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    • 12. 发明授权
    • Magneto-optical recording medium
    • 磁光记录介质
    • US06436524B1
    • 2002-08-20
    • US08913974
    • 1998-01-13
    • Masaya IshidaTakeo Kawase
    • Masaya IshidaTakeo Kawase
    • G11B566
    • G11B11/10586G11B11/10508G11B11/10584Y10S428/90Y10T428/26Y10T428/265
    • When recording using magnetic field modulation recording, the magneto-optical recording medium which is disclosed is capable of satisfactory recording with a low magnetic field. This recording medium is a layered superposition of a recording layer 13 and an auxiliary recording layer 14 having a film thickness of less than or equal to 100 angstroms. The recording layer 13 is a film having an easy perpendicular axis of magnetization whose value of magnetization at room temperature is at least 150 emu/cc, and for example a heavy rare earth—transition metal alloy, a magnetic multilayer film which employs a precious metal, an oxide like a garnet or Spinel ferrite, or some other magnetic alloy may be used. The auxiliary recording layer 14 is typically a heavy rare earth—transition metal alloy, and has a Curie temperature higher (desirably at least 30K higher) than that of the recording layer 13. It is desirable to further provide a stabilizing layer superimposed upon the recording layer 13 which has a lower Curie temperature and also a higher coercive field at room temperature than the recording layer recording layer 13. If HREx(Fe1−yCoy)1−x is used for the recording layer recording layer 13 (here HRE is a heavy rare earth metal), it is desirable that 0.08≦x≦0.20 and also 0.0≦y≦0.3.
    • 当使用磁场调制记录进行记录时,所公开的磁光记录介质能够以低磁场良好的记录。 该记录介质是具有薄膜厚度小于或等于100埃的记录层13和辅助记录层14的分层叠加。 记录层13是具有容易的垂直磁化轴的膜,其室温下的磁化强度至少为150emu / cc,例如重稀土 - 过渡金属合金,使用贵金属的磁性多层膜 ,可以使用像石榴石或尖晶石铁氧体的氧化物,或其它一些磁性合金。 辅助记录层14通常是重稀土 - 过渡金属合金,并且居里温度高于记录层13的居里温度(期望地至少高30K)。期望进一步提供叠加在记录上的稳定层 层13具有较低的居里温度,并且在室温下比记录层记录层13具有更高的矫顽场。如果将HREx(Fe1-yCoy)1-x用于记录层记录层13(这里HRE是重的 稀土金属),希望0.08 <= x <= 0.20,并且0.0 <= y <= 0.3。
    • 15. 发明申请
    • Method for producing nitride semiconductor laser light source and apparatus for producing nitride semiconductor laser light source
    • 氮化物半导体激光光源的制造方法以及氮化物半导体激光光源的制造装置
    • US20110174288A1
    • 2011-07-21
    • US13064534
    • 2011-03-30
    • Daisuke HanaokaMasaya IshidaAtsushi OgawaYoshihiko TaniTakuro Ishikura
    • Daisuke HanaokaMasaya IshidaAtsushi OgawaYoshihiko TaniTakuro Ishikura
    • F24B1/00
    • H01S5/02212H01S5/0222H01S5/32341Y10T29/5176
    • A method for producing a nitride semiconductor laser light source is provided. The nitride semiconductor laser light source has a nitride semiconductor laser chip, a stem for mounting the laser chip thereon, and a cap for covering the laser chip. The laser chip is encapsulated in a sealed container composed of the stem and the cap. The method for producing this nitride semiconductor laser light source has a cleaning step of cleaning the surface of the laser chip, the stem, or the cap. In the cleaning step, the laser chip, the stem, or the cap is exposed with ozone or an excited oxygen atom, or baked by heat. The method also has, after the cleaning step, a capping step of encapsulating the laser chip in the sealed container composed of the stem and the cap. During the capping step, the cleaned surface of the laser chip, the stem, or the cap is kept clean. This method provides a long-life nitride semiconductor laser light source the light emission intensity of which is not easily reduced after a long period of use.
    • 提供一种生产氮化物半导体激光光源的方法。 氮化物半导体激光光源具有氮化物半导体激光器芯片,用于在其上安装激光器芯片的杆和用于覆盖激光器芯片的盖。 激光芯片被封装在由杆和盖组成的密封容器中。 用于制造该氮化物半导体激光光源的方法具有清洁激光芯片,杆或盖的表面的清洁步骤。 在清洁步骤中,激光芯片,阀杆或盖子暴露于臭氧或激发氧原子,或通过加热进行烘烤。 该方法在清洁步骤之后还具有将激光芯片封装在由杆和盖组成的密封容器中的封盖步骤。 在封盖步骤中,激光芯片,阀杆或盖子的清洁表面保持清洁。 该方法提供了长期使用后其发光强度不容易降低的长寿命氮化物半导体激光光源。
    • 17. 发明授权
    • Method for producing nitride semiconductor laser light source and apparatus for producing nitride semiconductor laser light source
    • 氮化物半导体激光光源的制造方法及氮化物半导体激光光源的制造装置
    • US07833834B2
    • 2010-11-16
    • US11237946
    • 2005-09-29
    • Daisuke HanaokaMasaya IshidaAtsushi OgawaYoshihiko TaniTakuro Ishikura
    • Daisuke HanaokaMasaya IshidaAtsushi OgawaYoshihiko TaniTakuro Ishikura
    • H01L21/00
    • H01S5/02212H01S5/0222H01S5/32341Y10T29/5176
    • A method for producing a nitride semiconductor laser light source is provided. The nitride semiconductor laser light source has a nitride semiconductor laser chip, a stem for mounting the laser chip thereon, and a cap for covering the laser chip. The laser chip is encapsulated in a sealed container composed of the stem and the cap. The method for producing this nitride semiconductor laser light source has a cleaning step of cleaning the surface of the laser chip, the stem, or the cap. In the cleaning step, the laser chip, the stem, or the cap is exposed with ozone or an excited oxygen atom, or baked by heat. The method also has, after the cleaning step, a capping step of encapsulating the laser chip in the sealed container composed of the stem and the cap. During the capping step, the cleaned surface of the laser chip, the stem, or the cap is kept clean. This method provides a long-life nitride semiconductor laser light source the light emission intensity of which is not easily reduced after a long period of use.
    • 提供一种生产氮化物半导体激光光源的方法。 氮化物半导体激光光源具有氮化物半导体激光器芯片,用于在其上安装激光器芯片的杆和用于覆盖激光器芯片的盖。 激光芯片被封装在由杆和盖组成的密封容器中。 用于制造该氮化物半导体激光光源的方法具有清洁激光芯片,杆或盖的表面的清洁步骤。 在清洁步骤中,激光芯片,阀杆或盖子暴露于臭氧或激发氧原子,或通过加热进行烘烤。 该方法在清洁步骤之后还具有将激光芯片封装在由杆和盖组成的密封容器中的封盖步骤。 在封盖步骤中,激光芯片,阀杆或盖子的清洁表面保持清洁。 该方法提供了长期使用后其发光强度不容易降低的长寿命氮化物半导体激光光源。