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11. 发明授权

US07750313B2 Ion source 失效
标题翻译：离子源
公开(公告)号：US07750313B2
公开(公告)日：2010-07-06
申请号：US12076979
申请日：2008-03-26
申请人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
发明人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
IPC分类号： H01J49/10 , H01J49/16 , H01J37/08 , H01J27/02
CPC分类号： H01J27/08 , H01J27/14
摘要： A cathode holder of a tubular shape is inserted into an opening for a cathode of a plasma generating chamber, the cathode holder positioned such that a surface thereof opposes or surrounds a side surface of a cathode. The cathode is held in the cathode holder so that a front surface of the cathode will be positioned on the same plane as, outward from, or inward from the inner wall surface. In the cathode holder is provided a tubular first heat shield surrounding the cathode with a space provided between the first heat shield and the cathode, a surface of the first heat shield positioned to oppose or surround the side surface of the cathode. At a rear end of the cathode is provided a filament. The gap between the cathode holder and the plasma generating chamber is filled with an electrical insulating material.
摘要翻译：将管状阴极保持器插入到等离子体产生室的阴极的开口中，阴极保持器定位成使得其表面与阴极的侧表面相对或包围。阴极保持在阴极保持器中，使得阴极的前表面将位于与内壁表面相同的平面上，从内壁表面向外或向内定位。阴极保持器设置有围绕阴极的管状第一热屏蔽件，其具有设置在第一隔热罩和阴极之间的空间，第一热屏蔽的表面被定位成与阴极的侧表面相对或围绕。在阴极的后端设有细丝。阴极保持器和等离子体发生室之间的间隙填充有电绝缘材料。

12. 发明授权

US07655929B2 Ion beam measuring method and ion implanting apparatus 有权
标题翻译：离子束测量方法和离子注入装置
公开(公告)号：US07655929B2
公开(公告)日：2010-02-02
申请号：US11583830
申请日：2006-10-20
申请人： Sei Umisedo , Nariaki Hamamoto , Tadashi Ikejiri , Kohei Tanaka
发明人： Sei Umisedo , Nariaki Hamamoto , Tadashi Ikejiri , Kohei Tanaka
IPC分类号： G21K5/10 , H01J37/08
CPC分类号： H01J37/3171 , H01J37/244 , H01J37/304 , H01J2237/24405 , H01J2237/24507 , H01J2237/24535 , H01J2237/24564 , H01J2237/24578 , H01J2237/3045 , H01J2237/30483 , H01J2237/31703
摘要： A change of a beam current of an ion beam which passes an outside of the side of a forestage beam restricting shutter, and which is incident on a forestage multipoints Faraday is measured while the forestage beam restricting shutter is driven in a y direction by a forestage shutter driving apparatus in order to obtain a beam current density distribution in the y direction of the ion beam at a position of the forestage beam restricting shutter. A change of a beam current of the ion beam which passes an outside of the side of a poststage beam restricting shutter, and which is incident on a poststage multipoints Faraday is measured while the poststage beam restricting shutter is driven in the y direction by a poststage shutter driving apparatus in order to obtain a beam current density distribution in the y direction of the ion beam at a position of the poststage beam restricting shutter. By using these results, an angle deviation, a diverging angle, and/or a beam size in the y direction of the ion beam can be obtained.
摘要翻译：测量通过森林梁限制快门侧的外侧并入射在森林多点法拉第的离子束的射束电流的变化，同时森林光束限制快门通过森林遮挡板在ay方向上驱动驱动装置，以便在森林光束限制快门的位置处获得离子束的y方向上的束电流密度分布。在后级光束限制快门通过后台沿y方向驱动时，测量通过舞台前限制快门侧的外侧并且入射到后台多点法拉第的离子束的束电流的变化快门驱动装置，以便在后级束限制快门的位置处获得离子束的y方向上的束电流密度分布。通过使用这些结果，可以获得离子束的y方向上的角度偏差，发散角度和/或光束尺寸。

13. 发明申请

US20080277593A1 Ion source 失效
标题翻译：离子源
公开(公告)号：US20080277593A1
公开(公告)日：2008-11-13
申请号：US12076979
申请日：2008-03-26
申请人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
发明人： Hideki Fujita , Sei Umisedo , Nariaki Hamamoto
IPC分类号： H01J27/00
CPC分类号： H01J27/08 , H01J27/14
摘要： A cathode holder of a tubular shape is inserted into an opening for a cathode of a plasma generating chamber, the cathode holder positioned such that a surface thereof opposes or surrounds a side surface of a cathode. The cathode is held in the cathode holder so that a front surface of the cathode will be positioned on the same plane as, outward from, or inward from the inner wall surface. In the cathode holder is provided a tubular first heat shield surrounding the cathode with a space provided between the first heat shield and the cathode, a surface of the first heat shield positioned to oppose or surround the side surface of the cathode. At a rear end of the cathode is provided a filament. The gap between the cathode holder and the plasma generating chamber is filled with an electrical insulating material.
摘要翻译：将管状阴极保持器插入到等离子体产生室的阴极的开口中，阴极保持器定位成使得其表面与阴极的侧表面相对或包围。阴极保持在阴极保持器中，使得阴极的前表面将位于与内壁表面相同的平面上，从内壁表面向外或向内定位。阴极保持器设置有围绕阴极的管状第一热屏蔽件，其具有设置在第一隔热罩和阴极之间的空间，第一热屏蔽的表面被定位成与阴极的侧表面相对或围绕。在阴极的后端设有细丝。阴极保持器和等离子体发生室之间的间隙填充有电绝缘材料。

14. 发明申请

US20080073579A1 Ion beam measuring method and ion implanting apparatus 有权
标题翻译：离子束测量方法和离子注入装置
公开(公告)号：US20080073579A1
公开(公告)日：2008-03-27
申请号：US11583830
申请日：2006-10-20
申请人： Sei Umisedo , Nariaki Hamamoto , Tadashi Ikejiri , Kohei Tanaka
发明人： Sei Umisedo , Nariaki Hamamoto , Tadashi Ikejiri , Kohei Tanaka
IPC分类号： H01J37/08
CPC分类号： H01J37/3171 , H01J37/244 , H01J37/304 , H01J2237/24405 , H01J2237/24507 , H01J2237/24535 , H01J2237/24564 , H01J2237/24578 , H01J2237/3045 , H01J2237/30483 , H01J2237/31703
摘要： A change of a beam current of an ion beam which passes an outside of the side of a forestage beam restricting shutter, and which is incident on a forestage multipoints Faraday is measured while the forestage beam restricting shutter is driven in a y direction by a forestage shutter driving apparatus in order to obtain a beam current density distribution in the y direction of the ion beam at a position of the forestage beam restricting shutter. A change of a beam current of the ion beam which passes an outside of the side of a poststage beam restricting shutter, and which is incident on a poststage multipoints Faraday is measured while the poststage beam restricting shutter is driven in the y direction by a poststage shutter driving apparatus in order to obtain a beam current density distribution in the y direction of the ion beam at a position of the poststage beam restricting shutter. By using these results, an angle deviation, a diverging angle, and/or a beam size in the y direction of the ion beam can be obtained.
摘要翻译：测量通过森林梁限制快门侧的外侧并入射在森林多点法拉第的离子束的射束电流的变化，同时森林光束限制快门通过森林遮挡板沿ay方向驱动驱动装置，以便在森林光束限制快门的位置处获得离子束的y方向上的束电流密度分布。在后级光束限制快门通过后台沿y方向驱动时，测量通过舞台前限制快门侧的外侧并且入射到后台多点法拉第的离子束的束电流的变化快门驱动装置，以便在后级束限制快门的位置处获得离子束的y方向上的束电流密度分布。通过使用这些结果，可以获得离子束的y方向上的角度偏差，发散角度和/或光束尺寸。

15. 发明授权

US07087912B2 Ion beam irradiation apparatus for suppressing charge up of substrate and method for the same 失效
公开(公告)号：US07087912B2
公开(公告)日：2006-08-08
申请号：US10308016
申请日：2002-12-03
申请人： Nariaki Hamamoto
发明人： Nariaki Hamamoto
IPC分类号： H01J37/08
CPC分类号： H01J37/32082 , C23C14/48 , H01J37/026 , H01J2237/31701
摘要： An ion beam irradiation apparatus is equipped with a plasma generator which generates a plasma and supplies it to a region in the vicinity of the upstream side of a substrate, thereby suppressing a charging up of a surface of the substrate, which results from an irradiation of the ion beam. The radio frequency electric source for supplying the plasma for generating the plasma to a plasma generator is a radio frequency electric source for producing a radio frequency electric power formed by amplitude modulating an original radio frequency signal.

16. 发明授权

US06686599B2 Ion production device for ion beam irradiation apparatus 有权
标题翻译：离子束照射装置的离子生产装置
公开(公告)号：US06686599B2
公开(公告)日：2004-02-03
申请号：US09996926
申请日：2001-11-30
申请人： Nariaki Hamamoto , Shigeki Sakai
发明人： Nariaki Hamamoto , Shigeki Sakai
IPC分类号： H01J3730
CPC分类号： H01J37/3171 , H01J2237/0041
摘要： An ion beam irradiation apparatus is provided with a plasma production device 30 which produces a plasma 12 through the radio frequency discharge and supplies the produced plasma in the vicinity of the substrate 4. The plasma production device 30 includes a plasma producing chamber 32 being elongated along an axis 33 extending in scanning directions X in which the ion beam is moved; a plasma emission hole 34 being provided in a side thereof and elongated along the axis 33 of the plasma producing chamber; and a magnet 36 provided outside the plasma producing chamber 32 for producing a magnetic field having a direction along the axis 33. The magnetic field developed by the magnet 36 contains a magnetic field which has a direction along the axis and bends to the substrate ions contained in the plasma 12 emitted from a plasma emission hole 34.
摘要翻译：离子束照射装置设置有等离子体生成装置30，其通过射频放电产生等离子体12，并将所产生的等离子体供给到基板4附近。等离子体生成装置30包括沿着在离子束移动的扫描方向X上延伸的轴33; 等离子体发射孔34设置在其侧面并沿着等离子体产生室的轴线33延伸; 以及设置在等离子体产生室32外部的磁体36，用于产生具有沿着轴线33的方向的磁场。由磁体36产生的磁场包含具有沿着轴线的方向并弯曲到包含的基板离子的磁场在从等离子体发射孔34发射的等离子体12中。

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