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11. 发明专利

DE60029557D1 未知
公开(公告)号：DE60029557D1
公开(公告)日：2006-09-07
申请号：DE60029557
申请日：2000-09-11
申请人： FUJIKIN KK
发明人： IKEDA NOBUKAZU , MORIMOTO AKIHIRO , MINAMI YUKIO , HONIDEN TERUO , KAWADA KOUJI , KOMEHANA KATUNORI , HIRAI TOURU , YAMAJI MICHIO
IPC分类号： F17D1/04 , B01D53/26 , F17D3/14
摘要： A method of removing moisture efficiently in the gas supply system by evacuation at normal temperature without using the baking method. The method involves flowing a gas to remove moisture in the gas supply system with the flow pressure of the gas to remove moisture set at not lower than a minimum pressure at which the gas flow becomes viscous and not higher than a water saturated vapor pressure at a flow temperature of the gas to remove moisture. The gas to remove moisture achieves a viscous flow when a mean free path of gas molecules is smaller than a diameter of piping of the gas supply system. If the gas for removing moisture is evacuated at normal temperature under such conditions, the adsorbed moisture on an inside surface of the piping and in the valves and filters can be removed effectively.

12. 发明专利

SG102028A1 REACTOR FOR GENERATING MOISTURE 未知
公开(公告)号：SG102028A1
公开(公告)日：2004-02-27
申请号：SG200200439
申请日：2002-02-01
申请人： FUJIKIN KK
发明人： KOMEHANA KATSUNORI , MINAMI YUKIO , KAWADA KOJI , MORIMOTO AKIHIRO , IKEDA NOBUKAZU , NAKAMURA OSAMU , HONIDEN TERUO , HIRAI TORU
IPC分类号： B01J12/00 , H01L21/20 , C01B5/00
摘要： A reactor (2) for generating moisture in which the starting material gases are caused to undergo turbulence so as to increase the efficiency of the moisture-generating reaction. The reactor (2) for generating moisture comprises a first inlet-side reactor structural component (4) which is adapted to supply the starting material gases from a starting material gas feed port into the inlet side of an interior space; a second outlet-side reactor structural component (2) which is adapted to transfer generated gas to a moisture gas take-out port (30a) from a moisture gas feed passage (28); a reflector (12) clamped air-tightly between the first and second structural components (4,20) and having a plurality of blowing holes (16) at predetermined locations for communicating with the inlet-side interior space (8); a reactor chamber (18) formed with a narrow gap d provided between the reflector (12) and the second structural component (20); a nozzle hole (24) formed in the second structural component (20) for communicating with the moisture gas feed passage (28); and a coating catalyst layer (21) formed on a wall surface (20a) of the reaction chamber opposing the reflector (12); wherein when hydrogen and oxygen gas fed from the starting material gas feed port flow into the reaction chamber (18) through the blowing holes (16) in the reflector (12), they react and generate moisture gas by a non-combustive pathway by the catalytic effect of the coating catalyst layer (21).

13. 发明专利

SG94873A1 REACTOR FOR GENERATING HIGH PURITY MOISTURE 未知
公开(公告)号：SG94873A1
公开(公告)日：2003-03-18
申请号：SG200202050
申请日：2000-07-21
申请人： FUJIKIN KK , TADAHIRO OHMI
发明人： OHMI TADAHIRO , IKEDA NOBUKAZU , MINAMI YUKIO , KAWADA KOUJI , KOMEHANA KATSUNORI , HONIDEN TERUO , HIRAI TOURU , MORIMOTO AKIHIRO , NARIAI TOSHIROU , HIRAO KEIJI , TAGUCHI MASAHARU , NAKAMURA OSAMU
IPC分类号： B01J3/00 , B01J7/00 , B01J12/00 , C01B5/00
摘要： A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.

14. 发明专利

CA2347784A1 METHOD OF REMOVING MOISTURE IN GAS SUPPLY SYSTEM 未知
公开(公告)号：CA2347784A1
公开(公告)日：2001-03-22
申请号：CA2347784
申请日：2000-09-11
申请人： FUJIKIN KK
发明人： HONIDEN TERUO , YAMAJI MICHIO , HIRAI TOURU , KOMEHANA KATUNORI , MINAMI YUKIO , KAWADA KOUJI , MORIMOTO AKIHIRO , IKEDA NOBUKAZU
IPC分类号： B01D53/26 , F17D1/04 , F17D3/14
摘要： A dewatering method for gas supply systems which is adapted for effective removal of adsorbed water by ordinary-temperature exhaust processing without using the baking method. The dewatering method for gas supply systems which remove water remaining inside a gas supply system by passing a dewatering ga s through the gas supply system, characterized in that the dewatering gas flow pressure is set at values which are above a minimum pressure at which the ga s flow becomes a viscous flow but which are below the saturated vapor pressure of water at the dewatering gas flow temperature. The condition under which t he dewatering gas becomes a viscous flow is determined by the mean free path of gas molecules becoming smaller than the diameter of the piping for the gas supply system. If the dewatering gas is exhausted at ordinary temperature under such condition, the adsorbed water on the inner surface of the piping or in the valve filter can be effectively removed.

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