专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5759740A High resolution i-line photoresist of high sensitivity 失效
标题翻译：高灵敏度的高分辨率i线光刻胶
公开(公告)号：US5759740A
公开(公告)日：1998-06-02
申请号：US748298
申请日：1996-11-13
申请人： Norbert Munzel , Reinhard Schulz , Heinz Holzwarth , Stephan Ilg
发明人： Norbert Munzel , Reinhard Schulz , Heinz Holzwarth , Stephan Ilg
IPC分类号： C07D333/24 , C07C309/28 , G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , Y10S430/11 , Y10S430/111 , Y10S430/12 , Y10S430/122 , Y10S430/123
摘要： The invention relates to the use of oxime sulfonates of formula 1 ##STR1## wherein R is naphthyl, ##STR2## Ar is an unsubstituted aryl group or an aryl group which carries one or more than one substituent selected from the group consisting of nitro, chloro, bromo, hydroxyl, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 perfluoroalkyl, C.sub.1 -C.sub.4 alkoxy and acid degradable substituent; R.sub.0 is either a R.sub.1 -X group or R.sub.2 ; X is an oxygen or a sulfur atom; R.sub.1 is hydrogen, C.sub.1 -C.sub.4 alkyl or unsubstituted phenyl or phenyl which is substituted by a member selected from the group consisting of chloro, bromo, C.sub.1 -C.sub.4 alkyl and C.sub.1 -C.sub.4 alkoxy, and R.sub.2 is hydrogen, C.sub.1 -C.sub.4 alkyl or an acid-degradable substituent, as radiation-sensitive photoacid generator in a chemically amplified photoresist which is developable in alkaline medium and is sensitive to radiation of a wavelength in the range from 340-390 nm, and to corresponding positive-working and negative-working photoresists for the cited wavelength range.
摘要翻译：本发明涉及式1的肟磺酸盐，其中R是萘基，Ar是未取代的芳基或芳基，其携带一个或多于一个选自以下的取代基：硝基，氯，溴，羟基，C 1 -C 4烷基，C 1 -C 4全氟烷基，C 1 -C 4烷氧基和酸可降解取代基; R0是R1-X基团或R2; X是氧或硫原子; R 1是氢，C 1 -C 4烷基或未取代的苯基或被选自氯，溴，C 1 -C 4烷基和C 1 -C 4烷氧基的成员所取代的苯基，R 2是氢，C 1 -C 4烷基或酸可降解取代基作为在碱性介质中可显影并对波长在340-390nm范围内的辐射敏感的化学放大光致抗蚀剂中的辐射敏感光致酸产生剂，以及用于所述波长的相应的正性和负性光致抗蚀剂范围。

2. 发明授权

US5627011A High resolution i-line photoresist of high sensitivity 失效
标题翻译：高灵敏度的高分辨率i线光刻胶
公开(公告)号：US5627011A
公开(公告)日：1997-05-06
申请号：US440388
申请日：1995-05-12
申请人： Norbert Munzel , Reinhard Schulz , Heinz Holzwarth , Stephan Ilg
发明人： Norbert Munzel , Reinhard Schulz , Heinz Holzwarth , Stephan Ilg
IPC分类号： C07D333/24 , C07C309/28 , G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , Y10S430/11 , Y10S430/111 , Y10S430/12 , Y10S430/122 , Y10S430/123
摘要： The invention relates to the use of oxime sulfonates of formula 1 ##STR1## wherein R is naphthyl, ##STR2## Ar is an unsubstituted aryl group or an aryl group which carries one or more than one substituent selected from the group consisting of nitro, chloro, bromo, hydroxyl, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 perfluoroalkyl, C.sub.1 -C.sub.4 alkoxy and acid degradable substituents;R.sub.0 is either a R.sub.1 --X group or R.sub.2 ;X is an oxygen or a sulfur atom;R.sub.1 is hydrogen, C.sub.1 -C.sub.4 alkyl or unsubstituted phenyl or phenyl which is substituted by a member selected from the group consisting of chloro, bromo, C.sub.1 -C.sub.4 alkyl and C.sub.1 -C.sub.4 alkoxy, andR.sub.2 is hydrogen, C.sub.1 -C.sub.4 alkyl or an acid-degradable substituent, as radiation-sensitive photoacid generator in a chemically amplified photoresist which is developable in alkaline medium and is sensitive to radiation of a wavelength in the range from 340-390 nm, and to corresponding positive-working and negative-working photoresists for the cited wavelength range.
摘要翻译：本发明涉及式1的肟磺酸盐，其中R是萘基，Ar是未取代的芳基或芳基，其携带一个或多于一个选自以下的取代基：硝基，氯，溴，羟基，C 1 -C 4烷基，C 1 -C 4全氟烷基，C 1 -C 4烷氧基和酸可降解取代基; R0是R1-X基团或R2; X是氧或硫原子; R 1是氢，C 1 -C 4烷基或未取代的苯基或被选自氯，溴，C 1 -C 4烷基和C 1 -C 4烷氧基的成员所取代的苯基，R 2是氢，C 1 -C 4烷基或酸可降解取代基作为在碱性介质中可显影并对波长在340-390nm范围内的辐射敏感的化学放大光致抗蚀剂中的辐射敏感光致酸产生剂，以及用于所述波长的相应的正性和负性光致抗蚀剂范围。

3. 发明授权

US5650262A High-resolution negative photoresist with wide process latitude 失效
标题翻译：高分辨率负光刻胶，工艺宽广
公开(公告)号：US5650262A
公开(公告)日：1997-07-22
申请号：US417119
申请日：1995-04-05
申请人： Norbert Munzel , Reinhard Schulz , Heinz Holzwarth
发明人： Norbert Munzel , Reinhard Schulz , Heinz Holzwarth
IPC分类号： C07C39/04 , G03F7/004 , G03F7/038 , H01L21/027
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/0382 , Y10S430/106 , Y10S430/122
摘要： The invention relates to a chemically amplified negative photoresist which can be developed in aqueous alkaline media, which contains a radiation-sensitive acid generator and a compound which reduces the solubility of the resist in aqueous alkaline solutions in the presence of acid, and a polyhydroxyl compound of the formula I ##STR1## in which n is an integer between 2 and 6,R is hydrogen, halogen, C.sub.1 -C.sub.4 alkoxy or C.sub.1 -C.sub.4 alkyl, andZ is an n-valent radical which is unsubstituted or substituted by one or more substituents from the group consisting of hydroxyl, halogen and C.sub.1 -C.sub.4 alkoxy, and is selected from the group consisting of:a) aliphatic radicals having 1 to 12 carbon atoms,b) cycloaliphatic radicals having 5 to 20 carbon atoms,c) aromatic radicals having 6 to 20 carbon atoms andd) radicals having 7 to 30 carbon atoms which comprise at least two different structural units selected from aliphatic, cycloaliphatic or aromatic groups. The resists described make it possible to reduce the demands made on the focusing accuracy during imagewise exposure.
摘要翻译：本发明涉及一种可在含水碱性介质中显影的化学放大型负性光致抗蚀剂，其含有辐射敏感性酸产生剂和在酸存在下降低抗蚀剂在碱性水溶液中的溶解度的化合物，以及多羟基化合物其中n是2和6之间的整数，R是氢，卤素，C 1 -C 4烷氧基或C 1 -C 4烷基，Z是未被取代或被一个取代的n价基团的式I 或更多的选自羟基，卤素和C 1 -C 4烷氧基的取代基，并且选自：a）具有1至12个碳原子的脂族基团，b）具有5至20个碳原子的脂环族基团，c）芳族具有6至20个碳原子的基团和d）具有7至30个碳原子的基团，其包含至少两个选自脂肪族，脂环族或芳族基团的不同结构单元。所描述的抗蚀剂使得可以降低在成像曝光期间对聚焦精度的要求。

4. 发明授权

US5296330A Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive 失效
标题翻译：含有醌二叠氮敏感剂，碱溶性树脂和四（羟基苯基）烷烃添加剂的正型光致抗蚀剂
公开(公告)号：US5296330A
公开(公告)日：1994-03-22
申请号：US932128
申请日：1992-08-15
申请人： Reinhard Schulz , Norbert Munzel , Martin Roth , Wilhelm Knobloch
发明人： Reinhard Schulz , Norbert Munzel , Martin Roth , Wilhelm Knobloch
IPC分类号： G03F7/004 , C07C39/15 , C07C309/71 , C07C309/76 , C08K5/42 , C08L101/00 , G03F7/022 , H01L21/027 , H05K3/00 , G03F7/023 , G03C1/61
CPC分类号： C07C309/76 , C07C39/15 , G03F7/0226
摘要： Positive photoresist compositions comprising, in an organic solvent, at leasta) one alkali-soluble resin,b) one photosensitive quinone diazide,c) one aromatic hydroxy compound of formula I ##STR1## wherein each R is --H, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, --OCH.sub.2 C.sub.6 H.sub.5, --OC.sub.6 H.sub.5 or --COOC.sub.1 -C.sub.4 alkyl, and R.sub.1 and R.sub.2 are each independently of the other H, C.sub.1 -C.sub.4 alkyl, --C.sub.6 H.sub.5 or a cycloaliphatic 5- or 6-membered ring, a is an integer from 0 to 4, and m and n are each independently of the other 0, 1 or 2, which compound enhances the photosensitivity and/or the rate of development, and optionallyd) additional customary modifiers,are eminently suitable for making relief structures.
摘要翻译：正性光致抗蚀剂组合物，其在有机溶剂中包含至少一种碱溶性树脂，b）一种光敏醌二叠氮化物，c）一种式I的芳族羟基化合物（*化学结构*）（I），其中每个R是 - H，C 1 -C 4烷基，C 1 -C 4烷氧基，-OCH 2 C 6 H 5，-OC 6 H 5或-COOC 1 -C 4烷基，R 1和R 2各自独立地为H，C 1 -C 4烷基，-C 6 H 5或脂环族五元或六元环， a是0至4的整数，m和n各自独立地为0,1或2，该化合物增强光敏性和/或显影速率，以及任选地d）另外的常规改性剂，特别适用于做救济结构。

5. 发明授权

US5436098A Positive photoresists with enhanced resolution and reduced crystallization containing novel tetra(hydroxyphenyl)alkanes 失效
标题翻译：正性光致抗蚀剂具有增强的分辨率和减少含有新型四（羟基苯基）烷烃的结晶
公开(公告)号：US5436098A
公开(公告)日：1995-07-25
申请号：US180180
申请日：1994-01-11
申请人： Reinhard Schulz , Norbert Munzel , Martin Roth , Wilhelm Knobloch
发明人： Reinhard Schulz , Norbert Munzel , Martin Roth , Wilhelm Knobloch
IPC分类号： G03F7/004 , C07C39/15 , C07C309/71 , C07C309/76 , C08K5/42 , C08L101/00 , G03F7/022 , H01L21/027 , H05K3/00 , G03F7/023
CPC分类号： C07C309/76 , C07C39/15 , G03F7/0226
摘要： Positive photoresist compositions comprising, in an organic solvent, at leasta) one alkali-soluble resin,b) one photosensitive quinone diazide,c) one aromatic hydroxy compound of formula I ##STR1## wherein each R is --H, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, --OCH.sub.2 C.sub.6 H.sub.5, --OC.sub.6 H.sub.5 or --COOC.sub.1 -C.sub.4 alkyl, and R.sub.1 and R.sub.2 are each independently of the other H, C.sub.1 -C.sub.4 alkyl, --C.sub.6 H.sub.5 or a cycloaliphatic 5- or 6-membered ring, a is an integer from 0 to 4, and m and n are each independently of the other 0, 1 or 2, which compound enhances the photosensitivity and/or the rate of development, and optionallyd) additional customary modifiers, are eminently suitable for making relief structures.
摘要翻译：正性光致抗蚀剂组合物，其在有机溶剂中包含至少一种碱溶性树脂，b）一种光敏醌二叠氮化物，c）一种式I的芳族羟基化合物，其中每个R是-H，C1 C 1-4烷基，C 1 -C 4烷氧基，-OCH 2 C 6 H 5，-OC 6 H 5或-COOC 1 -C 4烷基，R 1和R 2各自独立地为H，C 1 -C 4烷基，-C 6 H 5或脂环族五元或六元环，a为 0至4的整数，m和n各自独立地为0,1或2，该化合物增强了光敏性和/或显影速率，并且任选地d）另外的常规改性剂特别适用于制备浮雕结构。

6. 发明授权

US06306555B1 Iodonium salts as latent acid donors 有权
标题翻译：碘盐作为潜酸供体
公开(公告)号：US06306555B1
公开(公告)日：2001-10-23
申请号：US09740205
申请日：2000-12-18
申请人： Reinhard Schulz , Jean-Luc Birbaum , Jean-Pierre Wolf , Stephan Ilg , Hitoshi Yamato , Toshikage Asakura
发明人： Reinhard Schulz , Jean-Luc Birbaum , Jean-Pierre Wolf , Stephan Ilg , Hitoshi Yamato , Toshikage Asakura
IPC分类号： G03F7004
CPC分类号： G03F7/0382 , B33Y70/00 , C07C17/00 , C07C25/18 , C07C2601/14 , C08G59/68 , C08G65/105 , G03F7/0045 , G03F7/038 , G03F7/0392 , Y10S430/115
摘要： Radiation-sensitive compositions comprising (a1) a cationically or acid-catalytically polymerisable or crosslinkable compound or (a2) a compound that increases its solubility in a developer under the action of acid; and (b) at least one diaryliodonium salt of formula I X is branched C3-C20alkyl or C3-C8cycloalkyl; X1 is hydrogen, linear C1-C20alkyl, branched C3-C20alkyl or C3-C8cycloalkyl; with the proviso that the sum of the carbon atoms in X and X1 is at least 4; Y is linear C1-C10alkyl, branched C3-C10alkyl or C3-C8cycloalkyl; A− is a non-nucleophilic anion, selected from the group (BF4)−, (SbF6)−, (PF6)−, (B(C6F5))4−, C1-C20alkylsulfonate, C2-C20haloalkylsulfonate, unsubstituted C6-C10arylsulfonate, camphorsulfonate, and C6-C10arylsulfonate substituted by halogen, NO2, C1-C12alkyl, C1-C12halo-alkyl, C1-C12alkoxy or by COOR1; and R1 is C1-C20alkyl, phenyl, benzyl; or phenyl mono- or poly-substituted by C1-C12alkyl, C1-C12alkoxy or by halogen; with the proviso that the two phenyl rings on the iodine atom are not identically substituted.
摘要翻译：辐射敏感性组合物，其包含（a1）阳离子或酸可催化聚合或交联的化合物或（a2）在酸的作用下增加其在显影剂中的溶解度的化合物; 和（b）式IX的至少一种二芳基碘鎓盐是支链C 3 -C 20烷基或C 3 -C 8环烷基; X 1是氢，直链C 1 -C 20烷基，支链C 3 -C 20烷基或C 3 -C 8环烷基; 条件是X和X 1中的碳原子总数至少为4; Y为直链C 1 -C 10烷基，支链C 3 -C 10烷基或C 3 -C 8环烷基; A-为非亲核阴离子，选自（BF 4 ） - ，（SbF 6） - ，（PF 6） - ，（B（C 6 F 5））4-，C 1 -C 20烷基磺酸酯，C 2 -C 20卤代烷基磺酸酯，未取代的C 6 -C 10芳基磺酸酯，樟脑磺酸酯和C 6 -C 10芳基磺酸酯，被卤素，，C 1 -C 12卤代烷基，C 1 -C 12烷氧基或COOR 1; 并且R 1是C 1 -C 20烷基，苯基，苄基; 或被C 1 -C 12烷基，C 1 -C 12烷氧基或卤素单取代或多取代的苯基;条件是碘原子上的两个苯环不同等取代。

7. 发明申请

US20100224380A1 PNEUMATIC HAMMER MECHANISM AND CONTROL METHOD 有权
标题翻译：气动锤机理及控制方法
公开(公告)号：US20100224380A1
公开(公告)日：2010-09-09
申请号：US12697066
申请日：2010-01-29
申请人： Alexander JOHN , Reinhard Schulz , Eduard Pfeiffer
发明人： Alexander JOHN , Reinhard Schulz , Eduard Pfeiffer
IPC分类号： B25D11/06
CPC分类号： B25D11/125 , B25D11/005 , B25D2250/245
摘要： A pneumatic hammer mechanism is disclosed. The hammer mechanism features: a flying mass, which is movable along an impact axis; an impact surface, which limits a movement of the flying mass along the impact axis in the impact direction; a hammer piston, which limits a movement of the flying mass along the impact axis opposite from the impact direction; a pneumatic chamber between the flying mass and hammer piston; a drive for periodically moving the hammer piston with a stroke along the impact axis, wherein the flying mass is excited to a periodic movement between the impact surface and hammer piston. The stroke is selected as a function of a maximum length of the pneumatic chamber such that the periodic movement of the flying mass on the path between an impact on the impact surface and a minimum approach of the hammer piston intermittently has a velocity of zero.
摘要翻译：公开了一种气动锤机构。锤子机构具有：可沿着冲击轴线移动的飞行质量块; 撞击表面，其限制飞行质量沿冲击轴线在冲击方向上的运动; 一个锤子活塞，其限制飞行质量块沿冲击轴线与冲击方向相反的运动; 飞行质量块和锤式活塞之间的气动室; 驱动器，用于沿着冲击轴线周期性地移动锤子活塞，其中飞行质量被激发以在冲击表面和锤形活塞之间的周期性运动。作为气动室的最大长度的函数来选择行程，使得飞行质量在冲击表面上的冲击和锤式活塞的最小接近之间的路径上的周期性运动具有零速度。

8. 发明授权

US5200293A Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound 失效
标题翻译：含有特定量的四羟基二苯硫醚和多羟基化合物的萘醌二叠氮磺酰酯的光致抗蚀剂组合物
公开(公告)号：US5200293A
公开(公告)日：1993-04-06
申请号：US793494
申请日：1991-11-14
申请人： Reinhard Schulz , Horst Munzel , Ekkehard Bartmann
发明人： Reinhard Schulz , Horst Munzel , Ekkehard Bartmann
IPC分类号： G03F7/022
CPC分类号： G03F7/022
摘要： Positive-working photoresist compositions containing 23-27%, based on said composition, of at least one compound of formula (I) ##STR1## wherein one of the substituents X is hydrogen or a group of formula II ##STR2## and the other substituents X are a group of formula II; and 6-11%, based on said composition, of at least one polyhydroxy compound of formula III ##STR3## wherein X is a direct bond, --O--, --S--, --SO.sub.2 --, --CO-- or C(R.sub.6 (R.sub.7)--, and R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are each independently of the other hydrogen, halogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or hydroxy, and R.sub.6 and R.sub.7 are each independently of the other hydrogen, --CH.sub.3 or --CF.sub.3.These compositions have particularly good profile contrast and exhibit insignificant fluctuations in line width.
摘要翻译：基于所述组合物含有至少一种式（I）化合物（I）的23-27％的正性光致抗蚀剂组合物，其中一个取代基X为氢或式II的基团 II），其它取代基X是式II的基团; 基于所述组合物的至少一种式III III的多羟基化合物（III）的6-11％，其中X是直接键，-O - ， - S - ， - SO 2 - ， - CO-或C （R 6（R 7） - ，R 1，R 2，R 3，R 4和R 5各自独立地为氢，卤素，C 1 -C 4烷基，C 1 -C 4烷氧基或羟基，R 6和R 7各自独立地为氢， CH3或-CF3。这些组合物具有特别好的轮廓对比度，并且在线宽上显示出不显着的波动。

9. 发明授权

US5104768A Positive photoresist composition containing radiation sensitive quinonediazide compound and completely esterified polyamic acid polymer 失效
标题翻译：含有辐射敏感的喹喔啉化合物的阳性光电组合物和完全纯化的聚酰胺聚合物
公开(公告)号：US5104768A
公开(公告)日：1992-04-14
申请号：US430760
申请日：1989-11-02
申请人： Jorg Sassmannshausen , Reinhard Schulz , Ekkehard Bartmann
发明人： Jorg Sassmannshausen , Reinhard Schulz , Ekkehard Bartmann
IPC分类号： G03F7/022 , G03F7/023 , H01L21/027
CPC分类号： G03F7/0233 , Y10S430/106 , Y10S430/107
摘要： The invention relates to positive working photoresists for producing relief structures of high-temperature resistant polyimide prepolymers, which photoresists can be developed in aqueous-alkaline medium and which contain, in an organic solvent, essentially at leasta) one prepolymer which is convertible into a polyimide,b) one radiation-sensitive quinonediazide compound, and further optional components, said prepolymer being a completely esterified polyamic acid polymer.
摘要翻译：本发明涉及用于生产耐高温聚酰亚胺预聚物的浮雕结构的正性工作光致抗蚀剂，该光致抗蚀剂可在含水 - 碱性介质中显影，并且在有机溶剂中含有至少一种可转化为聚酰亚胺，b）一种辐射敏感性醌二叠氮化合物，以及另外任选的组分，所述预聚物是完全酯化的聚酰胺酸聚合物。

10. 发明授权

US4980268A Negative photoresists of the polyimide type containing 1,2-disulfones 失效
标题翻译：含有1,2-二砜的聚酰亚胺类型的负型光致抗蚀剂
公开(公告)号：US4980268A
公开(公告)日：1990-12-25
申请号：US321432
申请日：1989-03-09
申请人： Ekkehard Bartmann , Rudolf Klug , Reinhard Schulz , Hartmut Hartner
发明人： Ekkehard Bartmann , Rudolf Klug , Reinhard Schulz , Hartmut Hartner
IPC分类号： C08L79/08 , C08G73/10 , C08K5/42 , G03F7/031
CPC分类号： G03F7/031 , Y10S430/122 , Y10S430/128
摘要： The invention relates to negative photoresists of the polyimide type essentially containing, in an organic solvent, in each case at least(a) one polyamide-acid or polyamide-acid derivative prepolymer which can be converted into a highly heat-resistant polyimide polymer,(b) a photoinitiator, and, if appropriate, further customary additives which contain, as the photoinitiator, a compound of the formula IR.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 I in which R.sup.1 and R.sup.2 are as defined.
摘要翻译：本发明涉及聚酰亚胺类型的负型光致抗蚀剂，其基本上在有机溶剂中含有至少（a）一种聚酰胺酸或聚酰胺 - 酸衍生物预聚物，其可以转化为高耐热聚酰亚胺聚合物（ b）光引发剂，以及如果合适的话，还含有作为光引发剂的式Ⅰ化合物R1-SO2-SO2-R2Ⅰ的其它常规添加剂，其中R 1和R 2如所定义。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式