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11. 发明申请

US20080263502A1 MASK PATTERN DATA GENERATING METHOD, INFORMATION PROCESSING APPARATUS, PHOTOMASK FABRICATION SYSTEM, AND IMAGE SENSING APPARATUS 有权
标题翻译：掩模图形数据生成方法，信息处理装置，光电装置制造系统和图像感测装置
公开(公告)号：US20080263502A1
公开(公告)日：2008-10-23
申请号：US12048691
申请日：2008-03-14
申请人： Kyouhei Watanabe , Masaki Kurihara , Hitoshi Shindo , Nobuhiko Sato , Yasuhiro Sekine , Masataka Ito
发明人： Kyouhei Watanabe , Masaki Kurihara , Hitoshi Shindo , Nobuhiko Sato , Yasuhiro Sekine , Masataka Ito
IPC分类号： G06F17/50
CPC分类号： G03F1/68 , G03F1/50 , G03F7/0005 , Y10T29/49
摘要： A method for generating mask pattern data of a photomask used to form microlenses divides a pattern formation surface of a mask pattern to be used for the photomask into a plurality of grid cells, acquires data which represents transmitted light distribution of the mask pattern to be used for the photomask, determines whether to place a shield on each of the plurality of grid cells by binarizing the plurality of grid cells in order of increasing or decreasing distance from a center of the pattern formation surface using an error diffusion method to acquire the transmitted light distribution, and generates mask pattern data which represents an arrangement of the shields based on results from the determining step.
摘要翻译：用于生成用于形成微透镜的光掩模的掩模图案数据的方法将用于光掩模的掩模图案的图案形成表面划分成多个网格单元，获取表示要使用的掩模图案的透射光分布的数据对于光掩模，通过使用误差扩散方法使用误差扩散方法来依次增加或减小距离图案形成表面的中心的距离来二进制化多个网格单元，来确定是否将多个网格单元中的每一个放置屏蔽，以获取透射光分配，并且基于来自确定步骤的结果生成表示屏蔽的布置的掩模图案数据。

12. 发明申请

US20120200751A1 PHOTOELECTRIC CONVERSION APPARATUS 有权
标题翻译：光电转换装置
公开(公告)号：US20120200751A1
公开(公告)日：2012-08-09
申请号：US13365146
申请日：2012-02-02
申请人： Taro Kato , Mineo Shimotsusa , Hiroaki Sano , Takeshi Ichikawa , Yasuhiro Sekine , Mahito Shinohara , Genzo Momma
发明人： Taro Kato , Mineo Shimotsusa , Hiroaki Sano , Takeshi Ichikawa , Yasuhiro Sekine , Mahito Shinohara , Genzo Momma
IPC分类号： H04N5/335
CPC分类号： H01L27/14627 , H01L27/14621 , H01L27/14629 , H01L27/1463
摘要： A photoelectric conversion apparatus includes a semiconductor substrate having a photoelectric conversion portion. An insulator is provided on the semiconductor substrate. The insulator has a hole corresponding to the photoelectric conversion portion. A waveguide member is provided in the hole. An in-layer lens is provided on a side of the waveguide member farther from the semiconductor substrate. A first intermediate member is provided between the waveguide member and the in-layer lens. The first intermediate member has a lower refractive index than the in-layer lens.
摘要翻译：光电转换装置包括具有光电转换部分的半导体衬底。绝缘体设置在半导体衬底上。绝缘体具有与光电转换部对应的孔。波导构件设置在孔中。在距离半导体衬底更远的波导构件的一侧设置有层内透镜。第一中间构件设置在波导构件和内层透镜之间。第一中间构件具有比层内透镜低的折射率。

13. 发明申请

US20110170197A1 Method of Fabricating a Photomask Used to Form a Lens 有权
标题翻译：制造用于形成镜片的光掩模的方法
公开(公告)号：US20110170197A1
公开(公告)日：2011-07-14
申请号：US13076511
申请日：2011-03-31
申请人： Kyouhei Watanabe , Masaki Kurihara , Hitoshi Shindo , Nobuhiko Sato , Yasuhiro Sekine , Masataka Ito
发明人： Kyouhei Watanabe , Masaki Kurihara , Hitoshi Shindo , Nobuhiko Sato , Yasuhiro Sekine , Masataka Ito
IPC分类号： G02B27/12 , G02B3/00 , G03F1/00 , B23P17/04
CPC分类号： G03F1/68 , G03F1/50 , G03F7/0005 , Y10T29/49
摘要： A method of fabricating a photomask used to form a lens. The method includes the steps of generating mask pattern data for each of a plurality of grid cells constituting a mask pattern for the lens, and fabricating the photomask based on the mask pattern data. The step of generating the mask pattern data includes acquiring data which represents a transmitted light distribution required for the photomask to fabricate the lens, in which the transmitted light distribution includes a quantity of transmitted light in each of the plurality of grid cells, and determining whether to place a shield on each of the plurality of grid cells by binarizing the quantity of transmitted light in each of the plurality of grid cells in order of increasing or decreasing distance from a center of the mask pattern using an error diffusion method.
摘要翻译：一种制造用于形成透镜的光掩模的方法。该方法包括以下步骤：为构成透镜的掩模图案的多个网格单元中的每一个生成掩模图案数据，以及基于掩模图案数据来制造光掩模。生成掩模图案数据的步骤包括获取表示光掩模所需的透射光分布以制造透镜的数据，其中透射光分布包括多个格栅单元中的每一个中的透射光量，以及确定是否通过使用误差扩散法从掩模图案的中心的距离的增加或减小的顺序二值化多个网格单元中的每一个网格单元中的透射光的量来将屏蔽放置在多个网格单元中的每一个上。

14. 发明授权

US07777795B2 Solid-state image pickup device 有权
标题翻译：固态图像拾取装置
公开(公告)号：US07777795B2
公开(公告)日：2010-08-17
申请号：US11867131
申请日：2007-10-04
申请人： Satoshi Hirayama , Yasuhiro Sekine
发明人： Satoshi Hirayama , Yasuhiro Sekine
IPC分类号： H04N3/14 , H04N5/335 , H04N9/04
CPC分类号： H01L31/02162 , H01L27/14621 , H01L27/14623 , H01L27/14625 , H01L31/02327
摘要： A solid-state image pickup device includes a photoelectric conversion portion for generating signal electric charges in accordance with an amount of incident light, a plurality of color filters, and a flattening layer formed on the plurality of color filters. A thickness of a projection or a recess on a surface of the flattening layer, provided on a region where color filters are adjacent to each other, is equal to or less than 0.2 μm.
摘要翻译：固态图像拾取装置包括：用于根据入射光量产生信号电荷的光电转换部分，多个滤色器以及形成在多个滤色器上的平坦化层。设置在滤色器彼此相邻的区域上的平坦化层的表面上的突起或凹部的厚度等于或小于0.2μm。

15. 发明申请

US20070058239A1 Projection lens unit 审中-公开
标题翻译：投影镜头单元
公开(公告)号：US20070058239A1
公开(公告)日：2007-03-15
申请号：US11519020
申请日：2006-09-12
申请人： Yasuhiro Sekine , Takeki Nakada
发明人： Yasuhiro Sekine , Takeki Nakada
IPC分类号： G02B26/00
CPC分类号： G02B26/0833 , G02B7/02 , H04N5/7458
摘要： The setting distance between a DMD element and a projection lens is maintained accurately to display a high-quality image on a screen or the like. A projection lens unit is one in which light from a light source lamp side is reflected on the DMD element as image light and is subsequently projected at a projection lens. The projection lens unit includes a coupling tool that fixes the DMD element and the projection lens integrally in a state where the distance therebetween is accurately supported to a set value. The coupling tool has a color wheel fitting portion positioning and supporting a color wheel, a relay lens fitting portion positioning and supporting a relay lens, a reflection mirror fitting portion positioning and supporting a reflection mirror, a DMD element mounting portion in which the DMD element is mounted and supported, and a projection lens portion in which the projection lens is mounted and supported.
摘要翻译： DMD元件与投影透镜之间的设置距离保持精确，以在屏幕等上显示高质量的图像。投影透镜单元是其中来自光源灯侧的光作为图像光在DMD元件上反射并随后投影在投影透镜的单元。投影透镜单元包括将DMD元件和投影透镜在其间的距离精确地支撑到设定值的状态下一体地固定的联接工具。耦合工具具有定位和支撑色轮的色轮配件部分，定位和支撑中继透镜的中继透镜配件部分，定位和支撑反射镜的反射镜配合部分，DMD元件安装部分，其中DMD元件被安装和支撑的投影透镜部分和安装和支撑投影透镜的投影透镜部分。

16. 发明申请

US20060046162A1 Manufacturing method of semiconductor device 失效
标题翻译：半导体器件的制造方法
公开(公告)号：US20060046162A1
公开(公告)日：2006-03-02
申请号：US11212649
申请日：2005-08-29
申请人： Yasuhiro Sekine
发明人： Yasuhiro Sekine
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F7/70475 , G03F1/00
摘要： Various problems caused by a pattern difference in a semiconductor device manufactured by divided exposure are solved. When a chip area 161 on a wafer is exposed by being divided into two areas 161a and 161b, the center position of a mask pattern 1a formed on a reticle 1A used for the exposure of the area 161a is made to be different from the center position of the reticle 1A, and the center position of a mask pattern 1b formed on a reticle 1B used for the exposure of the area 161b is made to be different from the center position of the reticle 1B.
摘要翻译：解决了通过分割曝光制造的半导体器件中的图案差异引起的各种问题。当晶片上的芯片区域161被分成两个区域161a和161b而暴露时，形成在用于曝光区域161a的掩模版1A上的掩模图案1a的中心位置被制成不同于标线片1A的中心位置，并且形成在用于曝光区域161b的掩模版1B上的掩模图案1b的中心位置与标线片1B的中心位置不同。

17. 发明授权

US06798584B2 Lens apparatus for projection 失效
标题翻译：投影镜头设备
公开(公告)号：US06798584B2
公开(公告)日：2004-09-28
申请号：US10327904
申请日：2002-12-26
申请人： Susumu Matsumoto , Kumajiro Sekine , Yasuhiro Sekine , Yasaburou Ootaka
发明人： Susumu Matsumoto , Kumajiro Sekine , Yasuhiro Sekine , Yasaburou Ootaka
IPC分类号： G02B900
CPC分类号： G02B13/00
摘要： A lens apparatus for projection includes a plurality of lenses on an optical axis. A shading plate 11 for covering the peripheral portion of the lens to block off light entering the peripheral portion is provided as a single member on the optical axis with the lenses to omit an inking process. In addition, the shading plate 11 is integrally provided with a contrast compensating plate 13 for compensating a projected image, so that it is not required to provide any portions for supporting the contrast compensating plate 13. Moreover, a shading wall 23 for blocking off light leaking out of the peripheral portion of the lens is provided on the peripheral portion of the shading plate 11. Thus, it is possible to provide a lens apparatus for projection, which has a simple structure and which can be easily assembled to reduce the producing costs.
摘要翻译：用于投影的透镜装置包括在光轴上的多个透镜。在透镜上设置用于覆盖透镜的周边部分以阻挡进入周边部分的光的遮光板11作为光轴上的单个部件，以省略墨迹处理。此外，遮光板11一体地设置有用于补偿投影图像的对比度补偿板13，从而不需要提供用于支撑对比度补偿板13的任何部分。此外，遮光壁23用于遮挡光在遮光板11的周边部分上设置有从透镜的周边部分漏出的透镜装置。因此，可以提供一种结构简单且易于组装以便降低生产成本的投影透镜装置。

18. 发明授权

US06552859B1 Lens apparatus for projection 失效
标题翻译：投影镜头设备
公开(公告)号：US06552859B1
公开(公告)日：2003-04-22
申请号：US09690808
申请日：2000-10-18
申请人： Susumu Matsumoto , Kumajiro Sekine , Yasuhiro Sekine , Yasaburou Ootaka
发明人： Susumu Matsumoto , Kumajiro Sekine , Yasuhiro Sekine , Yasaburou Ootaka
IPC分类号： G02B900
CPC分类号： G02B13/00
摘要： A lens apparatus for projection includes a plurality of lenses on an optical axis. A shading plate 11 for covering the peripheral portion of the lens to block off light entering the peripheral portion is provided as a single member on the optical axis with the lenses to omit an inking process. In addition, the shading plate 11 is integrally provided with a contrast compensating plate 13 for compensating a projected image, so that it is not required to provide any portions for supporting the contrast compensating plate 13. Moreover, a shading wall 23 for blocking off light leaking out of the peripheral portion of the lens is provided on the peripheral portion of the shading plate 11. Thus, it is possible to provide a lens apparatus for projection, which has a simple structure and which can be easily assembled to reduce the producing costs.
摘要翻译：用于投影的透镜装置包括在光轴上的多个透镜。在透镜上设置用于覆盖透镜的周边部分以阻挡进入周边部分的光的遮光板11作为光轴上的单个部件，以省略墨迹处理。此外，遮光板11一体地设置有用于补偿投影图像的对比度补偿板13，从而不需要提供用于支撑对比度补偿板13的任何部分。此外，遮光壁23用于遮挡光在遮光板11的周边部分上设置有从透镜的周边部分漏出的透镜装置。因此，可以提供一种结构简单且易于组装以便降低生产成本的投影透镜装置。

19. 发明授权

US6156657A Method of treating active material 失效
标题翻译：活性物质处理方法
公开(公告)号：US6156657A
公开(公告)日：2000-12-05
申请号：US637410
申请日：1996-04-25
申请人： Hideshi Kuwabara , Yasushi Kawasumi , Tetsuo Asaba , Kenji Makino , Yuzo Kataoka , Yasuhiro Sekine , Shigeru Nishimura
发明人： Hideshi Kuwabara , Yasushi Kawasumi , Tetsuo Asaba , Kenji Makino , Yuzo Kataoka , Yasuhiro Sekine , Shigeru Nishimura
IPC分类号： B01D53/72 , C23C16/44 , H01J37/32 , H01L21/44
CPC分类号： H01J37/3244 , B01D53/72 , C23C16/4412 , H01J37/32844 , Y02C20/30
摘要： An active substance treating method is characterized in that an active substance is caused to react with an inactivating substance in an exhaust system for a thin film forming apparatus. A thin film forming apparatus includes a common chamber having a region where plasma CVD is carried out and a region where thermal CVD is carried out, a device provided in the chamber for pressing a substrate onto a holder, a lamp for illuminating light having a component of a wavelength of 1 .mu.m or above to heat the substrate, an introducing port for separately introducing two active substances to a vicinity of the substrate, a vaporizing device in which at least two bubblers are series-connected to vaporize the active substances, and an exhaust system which is divided into two systems each of which has a heater and which has a port for introducing an inactivating substance into an exhaust pump.
摘要翻译：活性物质处理方法的特征在于使活性物质与用于薄膜形成装置的排气系统中的灭活物质反应。薄膜形成装置包括具有进行等离子体CVD的区域和进行热CVD的区域的公共室，设置在用于将基板按压到保持器上的室中的装置，用于照射具有成分波长1μm以上的加热用基板，将两个活性物质分别引入到基板附近的引入口，将至少两个起泡器串联连接以蒸发活性物质的汽化装置，以及排气系统，其被分成两个系统，每个系统具有加热器，并且具有用于将灭活物质引入排气泵的端口。

20. 发明授权

US5534069A Method of treating active material 失效
公开(公告)号：US5534069A
公开(公告)日：1996-07-09
申请号：US92782
申请日：1993-07-19
申请人： Hideshi Kuwabara , Yasushi Kawasumi , Tetsuo Asaba , Kenji Makino , Yuzo Kataoka , Yasuhiro Sekine , Shigeru Nishimura
发明人： Hideshi Kuwabara , Yasushi Kawasumi , Tetsuo Asaba , Kenji Makino , Yuzo Kataoka , Yasuhiro Sekine , Shigeru Nishimura
IPC分类号： B01D53/72 , C23C16/44 , H01J37/32 , C23C16/18 , C23C16/46 , C23C16/48
CPC分类号： H01J37/3244 , B01D53/72 , C23C16/4412 , H01J37/32844 , Y02C20/30
摘要： An active substance treating method is characterized in that an active substance is caused to react with an inactivating substance in an exhaust system for a thin film forming apparatus. A thin film forming apparatus includes a common chamber having a region where plasma CVD is carried out and a region where thermal CVD is carried out, a device provided in the chamber for pressing a substrate onto a holder, a lamp for illuminating light having a component of a wavelength of 1 .mu.m or above to heat the substrate, an introducing port for separately introducing two active substances to a vicinity of the substrate, a vaporizing device in which at least two bubblers are series-connected to vaporize the active substances, and an exhaust system which is divided into two systems each of which has a heater and which has a port for introducing an inactivating substance into an exhaust pump.

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