专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明授权

US06627468B2 Method for manufacturing optical element, optical element, optical system using optical element, optical apparatus and exposure apparatus using optical system, and method for manufacturing device 失效
标题翻译：使用光学元件的光学元件，光学元件，光学系统的制造方法，使用光学系统的光学装置和曝光装置以及制造装置的方法
公开(公告)号：US06627468B2
公开(公告)日：2003-09-30
申请号：US09875009
申请日：2001-06-07
申请人： Keiko Chiba
发明人： Keiko Chiba
IPC分类号： H01L2100
CPC分类号： G03F7/70158 , C03C3/06 , C03C15/00 , C03C2201/02 , C03C2201/23 , G02B5/1857 , G03F7/70316 , G03F7/70958
摘要： The present invention provides a method for manufacturing an optical element to be used for an optical system and an optical instrument using the optical system, and a method for manufacturing a device using the optical instrument, wherein the optical element is manufactured by the steps including the steps for processing a high purity silica glass by lithography, and the hydrogen molecule content is adjusted after manufacturing the optical element.
摘要翻译：本发明提供了一种用于制造用于光学系统的光学元件的方法和使用该光学系统的光学仪器，以及一种使用该光学仪器的装置的制造方法，其中该光学元件由包括通过光刻处理高纯度二氧化硅玻璃的步骤，并且在制造光学元件之后调节氢分子含量。

12. 发明授权

US06605392B2 X-ray mask structure, and X-ray exposure method and apparatus using the same 失效
标题翻译： X射线掩模结构和X射线曝光方法及使用其的装置
公开(公告)号：US06605392B2
公开(公告)日：2003-08-12
申请号：US09335494
申请日：1999-06-18
申请人： Takahiro Matsumoto , Keiko Chiba
发明人： Takahiro Matsumoto , Keiko Chiba
IPC分类号： G03F900
CPC分类号： G03F1/22 , G03F1/62 , G03F1/64 , G03F7/70983
摘要： An X-ray mask structure for use in X-ray lithography includes an X-ray transmission film to be disposed opposed to a workpiece in X-ray exposure, the X-ray transmission film having an X-ray absorptive material corresponding to a pattern to be printed on the workpiece, and a thin film covering at least a portion of the X-ray transmission film, the thin film having an anti-reflection function with respect to alignment light to be projected to the thin film for direct or indirect detection of relative positional deviation between the mask structure and the workpiece.
摘要翻译：用于X射线光刻的X射线掩模结构包括在X射线曝光中与工件相对设置的X射线透射膜，X射线透射膜具有对应于图案的X射线吸收材料被印刷在工件上，薄膜覆盖至少一部分X射线透射膜，薄膜具有相对于对准光的抗反射功能，以投射到薄膜上用于直接或间接检测掩模结构和工件之间的相对位置偏差。

13. 发明授权

US6087076A Method of manufacturing semiconductor devices by performing coating, heating, exposing and developing in a low-oxygen or oxygen free controlled environment 失效
标题翻译：通过在低氧或无氧的受控环境中进行涂覆，加热，曝光和显影来制造半导体器件的方法
公开(公告)号：US6087076A
公开(公告)日：2000-07-11
申请号：US968589
申请日：1997-11-13
申请人： Keita Sakai , Keiko Chiba , Hiroshi Maehara
发明人： Keita Sakai , Keiko Chiba , Hiroshi Maehara
IPC分类号： G03F7/004 , G03F7/30 , G03F7/38 , H01L21/027 , G03C5/00
CPC分类号： G03F7/0048
摘要： A method of manufacturing semiconductor devices includes a coating step for coating a substrate using a resist solution including a base resin and a low-oxygen or oxygen-free solvent in which oxygen is removed by nitrogen bubbling, a heating step for heating the substrate coated with the resist, an exposing step for exposing the substrate with radiation to transfer a pattern, and a developing step for developing the exposed substrate. The coating step, the heating step, the exposing step and the developing step are performed under an environment controlled in a low-oxygen or oxygen-free state.
摘要翻译：一种制造半导体器件的方法包括：涂覆步骤，用于使用包含基础树脂的抗蚀剂溶液和通过氮气鼓泡除去氧的低氧或无氧溶剂的涂覆步骤，用于加热涂覆有抗蚀剂，用于用辐射曝光衬底以转印图案的曝光步骤，以及用于显影曝光的衬底的显影步骤。涂布步骤，加热步骤，曝光步骤和显影步骤在控制在低氧或无氧状态的环境下进行。

14. 发明授权

US5422921A X-ray mask structure and manufacturing methods including forming a metal oxide film on a portion of an X-ray permeable film having no X-ray absorber thereon 失效
标题翻译： X射线掩模结构和包括在其上没有X射线吸收体的X射线透过膜的一部分上形成金属氧化物膜的制造方法
公开(公告)号：US5422921A
公开(公告)日：1995-06-06
申请号：US975521
申请日：1992-11-12
申请人： Keiko Chiba
发明人： Keiko Chiba
IPC分类号： G03F1/22 , G21K5/00 , G11B11/00 , H01L39/00
CPC分类号： G03F1/22
摘要： An X-ray mask structure includes an X-ray absorber having a masking pattern, an X-ray permeable film for supporting the X-ray absorber on a surface of the X-ray permeable film, and a supporting frame for supporting the X-ray permeable film. The X-ray mask structure has a metal oxide film formed on a portion of the surface of the X-ray permeable film having no X-ray absorber thereon. Also disclosed is a method for manufacturing such an X-ray mask structure.
摘要翻译： X射线掩模结构包括具有掩模图案的X射线吸收体，用于在X射线透过膜的表面上支撑X射线吸收体的X射线透过膜，以及用于支撑X射线透过膜的支撑框架，透射膜。 X射线掩模结构在其上没有X射线吸收体的X射线透过膜的表面的一部分上形成有金属氧化物膜。还公开了一种用于制造这种X射线掩模结构的方法。

15. 发明授权

US07916273B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07916273B2
公开(公告)日：2011-03-29
申请号：US11559084
申请日：2006-11-13
申请人： Masaru Nyui , Keiko Chiba , Keiji Yamashita
发明人： Masaru Nyui , Keiko Chiba , Keiji Yamashita
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70916 , G03F7/70341
摘要： An exposure apparatus includes an illumination optical system for illuminating a reticle using a light from a light source, and a projection optical system for projecting a pattern of the reticle onto a substrate, the exposure apparatus exposing the substrate through a liquid that is supplied to a space between the substrate and a lens of the projection optical system closest to the substrate, a surface of the lens on which the light does not pass having a polished surface.
摘要翻译：曝光装置包括：照明光学系统，用于使用来自光源的光照射光罩;以及投影光学系统，用于将掩模版的图案投射到基板上，所述曝光装置通过供给到基板和最靠近基板的投影光学系统的透镜之间的空间，光线不通过的透镜的表面具有抛光表面。

16. 发明授权

US06829091B2 Optical system and optical instrument with diffractive optical element 失效
$Optical system and optical instrument with diffractive optical element$
标题翻译：具有衍射光学元件的光学系统和光学仪器
公开(公告)号：US06829091B2
公开(公告)日：2004-12-07
申请号：US09362698
申请日：1999-07-29
申请人： Takashi Kato , Kenji Saitoh , Hiroshi Maehara , Makoto Ogusu , Keiko Chiba
发明人： Takashi Kato , Kenji Saitoh , Hiroshi Maehara , Makoto Ogusu , Keiko Chiba
IPC分类号： G02B518
CPC分类号： G02B5/1814 , G02B5/1838 , G02B5/1857 , G02B5/1895 , G02B7/00 , G02B27/4222 , G03F7/70316 , G03F7/70825
摘要： An optical system for forming an image of an object. The optical system includes an optical element, which is deformed by the weight thereof, and at least one optical member for preventing a change in optical performance of the optical system due to deformation of the optical element, when the optical element is provided in the optical system.
摘要翻译：一种用于形成物体的图像的光学系统。该光学系统包括光学元件，该光学元件由于其重量而变形，并且至少一个光学构件用于防止当光学元件设置在光学元件中时由于光学元件的变形而导致的光学系统的光学性能的变化系统。

17. 发明授权

US06337161B2 Mask structure exposure method 有权
标题翻译：面膜结构曝光方法
公开(公告)号：US06337161B2
公开(公告)日：2002-01-08
申请号：US09161372
申请日：1998-09-28
申请人： Keiko Chiba , Hideo Kato , Hiroshi Maehara
发明人： Keiko Chiba , Hideo Kato , Hiroshi Maehara
IPC分类号： G03F900
CPC分类号： G03F1/22 , G03F1/62
摘要： A mask structure to be used for X-ray exposure or the like in manufacturing semiconductor devices prevents contaminants from adhering and accumulating on the surface of a mask, thereby extending the life of the mask. In this mask structure, titanium oxide films are formed on front and back pellicles that protect a mask, composed of a support film and an X-ray absorber, from dust or the like. Titanium oxide decomposes contaminants by functioning as a photocatalyst, and prevents the adhesion and accumulation of contaminants by an antistatic function based on photoconductivity. When a titanium oxide film is formed on the surface of the mask itself, it is preferable that the film be formed outside the exposure area or the like.
摘要翻译：在制造半导体器件中用于X射线曝光等的掩模结构防止污染物粘附并积聚在掩模的表面上，从而延长掩模的使用寿命。在该掩模结构中，在保护由支撑膜和X射线吸收体构成的掩模的灰尘等上的前面和后面防护薄膜上形成氧化钛膜。氧化钛通过作为光催化剂起作用来分解污染物，并且通过基于光电导性的抗静电功能来防止污染物的粘附和积累。当在掩模本身的表面上形成氧化钛膜时，优选将膜形成在曝光区域等之外。

18. 发明授权

US6101237A X-ray mask and X-ray exposure method using the same 失效
标题翻译： X射线掩模和使用其的X射线曝光方法
公开(公告)号：US6101237A
公开(公告)日：2000-08-08
申请号：US917854
申请日：1997-08-27
申请人： Takeshi Miyachi , Keiko Chiba , Hiroshi Osawa , Koichi Sentoku , Hiroshi Maehara
发明人： Takeshi Miyachi , Keiko Chiba , Hiroshi Osawa , Koichi Sentoku , Hiroshi Maehara
IPC分类号： G03F1/22 , G03F1/62 , G03F7/20 , G21K1/10 , G21K5/00
CPC分类号： G03F1/22 , G03F1/62 , G03F7/70691 , G21K1/10
摘要： An X-ray mask includes a holding frame, a membrane held by the holding frame, a pattern formed on a surface of the membrane by an X-ray absorptive material, the surface being disposed opposed to a workpiece to which the pattern is to be transferred when the mask is mounted in an exposure apparatus, a member for reinforcing the holding frame and having a portion placed closer to the workpiece than to the membrane and a pellicle provided at a side where the pattern is formed, the pellicle being attached to the portion of the member so that the pellicle is placed at the workpiece side of the membrane.
摘要翻译： X射线掩模包括保持框架，由保持框架保持的膜，通过X射线吸收材料形成在膜的表面上的图案，该表面设置成与图案所在的工件相对当掩模安装在曝光装置中时转印，用于加强保持框架并且具有比膜更靠近工件的部分的膜和设置在图案形成侧的防护薄膜组件，防护薄膜组件附接到部件，使防护薄膜组件放置在膜的工件侧。

19. 发明授权

US5770335A Mask and exposure apparatus using the same 失效
标题翻译：掩模和曝光装置使用它
公开(公告)号：US5770335A
公开(公告)日：1998-06-23
申请号：US687782
申请日：1996-07-31
申请人： Akira Miyake , Keiko Chiba
发明人： Akira Miyake , Keiko Chiba
IPC分类号： G03F1/22 , G03F1/68 , G21K1/10 , H01L21/027 , G03F9/00 , G21K5/00
CPC分类号： G21K1/10 , G03F1/22 , G03F1/29
摘要： A mask for use with radiation including one of X-rays and vacuum ultraviolet rays. The mask includes a transmissive member for supporting a pattern of a radiation absorptive material, and a phase shifter material provided on the transmissive member. The phase shifter material has a radiation absorptivity less than that of the radiation absorptive material. The thickness of the transmissive member at a portion where the phase shifter material is provided is less than that of another portion thereof.
摘要翻译：用于辐射的掩模，包括X射线和真空紫外线之一。掩模包括用于支撑辐射吸收材料的图案的透射构件和设置在透射构件上的移相器材料。移相器材料的辐射吸收率小于辐射吸收材料的辐射吸收率。在设置移相器材料的部分处的透射构件的厚度小于其另一部分的厚度。

20. 发明授权

US5589304A Photomask comprising a holding frame and reinforcing member with a ceramic oxide bond 失效
标题翻译：光掩模包括具有陶瓷氧化物键的保持框架和加强构件
公开(公告)号：US5589304A
公开(公告)日：1996-12-31
申请号：US404959
申请日：1995-03-16
申请人： Keiko Chiba , Takeshi Miyachi
发明人： Keiko Chiba , Takeshi Miyachi
IPC分类号： G03F1/22 , H01L21/027 , G03F9/00
CPC分类号： G03F1/22
摘要： Disclosed is a mask structure which includes a membrane on which a pattern is formed or to be formed, a holding frame for holding the membrane, and a reinforcing member for reinforcing the holding frame, wherein the reinforcing member comprises ceramics and wherein the reinforcing member and the holding frame are bonded to each other through a film oxide of the ceramics. Also disclosed is a mask structure which includes a membrane on which a pattern is formed or to be formed, a holding frame for holding the membrane, and a reinforcing member for reinforcing the holding frame, wherein the reinforcing member has a major constituent the same as that of the membrane.
摘要翻译：公开了一种掩模结构，其包括其上形成有图案或要形成图案的膜，用于保持膜的保持框架和用于加强保持框架的加强构件，其中，加强构件包括陶瓷，并且其中加强构件和保持框通过陶瓷的氧化膜彼此接合。还公开了一种掩模结构，其包括其上形成有图案或要形成图案的膜，用于保持膜的保持框架和用于加强保持框架的加强构件，其中，加强构件具有与膜的那个。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式