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11. 发明授权

US08461556B2 Using beam blockers to perform a patterned implant of a workpiece 有权
标题翻译：使用光束阻挡器来执行工件的图案化植入
公开(公告)号：US08461556B2
公开(公告)日：2013-06-11
申请号：US12877666
申请日：2010-09-08
申请人： Daniel Distaso , Russell J. Low
发明人： Daniel Distaso , Russell J. Low
IPC分类号： G21K5/10
CPC分类号： H01J37/3026 , H01J37/3171 , H01J2237/31703
摘要： Blockers in an ion beam blocker unit selectively block or trim an ion beam. In one instance, the ion beam has first current regions and second current regions. These current regions may be unequal. The ion beam is then implanted into a workpiece to form regions with different doses. The workpiece may be scanned so that the entirety of its surface is implanted.
摘要翻译：离子束阻挡单元中的阻挡剂选择性地阻挡或修整离子束。在一种情况下，离子束具有第一电流区域和第二电流区域。这些当前区域可能不相等。然后将离子束植入工件中以形成具有不同剂量的区域。可以扫描工件以使其整个表面被植入。

12. 发明授权

US08330127B2 Flexible ion source 有权
标题翻译：柔性离子源
公开(公告)号：US08330127B2
公开(公告)日：2012-12-11
申请号：US12080028
申请日：2008-03-31
申请人： Russell J. Low , Jay T. Scheuer , Alexander S. Perel , Craig R. Chaney , Neil J. Bassom
发明人： Russell J. Low , Jay T. Scheuer , Alexander S. Perel , Craig R. Chaney , Neil J. Bassom
IPC分类号： G21K5/00
CPC分类号： H01J27/022 , H01J37/04 , H01J37/08 , H01J37/16 , H01J2237/082
摘要： Liner elements to protect the ion source housing and also increase the power efficiency of the ion source are disclosed. Two liner elements, preferably constructed from tungsten, are inserted into the ion source chamber, one placed against each of the two sidewalls. These inserts are electrically biased so as to induce an electrical field that is perpendicular to the applied magnetic field. Such an arrangement has been unexpectedly found to increase the life of not only the ion chamber housing, but also the indirectly heated cathode (IHC) and the repeller. In addition, the use of these biased liner elements also improved the power efficiency of the ion source; allowing more ions to be generated at a given power level, or an equal number of ions to be generated at a lower power level.
摘要翻译：公开了用于保护离子源壳体的衬垫元件并且还提高了离子源的功率效率。将优选由钨构成的两个衬垫元件插入到离子源室中，一个放置在两个侧壁中的每一个上。这些插入物被电偏置以便引起垂直于所施加的磁场的电场。已经意外地发现这种布置不仅增加了离子室壳体的寿命，而且延长了间接加热的阴极（IHC）和排斥器的使用寿命。此外，使用这些偏置的衬垫元件也提高了离子源的功率效率; 允许在给定功率水平下产生更多的离子，或者在较低功率水平下产生相等数量的离子。

13. 发明申请

US20120056110A1 USING BEAM BLOCKERS TO PERFORM A PATTERNED IMPLANT OF A WORKPIECE 有权
标题翻译：使用光束阻挡器来执行工作的图案植入
公开(公告)号：US20120056110A1
公开(公告)日：2012-03-08
申请号：US12877666
申请日：2010-09-08
申请人： Daniel DISTASO , Russell J. Low
发明人： Daniel DISTASO , Russell J. Low
IPC分类号： G21K5/04
CPC分类号： H01J37/3026 , H01J37/3171 , H01J2237/31703
摘要： Blockers in an ion beam blocker unit selectively block or trim an ion beam. In one instance, the ion beam has first current regions and second current regions. These current regions may be unequal. The ion beam is then implanted into a workpiece to form regions with different doses. The workpiece may be scanned so that the entirety of its surface is implanted.
摘要翻译：离子束阻挡单元中的阻挡剂选择性地阻挡或修整离子束。在一种情况下，离子束具有第一电流区域和第二电流区域。这些当前区域可能不相等。然后将离子束植入工件中以形成具有不同剂量的区域。可以扫描工件以使其整个表面被植入。

14. 发明申请

US20120017938A1 PLATEN CLEANING 审中-公开
标题翻译：板清洁
公开(公告)号：US20120017938A1
公开(公告)日：2012-01-26
申请号：US13187078
申请日：2011-07-20
申请人： William T. Weaver , Kevin M. Daniels , Dale K. Stone , Russell J. Low , Benjamin B. Riordon , Jeffrey Blahnik
发明人： William T. Weaver , Kevin M. Daniels , Dale K. Stone , Russell J. Low , Benjamin B. Riordon , Jeffrey Blahnik
IPC分类号： B08B1/00
CPC分类号： H01L21/67028 , B08B1/008 , H01J2237/31711 , H01L21/67046
摘要： To achieve cost efficiency, solar cells must be processed at a high throughput. Breakages, which may leave debris on the clamping surface of the platen, adversely affect this throughput. A plurality of embodiments are disclosed which may be used to remove debris from the clamping surface without breaking the vacuum condition within the processing station. In some embodiments, a brush is used to sweep the debris from the surface of the platen. In other embodiments, an adhesive material is used to collect the debris. In some embodiments, the automation equipment used to handle masks may also be used to handle the platen cleaning mechanisms. In still other embodiments, stream of gas or ion beams are used to clean debris from the clamping surface of the platen.
摘要翻译：为了实现成本效益，必须以高产量处理太阳能电池。碎片可能会使碎片在压板的夹紧表面上产生不利影响。公开了多个实施例，其可以用于从夹紧表面去除碎屑而不破坏处理站内的真空状况。在一些实施例中，刷子用于从压板的表面扫掠碎屑。在其他实施例中，使用粘合剂材料来收集碎屑。在一些实施例中，用于处理掩模的自动化设备也可用于处理压板清洁机构。在其它实施例中，气流或离子束用于从压板的夹紧表面清洁碎屑。

15. 发明授权

US07675046B2 Terminal structure of an ion implanter 有权
标题翻译：离子注入机的端子结构
公开(公告)号：US07675046B2
公开(公告)日：2010-03-09
申请号：US11527842
申请日：2006-09-27
申请人： Kasegn D. Tekletsadik , Russell J. Low
发明人： Kasegn D. Tekletsadik , Russell J. Low
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J37/09 , H01J37/16 , H01J2237/0206 , H01J2237/026 , H01J2237/038 , H01J2237/08
摘要： An apparatus includes a conductive structure and an insulated conductor disposed proximate an exterior portion of the conductive structure to modify an electric field about the conductive structure. The insulated conductor has an insulator with a dielectric strength greater than 75 kilovolts (kV)/inch disposed about a conductor. An ion implanter is also provided. The ion implanter includes an ion source configured to provide an ion beam, a terminal structure defining a cavity, the ion source at least partially disposed within the cavity, and an insulated conductor. The insulated conductor is disposed proximate an exterior portion of the terminal structure to modify an electric field about the terminal structure. The insulated conductor has an insulator with a dielectric strength greater than 75 kV/inch disposed about a conductor.
摘要翻译：一种装置包括导电结构和布置在导电结构的外部附近的绝缘导体，以修改围绕导电结构的电场。绝缘导体具有介于绝缘体上的介电强度大于75千伏（kV）/英寸的导体周围。还提供了离子注入机。离子注入机包括被配置为提供离子束的离子源，限定空腔的端子结构，至少部分地设置在空腔内的离子源和绝缘导体。绝缘导体设置在端子结构的外部附近以修改围绕端子结构的电场。绝缘导体具有介于绝缘体上的介电强度大于75kV /英寸的导体周围。

16. 发明申请

US20090147435A1 PARTICLE TRAP 失效
标题翻译：颗粒捕捉
公开(公告)号：US20090147435A1
公开(公告)日：2009-06-11
申请号：US12327888
申请日：2008-12-04
申请人： Stephen E. Krause , Russell J. Low , Kasegn D. Tekletsadik
发明人： Stephen E. Krause , Russell J. Low , Kasegn D. Tekletsadik
IPC分类号： H01G7/02
CPC分类号： H01J37/3171 , H01J37/16 , H01J2237/022 , H01J2237/028 , H01J2237/038
摘要： An apparatus and method for trapping particles in a housing is disclosed. A high voltage terminal/structure is situated within a housing. A conductive material, having a plurality of holes, such as a mesh, is disposed a distance away from an interior surface of the housing, such as the floor of the housing, forming a particle trap. The conductive mesh is biased so that the electrical field within the trap is either non-existent or pushing toward the floor, so as to retain particles within the trap. Additionally, a particle mover, such as a fan or mechanical vibration device, can be used to urge particles into the openings in the mesh. Furthermore, a conditioning phase may be used prior to operating the high voltage terminal, whereby a voltage is applied to the conductive mesh so as to attract particles toward the particle trap.
摘要翻译：公开了一种用于将颗粒捕获在壳体中的装置和方法。高压端子/结构位于壳体内。具有诸如网的多个孔的导电材料设置成远离壳体的内表面（例如壳体的地板）一定距离，形成颗粒捕集器。导电网被偏置，使得陷阱内的电场不存在或者朝向地板推动，以便将颗粒保持在陷阱内。此外，诸如风扇或机械振动装置的颗粒移动器可用于将颗粒推入网中的开口中。此外，可以在操作高电压端子之前使用调节阶段，由此将电压施加到导电网，以将颗粒吸引到颗粒捕集器。

17. 发明申请

US20090050347A1 INSULATED CONDUCTING DEVICE WITH MULTIPLE INSULATION SEGMENTS 有权
标题翻译：具有多个绝缘部分的绝缘导体装置
公开(公告)号：US20090050347A1
公开(公告)日：2009-02-26
申请号：US11841086
申请日：2007-08-20
申请人： Kasegn D. Tekletsadik , Steve Krause , Eric Hermanson , Russell J. Low
发明人： Kasegn D. Tekletsadik , Steve Krause , Eric Hermanson , Russell J. Low
IPC分类号： H01B7/00 , H05K5/02
CPC分类号： H01J37/3171 , H01J37/09 , H01J2237/2001 , H01J2237/26
摘要： Insulated conducting devices and related methods are disclosed. An insulated conducting device for a voltage structure comprises: a conductor connected to a voltage; and multiple insulation segments enclosing the conductor, the multiple insulation segments interfacing with one another.
摘要翻译：公开了绝缘导电装置及相关方法。一种用于电压结构的绝缘导电装置包括：连接到电压的导体; 以及包围导体的多个绝缘段，多个绝缘段彼此接合。

18. 发明授权

US07446326B2 Technique for improving ion implanter productivity 有权
标题翻译：提高离子注入机生产率的技术
公开(公告)号：US07446326B2
公开(公告)日：2008-11-04
申请号：US11394825
申请日：2006-03-31
申请人： Craig R. Chaney , Russell J. Low , Jonathan Gerald England
发明人： Craig R. Chaney , Russell J. Low , Jonathan Gerald England
IPC分类号： G21K5/10
CPC分类号： H01J37/3171 , H01J37/08 , H01J2237/022 , H01J2237/082 , H01J2237/0822 , H01J2237/0827 , H01J2237/31705
摘要： A technique for improving ion implanter productivity is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for improving productivity of an ion implanter having an ion source chamber. The method may comprise supplying a gaseous substance to the ion source chamber, the gaseous substance comprising one or more reactive species for generating ions for the ion implanter. The method may also comprise stopping the supply of the gaseous substance to the ion source chamber. The method may further comprise supplying a hydrogen containing gas to the ion source chamber for a period of time after stopping the supply of the gaseous substance.
摘要翻译：公开了一种改善离子注入机生产率的技术。在一个特定的示例性实施例中，该技术可以被实现为用于提高具有离子源室的离子注入机的生产率的方法。该方法可以包括向离子源室供应气态物质，该气态物质包含用于产生用于离子注入机的离子的一种或多种反应性物质。该方法还可以包括停止向离子源室供应气态物质。该方法还可以包括在停止供应气态物质后的一段时间内向离子源室供应含氢气体。

19. 发明授权

US08756021B2 Method and system for in-situ monitoring of cathode erosion and predicting cathode lifetime 有权
标题翻译：阴极侵蚀现场监测方法及系统，预测阴极寿命
公开(公告)号：US08756021B2
公开(公告)日：2014-06-17
申请号：US12912312
申请日：2010-10-26
申请人： Russell J. Low , Kevin M. Daniels , Bon-Woong Koo , Richard M. White , James W. Blanchette
发明人： Russell J. Low , Kevin M. Daniels , Bon-Woong Koo , Richard M. White , James W. Blanchette
IPC分类号： G01B3/44
CPC分类号： H01J37/3171 , H01J37/08 , H01J37/242 , H01J2237/304
摘要： A method of controlling operation of an indirectly-heated cathode (IHC) ion source includes a step of measuring a rate of loss of cathode weight of the IHC ion source that occurs during operation using a first cathode configuration and under a first set of operation conditions. A maximum weight loss for the first cathode configuration is determined, and a cathode lifetime is calculated based upon the rate of cathode weight loss and the maximum weight loss. A further method includes receiving a minimum source bias power value for operation of a cathode in a first configuration, measuring a rate of decrease in source bias power for a cathode in the first configuration, and calculating a lifetime of the cathode based upon the minimum source bias power and rate of decrease in source bias power.
摘要翻译：控制间接加热的阴极（IHC）离子源的操作的方法包括以下步骤：测量在使用第一阴极配置的操作期间和在第一组操作条件下发生的IHC离子源的阴极重量损失率。确定第一阴极构造的最大重量损失，并且基于阴极重量损失率和最大重量损失计算阴极寿命。另一种方法包括：在第一配置中接收用于阴极操作的最小源偏置功率值，测量第一配置中阴极的源极偏置功率的降低率，以及基于最小源计算阴极的寿命偏置功率和源偏置功率的降低率。

20. 发明授权

US08455760B2 Interfacing two insulation parts in high voltage environment 有权
标题翻译：在高压环境下接合两个绝缘部件
公开(公告)号：US08455760B2
公开(公告)日：2013-06-04
申请号：US12983706
申请日：2011-01-03
申请人： Russell J. Low , Kasegn Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
发明人： Russell J. Low , Kasegn Tekletsadik , Anthony Renau , Piotr R. Lubicki , D. Jeffrey Lischer , Steve Krause , Eric Hermanson , Doug E. May
IPC分类号： H01R4/02
CPC分类号： H05H7/00 , H01B17/66 , H01J37/241 , H01J37/3171 , H01J2237/038
摘要： Methods of interfacing parts in a high voltage environment and related structures are disclosed. A method comprises: providing a first part and a second part; and interfacing the first part and the second part to create a first substantially zero electrical field area at a first outer extent of an interface between the first and second parts and a reduced electrical field area in a different portion of the interface.
摘要翻译：公开了在高电压环境中部分接口的相关结构的方法。一种方法包括：提供第一部分和第二部分; 以及接合所述第一部分和所述第二部分以在所述第一部分和所述第二部分之间的界面的第一外部范围处形成第一基本为零的电场区域，以及在所述界面的不同部分中的减小的电场区域。

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