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    • 12. 发明申请
    • SUBSTRATE LOADER AND UNLOADER
    • 基座装载机和卸载器
    • US20130011222A1
    • 2013-01-10
    • US13279432
    • 2011-10-24
    • Daniel GoodmanArthur KeiglerFreeman Fisher
    • Daniel GoodmanArthur KeiglerFreeman Fisher
    • B65G49/00
    • H01L21/67092H01L21/6838H01L21/68764H01L21/68785
    • A substrate loader adapted to load and unload a substrate to and from a moveable holder having a seal. The substrate loader has a base and a holder support frame coupled to the base, the holder support frame adapted to repeatably position the moveable holder relative to a predetermined datum. The substrate transport is coupled to the base and having a substrate chuck and adapted to move and transport the substrate relative to the holder. The substrate transport is deterministically positioned relative to the predetermined datum and is adapted to move the substrate from a first position, with the substrate captured by the moveable holder, to a second position with the substrate disengaged from the holder and the seal, the substrate transport movement of the substrate from the first to the second position effecting disengagement from the holder and the seal substantially without contacting the substrate.
    • 一种衬底装载机,其适于将基板装载到具有密封件的可移动保持器上和从其移出。 衬底装载机具有底座和联接到基座的保持器支撑框架,保持器支撑框架适于相对于预定的基准重复地定位可移动保持器。 衬底输送器耦合到基座并且具有衬底卡盘并且适于相对于保持器移动和运输衬底。 衬底传送相对于预定的原点确定地定位,并且适于将衬底从第一位置移动,其中衬底由可移动保持器捕获到第二位置,其中衬底与保持器和密封件脱离,衬底传送 基板从第一位置到第二位置的运动实质上不与基板接触,从而保持器和密封件脱离接触。
    • 15. 发明申请
    • SEED LAYER DEPOSITION IN MICROSCALE FEATURES
    • 微粒特征中的种子层沉积
    • US20110240481A1
    • 2011-10-06
    • US12755198
    • 2010-04-06
    • Arthur KeiglerJohannes ChiuZhenqiu LiuDaniel Goodman
    • Arthur KeiglerJohannes ChiuZhenqiu LiuDaniel Goodman
    • C25D5/02C25D17/00
    • C25D7/123C25D17/001H01L21/2885H01L21/76873H01L21/76898H01L2221/1089
    • A method and system for coating the interior surfaces of microscale hole features fabricated into the substantially planar surface of a work piece. The method comprises providing a work piece with a barrier metal coating that is substantially continuous and uniform both along the planar surface of the work piece and the inner surfaces of the microscale hole features wherein said barrier metal coating is applied by a substantially surface reaction limited process. The workpiece is provided with a coating, on the planar surface of the work piece, of a thick metal layer anchored to the barrier metal coat and disposed to provide substantially uniform electrical conduction capability to the microscale features located throughout and across the workpiece. An electrical contact path is provided to the electrically conductive coating at the perimeter of the work piece. The workpiece is immersed in a chemical bath, causing said chemical bath to fully contact the interior surfaces of the microscale hole features, said chemical bath containing metal ions suitable for electrodeposition. An electric potential is applied at the perimeter of the work piece to cause electrodeposition of metal ions onto all surfaces of the work piece including the interior surfaces of the microscale hole features to a predetermined finish coating in one step.
    • 一种用于涂覆微孔孔特征的内表面的方法和系统,其制造成工件的基本平坦的表面。 该方法包括提供具有阻挡金属涂层的工件,所述阻挡金属涂层沿着工件的平坦表面和微孔特征的内表面基本上连续且均匀,其中所述阻挡金属涂层通过基本上表面反应限制的工艺 。 工件在工件的平坦表面上设置有锚固到阻挡金属涂层的厚金属层并且设置成为位于整个和跨过工件的微尺度特征提供基本均匀的导电能力的涂层。 在工件周边处的导电涂层上提供电接触路径。 将工件浸入化学浴中,使所述化学浴与微孔特征的内表面完全接触,所述化学浴含有适合于电沉积的金属离子。 在工件的周边施加电势,使金属离子在工件的所有表面上电沉积,包括微孔孔特征的内表面到一个步骤中的预定的涂层。
    • 17. 发明申请
    • DUAL BAND SUPERHETERODYNE RECEIVER
    • 双带超级接收机
    • US20060089115A1
    • 2006-04-27
    • US10817416
    • 2004-04-02
    • Daniel Goodman
    • Daniel Goodman
    • H04B1/18H04B15/00H04B1/26H04B1/28
    • H04B1/28H04B1/005H04B1/406
    • A MMIC based superheterodyne receiver for converting at RF energy in an upper and a lower frequency band includes at least one attenuator for the RF energy input, a mixer for mixing the lower band input with a LO1 signal, another mixer for mixing the upper band input with the LO1 signal signal, a switch to direct the LO1 signal to the first mixer or to the second mixer, and a third mixer for mixing a LO2 signal with the first stage mixer output to produce a signal at the output frequency. Passband filters at the outputs of the mixers can reject interfering mixer-generated frequencies. Input frequency range can span 0.1 to 18 GHz with a 160 MHz or 1 GHz output. A modular receiver can have two or more converter modules for each LO module. The receiver can receive antenna input directly, without pre-mixing filtering or attenuating.
    • 用于在上和下频带中以RF能量转换的基于MMIC的超外差接收器包括用于RF能量输入的至少一个衰减器,用于将低频带输入与LO1信号混合的混频器,用于混合上频带输入 利用LO1信号信号,将LO1信号引导到第一混频器或第二混频器的开关,以及用于将LO2信号与第一级混频器输出混频以产生输出频率的信号的第三混频器。 混频器输出端的通带滤波器可以抑制干扰混频器产生的频率。 输入频率范围可以跨越0.1至18 GHz,具有160 MHz或1 GHz输出。 模块化接收器可以为每个LO模块提供两个或更多个转换器模块。 接收机可以直接接收天线输入,无需预混合滤波或衰减。
    • 18. 发明授权
    • Substrate processing pallet with cooling
    • 基板加工托盘带冷却
    • US09147588B2
    • 2015-09-29
    • US11716538
    • 2007-03-09
    • Daniel GoodmanArthur KeiglerStephen GolovatoDavid Felsenthal
    • Daniel GoodmanArthur KeiglerStephen GolovatoDavid Felsenthal
    • H01L21/00B05C11/00H01L21/67H01L21/677H01L21/683
    • H01L21/67103H01L21/67109H01L21/67703H01L21/6831
    • A substrate processing pallet can cool a substrate. A substrate processing pallet can include a base member; an interface pad attachable to the base member, the interface pad having substantially the same coefficient of thermal expansion as the base member and adapted to facilitate cooling of the substrate; and a surface of the base member having features for aligning a substrate on the interface pad. A substrate processing pallet can also include a base member; an interface pad attachable to the base member; an electrostatic chuck for gripping the substrate during processing; an energy storage system for storing energy to sustain the electrostatic chuck at sufficient charge to sustain grip the substrate during processing; and a conduit for transporting gas to a backside of the substrate to facilitate cooling of the substrate.
    • 基板处理托盘可以冷却基板。 基板处理托盘可以包括基部构件; 接口垫,其可附接到所述基底构件,所述界面垫具有与所述基底构件基本上相同的热膨胀系数并且适于促进所述衬底的冷却; 并且所述基底构件的表面具有用于使所述界面垫上的衬底对准的特征。 基板处理托盘还可以包括基部构件; 可附接到基座构件的接口垫; 用于在加工期间夹持基板的静电卡盘; 能量存储系统,用于存储能量以在足够的电荷下维持静电卡盘,以在加工期间保持夹持基板; 以及用于将气体输送到衬底的背面以便于冷却衬底的导管。