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    • 14. 发明授权
    • Platform for ladders
    • 梯子平台
    • US5975240A
    • 1999-11-02
    • US119361
    • 1998-07-20
    • Sean O'Brien
    • Sean O'Brien
    • E06C7/16
    • E06C7/165
    • A safety platform foldable structure for a ladder for a worker to stand on. The platform structure has a platform flooring in the shape of the letter H which is removably mountable to one rung of an upstanding ladder to an open horizontal or vertical closed position. Spaced apart hook mechanisms extending from the flooring, are releasably secured to the rung to assist holding the platform in the horizontal position and to hold the platform in the vertical closed position. Downwardly extending front side walls from the flooring engage rails on the ladder to secure the platform in the horizontal position.
    • 一个梯子的安全平台可折叠结构,用于工人站立。 平台结构具有以字母H的形式的平台地板,其可拆卸地安装到直立梯的一个梯级到开放的水平或垂直关闭位置。 从地板延伸的间隔开的钩机构可释放地固定到梯级上,以帮助将平台保持在水平位置并将平台保持在垂直关闭位置。 从地板向下延伸的前侧壁接合梯子上的轨道,以将平台固定在水平位置。
    • 19. 发明授权
    • Method of locating sub-resolution assist feature(s)
    • 定位辅助分辨率辅助功能的方法
    • US07200835B2
    • 2007-04-03
    • US11340251
    • 2006-01-25
    • Guohong ZhangSean O'Brien
    • Guohong ZhangSean O'Brien
    • G06F17/50G06F19/00G21K5/00G03F1/00
    • G03F1/70G03F1/36
    • A method of operating a computing system to determine reticle data. The reticle data is for completing a reticle for use in projecting an image to a semiconductor wafer. The method receives circuit design layer data comprising a desired circuit layer layout, and the layout comprises a plurality of lines. The method also identifies in the plurality of lines a first line portion for use as a first circuit function and a second line portion for use as a second circuit function that differs from the first circuit function. The first line portion is parallel and adjacent to the second line portion. The method also provides the reticle data in an output data file for use in forming features on the reticle. The method also indicates parameters for forming first and second primary features as well as at least one assist feature on the reticle having an area between the first primary feature and the second primary feature, wherein in use of the reticle for use in projecting the image to the semiconductor wafer the area will favor greater assistance to the first primary feature as compared to the second primary feature.
    • 一种操作计算系统以确定掩模版数据的方法。 掩模版数据用于完成用于将图像投影到半导体晶片的掩模版。 该方法接收包括所需电路层布局的电路设计层数据,并且布局包括多条线。 该方法还在多行中标识出用作第一电路功能的第一线路部分和用作不同于第一电路功能的第二电路功能的第二线路部分。 第一线部分平行并与第二线部分相邻。 该方法还在输出数据文件中提供掩模版数据,以用于在掩模版上形成特征。 该方法还指示用于形成第一和第二主要特征的参数以及在标线片上的至少一个辅助特征,其具有在第一主要特征和第二主要特征之间的区域,其中在使用掩模版以用于将图像投影到 与第二主要特征相比,半导体晶片该区域将有助于对第一主要特征的更大的帮助。