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    • 12. 发明授权
    • High resolution i-line photoresist of high sensitivity
    • 高灵敏度的高分辨率i线光刻胶
    • US5759740A
    • 1998-06-02
    • US748298
    • 1996-11-13
    • Norbert MunzelReinhard SchulzHeinz HolzwarthStephan Ilg
    • Norbert MunzelReinhard SchulzHeinz HolzwarthStephan Ilg
    • C07D333/24C07C309/28G03F7/004G03F7/038G03F7/039H01L21/027
    • G03F7/0045Y10S430/11Y10S430/111Y10S430/12Y10S430/122Y10S430/123
    • The invention relates to the use of oxime sulfonates of formula 1 ##STR1## wherein R is naphthyl, ##STR2## Ar is an unsubstituted aryl group or an aryl group which carries one or more than one substituent selected from the group consisting of nitro, chloro, bromo, hydroxyl, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 perfluoroalkyl, C.sub.1 -C.sub.4 alkoxy and acid degradable substituent; R.sub.0 is either a R.sub.1 -X group or R.sub.2 ; X is an oxygen or a sulfur atom; R.sub.1 is hydrogen, C.sub.1 -C.sub.4 alkyl or unsubstituted phenyl or phenyl which is substituted by a member selected from the group consisting of chloro, bromo, C.sub.1 -C.sub.4 alkyl and C.sub.1 -C.sub.4 alkoxy, and R.sub.2 is hydrogen, C.sub.1 -C.sub.4 alkyl or an acid-degradable substituent, as radiation-sensitive photoacid generator in a chemically amplified photoresist which is developable in alkaline medium and is sensitive to radiation of a wavelength in the range from 340-390 nm, and to corresponding positive-working and negative-working photoresists for the cited wavelength range.
    • 本发明涉及式1的肟磺酸盐,其中R是萘基,Ar是未取代的芳基或芳基,其携带一个或多于一个选自以下的取代基: 硝基,氯,溴,羟基,C 1 -C 4烷基,C 1 -C 4全氟烷基,C 1 -C 4烷氧基和酸可降解取代基; R0是R1-X基团或R2; X是氧或硫原子; R 1是氢,C 1 -C 4烷基或未取代的苯基或被选自氯,溴,C 1 -C 4烷基和C 1 -C 4烷氧基的成员所取代的苯基,R 2是氢,C 1 -C 4烷基或酸可降解取代基 作为在碱性介质中可显影并对波长在340-390nm范围内的辐射敏感的化学放大光致抗蚀剂中的辐射敏感光致酸产生剂,以及用于所述波长的相应的正性和负性光致抗蚀剂 范围。
    • 13. 发明授权
    • High resolution i-line photoresist of high sensitivity
    • 高灵敏度的高分辨率i线光刻胶
    • US5627011A
    • 1997-05-06
    • US440388
    • 1995-05-12
    • Norbert MunzelReinhard SchulzHeinz HolzwarthStephan Ilg
    • Norbert MunzelReinhard SchulzHeinz HolzwarthStephan Ilg
    • C07D333/24C07C309/28G03F7/004G03F7/038G03F7/039H01L21/027
    • G03F7/0045Y10S430/11Y10S430/111Y10S430/12Y10S430/122Y10S430/123
    • The invention relates to the use of oxime sulfonates of formula 1 ##STR1## wherein R is naphthyl, ##STR2## Ar is an unsubstituted aryl group or an aryl group which carries one or more than one substituent selected from the group consisting of nitro, chloro, bromo, hydroxyl, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 perfluoroalkyl, C.sub.1 -C.sub.4 alkoxy and acid degradable substituents;R.sub.0 is either a R.sub.1 --X group or R.sub.2 ;X is an oxygen or a sulfur atom;R.sub.1 is hydrogen, C.sub.1 -C.sub.4 alkyl or unsubstituted phenyl or phenyl which is substituted by a member selected from the group consisting of chloro, bromo, C.sub.1 -C.sub.4 alkyl and C.sub.1 -C.sub.4 alkoxy, andR.sub.2 is hydrogen, C.sub.1 -C.sub.4 alkyl or an acid-degradable substituent, as radiation-sensitive photoacid generator in a chemically amplified photoresist which is developable in alkaline medium and is sensitive to radiation of a wavelength in the range from 340-390 nm, and to corresponding positive-working and negative-working photoresists for the cited wavelength range.
    • 本发明涉及式1的肟磺酸盐,其中R是萘基,Ar是未取代的芳基或芳基,其携带一个或多于一个选自以下的取代基: 硝基,氯,溴,羟基,C 1 -C 4烷基,C 1 -C 4全氟烷基,C 1 -C 4烷氧基和酸可降解取代基; R0是R1-X基团或R2; X是氧或硫原子; R 1是氢,C 1 -C 4烷基或未取代的苯基或被选自氯,溴,C 1 -C 4烷基和C 1 -C 4烷氧基的成员所取代的苯基,R 2是氢,C 1 -C 4烷基或酸可降解取代基 作为在碱性介质中可显影并对波长在340-390nm范围内的辐射敏感的化学放大光致抗蚀剂中的辐射敏感光致酸产生剂,以及用于所述波长的相应的正性和负性光致抗蚀剂 范围。
    • 19. 发明授权
    • Trifunctional photoinitiators
    • 三功能光引发剂
    • US07462650B2
    • 2008-12-09
    • US10552952
    • 2004-05-04
    • Reinhard H. SommerladeRinaldo HüslerStephan IlgAndré FuchsSouâd BoulmaâzJean-Luc Birbaum
    • Reinhard H. SommerladeRinaldo HüslerStephan IlgAndré FuchsSouâd BoulmaâzJean-Luc Birbaum
    • C08F2/46C07C49/00
    • G03F7/0295B33Y70/00C07C45/46C07C45/63C07C45/64C07C45/71C07C49/784C07C49/813C07C49/83C07C49/84C07C225/22C07C271/20C07C2601/14C08F2/50G03F7/029G03F7/031
    • The Invention relates to novel ketones of formulae (I) and (II) wherein R1, R2, R3 and R4 are, for example, C1-C8alkyl, R5 is, for example, hydrogen, A is CI, Br, -0-R7, —NR8R9 or —S—R16, A′ is —O—, —NH— or —NR8—, X and Y are each independently of the other —O—R10 or —N(R11)(R12), n is an integer from 1 to 10, R6 is, for example, an n-valent radical of linear or branched C2-C20alkyl the carbon chain of which may be interrupted by cyclohexanediyl, phenylene, —CH(OH)—, —C(C2H5)(CH2—CH2—OH)—, —C(CH3)(CH2—CH2—OH)—, —C(CH2—CH2—OH)2—, —N(CH3)—, —N(C2H5)—, —N(CH2—CH2—OH)—, —CO—O—, —O—CO—, —P(CH2—CH2—OH)—, —P(O)(CH2—CH2—OH)—, -0-P(O—CH2—CH2—OH)—O—, -0-P(O)(0-CH2—CH2—OH)—O—, —O-cyclohexanediyl-C(CH3)2-Cyclohexanediyl-O—, —O-phenylene-C(CH3)2-phenylene-O—, —O-phenylene-CH2-phenylene-O—, —Si(CH3)2—, -0-Si(CH3)2—O—, —O—Si(CH3)(0-CH3)—O—, —Si(CH3)(R17)—O—Si(CH3)(R18)—, 5-(2-hydroxyethyl)-[1,3,5]triazinane-2,4,6-trione-1,3-diyl and/or by from one to nine oxygen atoms.
    • 本发明涉及式(I)和(II)的新型酮,其中R 1,R 2,R 3和R 4是例如C 1 -C 8烷基,R 5是例如氢,A是Cl,Br,-O-R 7 ,-NR 8 R 9或-S-R 16,A'为-O-,-NH-或-NR 8 - ,X和Y各自独立地为O-R 10或-N(R 11)(R 12),n为 R 1为例如直链或支链C 2 -C 20烷基的n价基团,其碳链可以被环己二基,亚苯基,-CH(OH) - , - C(C 2 H 5)( CH 2 -CH 2 -OH) - , - C(CH 3)(CH 2 -CH 2 -OH) - , - C(CH 2 -CH 2 OH)2 - , - N(CH 3) - , - N(C 2 H 5) (CH2-CH2-OH) - , - CO-O - , - O-CO-,-P(CH2-CH2-OH) - ,-P(O)(CH2-CH2-OH) (O-CH 2 -CH 2 -OH)-O-,-O-P(O)(O-CH 2 -CH 2 -OH)-O-,-O-环己二基-C(CH 3)2 - 环己烷二基-O-, - O-亚苯基-C(CH 3)2 - 亚苯基-O - , - 亚苯基-CH 2 - 亚苯基-O-,-Si(CH 3)2 - , - O-Si(CH 3)2 -O-,-O- Si(CH 3)(O-CH 3)-O-,-Si(CH 3)(R 17)-O-Si(CH 3)(R 18) - ,5-(2-羟乙基) - [1,3,5] 2,4,6-三酮-1,3-二基和/或1-9个氧原子。