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11. 发明授权

US07988816B2 Plasma processing apparatus and method 有权
标题翻译：等离子体处理装置及方法
公开(公告)号：US07988816B2
公开(公告)日：2011-08-02
申请号：US11157061
申请日：2005-06-21
申请人： Akira Koshiishi , Masaru Sugimoto , Kunihiko Hinata , Noriyuki Kobayashi , Chishio Koshimizu , Ryuji Ohtani , Kazuo Kibi , Masashi Saito , Naoki Matsumoto , Yoshinobu Ooya , Manabu Iwata , Daisuke Yano , Yohei Yamazawa , Hidetoshi Hanaoka , Toshihiro Hayami , Hiroki Yamazaki , Manabu Sato
发明人： Akira Koshiishi , Masaru Sugimoto , Kunihiko Hinata , Noriyuki Kobayashi , Chishio Koshimizu , Ryuji Ohtani , Kazuo Kibi , Masashi Saito , Naoki Matsumoto , Yoshinobu Ooya , Manabu Iwata , Daisuke Yano , Yohei Yamazawa , Hidetoshi Hanaoka , Toshihiro Hayami , Hiroki Yamazaki , Manabu Sato
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H05B31/26
CPC分类号： H01J37/32422 , H01J37/32018 , H01J37/32091 , H01J37/3244 , H01J37/32522 , H01J37/32834 , H01J2237/2001 , H01J2237/334 , H01J2237/3344 , H01L21/67069 , Y10S156/915
摘要： A plasma etching apparatus includes an upper electrode and a lower electrode, between which plasma of a process gas is generated to perform plasma etching on a wafer W. The apparatus further comprises a cooling ring disposed around the wafer, a correction ring disposed around the cooling ring, and a variable DC power supply directly connected to the correction ring, the DC voltage being preset to provide the correction ring with a negative bias, relative to ground potential, for attracting ions in the plasma and to increase temperature of the correction ring to compensate for a decrease in temperature of a space near the edge of the target substrate due to the cooling ring.
摘要翻译：等离子体蚀刻装置包括上电极和下电极，在其间产生处理气体的等离子体以在晶片W上进行等离子体蚀刻。该装置还包括设置在晶片周围的冷却环，设置在冷却周围的校正环环和直接连接到校正环的可变直流电源，所述直流电压被预设为向校正环提供相对于地电位的负偏压，用于吸引等离子体中的离子并将校正环的温度增加到补偿由于冷却环导致的目标基板的边缘附近的空间的温度的降低。

12. 发明申请

US20110165000A1 Hermetic Compressor 审中-公开
标题翻译：密封压缩机
公开(公告)号：US20110165000A1
公开(公告)日：2011-07-07
申请号：US13063164
申请日：2009-09-03
申请人： Noriyuki Kobayashi
发明人： Noriyuki Kobayashi
IPC分类号： F04B35/04
CPC分类号： F04C18/0215 , F04C23/008 , F04C29/026 , F04C2240/806
摘要： There is provided a hermetic compressor which has a simplified structure and can satisfactorily separate a lubricating oil from a refrigerant and efficiently discharge the refrigerant from a hermetic container. A discharge passage (90) is provided to extend through a scroll unit (30) and a primary shaft frame (14), or between an inner wall surface of a body (3) of a hermetic container (2) and the scroll unit (30) and primary shaft frame (14) to guide the refrigerant with the lubricating oil directly to a stator (8) of an electric motor (6). Over the stator (96), an oil separation plate (96) is provided to separate the lubricating oil from the refrigerant conveyed through the discharge passage (96). A discharge pipe (72) is fitted to the body, below the primary shaft frame, to allow the refrigerant with the lubricating oil removed to be discharged from the hermetic container.
摘要翻译：提供了一种封闭式压缩机，其具有简化的结构，并且可以令人满意地将润滑油与制冷剂分离并且有效地从密封容器排出制冷剂。排出通道（90）设置成延伸穿过涡旋单元（30）和主轴框架（14），或者在密封容器（2）的主体（3）的内壁表面和涡旋单元（ 30）和主轴架（14）将制冷剂与润滑油直接引导到电动机（6）的定子（8）。在定子（96）上设置油分离板（96）以将润滑油与通过排出通道（96）输送的制冷剂分离。在主轴架下面的主体上安装有排出管72，以使除去了润滑油的制冷剂从密封容器排出。

13. 发明授权

US07740737B2 Plasma processing apparatus and method 有权
标题翻译：等离子体处理装置及方法
公开(公告)号：US07740737B2
公开(公告)日：2010-06-22
申请号：US11156559
申请日：2005-06-21
申请人： Akira Koshiishi , Masaru Sugimoto , Kunihiko Hinata , Noriyuki Kobayashi , Chishio Koshimizu , Ryuji Ohtani , Kazuo Kibi , Masashi Saito , Naoki Matsumoto , Manabu Iwata , Daisuke Yano , Yohei Yamazawa
发明人： Akira Koshiishi , Masaru Sugimoto , Kunihiko Hinata , Noriyuki Kobayashi , Chishio Koshimizu , Ryuji Ohtani , Kazuo Kibi , Masashi Saito , Naoki Matsumoto , Manabu Iwata , Daisuke Yano , Yohei Yamazawa
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01J37/32091 , H01J37/32082 , H01J37/32174 , H01J37/32348 , H01J37/3244 , H01J37/32541 , H01J37/32568 , H01J37/32642 , H01J37/32706 , H01J37/32834 , H01J2237/3344 , H01L21/02126 , H01L21/02164 , H01L21/0217 , H01L21/31116 , H01L21/31138 , H01L21/31144 , H01L21/67069
摘要： An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency is connected to the upper electrode. A second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber while any one of application voltage, application current, and application power from the variable DC power supply to the upper electrode is controlled, to generate plasma of the process gas so as to perform plasma etching.
摘要翻译：一种装置包括用于支撑在处理室内相对设置的晶片的上电极和下电极。被配置为施加具有相对较高频率的第一RF功率的第一RF电源连接到上电极。配置为施加具有相对较低频率的第二RF功率的第二RF电源连接到下电极。可变直流电源连接到上电极。将处理气体供给到处理室中，同时控制来自可变直流电源到上部电极的施加电压，施加电流和施加电力中的任何一个，以产生处理气体的等离子体，以进行等离子体蚀刻。

14. 发明申请

US20090111275A1 PLASMA ETCHING METHOD AND STORAGE MEDIUM 有权
标题翻译：等离子体蚀刻方法和储存介质
公开(公告)号：US20090111275A1
公开(公告)日：2009-04-30
申请号：US12254943
申请日：2008-10-21
申请人： Naotsugu HOSHI , Noriyuki Kobayashi
发明人： Naotsugu HOSHI , Noriyuki Kobayashi
IPC分类号： H01L21/3065
CPC分类号： H01L21/31138 , H01J37/32091 , H01L21/31116 , H01L21/31144 , H01L21/76802 , H01L21/76834
摘要： A plasma etching method that can prevent residues from becoming attached to bottoms and sides of via holes and trenches. An interlayer insulation film formed of CwFx (x and w are predetermined natural numbers) and a metallic layer or a metal-containing layer formed on a substrate are exposed at the same time to plasma generated from a process gas. The process gas is a mixed gas including CyFz (y and z are predetermined natural numbers) gas and N2 gas, and the flow rate of the N2 gas in the process gas is higher than the flow rate of the CyFz gas.
摘要翻译：等离子体蚀刻方法，可以防止残留物附着到通孔和沟槽的底部和侧面。由CwFx（x和w是预定的自然数）形成的层间绝缘膜和形成在基板上的金属层或含金属层同时暴露于由处理气体产生的等离子体。处理气体是包括CyFz（y和z是预定的自然数）气体和N 2气体的混合气体，并且处理气体中的N 2气体的流量高于CyFz气体的流量。

15. 发明申请

US20090029234A1 Method of manufacturing membrane electrode assembly, and membrane electrode assembly 审中-公开
标题翻译：膜电极组件和膜电极组件的制造方法
公开(公告)号：US20090029234A1
公开(公告)日：2009-01-29
申请号：US12219107
申请日：2008-07-16
申请人： Masao Okumura , Noriyuki Kobayashi , Toru Ikeda , Tatsuya Hatanaka
发明人： Masao Okumura , Noriyuki Kobayashi , Toru Ikeda , Tatsuya Hatanaka
IPC分类号： H01M4/00 , B05D5/12
CPC分类号： H01M8/1004 , H01M4/881 , H01M4/886 , H01M8/023 , H01M8/0234 , H01M8/0239 , H01M8/0245 , Y02P70/56
摘要： A method of manufacturing a membrane electrode assembly for a fuel cell includes: producing a gas diffusion layer powder that is used to form a gas diffusion layer; forming a catalyst layer on an electrolyte membrane; and forming the gas diffusion layer on the catalyst layer by depositing the gas diffusion layer powder on the catalyst layer.
摘要翻译：制造燃料电池用膜电极组件的方法包括：制造用于形成气体扩散层的气体扩散层粉末; 在电解质膜上形成催化剂层; 以及通过在催化剂层上沉积气体扩散层粉末在催化剂层上形成气体扩散层。

16. 发明申请

US20090006381A1 INFORMATION SEARCH DEVICE, INFORMATION SEARCH METHOD, AND INFORMATION SEARCH PROGRAM 审中-公开
标题翻译：信息搜索设备，信息搜索方法和信息搜索计划
公开(公告)号：US20090006381A1
公开(公告)日：2009-01-01
申请号：US12140808
申请日：2008-06-17
申请人： Kouji Aoyama , Noriyuki Kobayashi , Takanori Ukai , Jun Arima
发明人： Kouji Aoyama , Noriyuki Kobayashi , Takanori Ukai , Jun Arima
IPC分类号： G06F17/30
CPC分类号： G06Q10/06
摘要： A systematic problem search unit searches information about a systematic problem that is a common problem to a plurality of projects, using a conditional expression for searching the information about the systematic problem based on one of or a plurality of a count by which the information about the systematic problem is stored in the retrospect storage unit, a count by which a trial improvement plan linked to the systematic problem is stored in the retrospect storage unit, and information indicating whether the stored improvement plan is stored in the retrospect storage unit, as a conditional expression indicating a condition for extracting the information about the systematic problem. a systematic problem output unit outputs a search result in the systematic problem search procedure to each of or one of a predetermined storage unit and a predetermined output unit.
摘要翻译：系统问题搜索单元使用条件表达式来搜索关于多个项目的常见问题的系统问题的信息，该条件表达式用于基于关于系统问题的信息的一个或多个计数来搜索关于系统问题的信息系统问题存储在回收存储单元中，将与系统问题相关联的试用改进计划存储在回收存储单元中的计数以及指示存储的改进计划是否存储在回收存储单元中的信息作为条件表示提取有关系统问题的信息的条件。系统问题输出单元将系统问题搜索过程中的搜索结果输出到预定存储单元和预定输出单元中的每一个或其中之一。

17. 发明授权

US07271980B2 Disk chucking mechanism having a fan-shaped driving pin 失效
标题翻译：圆盘夹持机构具有扇形驱动销
公开(公告)号：US07271980B2
公开(公告)日：2007-09-18
申请号：US11065820
申请日：2005-02-25
申请人： Hisateru Komatsu , Makoto Konno , Noriyuki Kobayashi
发明人： Hisateru Komatsu , Makoto Konno , Noriyuki Kobayashi
IPC分类号： G11B17/02
CPC分类号： G11B17/0282
摘要： In a disk chucking mechanism for use in a flexible disk drive adopting a spindle motor (300) of a Hall sensor-less method, a driving pin (317A) freely received in a driving oval hole (46b) of a flexible disk (40) has a shape (shape of fan) where a catch factor portion is cut so that the driving pin (317A) is not in contact with an inner edge of the driving oval hole (46b) as much as possible when a rotor (310A) of the spindle motor (300) rotates in the opposite direction (counterclockwise).
摘要翻译：在采用霍尔传感器方法的主轴电动机（300）的软盘驱动器中使用的盘式夹紧机构中，可自由地容纳在软盘驱动椭圆孔（46b）中的驱动销（317A） 40）具有切割捕捉因子部分的形状（风扇形状），使得当转子（317A）不与驱动椭圆形孔（46b）的内边缘接触时，驱动销主轴电动机（300）的转子（310A）沿相反方向（逆时针方向）旋转。

18. 发明申请

US20070212421A1 Low hygroscopic aripiprazole drug substance and processes for the preparation thereof 有权
公开(公告)号：US20070212421A1
公开(公告)日：2007-09-13
申请号：US11790604
申请日：2007-04-26
申请人： Takuji Bando , Satoshi Aoki , Junichi Kawasaki , Makoto Ishigami , Youichi Taniguchi , Tsuyoshi Yabuuchi , Kiyoshi Fujimoto , Yoshihiro Nishioka , Noriyuki Kobayashi , Tsutomu Fujimura , Masanori Takahashi , Kaoru Abe , Tomonori Nakagawa , Koichi Shinhama , Naoto Utsumi , Michiaki Tominaga , Yoshihiro Ooi , Shohei Yamada , Kenji Tomikawa
发明人： Takuji Bando , Satoshi Aoki , Junichi Kawasaki , Makoto Ishigami , Youichi Taniguchi , Tsuyoshi Yabuuchi , Kiyoshi Fujimoto , Yoshihiro Nishioka , Noriyuki Kobayashi , Tsutomu Fujimura , Masanori Takahashi , Kaoru Abe , Tomonori Nakagawa , Koichi Shinhama , Naoto Utsumi , Michiaki Tominaga , Yoshihiro Ooi , Shohei Yamada , Kenji Tomikawa
IPC分类号： A61K9/14 , A61K31/497 , C07D401/12
CPC分类号： C07D215/227 , C07B2200/13 , C07D215/22 , Y10T428/2982
摘要： The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the aripiprazole anhydride crystals is stored for an extended period.

19. 发明申请

US20070202181A1 Low hygroscopic aripipazole drug substance and processes for the preparation thereof 有权
标题翻译：低吸湿性阿立哌唑药物及其制备方法
公开(公告)号：US20070202181A1
公开(公告)日：2007-08-30
申请号：US11790605
申请日：2007-04-26
申请人： Takuji Bando , Satoshi Aoki , Junichi Kawasaki , Makoto Ishigami , Youichi Taniguchi , Tsuyoshi Yabuuchi , Kiyoshi Fujimoto , Yoshihiro Nishioka , Noriyuki Kobayashi , Tsutomu Fujimura , Masanori Takahashi , Kaoru Abe , Tomonori Nakagawa , Koichi Shinhama , Naoto Utsumi , Michiaki Tominaga , Yoshihiro Ooi , Shohei Yamada , Kenji Tomikawa
发明人： Takuji Bando , Satoshi Aoki , Junichi Kawasaki , Makoto Ishigami , Youichi Taniguchi , Tsuyoshi Yabuuchi , Kiyoshi Fujimoto , Yoshihiro Nishioka , Noriyuki Kobayashi , Tsutomu Fujimura , Masanori Takahashi , Kaoru Abe , Tomonori Nakagawa , Koichi Shinhama , Naoto Utsumi , Michiaki Tominaga , Yoshihiro Ooi , Shohei Yamada , Kenji Tomikawa
IPC分类号： A61K9/14 , A61K31/497 , C07D401/12
CPC分类号： C07D215/227 , C07B2200/13 , C07D215/22 , Y10T428/2982
摘要： The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the aripiprazole anhydride crystals is stored for an extended period.
摘要翻译：本发明提供低吸湿形式的阿立哌唑及其制备方法，即使当含有阿立哌唑酐晶体的药物制剂长时间储存时，其也不会转化为水合物或丧失其原始溶解度。

20. 发明授权

US07136259B2 Frame structure and flexible disk drive having the same 失效
公开(公告)号：US07136259B2
公开(公告)日：2006-11-14
申请号：US10396594
申请日：2003-03-25
申请人： Hisateru Komatsu , Makoto Takahashi , Noriyuki Kobayashi
发明人： Hisateru Komatsu , Makoto Takahashi , Noriyuki Kobayashi
IPC分类号： G11B33/12 , G11B19/20
CPC分类号： G11B25/043 , G11B33/02
摘要： In order to provide a positioning mechanism that can be processed easily and accurately by press forming and a frame structure having the same, especially a main frame and a method of manufacturing the same, the invention provides a frame structure of the flexible disk drive including a pair of projections fitted into a pair of corresponding positioning holes on the inserted flexible disk. The pair of projections is formed by cutting and raising.

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