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11. 发明授权

US07281869B2 Coating and developing system and coating and developing method 有权
标题翻译：涂层开发系统及涂层开发方法
公开(公告)号：US07281869B2
公开(公告)日：2007-10-16
申请号：US11335635
申请日：2006-01-20
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03B5/00
CPC分类号： H01L21/67184 , H01L21/00 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with a case where antireflection films are formed and a case where any antireflection film is not formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and where no antireflection film is formed. The coating and developing system is controlled by a simple carrying program.
摘要翻译：涂覆显影系统包括：抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。涂覆和显影系统可以应对形成防反射膜的情况以及没有形成任何抗反射膜的情况。成膜单位块，即TCT层，COT层和BCT层，以及显影单元块，即DEV层，在处理块中层叠。在形成防反射膜并且不形成抗反射膜的情况下，TCT层，COT层和BCT层被选择性地使用。涂层和显影系统由简单的携带程序控制。

12. 发明申请

US20060164613A1 Coating and developing system and coating and developing method 有权
公开(公告)号：US20060164613A1
公开(公告)日：2006-07-27
申请号：US11117566
申请日：2005-04-29
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03B27/32
CPC分类号： H01L21/67184 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.

13. 发明申请

US20060162646A1 Coating and developing system and coating and developing method 有权
标题翻译：涂层开发系统及涂层开发方法
公开(公告)号：US20060162646A1
公开(公告)日：2006-07-27
申请号：US11117552
申请日：2005-04-29
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： B05D5/06 , B05C11/02 , B05C13/02
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.
摘要翻译：涂覆显影系统包括：抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。涂层显影系统能够应对形成防反射膜的情况和没有形成任何抗反射膜的情况，并且需要简单的软件。成膜单元块，即TCT层B 3，COT层B 4和BCT层B 5以及显影单元块，即DEV层B 1和B 2，层叠在处理块S 2。在形成防反射膜的情况下，选择性地使用TCT层B 3，COT层B 4和BCT层B 5以及未形成任何抗反射膜的情况。涂层和显影系统由简单的携带程序和简单的软件控制。

14. 发明授权

US06206681B1 Mold for producing resin-molded product 失效
标题翻译：用于生产树脂成型产品的模具
公开(公告)号：US06206681B1
公开(公告)日：2001-03-27
申请号：US09246692
申请日：1999-02-09
申请人： Hajime Kawase , Osamu Sasai , Yasunori Wada , Shinsuke Tsutsui , Hikaru Ito
发明人： Hajime Kawase , Osamu Sasai , Yasunori Wada , Shinsuke Tsutsui , Hikaru Ito
IPC分类号： B28B310
CPC分类号： B29C45/006 , B29C2045/0063 , H01R43/18 , Y10S29/029 , Y10T29/4922
摘要： A movable mold is movable toward and away from a fixed mold so as to close and open the mold. The fixed mold includes an intermediate plate facing a movable-side mold plate. This intermediate plate has a retainer-molding recess which cooperates with the movable-side mold plate to form a retainer-molding cavity, and a core pin, which cooperates with a housing-molding recess to form a housing-molding cavity, is mounted on the intermediate plate. A retainer, molded in the molding cavity, is moved downward by an ejector pin into a position where the retainer is disposed coaxial with a housing. Then, the two molds are again closed together, so that the housing and the retainer are connected together, and then this assembled product is taken out.
摘要翻译：可移动模具可以朝向和远离固定模具移动，以便关闭和打开模具。固定模具包括面向可动侧模板的中间板。该中间板具有与可动侧模板配合以形成保持器成型腔的保持器成型凹部，并且与壳体成型凹部配合以形成壳体成型腔的芯销安装在中间板。模制在模制腔中的保持器通过顶针向下移动到保持器与壳体同轴设置的位置。然后，将两个模具再次关闭在一起，使壳体和保持器连接在一起，然后将该组装的产品取出。

15. 发明授权

US08616925B2 Multi-contact terminal fitting 有权
标题翻译：多接点端子接头
公开(公告)号：US08616925B2
公开(公告)日：2013-12-31
申请号：US13357084
申请日：2012-01-24
申请人： Yutaka Kobayashi , Hikaru Ito
发明人： Yutaka Kobayashi , Hikaru Ito
IPC分类号： H01R13/11
CPC分类号： H01R13/113 , H01R43/16
摘要： A multi-contact terminal fitting (T) has a plurality of resilient contact pieces (40) that extend from a rectangular tubular base (25) and can be brought into contact with an outer peripheral surface of a flat plate-shaped tab (11). The resilient contact pieces (40) extending from parts of the base (25) that have relatively high rigidity are narrow and those extending from less rigid parts of the base (25) are wider.
摘要翻译：多接触端子接头（T）具有从矩形管状基座（25）延伸的多个弹性接触件（40），并可与平板状接头（11）的外周面接触，。从具有较高刚性的基部（25）的部分延伸的弹性接触片（40）较窄，并且从基部（25）的较刚性部分延伸的弹性接触片较宽。

16. 发明申请

US20100236477A1 HEAT TREATMENT APPARATUS, HEAT TREATMENT METHOD, AND RECORDING MEDIUM STORING COMPUTER PROGRAM CARRYING OUT THE SAME 有权
标题翻译：热处理设备，热处理方法和记录中继存储计算机程序
公开(公告)号：US20100236477A1
公开(公告)日：2010-09-23
申请号：US12788981
申请日：2010-05-27
申请人： Hikaru Ito , Shinji Okada , Masami Yamashita
发明人： Hikaru Ito , Shinji Okada , Masami Yamashita
IPC分类号： B05C11/00 , B05C21/00
CPC分类号： C21D9/00 , C21D9/0056 , C21D11/00
摘要： An experiment is conducted in advance, for finding a temperature of a cooling plate attained as a result of balancing between a temperature of a substrate after heat treatment and a temperature of the cooling plate at the time of cooling of the substrate. Then, before heat treatment of a first substrate, the cooling plate is moved to a position above a hot plate, the cooling plate is heated to that temperature, and thereafter heat treatment of the substrate is started.
摘要翻译：预先进行实验，以获得由于热处理后的基板的温度与冷却基板之间的冷却板的温度之间的平衡而获得的冷却板的温度。然后，在热处理第一基板之前，将冷却板移动到加热板上方的位置，将冷却板加热至该温度，然后开始对基板进行热处理。

17. 发明授权

US07245348B2 Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaning 有权
标题翻译：涂层和显影系统以及具有防反射膜和辅助块的检测和清洁的涂层和显影方法
公开(公告)号：US07245348B2
公开(公告)日：2007-07-17
申请号：US11117566
申请日：2005-04-29
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03B27/52
CPC分类号： H01L21/67184 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes an auxiliary block, a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either a case where antireflection films are formed or a case where no antireflection film is formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block S2. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a carrying program.
摘要翻译：涂覆显影系统包括辅助块，抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗蚀剂膜下面的抗反射膜，以及抗反射膜，覆盖抗蚀剂膜空间。涂覆和显影系统可以应对形成防反射膜的情况或不形成抗反射膜的情况。成膜单位块，即TCT层，COT层和BCT层，以及显影单元块，即DEV层，在处理块S2中层叠。在形成防反射膜的情况下选择性地使用TCT层，COT层和BCT层以及未形成任何抗反射膜的情况。涂层和显影系统由携带程序控制。

18. 发明申请

US20070056514A1 Coating and developing apparatus 有权
标题翻译：涂装显影装置
公开(公告)号：US20070056514A1
公开(公告)日：2007-03-15
申请号：US11342616
申请日：2006-01-31
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： C23C16/00
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178 , H01L21/67207 , H01L21/67745
摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.
摘要翻译：提供一种由多个单元块组成的涂层显影装置。第一单位块堆叠和第二单位块堆叠被布置在相对于前后方向的不同位置。用于显影的单元块，每个包括多个处理单元，包括执行曝光之后的显影处理的显影单元和在处理单元之间传送基板的转印装置布置在最下层。用于应用或涂布的单元块包括多个处理单元，包括在曝光之前进行施加处理的涂布单元和在处理单元之间传送基板的转印装置，布置在用于显影的单位块上方。用于应用的单元块被布置在第一和第二单元块堆叠中。根据防反射膜和抗蚀剂膜之间的层叠位置关系确定晶片通过的应用单元块。暴露的晶片仅通过单元块进行开发，而不经过用于应用的单元块中的任何一个。

19. 发明申请

US20060162858A1 Coating and developing system and coating and developing method 有权
公开(公告)号：US20060162858A1
公开(公告)日：2006-07-27
申请号：US11336990
申请日：2006-01-23
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： B32B37/00
CPC分类号： H01L21/6715 , H01L21/00 , H01L21/67178 , H01L21/67184 , H01L21/6719
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.

20. 发明授权

US06790106B2 Male terminal fitting and method of forming it 有权
公开(公告)号：US06790106B2
公开(公告)日：2004-09-14
申请号：US10631603
申请日：2003-07-31
申请人： Hikaru Ito , Yoshio Okura
发明人： Hikaru Ito , Yoshio Okura
IPC分类号： H01R1304
CPC分类号： H01R43/16 , H01R4/185 , H01R13/04
摘要： A tab (20) has first and second plates (21, 22). A bulge (23) of the first plate (21) is spaced from the second plate (22). Supports (25) project from the bulge (23) and contact with the second plate (22). Thus, a sufficient strength is secured for the tab (20). The supports (25) are in contact with the second plate (22) at positions displaced toward side edges from the free ends (28a). Thus, there is no danger that the supports (25) will thrust themselves between the free ends (28a) to separate the free ends (28a) when the first plate (21) is pressed, thereby preventing the tab (20) from being deformed.

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