会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明申请
    • METHOD FOR ACHIEVING COMPLIANT SUB-RESOLUTION ASSIST FEATURES
    • 实现合适分解辅助特征的方法
    • US20080063948A1
    • 2008-03-13
    • US11531048
    • 2006-09-12
    • Sean O'Brien
    • Sean O'Brien
    • G03C5/00G06F17/50G03F1/00
    • G03F1/36
    • The present application is directed to a process of forming a photomask pattern comprising one or more sub-resolution assist features (SRAF). The process comprises generating a first set of SRAF patterns. Each of the SRAF patterns in the first set having a first assigned mask position. After the first set of SRAF patterns are generated, determining if the SRAF patterns of the first set comply with a preselected set of rules, wherein one or more of the SRAF patterns are found to be illegal because they do not comply with at least one of the preselected rules. One or more of the illegal SRAF patterns are reassigned to second mask positions that are different from the first mask positions, the second mask positions allowing the illegal SRAF patterns to comply with the at least one preselected rule to form corrected SRAF patterns. The present application also discloses systems for generating a sub-resolution assist feature pattern for a photomask, as well as SRAF modules embodied on a computer readable medium comprising instructions operable to carry out the processes of the present application.
    • 本申请涉及形成包括一个或多个子分辨率辅助特征(SRAF)的光掩模图案的过程。 该过程包括生成第一组SRAF模式。 第一组中的每个SRAF图案具有第一分配的屏蔽位置。 在生成第一组SRAF模式之后,确定第一组的SRAF模式是否符合预选的一组规则,其中发现一个或多个SRAF模式是非法的,因为它们不符合以下中的至少一个: 预选规则。 一个或多个非法SRAF图案被重新分配给与第一掩模位置不同的第二掩模位置,允许非法SRAF图案的第二掩码位置符合至少一个预选规则以形成校正的SRAF图案。 本申请还公开了用于生成用于光掩模的子分辨率辅助特征图案的系统,以及体现在包括可操作以执行本申请的处理的指令的计算机可读介质上的SRAF模块。