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1. 发明申请

US20090324823A1 ROLL-TO-ROLL VACUUM DEPOSITION METHOD AND ROLL-TO-ROLL VACUUM DEPOSITION APPARATUS 审中-公开
标题翻译：滚筒至滚筒真空沉积方法和滚筒至滚筒真空沉积装置
公开(公告)号：US20090324823A1
公开(公告)日：2009-12-31
申请号：US12438960
申请日：2007-11-16
申请人： Takayoshi Hirono , Tsunehito Nomura , Isao Tada , Atsushi Nakatsuka
发明人： Takayoshi Hirono , Tsunehito Nomura , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C16/44 , C23C16/02
CPC分类号： C23C14/564 , C23C14/562
摘要： [Object] To carry out high-quality deposition processing while effectively maintaining a function of cleaning a can roller by a cleaning unit.[Solving Means] In the present invention, prior to deposition onto a base film, a cleaning unit is brought into contact with a cooling can roller to clean the can roller rotating in a non-cooled state, whereby it becomes possible to prevent excessive cooling of the cleaning unit and inhibit fallaway of removed dust so that the cleaning unit can efficiently carry out dust removal processing of the cooling roller. In addition, by canceling an in-contact state of the cleaning unit and the can roller after the end of the cleaning, the cleaning unit can be prevented from being cooled by a cooling operation of the can roller during deposition, thus making it possible to hold the dust removed from a circumferential surface of the can roller without letting it fall away.
摘要翻译：为了进行高质量的沉积处理，同时有效地保持清洁单元清洁罐辊的功能。本发明中，在沉积到基膜上之前，使清洁单元与冷却罐辊接触，以清洁以非冷却状态旋转的罐辊，从而可以防止过度冷却并且防止除去的灰尘脱落，使得清洁单元能够有效地进行冷却辊的除尘处理。此外，通过在清洁结束之后取消清洁单元和罐辊的接触状态，可以防止清洁单元在沉积期间通过罐辊的冷却操作而被冷却，从而使得可以保持从罐辊的圆周表面除去的灰尘，而不会使其脱落。

2. 发明申请

US20100307414A1 Take-Up Type Vacuum Deposition Apparatus 审中-公开
标题翻译：吸收式真空沉积装置
公开(公告)号：US20100307414A1
公开(公告)日：2010-12-09
申请号：US12867254
申请日：2008-04-14
申请人： Shin Yokoi , Tsunehito Nomura , Atsushi Nakatsuka , Isao Tada
发明人： Shin Yokoi , Tsunehito Nomura , Atsushi Nakatsuka , Isao Tada
IPC分类号： C23C14/14 , C23C14/28 , C23C14/58
CPC分类号： C23C14/562 , C23C14/541
摘要： [Object] To provide a take-up type vacuum deposition apparatus capable of preventing a thermal deformation of a base material due to charged particles leaked from a neutralization unit without an increase in size of the apparatus.[Solving Means] A take-up type vacuum deposition apparatus according to the present invention includes a charge capturing body provided between a cooling can roller and a neutralization unit that captures charged particles floating from the neutralization unit toward the can roller. Accordingly, the charged particles leaked from the neutralization unit are prevented from reaching the can roller, which suppresses variation in a bias potential applied to the can roller for bringing it into close contact with a base material, and keeps stable electrostatic force with respect to the base material. Accordingly, adhesion force between the base material and the cooling roller can be kept stable, and thus a thermal deformation of the base material can be suppressed.
摘要翻译：本发明提供一种卷取式真空沉积设备，其能够防止由于中和单元泄漏的带电粒子而引起的基体材料的热变形，而不会增加设备的尺寸。本发明的卷取式真空沉积设备包括：一个设置在冷却罐辊和中和装置之间的电荷捕获体，该中和装置捕获从中和单元向罐辊移动的带电粒子。因此，从中和单元泄漏的带电粒子被防止到达罐辊，这抑制了施加到罐辊的偏置电位的变化，使其与基材紧密接触，并且相对于该辊辊保持稳定的静电力基材。因此，可以保持基材和冷却辊之间的粘合力稳定，能够抑制基材的热变形。

3. 发明申请

US20100055311A1 Film Conveyor Apparatus and Roll-to-Roll Vacuum Deposition Method 审中-公开
标题翻译：薄膜输送设备和卷对卷真空沉积方法
公开(公告)号：US20100055311A1
公开(公告)日：2010-03-04
申请号：US12597916
申请日：2008-04-18
申请人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka
发明人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka
IPC分类号： C23C16/44 , C23C16/00 , B65G13/00
CPC分类号： C23C14/562 , B65H27/00 , B65H2701/1315
摘要： [Object] To enable a deposition area of a base film to be protected and realize stable film traveling performance.[Solving Means] A roll-to-roll vacuum deposition apparatus according to the present invention includes a guide unit including a guide roller and an auxiliary roller, the guide roller including a pair of annular guide portions that support side edge portions of a base film, the auxiliary roller being opposed to the guide roller and pressing the side edge portions of the base film against the pair of guide portions. As a result, a deposition area of the base film and roll surfaces of the guide roller and auxiliary roller of the guide unit can be prevented from being brought into contact with each other, and the deposition area) can thus be protected.
摘要翻译：为了使基膜的沉积区域得到保护并且实现稳定的膜行进性能。本发明的卷绕式真空蒸镀装置具备：引导部，其具有引导辊和辅助辊，所述引导辊包括一对环状的引导部，所述导向部支承基膜的侧缘部辅助辊与引导辊相对并将基膜的侧边缘部分压靠在一对引导部上。结果，可以防止基膜的沉积区域和引导单元的引导辊和辅助辊的辊表面彼此接触，从而可以保护沉积区域）。

4. 发明授权

US07896968B2 Winding type plasma CVD apparatus 有权
标题翻译：卷绕式等离子体CVD装置
公开(公告)号：US07896968B2
公开(公告)日：2011-03-01
申请号：US11792810
申请日：2006-05-10
申请人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
发明人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/3277 , B08B7/00 , C23C16/4405 , C23C16/46 , C23C16/5096 , C23C16/545 , H01J37/32009
摘要： The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film.A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33, 34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask (51) with a shutter (65), thereby preventing leakage of cleaning gas.
摘要翻译：本发明的目的是提供一种绕线式等离子体CVD装置，通过将反应气体均匀地供应到膜的沉积区域，可以使层的质量均匀，并且可以进行沉积部分的自清洁处理在沉积到膜上的路径。相对于膜的行进方向，膜（22）被支撑在布置在沉积部分（25）的上游侧和下游侧的一对可动辊（33,34）之间，然后，膜（22）使其在沉积位置大致线性地移动。因此，喷淋板（37）和膜（22）之间的距离保持恒定，并且使层的质量均匀。薄膜通过金属带（40）加热，同时在薄膜背面行进。可移动辊（33,34）从沉积位置上升到自清洁位置，并且膜（22）可以与喷淋板（37）分离。通过用挡板（65）封闭掩模（51）的孔径，可以在沉积到膜上的路径中进行自清洁，从而防止清洁气体的泄漏。

5. 发明申请

US20080006206A1 Winding Type Plasma Cvd Apparatus 有权
标题翻译：绕组式等离子体Cvd装置
公开(公告)号：US20080006206A1
公开(公告)日：2008-01-10
申请号：US11792810
申请日：2006-05-10
申请人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
发明人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
IPC分类号： C23C16/505 , C23C16/44 , H01L21/205
CPC分类号： H01J37/3277 , B08B7/00 , C23C16/4405 , C23C16/46 , C23C16/5096 , C23C16/545 , H01J37/32009
摘要： The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film. A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33,34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask (51) with a shutter (65), thereby preventing leakage of cleaning gas.
摘要翻译：本发明的目的是提供一种绕线式等离子体CVD装置，通过将反应气体均匀地供应到膜的沉积区域，可以使层的质量均匀，并且可以进行沉积部分的自清洁处理在沉积到膜上的路径。相对于膜的行进方向，膜（22）被支撑在布置在沉积部分（25）的上游侧和下游侧的一对可动辊（33,34）之间，然后，膜（22）使其在沉积位置基本线性地行进。因此，喷淋板（37）和膜（22）之间的距离保持恒定，并且使层的质量均匀。薄膜通过金属带（40）加热，同时在薄膜背面行进。可移动辊（33,34）从沉积位置上升到自清洁位置，并且膜（22）可以与喷淋板（37）分离。通过用挡板（65）封闭掩模（51）的孔径，可以在沉积到膜上的路径中进行自清洁，从而防止清洁气体的泄漏。

6. 发明申请

US20070134426A1 Vacuum evaporation deposition method of the winding type and vacuum evaporation deposition apparatus of the same 审中-公开
标题翻译：卷取式真空蒸镀法和真空蒸镀沉积装置相同
公开(公告)号：US20070134426A1
公开(公告)日：2007-06-14
申请号：US10574715
申请日：2004-11-12
申请人： Nobuhiro Hayashi , Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka
发明人： Nobuhiro Hayashi , Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka
IPC分类号： B05D3/00 , C23C8/00 , H05B6/02 , C23C16/00 , B29C71/04
CPC分类号： C23C14/562 , C23C14/022 , G11B5/85
摘要： The invention provides a vacuum evaporation deposition method of the winding type and a vacuum evaporation deposition apparatus of the winding type which can form a metal film on a base film made of a single layer of insulating material such as plastic film without thermal deformation, and which is superior in productivity. An electron beam irradiator 21 irradiates an electron beam onto an insulating material base film 12 before deposition of metal, and a DC bias power source 22 applies bias voltage between an auxiliary roller 18 for guiding the base film 12 with metal film deposited thereon and a can roller 14, whereby the base film 12 charged by the irradiation of the electron beam before the deposition of metal film, is made to be in close contact with the can roller 14. The base film 12 after deposition of metal film is made to be in close contact with the can roller 14 by the bias voltage applied between the auxiliary roller 18 connected electrically to the metal film and the can roller 14.
摘要翻译：本发明提供一种绕线式真空蒸发沉积方法和一种绕线式的真空蒸发沉积设备，该真空蒸镀沉积设备可以在由单层绝缘材料如塑料薄膜制成的基膜上形成金属膜而不会发生热变形，生产力优越。电子束照射器21在沉积金属之前将电子束照射到绝缘材料基膜12上，并且DC偏压电源22在用于引导基膜12的辅助辊18与其上沉积有金属膜的辅助辊18之间施加偏置电压，辊14，由此通过在沉积金属膜之前通过电子束的照射而充电的基膜12被制成与罐辊14紧密接触。通过施加在与金属膜电连接的辅助辊18和罐辊14之间的偏压施加金属膜沉积后的基膜12与罐辊14紧密接触。

7. 发明申请

US20100006030A1 TAKE-UP TYPE VACUUM VAPOR DEPOSITION APPARATUS 审中-公开
标题翻译：升降式真空蒸发器沉积装置
公开(公告)号：US20100006030A1
公开(公告)日：2010-01-14
申请号：US12305387
申请日：2007-06-07
申请人： Nobuhiro Hayashi , Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Kenji Komatsu
发明人： Nobuhiro Hayashi , Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Kenji Komatsu
IPC分类号： C23C16/48 , C23C16/00
CPC分类号： C23C14/562 , C23C14/02 , C23C14/5826
摘要： To provide a take up type vacuum vapor deposition apparatus capable of suppressing generation of a thermally-affected area on a film without lowering productivity. A take-up type vacuum vapor deposition apparatus according to the present invention includes: a payout roller configured to successively pay out a film ; a take-up roller configured to take up the film paid out from the payout roller; a cooling roller disposed between the payout roller and the take-up roller and configured to cool the film by coming into close contact with the film ; an evaporation source that faces the cooling roller and configured to deposit an evaporation material on the film; and an electron beam irradiator disposed between the payout roller and the evaporation source and configured to irradiate the film with an electron beam while the film is traveling. In the take-up type vacuum vapor deposition apparatus, the electron beam irradiator includes a filament configured to discharge electrons by electrical heating and DC generation means for supplying a direct current to the filament.
摘要翻译：提供能够抑制膜上的热影响区域的产生而不降低生产率的卷取式真空蒸镀装置。根据本发明的卷取式真空蒸镀装置包括：延伸辊，其配置成连续地支付膜; 卷取辊，其构造成从所述支付辊上取出所述胶片; 冷却辊，其布置在所述支承辊和所述卷取辊之间，并且构造成通过与所述膜紧密接触来冷却所述膜; 蒸发源，其面向所述冷却辊并且构造成将蒸发材料沉积在所述膜上; 以及电子束照射器，其设置在所述分支辊和所述蒸发源之间并且被配置为在所述膜行进时用电子束照射所述膜。在卷取式真空蒸镀装置中，电子束照射装置具备：通过电加热而放电的灯丝，以及向灯丝供给直流电的直流产生装置。

8. 外观设计

USD689534S1 Film-forming apparatus 有权
标题翻译：成膜装置
公开(公告)号：USD689534S1
公开(公告)日：2013-09-10
申请号：US29373100
申请日：2011-02-28
申请人： Shinya Fujimoto , Nobuhiro Hayashi , Takayoshi Hirono , Isao Tada , Shuji Saito
设计人： Shinya Fujimoto , Nobuhiro Hayashi , Takayoshi Hirono , Isao Tada , Shuji Saito

9. 发明申请

US20130168243A1 Vacuum Processing Apparatus 有权
标题翻译：真空处理设备
公开(公告)号：US20130168243A1
公开(公告)日：2013-07-04
申请号：US13823192
申请日：2011-09-07
申请人： Takayoshi Hirono , Isao Tada
发明人： Takayoshi Hirono , Isao Tada
IPC分类号： C23C14/34
CPC分类号： C23C14/34 , C23C14/50 , C23C14/562
摘要： Provided is a low-cost vacuum processing apparatus which enables the miniaturization of the apparatus and achieves good productivity. An elongated sheet base material is transported through a vacuum processing chamber, and predetermined processing is performed on the sheet base material in this vacuum processing chamber. The vacuum processing chamber is provided with a single processing unit, and has an auxiliary vacuum chamber provided in continuation with the vacuum processing chamber. The auxiliary vacuum chamber is provided with a feed roller and a take-up roller. The vacuum processing apparatus includes a pair of first roller units provided on opposite sides across the processing unit in the vacuum processing chamber. Each of the first roller units has multiple rollers disposed at regular distances. The rollers are deviated from each other in the axial direction and arranged in such a staggered manner that the sheet base material is helically wound around the rollers.
摘要翻译：提供一种低成本的真空处理装置，其能够使装置小型化并且实现良好的生产率。细长的片材基材通过真空处理室输送，在该真空处理室中对片材基材进行规定的处理。真空处理室设置有单个处理单元，并且具有与真空处理室连续设置的辅助真空室。辅助真空室设有进料辊和卷取辊。真空处理装置包括一对第一辊单元，设置在真空处理室中的处理单元的相对侧。每个第一辊单元具有以规则距离布置的多个辊。辊在轴向上彼此偏离并且以这样的交错方式布置，使得片状基材被螺旋缠绕在辊上。

10. 发明授权

US09109284B2 Vacuum processing apparatus 有权
标题翻译：真空加工设备
公开(公告)号：US09109284B2
公开(公告)日：2015-08-18
申请号：US13823192
申请日：2011-09-07
申请人： Takayoshi Hirono , Isao Tada
发明人： Takayoshi Hirono , Isao Tada
IPC分类号： C23C14/56 , C23C14/34 , C23C14/50
CPC分类号： C23C14/34 , C23C14/50 , C23C14/562
摘要： Provided is a low-cost vacuum processing apparatus which enables the miniaturization of the apparatus and achieves good productivity. An elongated sheet base material is transported through a vacuum processing chamber, and predetermined processing is performed on the sheet base material in this vacuum processing chamber. The vacuum processing chamber is provided with a single processing unit, and has an auxiliary vacuum chamber provided in continuation with the vacuum processing chamber. The auxiliary vacuum chamber is provided with a feed roller and a take-up roller. The vacuum processing apparatus includes a pair of first roller units provided on opposite sides across the processing unit in the vacuum processing chamber. Each of the first roller units has multiple rollers disposed at regular distances. The rollers are deviated from each other in the axial direction and arranged in such a staggered manner that the sheet base material is helically wound around the rollers.
摘要翻译：提供一种低成本的真空处理装置，其能够使装置小型化并且实现良好的生产率。细长的片材基材通过真空处理室输送，在该真空处理室中对片材基材进行规定的处理。真空处理室设置有单个处理单元，并且具有与真空处理室连续设置的辅助真空室。辅助真空室设有进料辊和卷取辊。真空处理装置包括一对第一辊单元，设置在真空处理室中的处理单元的相对侧。每个第一辊单元具有以规则距离布置的多个辊。辊在轴向上彼此偏离并且以这样的交错方式布置，使得片状基材被螺旋缠绕在辊上。

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