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11. 发明专利

JP2002200463A METHOD FOR CLEANING FLUORORESIN-MADE INSTRUMENT 失效
公开(公告)号：JP2002200463A
公开(公告)日：2002-07-16
申请号：JP2000400931
申请日：2000-12-28
申请人： TOSHIBA CERAMICS CO
发明人： TANAKA MASAFUMI
IPC分类号： B08B3/08
摘要： PROBLEM TO BE SOLVED: To provide a method for cleaning a fluororesin-made instrument, by which the fluororesin-made instrument, a fluororesin-made analytical instrument or the like to be used at a step to manufacturing a semiconductor or another step can be cleaned in a short time to be kept in a high-purity state by removing metallic impurities existing in each instrument. SOLUTION: This method for cleaning the fluororesin-made instrument comprises a step to expose the instrument to the pressurized vapor of an acid and a step to immerse the acid vapor-exposed instrument in a diluted acid. According to this cleaning method, an unimaginably small amount of metal existing in the instrument and metallic impurities existing inside the fluororesin can be removed.

12. 发明专利

JPH11183342A SAMPLE PROCESSING METHOD FOR HIGH-ACCURACY IMPURITY ANALYSIS OF SILICON MATERIAL AND PROCESSING UNIT USED FOR IT 失效
公开(公告)号：JPH11183342A
公开(公告)日：1999-07-09
申请号：JP36712497
申请日：1997-12-25
申请人： TOSHIBA CERAMICS CO
发明人： TANAKA MASAFUMI , TANAKA HIDEKO , ARIGA SHOZO , NAGAMINE YOSHINOBU
IPC分类号： G01N1/28 , G01N1/32
摘要： PROBLEM TO BE SOLVED: To remarkably shorten the processing time, to avoid distortion and deformation of a processing container and to remarkably improve analysis accuracy. SOLUTION: In this processing method, a sample 10 of a silicon material 11 dipped in water is fed to the sample receiver 5 of a sealed container 3 provided with the sample receiver 5 and a liquid storage section 8 below it, an etching solution is fed to the liquid storage section 8, reactive vapor is generated from the etching solution, the generated vapor is absorbed in the dipping water 9 in the sample receiver 5 into contact with the a sample 10, the silicon component of the assay sample 10 is decomposed and removed, then the impurity- containing liquid remaining in the sample receiver 5 is recovered. The reactive vapor is generated from the etching solution by the temperature rise of the solution due to the reaction of the separately inserted silicon material 11 and the reaction heat caused by it. The analysis accuracy is improved.

13. 发明专利

JP2000266650A METHOD FOR ANALYZING SURFACE-LAYER IMPURITY OF POLYSILICON, AND SAMPLE-TREATING CONTAINER FOR ETCHING POLYSILICON 失效
公开(公告)号：JP2000266650A
公开(公告)日：2000-09-29
申请号：JP7026499
申请日：1999-03-16
申请人： TOSHIBA CERAMICS CO , TOKUYAMA CORP
发明人： TANAKA MASAFUMI , TOKUTAKE FUMIO , MUROTA HITOSHI
IPC分类号： G01N27/62 , G01N1/10 , G01N1/28 , G01N31/00 , G01N33/00 , H01L21/306 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To prevent the contamination of a sample in analysis for making a high- sensitivity analysis performable by housing a polysilicon sample and an etching liquid in a sample treatment container, then moving the treatment container for bringing the etching liquid into contact with the surface of the polysilicon sample, and collecting the etching liquid. SOLUTION: The sample treatment container 1 is provided with a container body 2 made of a fluororesin having an opening 2a of polysilicon sample inlet/outlet, a lid body 3 made of a fluororesin being provided at the opening 2a of the body 2 detachably and the body 2, and an etching liquid inlet/outlet 5 at the lid body 3. The container 1 is also provided with knurls 4 and 6 at the both end that can rotate the body 2 in one direction while being in contact with a rotary roller. In this configuration, the sample treatment container 1 accommodating the polysilicon sample and the etching liquid is mounted between a rotary-driving roller and a follower roller of a roller shaker for rotating via the knurls 4 and 6. After the etching is completed, the etching liquid is transferred to a washed evaporation condensation tool from the etching liquid inlet/outlet 5 of the lid body 3.

14. 发明专利

JP2000007370A QUARTZ GLASS FOR OPTICS 失效
公开(公告)号：JP2000007370A
公开(公告)日：2000-01-11
申请号：JP16890098
申请日：1998-06-16
申请人： TOSHIBA CERAMICS CO
发明人： TANIIKE SEIJI , SHINPO MASARU , TANAKA MASAFUMI , TOKUTAKE FUMIO
IPC分类号： C03C3/06
摘要： PROBLEM TO BE SOLVED: To obtain an optical quartz glass that suppresses the emission of fluorescence, even when a laser beam of short wavelength is used, and can draw sharp patterns, for example, on wafers by setting the concentration of Ni on the basis of the positive correlation with the intensity of the fluorescence. SOLUTION: A positive correlation between the concentration of Ni and the intensity of its fluorescence can be noticed clearly, when the correlation between the impurity elements in quartz glass and the fluorescent intensity is examined individually. When the concentration of Ni is in the range of from 0.1 ppb to 1.0 ppb, the emission of the fluorescence can be substantially inhibited, regardless of the existence of other elements and their concentrations. If it is in this range, the emission of fluorescence can be inhibited, even when the excimer laser is employed. This merit can be revealed at maximum, when these elements constituted with this optical quartz glass are applied to the optical lithography.

15. 发明专利

JP2000002633A DEVICE FOR EVAPORATING AND CONCENTRATING SAMPLE 失效
公开(公告)号：JP2000002633A
公开(公告)日：2000-01-07
申请号：JP16890198
申请日：1998-06-16
申请人： TOSHIBA CERAMICS CO
发明人： TANAKA MASAFUMI , TOKUTAKE FUMIO
IPC分类号： G01N1/36 , G01N1/28 , G01N33/00
摘要： PROBLEM TO BE SOLVED: To prevent a sample from being contaminated by metal impurities, and to quickly and uniformly perform concentration by detachably mounting a container body made of a highly pure synthetic resin to a substrate for maintaining an integrality, and by suppressing the thermal expansion of the container body. SOLUTION: The device 1 for evaporating and concentrating sample is composed of a container body 3 made of a synthetic resin where a plurality of sample accommodation parts 2 are formed, a substrate 4, and a heater 5 being provided on the substrate 4. When the sample is to be evaporated and concentrated, the heater 5 is accommodated into a heater shrinking groove 11 formed on the substrate 4, an engagement projection line 9 of the washed container body 3 is engaged and pushed to an engagement recessed groove 13 on the substrate 4, and the container body 3 is connected to the substrate 4, thus detachably maintaining them integrally, and at the same time allowing a rear surface 7 and a placement surface 4 to adhere each other. In this state, the sample is accommodated into the sample accommodation part 2, and is concentrated while heating due to the heater 5 is controlled. At this time, the container body 3 and the substrate 4 are strongly maintained integrally, thus suppressing deformation due to the thermal expansion of the container body 3 by the substrate 4.

16. 发明专利

JP2003240688A COLLECTOR OF GAS COMPONENT 审中-公开
公开(公告)号：JP2003240688A
公开(公告)日：2003-08-27
申请号：JP2002040026
申请日：2002-02-18
申请人： TOSHIBA CERAMICS CO
发明人： TANAKA MASAFUMI , TOKUTAKE FUMIO
IPC分类号： G01N1/22 , G01N30/00 , G01N30/04
摘要： PROBLEM TO BE SOLVED: To provide a collector of gas components which dispenses with a blank value eliminating operation, and wherein the collecting efficiency is not affected by temperature and humidity conditions, a target component can be easily extracted, and various gas components can be collected. SOLUTION: A thin film 3 of a reagent composed of acid, alkali or organic solvent is formed on one face of a chip-shaped collecting board 2 made of a silicon or quartz thin plate, or a synthetic resin film. COPYRIGHT: (C)2003,JPO

17. 发明专利

JP2000292326A METHOD FOR MANUFACTURING ANALYZING SAMPLE FOR METAL IMPURITY CONTAINED IN SYNTHETIC RESIN, AND MEASURING METHOD OF METAL IMPURITY USING IT 失效
公开(公告)号：JP2000292326A
公开(公告)日：2000-10-20
申请号：JP9559199
申请日：1999-04-01
申请人： TOSHIBA CERAMICS CO
发明人： TANAKA MASAFUMI , TAKAHASHI MASATO
IPC分类号： G01N27/62 , G01N1/28 , G01N21/31 , G01N33/00
摘要： PROBLEM TO BE SOLVED: To provide an analyzing sample for metal impurity capable of precisely measuring the metal impurity content in a synthetic resin by adhering an acid droplet to a synthetic resin analyzing sample to extract a metal element, and evaporating and condensing the recovered droplet to perform quantitative determination. SOLUTION: An analyzing sample vessel 2 containing an analyzing sample S2 is arranged with a space so as not to make direct contact with a sample decomposing solution 3. Therefore, only the gas phase of the sample decomposing solution 3 evaporated by heating can touch the analyzing sample S2 to decompose the analyzing sample S2. Accordingly, by the synergistic effect of the sampling free from metal contamination of shaving by use of a silicon wafer having a small metal contamination degree and the analyzing sample treatment method of extracting an intended matter without metal contamination of the analyzing sample S2 by the gas phase of the evaporated sample decomposing solution 3, the analyzing sample S2 free from metal contamination can be manufactured. Further, a plurality of analyzing samples S2 manufactured by shaving the same part of a synthetic resin-made analyzing sample group (for example, physical and chemical apparatus) by use of a cut silicon wafer in the depth direction a plurality of times is analyzed, whereby a sample capable of precisely measuring the depth directional contamination degree of the analyzing sample group can be provided.

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