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11. 发明授权

US07896968B2 Winding type plasma CVD apparatus 有权
标题翻译：卷绕式等离子体CVD装置
公开(公告)号：US07896968B2
公开(公告)日：2011-03-01
申请号：US11792810
申请日：2006-05-10
申请人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
发明人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/3277 , B08B7/00 , C23C16/4405 , C23C16/46 , C23C16/5096 , C23C16/545 , H01J37/32009
摘要： The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film.A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33, 34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask (51) with a shutter (65), thereby preventing leakage of cleaning gas.
摘要翻译：本发明的目的是提供一种绕线式等离子体CVD装置，通过将反应气体均匀地供应到膜的沉积区域，可以使层的质量均匀，并且可以进行沉积部分的自清洁处理在沉积到膜上的路径。相对于膜的行进方向，膜（22）被支撑在布置在沉积部分（25）的上游侧和下游侧的一对可动辊（33,34）之间，然后，膜（22）使其在沉积位置大致线性地移动。因此，喷淋板（37）和膜（22）之间的距离保持恒定，并且使层的质量均匀。薄膜通过金属带（40）加热，同时在薄膜背面行进。可移动辊（33,34）从沉积位置上升到自清洁位置，并且膜（22）可以与喷淋板（37）分离。通过用挡板（65）封闭掩模（51）的孔径，可以在沉积到膜上的路径中进行自清洁，从而防止清洁气体的泄漏。

12. 发明申请

US20100012035A1 VACUUM VAPOR PROCESSING APPARATUS 有权
标题翻译：真空蒸汽加工设备
公开(公告)号：US20100012035A1
公开(公告)日：2010-01-21
申请号：US12440635
申请日：2007-09-10
申请人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
发明人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
IPC分类号： C23C14/14 , C23C14/24
CPC分类号： C23C14/24 , H01F41/0293
摘要： There is provided a vacuum evaporating apparatus which is suitable for performing a process in which a metal vapor atmosphere is formed in a processing chamber, the metal atoms in this metal vapor atmosphere are caused to be adhered to the surface of an object to be processed, and the metal atoms adhered to the surface of the object to be processed are diffused into grain boundary phases thereof. The apparatus comprises: a processing furnace (11); at least one processing box (4) disposed inside the processing furnace; and a heating means (2) provided inside the processing furnace so as to enclose the processing box. An evacuating means is provided which, after housing the processing box inside the processing furnace in a state in which the object to be processed (S) and the metal evaporating material (V) are disposed in the processing box, reduces the processing furnace and the processing box to a predetermined pressure and keep them at that pressure. The heating means is operated in the reduced pressure to evaporate the metal evaporating material while increasing the object to be processed to a predetermined temperature. The evaporated metal atoms are supplied to the surface of the object to be processed.
摘要翻译：提供了一种真空蒸发装置，其适于进行在处理室中形成金属蒸汽气氛的过程，使金属蒸气气氛中的金属原子粘附到待处理物体的表面，并且附着在待处理物体表面的金属原子扩散到其晶界相。该装置包括：加工炉（11）; 设置在处理炉内的至少一个处理箱（4）以及设置在处理炉内部以包围处理盒的加热装置（2）。本发明提供一种排气装置，其特征在于，处理炉内处理箱内处理箱体（S）和金属蒸发材料（V）的状态被设置在处理箱内时，将加工炉和处理箱到预定的压力并保持在该压力下。加热装置在减压下操作以蒸发金属蒸发材料，同时将待处理物体增加到预定温度。蒸发的金属原子被供应到待处理物体的表面。

13. 发明申请

US20080006206A1 Winding Type Plasma Cvd Apparatus 有权
标题翻译：绕组式等离子体Cvd装置
公开(公告)号：US20080006206A1
公开(公告)日：2008-01-10
申请号：US11792810
申请日：2006-05-10
申请人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
发明人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
IPC分类号： C23C16/505 , C23C16/44 , H01L21/205
CPC分类号： H01J37/3277 , B08B7/00 , C23C16/4405 , C23C16/46 , C23C16/5096 , C23C16/545 , H01J37/32009
摘要： The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film. A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33,34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask (51) with a shutter (65), thereby preventing leakage of cleaning gas.
摘要翻译：本发明的目的是提供一种绕线式等离子体CVD装置，通过将反应气体均匀地供应到膜的沉积区域，可以使层的质量均匀，并且可以进行沉积部分的自清洁处理在沉积到膜上的路径。相对于膜的行进方向，膜（22）被支撑在布置在沉积部分（25）的上游侧和下游侧的一对可动辊（33,34）之间，然后，膜（22）使其在沉积位置基本线性地行进。因此，喷淋板（37）和膜（22）之间的距离保持恒定，并且使层的质量均匀。薄膜通过金属带（40）加热，同时在薄膜背面行进。可移动辊（33,34）从沉积位置上升到自清洁位置，并且膜（22）可以与喷淋板（37）分离。通过用挡板（65）封闭掩模（51）的孔径，可以在沉积到膜上的路径中进行自清洁，从而防止清洁气体的泄漏。

14. 发明申请

US20100307414A1 Take-Up Type Vacuum Deposition Apparatus 审中-公开
标题翻译：吸收式真空沉积装置
公开(公告)号：US20100307414A1
公开(公告)日：2010-12-09
申请号：US12867254
申请日：2008-04-14
申请人： Shin Yokoi , Tsunehito Nomura , Atsushi Nakatsuka , Isao Tada
发明人： Shin Yokoi , Tsunehito Nomura , Atsushi Nakatsuka , Isao Tada
IPC分类号： C23C14/14 , C23C14/28 , C23C14/58
CPC分类号： C23C14/562 , C23C14/541
摘要： [Object] To provide a take-up type vacuum deposition apparatus capable of preventing a thermal deformation of a base material due to charged particles leaked from a neutralization unit without an increase in size of the apparatus.[Solving Means] A take-up type vacuum deposition apparatus according to the present invention includes a charge capturing body provided between a cooling can roller and a neutralization unit that captures charged particles floating from the neutralization unit toward the can roller. Accordingly, the charged particles leaked from the neutralization unit are prevented from reaching the can roller, which suppresses variation in a bias potential applied to the can roller for bringing it into close contact with a base material, and keeps stable electrostatic force with respect to the base material. Accordingly, adhesion force between the base material and the cooling roller can be kept stable, and thus a thermal deformation of the base material can be suppressed.
摘要翻译：本发明提供一种卷取式真空沉积设备，其能够防止由于中和单元泄漏的带电粒子而引起的基体材料的热变形，而不会增加设备的尺寸。本发明的卷取式真空沉积设备包括：一个设置在冷却罐辊和中和装置之间的电荷捕获体，该中和装置捕获从中和单元向罐辊移动的带电粒子。因此，从中和单元泄漏的带电粒子被防止到达罐辊，这抑制了施加到罐辊的偏置电位的变化，使其与基材紧密接触，并且相对于该辊辊保持稳定的静电力基材。因此，可以保持基材和冷却辊之间的粘合力稳定，能够抑制基材的热变形。

15. 发明申请

US20100026432A1 PERMANENT MAGNET AND METHOD OF MANUFACTURING SAME 有权
标题翻译：永磁体及其制造方法
公开(公告)号：US20100026432A1
公开(公告)日：2010-02-04
申请号：US12519878
申请日：2007-12-19
申请人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
发明人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
IPC分类号： H01F3/08 , B22F1/00 , B22F3/12 , B22F3/26
CPC分类号： C22C33/0242 , B22F2998/00 , B22F2998/10 , B22F2999/00 , C22C2202/02 , H01F41/0273 , H01F41/0293 , C22C33/0278 , B22F3/12 , B22F2201/40 , B22F2201/10 , B22F2201/20
摘要： There is provided a method of manufacturing a permanent magnet which has an extremely high coercive force and high magnetic properties is manufactured at high productivity There are executed: a first step of causing at least one of Dy and Tb to adhere to at least part of a surface of iron-boron-rare-earth based sintered magnet; and a second step of diffusing, through heat-treatment at a predetermined temperature, at least one of Dy and Tb adhered to the surface of the sintered magnet into grain boundary phase of the sintered magnet. As the sintered magnet, there is used one which is manufactured by: mixing each powder of principal phase alloy (constituted primarily by R2T14B phase, where R is at least one rare earth element primarily including Nd and where T is a transition metal primarily including Fe), and a liquid phase alloy (having a higher content of R than R2T14B phase and primarily constituted by R-rich phase) in a predetermined mixing ratio; press-forming in magnetic field a mixed powder thus obtained; and sintering a press-formed body in vacuum or inert gas atmosphere.
摘要翻译：提供了一种制造具有极高矫顽力的永磁体的方法，并且以高生产率制造高磁特性执行：第一步骤，使Dy和Tb中的至少一种粘附到至少一部分铁 - 硼 - 稀土类烧结磁体的表面; 以及第二步骤，通过在预定温度下进行热处理，将附着在烧结磁体表面上的Dy和Tb中的至少一种扩散到烧结磁体的晶界相。作为烧结磁体，使用以下制造方法：将主相合金粉末（主要由R2T14B相构成，其中R为主要包含Nd的至少一种稀土元素，其中T为主要包含Fe的过渡金属））和预定混合比的液相合金（R含量比R2T14B相高，主要由富R相构成）; 在磁场中成形如此得到的混合粉末; 并在真空或惰性气体气氛中烧结压制成形体。

16. 发明申请

US20100009082A1 ROLL-TO-ROLL VACUUM DEPOSITION APPARATUS 审中-公开
标题翻译：滚筒式滚筒真空沉积装置
公开(公告)号：US20100009082A1
公开(公告)日：2010-01-14
申请号：US12438957
申请日：2007-09-28
申请人： Nobuhiro Hayaski , Tomoharu Fujii , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayaski , Tomoharu Fujii , Isao Tada , Atsushi Nakatsuka
IPC分类号： B05D1/32 , B05D1/28
CPC分类号： C23C14/042 , B05C1/0834 , B41F31/002 , B41F31/15 , C23C14/562
摘要： [Object] To simplify a structure and improve assembling property of an oil condensing roller, while preventing deterioration of condensation and adhesion efficiency of oil and transfer efficiency of the oil to a printing roller.[Solving Means] In a roll-to-roll vacuum deposition apparatus of the present invention, a mask forming unit includes an oil condensing roller for holding the oil for forming a mask pattern on its outer circumferential surface, a printing roller for transferring the oil as the mask pattern to the deposition surface of a film, and a transfer roller disposed between the oil condensing roller and the printing roller, for transferring the oil from the oil condensing roller to the printing roller. The mask forming unit further includes a cooling mechanism for cooling the oil condensing roller, and a rocking mechanism for periodically rocking the transfer roller in the axial direction with respect to the oil condensing roller and the printing roller.
摘要翻译：为了简化结构，提高油冷凝辊的组装性，同时防止油的冷凝劣化和粘合效率以及油向印刷辊的转印效率。本发明的卷对卷真空蒸镀装置中，掩模形成单元包括：用于保持在其外周面上形成掩模图案的油的聚光辊，用于输送油的印刷辊作为到膜的沉积表面的掩模图案，以及设置在聚光辊和印刷辊之间的转印辊，用于将油从油冷凝辊传送到印刷辊。掩模形成单元还包括用于冷却聚光辊的冷却机构和用于相对于油冷凝辊和印刷辊在轴向上周期性地摇动转印辊的摆动机构。

17. 发明申请

US20100006030A1 TAKE-UP TYPE VACUUM VAPOR DEPOSITION APPARATUS 审中-公开
标题翻译：升降式真空蒸发器沉积装置
公开(公告)号：US20100006030A1
公开(公告)日：2010-01-14
申请号：US12305387
申请日：2007-06-07
申请人： Nobuhiro Hayashi , Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Kenji Komatsu
发明人： Nobuhiro Hayashi , Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Kenji Komatsu
IPC分类号： C23C16/48 , C23C16/00
CPC分类号： C23C14/562 , C23C14/02 , C23C14/5826
摘要： To provide a take up type vacuum vapor deposition apparatus capable of suppressing generation of a thermally-affected area on a film without lowering productivity. A take-up type vacuum vapor deposition apparatus according to the present invention includes: a payout roller configured to successively pay out a film ; a take-up roller configured to take up the film paid out from the payout roller; a cooling roller disposed between the payout roller and the take-up roller and configured to cool the film by coming into close contact with the film ; an evaporation source that faces the cooling roller and configured to deposit an evaporation material on the film; and an electron beam irradiator disposed between the payout roller and the evaporation source and configured to irradiate the film with an electron beam while the film is traveling. In the take-up type vacuum vapor deposition apparatus, the electron beam irradiator includes a filament configured to discharge electrons by electrical heating and DC generation means for supplying a direct current to the filament.
摘要翻译：提供能够抑制膜上的热影响区域的产生而不降低生产率的卷取式真空蒸镀装置。根据本发明的卷取式真空蒸镀装置包括：延伸辊，其配置成连续地支付膜; 卷取辊，其构造成从所述支付辊上取出所述胶片; 冷却辊，其布置在所述支承辊和所述卷取辊之间，并且构造成通过与所述膜紧密接触来冷却所述膜; 蒸发源，其面向所述冷却辊并且构造成将蒸发材料沉积在所述膜上; 以及电子束照射器，其设置在所述分支辊和所述蒸发源之间并且被配置为在所述膜行进时用电子束照射所述膜。在卷取式真空蒸镀装置中，电子束照射装置具备：通过电加热而放电的灯丝，以及向灯丝供给直流电的直流产生装置。

18. 发明申请

US20090324823A1 ROLL-TO-ROLL VACUUM DEPOSITION METHOD AND ROLL-TO-ROLL VACUUM DEPOSITION APPARATUS 审中-公开
标题翻译：滚筒至滚筒真空沉积方法和滚筒至滚筒真空沉积装置
公开(公告)号：US20090324823A1
公开(公告)日：2009-12-31
申请号：US12438960
申请日：2007-11-16
申请人： Takayoshi Hirono , Tsunehito Nomura , Isao Tada , Atsushi Nakatsuka
发明人： Takayoshi Hirono , Tsunehito Nomura , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C16/44 , C23C16/02
CPC分类号： C23C14/564 , C23C14/562
摘要： [Object] To carry out high-quality deposition processing while effectively maintaining a function of cleaning a can roller by a cleaning unit.[Solving Means] In the present invention, prior to deposition onto a base film, a cleaning unit is brought into contact with a cooling can roller to clean the can roller rotating in a non-cooled state, whereby it becomes possible to prevent excessive cooling of the cleaning unit and inhibit fallaway of removed dust so that the cleaning unit can efficiently carry out dust removal processing of the cooling roller. In addition, by canceling an in-contact state of the cleaning unit and the can roller after the end of the cleaning, the cleaning unit can be prevented from being cooled by a cooling operation of the can roller during deposition, thus making it possible to hold the dust removed from a circumferential surface of the can roller without letting it fall away.
摘要翻译：为了进行高质量的沉积处理，同时有效地保持清洁单元清洁罐辊的功能。本发明中，在沉积到基膜上之前，使清洁单元与冷却罐辊接触，以清洁以非冷却状态旋转的罐辊，从而可以防止过度冷却并且防止除去的灰尘脱落，使得清洁单元能够有效地进行冷却辊的除尘处理。此外，通过在清洁结束之后取消清洁单元和罐辊的接触状态，可以防止清洁单元在沉积期间通过罐辊的冷却操作而被冷却，从而使得可以保持从罐辊的圆周表面除去的灰尘，而不会使其脱落。

19. 发明申请

US20090322459A1 PERMANENT MAGNET AND METHOD OF MANUFACTURING SAME 有权
标题翻译：永磁体及其制造方法
公开(公告)号：US20090322459A1
公开(公告)日：2009-12-31
申请号：US12440748
申请日：2007-09-10
申请人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshizumi , Yoshinori Shingaki
发明人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshizumi , Yoshinori Shingaki
IPC分类号： H01F7/02 , B05D5/00 , B05D3/02
CPC分类号： H01F7/0221 , C23C14/18 , C23C14/24 , C23C14/243 , C23C14/5806 , H01F1/0577 , H01F41/0293
摘要： A permanent magnet is provided which has formed a Dy, Tb film on a surface of an iron-boron-rare earth sintered magnet of a predetermined shape, with diffusion thereof into grain boundary phases, having a higher coercive force. The method of manufacturing a permanent magnet includes a film-forming step of evaporating metal evaporating material containing at least one of Dy and Tb and adhering evaporated metal atoms to a surface of the iron-boron-rare earth sintered magnet, and a diffusing step of performing heat treatment to diffuse metal atoms adhered to the surface into grain boundary phases of the sintered magnet. The metal evaporating material contains at least one of Nd and Pr.
摘要翻译：提供一种永磁体，其在具有预定形状的铁 - 硼 - 稀土烧结磁体的表面上形成Dy，Tb膜，并将其扩散到具有较高矫顽力的晶界相中。制造永磁体的方法包括：蒸发含有Dy和Tb中的至少一种的金属蒸发材料并将蒸发的金属原子附着在铁 - 硼 - 稀土烧结磁体的表面上的成膜步骤，以及扩散步骤进行热处理，将附着在表面的金属原子扩散到烧结磁体的晶界相。金属蒸发材料含有Nd和Pr中的至少一种。

20. 发明授权

US08375891B2 Vacuum vapor processing apparatus 有权
标题翻译：真空蒸气处理装置
公开(公告)号：US08375891B2
公开(公告)日：2013-02-19
申请号：US12440635
申请日：2007-09-10
申请人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
发明人： Hiroshi Nagata , Kyuzo Nakamura , Takeo Katou , Atsushi Nakatsuka , Ichirou Mukae , Masami Itou , Ryou Yoshiizumi , Yoshinori Shingaki
IPC分类号： C23C16/448 , C23C16/455 , C23C16/458 , C23C16/46 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： C23C14/24 , H01F41/0293
摘要： There is provided a vacuum evaporating apparatus which is suitable for performing a process in which a metal vapor atmosphere is formed in a processing chamber, the metal atoms in this metal vapor atmosphere are caused to be adhered to the surface of an object to be processed, and the metal atoms adhered to the surface of the object to be processed are diffused into grain boundary phases thereof. The apparatus comprises: a processing furnace (11); at least one processing box (4) disposed inside the processing furnace; and a heating means (2) provided inside the processing furnace so as to enclose the processing box. An evacuating means is provided which, after housing the processing box inside the processing furnace in a state in which the object to be processed (S) and the metal evaporating material (V) are disposed in the processing box, reduces the processing furnace and the processing box to a predetermined pressure and keep them at that pressure. The heating means is operated in the reduced pressure to evaporate the metal evaporating material while increasing the object to be processed to a predetermined temperature. The evaporated metal atoms are supplied to the surface of the object to be processed.
摘要翻译：提供了一种真空蒸发装置，其适于进行在处理室中形成金属蒸汽气氛的过程，使金属蒸气气氛中的金属原子粘附到待处理物体的表面，并且附着在待处理物体表面的金属原子扩散到其晶界相。该装置包括：加工炉（11）; 设置在处理炉内的至少一个处理箱（4）以及设置在处理炉内部以包围处理盒的加热装置（2）。本发明提供一种排气装置，其特征在于，处理炉内处理箱内处理箱体（S）和金属蒸发材料（V）的状态被设置在处理箱内时，将加工炉和处理箱到预定的压力并保持在该压力下。加热装置在减压下操作以蒸发金属蒸发材料，同时将待处理物体增加到预定温度。蒸发的金属原子被供应到待处理物体的表面。

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