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    • 12. 发明授权
    • Method for fabricating a switch structure
    • 开关结构的制造方法
    • US06655011B1
    • 2003-12-02
    • US09677718
    • 2000-10-02
    • William Paul KornrumpfRobert John Wojnarowski
    • William Paul KornrumpfRobert John Wojnarowski
    • H01H1100
    • H01H1/0036H01H61/0107H01H2001/0042H01H2001/0073H01H2001/0084H01H2061/006Y10T29/49105Y10T29/49128Y10T29/49155
    • A switch structure having a base surface; a first high density interconnect (HDI) plastic interconnect layer overlying the base surface layer; a cavity within the HDI plastic interconnect layer; at least one patterned shape memory alloy (SMA) layer overlying the HDI plastic interconnect layer and the cavity, and at least one patterned conductive layer over the at least one patterned SMA layer; a fixed contact pad within the cavity and attached to the base surface and a movable contact pad attached to a portion of the first patterned SMA layer within the cavity such that when the first and second patterned SMA layers and the first and second patterned metallized layers are in a first stable position, the movable contact pad touches the fixed contact pad, thereby providing an electrical connection and forming a closed switch. The structure has a second stable position in which the SMA and metallized layers are flexed away from the cavity so that the contact pads are not in contact and form an open switch.
    • 具有基面的开关结构; 覆盖基底表面层的第一高密度互连(HDI)塑料互连层; HDI塑料互连层内的空腔; 覆盖HDI塑料互连层和空腔的至少一个图案形状记忆合金(SMA)层,以及至少一个图案化的SMA层上的至少一个图案化导电层; 空腔内的固定接触焊盘并附接到基体表面,以及可移动接触垫,其附接到空腔内的第一图案化SMA层的一部分,使得当第一和第二图案化SMA层和第一和第二图案化金属化层为 在第一稳定位置,可动接触垫接触固定接触垫,由此提供电连接并形成闭合的开关。 该结构具有第二稳定位置,其中SMA和金属化层从空腔弯曲,使得接触焊盘不接触并形成开放的开关。