专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明授权

US5161176A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5161176A
公开(公告)日：1992-11-03
申请号：US802705
申请日：1991-12-06
申请人： Ryuichi Ebinuma , Kunitaka Ozawa , Takao Kariya , Shunichi Uzawa , Noriyuki Nose
发明人： Ryuichi Ebinuma , Kunitaka Ozawa , Takao Kariya , Shunichi Uzawa , Noriyuki Nose
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70066
摘要： An exposure apparatus includes a light source for exposing a wafer through a mask; a light blocking device being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system for detecting positional deviation between the mask and the wafer; and a drive control system for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.
摘要翻译：曝光装置包括用于通过掩模曝光晶片的光源; 遮光装置可移动并且有效地阻挡来自光源的光以限制曝光区域; 用于检测掩模和晶片之间的位置偏差的位置偏差检测系统; 以及驱动控制系统，用于基于来自位置偏差检测系统的检测信号移动遮光装置以执行其位置控制。

12. 发明授权

US5122660A Distance measuring system utilizing an object with at least one inclined surface 失效
标题翻译：距离测量系统使用至少一个内置表面的对象
公开(公告)号：US5122660A
公开(公告)日：1992-06-16
申请号：US671657
申请日：1991-03-19
申请人： Minoru Yoshii , Noriyuki Nose , Yukichi Niwa , Ryo Kuroda
发明人： Minoru Yoshii , Noriyuki Nose , Yukichi Niwa , Ryo Kuroda
IPC分类号： G01D5/38 , G02B7/32 , G11B7/085
CPC分类号： G11B7/085 , G01D5/38 , G02B7/32
摘要： A device for measuring a relatively moving distance of two relatively moving objects is disclosed. The device includes a plurality of inclined surfaces formed on one of the objects and arrayed with a predetermined pitch along the relatively moving direction, with each of the inclined surfaces being inclined with respect to the relatively moving direction. A measuring portion is provided on the other object for measuring the distance to at least one of the inclined surfaces in a direction having an angle with respect to the relatively moving direction, and a detecting portion detects the relatively moving distance of the two objects on the basis of the measurement by the measuring portion.
摘要翻译：公开了一种用于测量两个相对移动的物体的相对移动距离的装置。该装置包括形成在一个物体上的多个倾斜表面，并且沿相对移动的方向以预定间距排列，每个倾斜表面相对于相对移动的方向倾斜。测量部分设置在另一物体上，用于测量在相对于相对运动方向具有角度的方向上至少一个倾斜表面的距离，并且检测部分检测两个物体在相对移动方向上的相对移动的距离由测量部分测量的基础。

13. 发明授权

US5028797A An alignment system for align first and second objects using alignment marks 失效
标题翻译：对准系统，用于使用对准标记对准第一和第二对象
公开(公告)号：US5028797A
公开(公告)日：1991-07-02
申请号：US413739
申请日：1989-09-28
申请人： Naoto Abe , Shigeyuki Suda , Koji Uda , Hirohisa Ohta , Noriyuki Nose
发明人： Naoto Abe , Shigeyuki Suda , Koji Uda , Hirohisa Ohta , Noriyuki Nose
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7096 , G03F9/7049
摘要： An alignment system for aligning a mask and a wafer into a predetermined positional relationship uses alignment marks provided on the mask and the water. In this system, light from a light source is directed to the alignment marks of the mask and the wafer and, then, the light from these alignment marks is detected by an accumulation type photoelectric converting device, for alignment of the mask and the wafer. The accumulation time of the photoelectric converting device is controlled to be sufficiently longer than or to be equal to a multiple, by an integral number, of the period of relative and natural vibration of the mask and the wafer. This makes it possible to reduce the effect of the relative vibration of the mask and the wafer upon the alignment result and, therefore, makes it possible to enhance the alignment precision.

14. 发明授权

US4539482A Reading apparatus 失效
标题翻译：阅读器
公开(公告)号：US4539482A
公开(公告)日：1985-09-03
申请号：US309380
申请日：1981-10-07
申请人： Noriyuki Nose
发明人： Noriyuki Nose
IPC分类号： H04N1/03 , H04N1/195 , H04N5/225 , H01J40/14
CPC分类号： H04N1/0306 , H04N1/03 , H04N1/19505 , H04N1/1951 , H04N1/19536 , H04N1/19547 , H04N1/19573 , H04N5/2254
摘要： An apparatus for dividing an original surface having image information into a plurality of areas and reading the image information with the use of a photosensor through a plurality of imaging systems provided correspondingly to said plurality of areas. The imaging systems for imaging the image information of the original surface on the photosensor include zone plates.
摘要翻译：一种用于将具有图像信息的原始表面划分成多个区域并且通过与所述多个区域相对应地设置的多个成像系统通过使用光电传感器来读取图像信息的装置。用于对光电传感器上原始表面的图像信息进行成像的成像系统包括区域板。

15. 发明授权

US4165930A Camera having a holographic indicator 失效
标题翻译：相机具有全息指示器
公开(公告)号：US4165930A
公开(公告)日：1979-08-28
申请号：US830036
申请日：1977-09-02
申请人： Kazuya Matsumoto , Susumu Matsumura , Noriyuki Nose , Youichi Okuno
发明人： Kazuya Matsumoto , Susumu Matsumura , Noriyuki Nose , Youichi Okuno
IPC分类号： G03B17/20 , G03H1/00 , G03H1/04 , G03H1/22
CPC分类号： G03H1/22 , G03H1/0248 , G03H1/0406 , G03H1/0408 , G03H1/2249 , G03H1/265 , G03H2001/221 , G03H2001/2231 , G03H2001/2234 , G03H2001/2284 , G03H2001/2615 , G03H2210/20 , G03H2222/34 , G03H2227/02 , G03H2240/11
摘要： A camera having a holographic indicator in which a reconstructed image of hologram and an image of an object formed by an image forming optical system are formed on the same plane, so that the reconstructed image and the object's image can be observed at the same diopter through a common observation optical system.
摘要翻译：具有全息指示器的照相机，其中在同一平面上形成全息图的重建图像和由图像形成光学系统形成的物体的图像，使得可以以相同的屈光度来观察重建图像和物体的图像常见的观察光学系统。

16. 发明授权

US5593800A Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus 失效
标题翻译：掩模制造方法和使用由该方法或装置制造的掩模的装置和装置制造方法
公开(公告)号：US5593800A
公开(公告)日：1997-01-14
申请号：US367856
申请日：1995-01-03
申请人： Hidehiko Fujioka , Noriyuki Nose , Ryuichi Ebinuma , Shinichi Hara , Hiroshi Maehara
发明人： Hidehiko Fujioka , Noriyuki Nose , Ryuichi Ebinuma , Shinichi Hara , Hiroshi Maehara
IPC分类号： G03F1/00 , G03F1/22 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70475 , G03F1/22 , G03F7/70358
摘要： A mask manufacturing method includes holding through a first stage a master reticle having a pattern, holding through a second stage a mask substrate, projecting an exposure beam to the pattern of the master reticle held by the first stage, and projecting the pattern onto the mask substrate held by the second stage at a predetermined reduction magnification, and scanning the first and second stages in a timed relation and at a predetermined speed ratio, whereby the pattern of the master reticle is transferred to the mask substrate.
摘要翻译：掩模制造方法包括：通过第一阶段保持具有图案的主掩模版，通过第二阶段保持掩模基板，将曝光光束投射到由第一平台保持的主光栅的图案上，并将图案投影到掩模上基板以预定的缩小倍率保持第二阶段，并以定时关系和预定的速度比扫描第一和第二阶段，从而将主标线的图案转印到掩模基板。

17. 发明授权

US5459573A Light quantity controlling apparatus 失效
标题翻译：光量控制装置
公开(公告)号：US5459573A
公开(公告)日：1995-10-17
申请号：US291747
申请日：1994-08-17
申请人： Naoto Abe , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Noriyuki Nose
发明人： Naoto Abe , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Noriyuki Nose
IPC分类号： G01B11/00 , G01D5/26 , G03F9/00 , H01L21/68 , H01L31/12 , H01L33/00 , H01S5/06 , H01S5/062 , H01S5/0683 , G01N21/86
CPC分类号： G03F9/7088 , G03F9/7049 , H01L21/68 , H01L21/682 , H01S5/06835 , H01S5/06216
摘要： A position detecting apparatus usable for aligning mask and a semiconductor wafer, wherein a laser beam produced by a semiconductor laser is projected through a predetermined optical system to alignment marks formed on the mask and the wafer, and the light reflected by the marks are detected by an accumulation type sensor to produce an electrical signal, from which the relative positional relation between the mask and the wafer are detected on the basis of the electrical signal. To obtain proper mark signals, the quantity of light incident on the accumulation sensor is controlled. In this apparatus, the beam emitting strength of the semiconductor laser is made constant, and the control of thee amount of light incident on the accumulation sensor is effected by controlling the operation period of the semiconductor laser. In addition, the actuation timing of the semiconductor laser is advanced from the accumulation start of the accumulation type sensor by the time required for the semiconductor laser to be thermally stabilized after its actuation. The mark detection signal produced by the accumulation sensor is precise.
摘要翻译：一种可用于对准掩模和半导体晶片的位置检测装置，其中由半导体激光器产生的激光束通过预定的光学系统投射到形成在掩模和晶片上的对准标记，并且由标记反射的光被用于产生电信号的累积型传感器，根据电信号检测掩模和晶片之间的相对位置关系。为了获得适当的标记信号，控制入射在累积传感器上的光量。在该装置中，半导体激光器的发射光强度保持恒定，并且通过控制半导体激光器的工作周期来控制入射到积聚传感器上的光量。此外，半导体激光器的激活定时从累积型传感器的累积开始到半导体激光器在其致动之后被热稳定所需的时间前进。由积累传感器产生的标记检测信号是精确的。

18. 发明授权

US5262257A Mask for lithography 失效
标题翻译：光刻面具
公开(公告)号：US5262257A
公开(公告)日：1993-11-16
申请号：US3867
申请日：1993-01-11
申请人： Yasuaki Fukuda , Noriyuki Nose
发明人： Yasuaki Fukuda , Noriyuki Nose
IPC分类号： G03F1/22 , G03F9/00
CPC分类号： G03F1/22 , G03F9/70
摘要： A mask structure according to an aspect of the invention includes a base having a first zone for an alignment pattern and a second zone for a circuit pattern; an alignment pattern forming material with which the alignment pattern is formed in the first zone; and a circuit pattern forming material with which the circuit pattern is formed in the second zone; wherein the alignment pattern forming material and the circuit pattern forming material are different from each other.
摘要翻译：根据本发明的一个方面的掩模结构包括具有用于对准图案的第一区域和用于电路图案的第二区域的底座; 对准图案形成材料，其中在所述第一区域中形成所述对准图案; 以及在所述第二区域中形成所述电路图案的电路图案形成材料; 其中所述对准图案形成材料和所述电路图案形成材料彼此不同。

19. 发明授权

US5182615A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5182615A
公开(公告)日：1993-01-26
申请号：US563420
申请日：1990-08-07
申请人： Hiroshi Kurosawa , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Nobutoshi Mizusawa , Shigeyuki Suda , Noriyuki Nose , Takao Kariya
发明人： Hiroshi Kurosawa , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Nobutoshi Mizusawa , Shigeyuki Suda , Noriyuki Nose , Takao Kariya
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70691 , G03F9/7049
摘要： An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.

20. 发明授权

US5148038A Device for detecting positional relationship between two objects 失效
标题翻译：用于检测两个对象之间的位置关系的设备
公开(公告)号：US5148038A
公开(公告)日：1992-09-15
申请号：US804514
申请日：1991-12-10
申请人： Noriyuki Nose , Naoto Abe
发明人： Noriyuki Nose , Naoto Abe
IPC分类号： G03F9/00
CPC分类号： G03F9/7076 , G03F9/7023
摘要： A device for detecting a positional relationship between opposed first and second objects. The device includes a light source for projecting light to the first and second objects; a photodetecting system for detecting two lights from one of the first and second objects illuminated by the light from the light source, the photodetecting system detecting those two lights the position of incidence of each of which on a predetermined plane is changeable with the positional relationship between the first and second objects in a direction perpendicular to the direction in which the first and second objects are opposed; a position detecting system for detecting the positional relationship between the first and second objects in a direction perpendicular to the opposing direction of the first and second objects, on the basis of the relationship of the two lights, on the predetermined plane, as detected by the photodetecting system; and an interval detecting system for detecting the positional relationship between the first and second objects in the opposing direction, by using at least one of the two lights detected by the photodetecting system.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式