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11. 发明专利

JPH05160044A METHOD AND DEVICE FOR PLASMA CVD 失效
公开(公告)号：JPH05160044A
公开(公告)日：1993-06-25
申请号：JP32736991
申请日：1991-12-11
申请人： NISSIN ELECTRIC CO LTD
发明人： WATANABE MASAO , KUWABARA SO , HAYASHI TSUKASA , KIRIMURA HIROYA
IPC分类号： C23C16/50 , H01L21/205
摘要： PURPOSE:To protect a film-forming part on a substrate from dust and to improve a film-forming rate by a method wherein the production of radical species to contribute to a film formation reaction is not obstructed and more over, the generation of the radical species, which cause the generation of the dust, is selectively inhibited. CONSTITUTION:A plasma CVD method and a plasma CVD device, which bring raw gas into a plasma state and make a substrate expose to this plasma to form a thin film on the substrate, are a plasma CVD method and a plasma CVD device, which made the turning to bring the raw gas into a plasma state perform by applying high-frequency power obtainable by making a first pulse modulation of 1KHz or lower and a second pulse modulation having a period shorter than that of the first pulse modulation superpose on triangular wave high-frequency power.

12. 发明专利

JPH05156451A PLASMA CVD METHOD AND DEVICE THEREFOR 失效
公开(公告)号：JPH05156451A
公开(公告)日：1993-06-22
申请号：JP32332591
申请日：1991-12-06
申请人： NISSIN ELECTRIC CO LTD
发明人： WATANABE MASAO , KUWABARA SO , NAKAHIGASHI TAKAHIRO
IPC分类号： C23C16/50 , C23C16/52 , H01L21/31
摘要： PURPOSE:To suppress the sticking of dust onto the film forming part on a substrate and to improve a film forming speed by selectively suppressing the generation of radical species which are the cause for the generation of dust particles without hindering the formation of radical species which contribute to film forming reaction. CONSTITUTION:The formation of the plasma of gaseous raw materials is executed by impression of the high-frequency electric power obtd. by superposing 1st pulse modulation of

13. 发明专利

JPH11354462A METHOD AND DEVICE FOR IMPLANTING NEGATIVE OXYGEN ION WITH PULSE BIAS 失效
公开(公告)号：JPH11354462A
公开(公告)日：1999-12-24
申请号：JP16346198
申请日：1998-06-11
申请人： NISSIN ELECTRIC CO LTD
发明人： MIYAKE KOJI , HAYASHI TSUKASA , KUWABARA SO
IPC分类号： H01J27/02 , H01J37/08 , H01J37/317 , H01L21/02 , H01L21/265 , H01L27/12
摘要： PROBLEM TO BE SOLVED: To limit the kind of generated oxygen ion to one kind and to eliminate the need for mass separation, by extracting negative ions from an oxygen plasma and by introducing them into an Si substrate. SOLUTION: An oxygen gas is introduced into a plasma generating chamber 30 and a trigger circuit 45 turns on a first switch 40. A high-frequency voltage is applied across an opposite electrode 32 and a susceptor electrode 31 to generate a glow discharge between the electrodes, which generates oxygen plasma. When the trigger circuit 45 is turned off, the first switch 40 is turned off to destroy the plasma, and an electron loses energy instantly and becomes a low energy level of several eV. This electron with low energy is dissociated and attached to an oxygen molecule to generate a negative oxygen ion. Therefore, the density of the negative oxygen ions starts to increase abruptly just after the trigger circuit 45 is turned off. The negative oxygen ions are generated with higher priority by enhancing gas pressure and electric field by increasing microwave power to be applied.

14. 发明专利

JPH09301759A PRODUCTION OF CURED BODY OF COLORED CEMENT 失效
公开(公告)号：JPH09301759A
公开(公告)日：1997-11-25
申请号：JP14095896
申请日：1996-05-10
申请人： NISSIN ELECTRIC CO LTD
发明人： ASAGI NORIO , NAKABAYASHI KIYOHIRO , KUWABARA SO
IPC分类号： C04B14/02 , B01J19/08 , C04B20/02 , C04B28/02
摘要： PROBLEM TO BE SOLVED: To obtain the cured body of colored cement which fades less in color in spite of long-term exposure to natural environment by kneading pigments subjected to a low-temp. plasma treatment, the raw material for the cured body of hydraulic cement and water and curing the mixture. SOLUTION: An electrode 8 in common use as a vessel housing the powder pigments 12 and a high-frequency electrode 10 are arranged to face each other in a vacuum vessel 2. Next, the inside of this vacuum vessel 2 is evacuated to vacuum and thereafter, gaseous oxygen, inorg. gas, such as CO2 , N2 or He or steam (6) is introduced from a gas introducing port 4 into the vacuum vessel. The pressure in the vacuum vessel 2 is maintained at 10 to 10 Torr. High-frequency electric power is then impressed between the electrode 8 in common use as the vessel and the high-frequency electrode 10 via a matching device 16 from a high-frequency power source 18 to generate low temp. plasma 20. The surfaces of the pigments 12 are made hydrophilic by subjecting the pigments 12 to the low-temp. plasma treatment while the pigments are vibrated by an excitation device 14. Such pigments 12 and the raw materials for the cured body of the hydraulic cement, such as cement, silica and aggregate and water are kneaded. The mixture is then molded and the molding is cured.

15. 发明专利

JPH0910990A PRODUCTION OF SOLDER BALL AND DEVICE THEREFOR 失效
公开(公告)号：JPH0910990A
公开(公告)日：1997-01-14
申请号：JP15734595
申请日：1995-06-23
申请人： NISSIN ELECTRIC CO LTD
发明人： NAKAHIGASHI TAKAHIRO , KUWABARA SO
IPC分类号： B23K3/06 , B22F9/10 , B23K35/40 , H05K3/34
摘要： PURPOSE: To eliminate the need for washing a printed circuit board by solvent after soldering tips on this circuit board by executing the dispersion of molten solder in a fluorine-contg. gaseous atmosphere. CONSTITUTION: A solder material is put into a crucible 2 and is melted by heating a heating furnace 3 and thereafter, the molten solder is drawn out into a chamber 1 via a nozzle 4 while the amt. of the solder to be drawn out is adjusted. On the other hand, fluorine-contg. gas is introduced from a fluorine- contg. gas supply section 8 into the chamber 1 and a dispersion plate 5 is rotated by running a motor 6. The number of revolutions of the dispersion plate 5 is controlled by the motor 6. The molten solder flowing onto the dispersion plate 5 from below the nozzle 4 is cooled in the chamber 1 of room temp. and disperses by colliding against the dispersion plate 5. The many very small spherical solder balls are formed into the fluorine-contg. atmosphere. The formed solder balls are gathered to a recovering hole 11 and are recovered.

16. 发明专利

JPH08176812A PRODUCTION OF SHELL WITH FILM FORMED ON ITS INNER PERIPHERY AND DEVICE THEREFOR 失效
公开(公告)号：JPH08176812A
公开(公告)日：1996-07-09
申请号：JP32257694
申请日：1994-12-26
申请人： NISSIN ELECTRIC CO LTD
发明人： FUJIYAMA HIROSHI , NAKAHIGASHI TAKAHIRO , KUWABARA SO
IPC分类号： H05H1/46 , A61M25/00 , C23C14/34 , F16L58/02 , C30B23/06
摘要： PURPOSE: To provide a method and device by which a film is uniformly formed on the inner periphery even for a small-inner-diameter shell and capable of obtaining a shell with a film formed on its inner periphery with good productivity. CONSTITUTION: A rod-shaped electrode 2 is set in a vacuum vessel 1, an annular electrode 3 is set around the electrode 2, a rod-shaped sputtering target 5 to be impressed with power is arranged on the extension line of the electrode 2, and a shell S1 to be coated with film is arranged around the target 5 almost in alignment with the annular electrode 3. The vessel 1 is evacuated to a specified vacuum, a plasma source gas is introduced between the electrodes 2 and 3, a power to convert the gas to plasma is impressed, and further a magnetic field is impressed. The plasma thus produced is introduced into the shell S1, a voltage is impressed on the target 5, hence the target 5 is sputtered, and a film is formed on the inner face of the shell S1. A shell with a film formed on its inner periphery is produced with this device.

17. 发明专利

JPH07283154A PLASMA CVD METHOD AND DEVICE 失效
公开(公告)号：JPH07283154A
公开(公告)日：1995-10-27
申请号：JP3046795
申请日：1995-02-20
申请人： NISSIN ELECTRIC CO LTD
发明人： NAKAHIGASHI TAKAHIRO , KUWABARA SO
IPC分类号： C23C16/50 , C23C16/515 , H01L21/205 , H01L21/31
摘要： PURPOSE:To provide a plasma CVD method and a device in which particles are prevented from being generated and a film is prevented from deteriorating in or improved in forming speed by a method wherein a basic high-frequency electric power of prescribed frequency range is modulated in amplitude with modulation frequency of a prescribed range, and a high-frequency electric power is applied to halogen compound gas or halogen gas and dissimilar material gas to turn them into plasma. CONSTITUTION:A substrate S1 on which a film is to be formed is placed on an electrode 2 inside a vacuum chamber 1, a high-frequency electric power is applied onto a high-frequency electrode 3 from a high-frequency electric power generating device 33, whereby halogen compound gas or halogen gas and dissimilar material gas introduced into the vacuum chamber 1 are turned into plasma to form a required film on the surface of the substrate S1. At this point, the high-frequency electric power generating device 33 is so set as to modulate a basic high-frequency electric power of frequencies 10MHz to 200MHz in amplitude with a prescribed frequency 1/10 to 1/10000 as high as 10MHz to 200MHz. Then, particles are restrained from occurring, and a film forming speed is improved or prevented from decreasing sharply. By this setup, a compound film of Si and Ti can be safely formed.

18. 发明专利

JPH0758358A LIGHT EMITTING DEVICE AND ITS MANUFACTURE 失效
公开(公告)号：JPH0758358A
公开(公告)日：1995-03-03
申请号：JP22814893
申请日：1993-08-19
申请人： NISSIN ELECTRIC CO LTD
发明人： HAYASHI TSUKASA , KUWABARA SO
IPC分类号： H01L21/205 , H01L33/06 , H01L33/20 , H01L33/34 , H01L33/42 , H01L33/44 , H01L33/00
摘要： PURPOSE:To provide a light emitting device which can be used as a panel-type light emitting unit, a spontaneous light emission type display or the like and, further, has a high light emitting efficiency and its manufacturing method. CONSTITUTION:The light emitting device of the present invention has a glass substrate 2, a transparent electrode 4 formed on it, a quantum box layer 6 which is a collective unit of quantum boxes only whose surface layer made of fine particles are oxide layers or nitride layers, an insulating film 8 formed on the quantum box layer 6 and an upper electrode 10 formed on it. The quantum box layer 6 can be formed in such a manner that the fine particles are deposited on the substrate 2 by a plasma CVD method while a positive voltage is applied to the transparent electrode 4 and then, without exposing the substrate 2 to the air, only the surface layer parts of the deposited respective fine particles oxidized or nitridized.

19. 发明专利

JPH0729829A METHOD AND SYSTEM FOR DC DISCHARGE PLASMA PROCESSING 失效
公开(公告)号：JPH0729829A
公开(公告)日：1995-01-31
申请号：JP15475593
申请日：1993-06-25
申请人： NISSIN ELECTRIC CO LTD
发明人： MURAKAMI HIROSHI , KUWABARA SO
IPC分类号： H01L21/205 , H01L21/302 , H01L21/3065
摘要： PURPOSE:To enhance the plasma processing rate by applying a magnetic field vertically to a DC electric field being applied for generation of plasma thereby expelling microparticles to the outside of a region. CONSTITUTION:During the filming operation, power is fed from a power supply to an electromagnetic coil 8 which applies a magnetic field vertically to a DC electric field. Consequently, microparticles generated through vapor phase reaction in the plasma are shifted to the left side of a region X opposing a substrate S and eventually expelled therefrom. The microparticles thus expelled are discharged to the outside of a vessel 1 through an exhaust port 11 by means of the vacuum pump in an evacuation equipment. This constitution enhances plasma processing rate.

20. 发明专利

JPH06269659A FINE PARTICLE GENERATING METHOD AND APPARATUS 失效
公开(公告)号：JPH06269659A
公开(公告)日：1994-09-27
申请号：JP5685593
申请日：1993-03-17
申请人： NISSIN ELECTRIC CO LTD
发明人： NAKAHIGASHI TAKAHIRO , KUWABARA SO
IPC分类号： B01J19/08 , C01B31/36 , C01B33/00 , H01L21/205
摘要： PURPOSE:To provide a fine particle generating method and apparatus capable of efficiently generating fine particles having a uniform particle size as compared with a conventional fine particle generating method and apparatus using a thermal CVD device. CONSTITUTION:Fine particle forming gas is introduced into a vacuum container 1 from a gas supply part containing mass flow controllers 521, 522, opening and closing valves 531a, 532a and gas sources 541, 542 to pulse-wise apply high frequency power to the fine particle forming gas under predetermined vacuum from a high frequency power applying device containing an arbitrary waveform generator 8 and a high frequency amplifier 9 not only to form fine particle forming gas plasma but also to form objective fine particles.

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