grains and water, and having a pH of 8.5 or higher. The aluminum oxide abrasive grains have a specific surface area of 20 m2/g or less. It is preferable for the aluminum oxide abrasive grains to have an average secondary particle size of 0.1 μm or more and 20 μm or less. The polishing composition is used for polishing hard and brittle materials having a Vickers hardness of 1,500 Hv or higher, such as sapphire, silicon carbide, and gallium nitride.
摘要翻译：本发明提供至少含有氧化铝磨粒和水，pH值在8.5以上的抛光组合物。氧化铝磨粒的比表面积为20m 2 / g以下。优选氧化铝磨粒的平均二次粒径为0.1μm以上且20μm以下。抛光组合物用于研磨维氏硬度为1500Hv或更高的硬质和脆性材料，例如蓝宝石，碳化硅和氮化镓。

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