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11. 发明申请

US20110155059A1 THIN FILM FORMING APPARATUS, THIN FILM FORMING METHOD, AND SHIELD COMPONENT 有权
标题翻译：薄膜成型装置，薄膜成型方法和屏蔽部件
公开(公告)号：US20110155059A1
公开(公告)日：2011-06-30
申请号：US12974245
申请日：2010-12-21
申请人： Akihiro Egami , Toshikazu Nakazawa , Katsuhiro Suzuki , Shinya Hasegawa
发明人： Akihiro Egami , Toshikazu Nakazawa , Katsuhiro Suzuki , Shinya Hasegawa
IPC分类号： C23C16/50 , C23C16/00
CPC分类号： C23C14/564 , C23C14/0036 , C23C14/34 , C23C16/4401 , C23C16/45591 , C23C16/4585 , H01J37/32477 , H01J37/32651 , H01J37/3405 , H01J37/3411 , H01J37/3441 , H01J2237/026 , H01J2237/0268
摘要： The inventors of this invention conducted a test and found out that to prevent peel-off of an adherent film, it is not of essential importance to set the radius of curvature equal to or larger than a predetermined threshold. The inventors of the present invention also found out that peel-off of an adherent film occurs in the region in which the curvature of a shield changes and is less likely to occur when the change in curvature of the shield is small. Accordingly, the key to the problem is the magnitude of a change in curvature of the shield, so changing the curvature stepwise makes it possible to suppress a large change in curvature, and thus to prevent peel-off of an adherent film free from any disadvantages such as deterioration in film thickness distribution, which may occur due to an increase in size of the shield.
摘要翻译：本发明人进行了测试，发现为了防止粘附膜的剥离，将曲率半径设定为等于或大于预定阈值不是重要的。本发明的发明人还发现，粘合膜的剥离发生在屏蔽的曲率变化的区域中，并且当屏蔽的曲率变化小时不太可能发生。因此，问题的关键在于屏蔽体的曲率变化的大小，因此逐渐改变曲率使得可以抑制曲率的大的变化，从而防止粘附膜的剥离没有任何缺点例如由于屏蔽件的尺寸增加而可能发生的膜厚分布的劣化。

12. 发明授权

US08007633B2 Surface processing apparatus 有权
标题翻译：表面处理装置
公开(公告)号：US08007633B2
公开(公告)日：2011-08-30
申请号：US13064484
申请日：2011-03-28
申请人： Akihiro Egami , Masayoshi Ikeda , Yasumi Sago , Yukito Nakagawa
发明人： Akihiro Egami , Masayoshi Ikeda , Yasumi Sago , Yukito Nakagawa
IPC分类号： C23C16/00 , H01L21/00
CPC分类号： H01J37/32623 , H01J37/32688 , Y10T428/24
摘要： This surface processing apparatus has a reactor in which plasma is generated and a substrate whose surface is to be processed by the plasma is arranged, and a magnet plate for creating a point-cusp magnetic field distributed in an inner space of the reactor, in which the plasma is generated. The magnet plate has a plurality of magnets. These magnets are arranged by a honeycomb lattice structure in a circular plane facing in parallel a surface of the substrate. One magnetic pole end face of each of magnets is arranged at a position of each of the lattice points forming hexagonal shapes on the circular plane. The polarities of the magnetic pole end faces of two adjoining magnets are arranged to become opposite alternately. The magnet plate may be provided with a plurality of magnets arranged by a lattice structure forming a square and the magnetic force (coercive force) of some of the magnets arranged at the outermost region is reduced. Thereby, the periodicity of the point-cusp magnetic field in the inside space is maintained as much as possible even at the peripheral edge and the asymmetry of the distribution of the magnetic field at the region where the periodicity is disturbed at the peripheral edge is reduced.
摘要翻译：该表面处理装置具有排列有等离子体的反应器和配置有等离子体的表面的基板，以及分配在反应器的内部空间中产生点尖点磁场的磁铁板，其中，产生等离子体。磁体板具有多个磁体。这些磁体通过蜂窝状晶格结构排列在圆形平面中并且平行于基板的表面。每个磁体的一个磁极端面设置在圆形平面上形成六边形形状的每个格子点的位置。两个邻接的磁体的磁极端面的极性被布置成交替地相反。磁体板可以设置有通过形成正方形的格子结构排列的多个磁体，并且排列在最外侧区域的一些磁体的磁力（矫顽力）减小。因此，即使在周边边缘，内部空间中的点尖点磁场的周期性仍然尽可能地保持，并且周边边缘周期性被扰动的区域处的磁场分布的不对称性减小。

13. 发明申请

US20110174221A1 Surface processing apparatus 有权
公开(公告)号：US20110174221A1
公开(公告)日：2011-07-21
申请号：US13064484
申请日：2011-03-28
申请人： Akihiro Egami , Masayoshi Ikeda , Yasumi Sago , Yukito Nakagawa
发明人： Akihiro Egami , Masayoshi Ikeda , Yasumi Sago , Yukito Nakagawa
IPC分类号： C23C16/52 , C23C16/50
CPC分类号： H01J37/32623 , H01J37/32688 , Y10T428/24
摘要： This surface processing apparatus has a reactor in which plasma is generated and a substrate whose surface is to be processed by the plasma is arranged, and a magnet plate for creating a point-cusp magnetic field distributed in an inner space of the reactor, in which the plasma is generated. The magnet plate has a plurality of magnets. These magnets are arranged by a honeycomb lattice structure in a circular plane facing in parallel a surface of the substrate. One magnetic pole end face of each of magnets is arranged at a position of each of the lattice points forming hexagonal shapes on the circular plane. The polarities of the magnetic pole end faces of two adjoining magnets are arranged to become opposite alternately. The magnet plate may be provided with a plurality of magnets arranged by a lattice structure forming a square and the magnetic force (coercive force) of some of the magnets arranged at the outermost region is reduced. Thereby, the periodicity of the point-cusp magnetic field in the inside space is maintained as much as possible even at the peripheral edge and the asymmetry of the distribution of the magnetic field at the region where the periodicity is disturbed at the peripheral edge is reduced.

14. 发明申请

US20080113149A1 Surface processing apparatus 审中-公开
标题翻译：表面处理装置
公开(公告)号：US20080113149A1
公开(公告)日：2008-05-15
申请号：US12003456
申请日：2007-12-26
申请人： Akihiro Egami , Masayoshi Ikeda , Yasumi Sago , Yukito Nakagawa
发明人： Akihiro Egami , Masayoshi Ikeda , Yasumi Sago , Yukito Nakagawa
IPC分类号： B32B7/00
CPC分类号： H01J37/32623 , H01J37/32688 , Y10T428/24
摘要： This surface processing apparatus has a reactor in which plasma is generated and a substrate whose surface is to be processed by the plasma is arranged, and a magnet plate for creating a point-cusp magnetic field distributed in an inner space of the reactor, in which the plasma is generated. The magnet plate has a plurality of magnets. These magnets are arranged by a honeycomb lattice structure in a circular plane facing in parallel a surface of the substrate. One magnetic pole end face of each of magnets is arranged at a position of each of the lattice points forming hexagonal shapes on the circular plane. The polarities of the magnetic pole end faces of two adjoining magnets are arranged to become opposite alternately. The magnet plate may be provided with a plurality of magnets arranged by a lattice structure forming a square and the magnetic force (coercive force) of some of the magnets arranged at the outermost region is reduced. Thereby, the periodicity of the point-cusp magnetic field in the inside space is maintained as much as possible even at the peripheral edge and the asymmetry of the distribution of the magnetic field at the region where the periodicity is disturbed at the peripheral edge is reduced.
摘要翻译：该表面处理装置具有排列有等离子体的反应器和配置有等离子体的表面的基板，以及分配在反应器的内部空间中产生点尖点磁场的磁铁板，其中，产生等离子体。磁体板具有多个磁体。这些磁体通过蜂窝状晶格结构排列在圆形平面中并且平行于基板的表面。每个磁体的一个磁极端面设置在圆形平面上形成六边形形状的每个格子点的位置。两个邻接的磁体的磁极端面的极性被布置成交替地相反。磁体板可以设置有通过形成正方形的格子结构排列的多个磁体，并且排列在最外侧区域的一些磁体的磁力（矫顽力）减小。因此，即使在周边边缘，内部空间中的点尖点磁场的周期性仍然尽可能地保持，并且周边边缘周期性被扰动的区域处的磁场分布的不对称性减小。

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