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11. 发明专利

JP2003334433A Continuous dissolving device, continuous dissolving method and apparatus for supplying gas-dissolved water 审中-公开
标题翻译：连续分解装置，连续分解方法和供应气体溶解水的装置
公开(公告)号：JP2003334433A
公开(公告)日：2003-11-25
申请号：JP2002142032
申请日：2002-05-16
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： MORITA HIROSHI , IDA JUNICHI , TSUKAMOTO KAZUMI
IPC分类号： C02F1/00 , B01F1/00 , B01F3/04 , B01F3/08 , B01F15/00 , B01F15/04 , C02F1/68 , H01L21/304
CPC分类号： B01F15/0412 , B01F3/0446 , B01F3/04985 , B01F15/00123 , B01F15/00136 , B01F15/00344 , B01F15/0479 , B01F2201/01 , B01F2215/0036 , B01F2215/0096 , C02F2103/346
摘要： PROBLEM TO BE SOLVED: To provide a continuous dissolving device designed to stably obtain a solution with a fixed concentration irrespective of the flow variation of a main fluid and adapted to supply cleaning water or surface treating water without wasting it to electronic materials to specifically need a clean and accurate surface, and also provide a continuous dissolving method.
SOLUTION: This continuous dissolving device having a dissolving part 1 to dissolve other fluids into the main fluid includes a flow meter 2 which measures the flow of the main fluid and outputs the signal of a measured value and a flow control mechanism 3 to control the supply amount of the other fluids based on the signal to be inputted. The continuous dissolving method is designed to dissolve the other fluids into the main fluid continuously. The supply amount of the other fluids is controlled based on the flow of the main fluid.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种连续溶解装置，其设计成稳定地获得具有固定浓度的溶液，而不管主流体的流动变化如何，并且适于提供清洁水或表面处理水而不浪费电子材料特别需要清洁准确的表面，并提供连续溶解方法。解决方案：具有将其它流体溶解到主流体中的溶解部分1的连续溶解装置包括流量计2，其测量主流体的流量并将测量值的信号和流量控制机构3输出到基于要输入的信号控制其他流体的供给量。连续溶解法是将其他流体连续溶解到主流体中。基于主流体的流动来控制其他流体的供给量。版权所有（C）2004，JPO

12. 发明专利

JP2013008976A Cleaning method of electronic material member 审中-公开
标题翻译：电子材料清洁剂清洗方法
公开(公告)号：JP2013008976A
公开(公告)日：2013-01-10
申请号：JP2012166756
申请日：2012-07-27
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , MORITA HIROSHI , KOMORI HIDEYUKI
IPC分类号： H01L21/304 , B01D61/00 , B01F1/00 , B01F3/04 , B01F5/06 , C01B32/50 , C02F1/20
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing apparatus and a manufacturing method of carbonated water capable of simply and rapidly manufacturing high-concentration carbonated water, and a method for cleaning electronic material members by the carbonated water manufactured by this manufacturing apparatus.SOLUTION: Raw water is supplied to a liquid phase chamber 1b of a deaeration membrane module 1 through a raw water pipe 11. A vacuum pump 3 is operated to decompress the inside of a gas phase chamber 1c. A dissolved gas dissolved in the raw water permeates through a gas permeation membrane 1a and is exhausted out of the system through the gas phase chamber and an exhaust pipe 13. Deaerated water flows into a liquid phase chamber 2b of a carbon dioxide dissolution membrane module 2 through a deaerated water pipe 12. Meanwhile, carbon dioxide is supplied from a carbon dioxide supplier 4 through a carbon dioxide pipe 15 to the gas phase chamber 1c. A prescribed amount of carbon dioxide permeates through a gas permeation membrane 2a and is dissolved in the deaerated water in the liquid phase chamber 2b. The deaerated water in which the carbon dioxide is dissolved flows out of a carbonated water pipe 14.
摘要翻译：要解决的问题：提供一种能够简单且快速地制造高浓度碳酸水的碳酸水的制造装置和制造方法，以及通过该制造装置制造的碳酸化水清洗电子材料构件的方法。解决方案：将原水通过原水管11供给到脱气膜组件1的液相室1b中。操作真空泵3以减压气相室1c的内部。溶解在原水中的溶解气体透过气体渗透膜1a，通过气相室和排气管13排出系统。脱气水流入二氧化碳溶解膜组件2的液相室2b 通过脱气水管12.同时，二氧化碳从二氧化碳供应器4通过二氧化碳管15供应到气相室1c。规定量的二氧化碳透过气体渗透膜2a，溶解在液相室2b的脱气水中。二氧化碳溶解的脱气水从碳酸水管14流出。版权所有（C）2013，JPO＆INPIT

13. 发明专利

JP2012195524A Electronic material cleaning method and electronic material cleaning device 审中-公开
标题翻译：电子材料清洁方法和电子材料清洁装置
公开(公告)号：JP2012195524A
公开(公告)日：2012-10-11
申请号：JP2011060040
申请日：2011-03-18
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： UCHIDA MINORU , MORITA HIROSHI
IPC分类号： H01L21/027 , B08B3/08 , G03F1/54 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To solve such a problem that the usage of a solution, the amount of waste liquid disposal, and the concentration of sulfuric acid lower when an electronic material is cleaned by mixing the solution to a sulfuric acid solution containing an oxidizer.SOLUTION: The single wafer electronic material cleaning method of cleaning an electronic material by supplying a sulfuric acid solution containing a persulfuric acid material and having sulfuric acid concentration of 70 mass% or higher, as a cleaning liquid, to the electronic material and bringing the cleaning liquid into contact with the electronic material comprises: a first cleaning step for mixing a solution to the cleaning liquid and bringing the cleaning liquid into contact with the electronic material immediately after mixing; and a second cleaning step for bringing the cleaning liquid into contact with the electronic material without mixing the solution to the cleaning liquid following to the first cleaning step. According to the method, lowering of the usage of the solution, the amount of waste liquid disposal, and the concentration of sulfuric acid can be minimized while sustaining excellent cleaning effect.
摘要翻译：要解决的问题：为了解决当通过将溶液混合到含有硫酸的硫酸溶液来清洁电子材料时，解决方案的使用，废液处理量和硫酸浓度降低的问题氧化剂。解决方案：通过将含有硫酸浓度为70质量％以上的硫酸浓度为70质量％以上的硫酸溶液作为清洗液供给电子材料，清洗电子材料的单片电子材料清洗方法，使清洗液与电子材料接触包括：第一清洗步骤，用于将溶液与清洗液混合并使混合后立即将清洗液与电子材料接触; 以及第二清洗步骤，用于在第一清洗步骤之后使清洗液与电子材料接触而不将溶液与清洗液混合。根据该方法，在保持优异的清洗效果的同时，可以使溶液的使用降低，废液排出量和硫酸浓度降低。版权所有（C）2013，JPO＆INPIT

14. 发明专利

JP2012146690A Cleaning method for electronic material and cleaning apparatus for electronic material 审中-公开
标题翻译：电子材料清洁方法及电子材料清洗装置
公开(公告)号：JP2012146690A
公开(公告)日：2012-08-02
申请号：JP2009086347
申请日：2009-03-31
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TSUKAMOTO KAZUMI , MORITA HIROSHI
IPC分类号： H01L21/027 , H01L21/304
CPC分类号： G03F7/423 , H01L21/02057 , H01L21/31133
摘要： PROBLEM TO BE SOLVED: To surely peel and remove a resist on an electronic material in a short period of time.SOLUTION: The cleaning method for the electronic material comprises cleaning the electronic material by using a sulfuric acid solution containing persulfuric acid to peel and remove the resist, and then wet-cleaning the electronic material by using a gas-dissolved water. The method can considerably shorten a period of time required for cleaning in comparison with a conventional method by conducting the wet-cleaning by using the gas-dissolved water after the resist is peeled by using the sulfuric acid solution containing persulfuric acid. The sulfuric acid solution containing persulfuric acid is preferably produced by electrolyzing a sulfuric acid solution. The method can efficiently peel and remove the resist by using persulfuric acid of high concentration and repeatedly use the sulfuric acid solution by feeding the sulfuric acid solution which is sent from a peeling and cleaning device for the resist and of which a concentration of persulfuric acid is decreased, to an electrolytic reaction device to regenerate the sulfuric acid solution and circulating the sulfuric acid solution of which the concentration of persulfuric acid is sufficiently enhanced, in the cleaning device.
摘要翻译：要解决的问题：在短时间内确实在电子材料上剥离和去除抗蚀剂。解决方案：电子材料的清洁方法包括通过使用含有硫酸的硫酸溶液来清洗电子材料以剥离和除去抗蚀剂，然后通过使用气体溶解的水来湿式清洁电子材料。通过使用含有过硫酸的硫酸溶液剥离抗蚀剂后，通过使用气体溶解的水进行湿式清洗，与常规方法相比，该方法可以显着缩短清洁所需的时间。含有过硫酸的硫酸溶液优选通过电解硫酸溶液来制备。该方法可以通过使用高浓度的过硫酸有效地剥离和除去抗蚀剂，并且通过将从抗蚀剂的剥离和清洁装置送来的硫酸溶液进料反复使用硫酸溶液，其中过硫酸的浓度为降低到电解反应装置中以再生硫酸溶液并使在过硫酸浓度充分增强的硫酸溶液循环在清洗装置中。版权所有（C）2012，JPO＆INPIT

15. 发明专利

JP2011240344A Water treatment apparatus for manufacturing ultrapure water 审中-公开
标题翻译：水处理设备制造超声波水
公开(公告)号：JP2011240344A
公开(公告)日：2011-12-01
申请号：JP2011171580
申请日：2011-08-05
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： MORITA HIROSHI , TOKOSHIMA HIROTO , IKUNO NOZOMI , KUNUGI TOMOHIKO
IPC分类号： C02F1/72 , C02F1/32 , C02F1/70
摘要： PROBLEM TO BE SOLVED: To provide a water treatment apparatus for manufacturing ultrapure water, including a gas component addition means that adds gas or gas dissolved water to water to be treated and an ultraviolet ray irradiation device for dissolving a substance to be treated in water by irradiating the water from the gas component addition means with ultraviolet rays, thus obtaining a suitable gas addition amount.SOLUTION: Raw water of ultrapure water is stored in a storage tank 2 and delivered through a supply pipe 3 and a supply pump 4, and oxygen is added by an oxygen supply device 5. Subsequently, a UV irradiation apparatus 6, a membrane deaerator 7, an ion exchange apparatus 8, and an ultrafiltration apparatus 9 perform each treatment, so that ultrapure water is supplied to a use point. According to a TOC concentration behavior on the primary side of the UV irradiation apparatus 6, an oxygen amount from the oxygen supply device 5 is controlled based on a signal from a dissolved oxygen meter 13.
摘要翻译：要解决的问题：提供一种用于制造超纯水的水处理装置，包括将待溶解的水中的气体或气体溶解的水添加到气体成分添加装置中，以及用于溶解待处理物质的紫外线照射装置通过用紫外线照射来自气体成分添加装置的水，从而获得合适的气体添加量。解决方案：将超纯水的原水储存在储罐2中并通过供给管3和供给泵4输送，并且由氧供给装置5加入氧。随后，将UV照射装置6，膜除气装置7，离子交换装置8和超滤装置9进行各处理，从而将超纯水供给到使用点。根据UV照射装置6的初级侧的TOC浓度特性，来自氧供给装置5的氧量基于来自溶解氧计13的信号进行控制。（C）2012，JPO＆INPIT

16. 发明专利

JP2011205015A Cleaning method for electronic material 审中-公开
标题翻译：电子材料清洗方法
公开(公告)号：JP2011205015A
公开(公告)日：2011-10-13
申请号：JP2010072936
申请日：2010-03-26
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , MORITA HIROSHI
IPC分类号： H01L21/304 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an inexpensive, resource-saving cleaning method that shortens a time needed for peeling processing etc., of, for example, a resist in cleaning of an electronic material and further securely removes resist residues in a short time by wet cleaning after the resist peeling.SOLUTION: Pressure gas with predetermined pressure is supplied by opening a pressure gas control value 19 while opening a carrier gas control value 14 to press a pressure plate 16, carrier gas G in a gas holder 15 is controlled to predetermined pressure to be supplied to a carrier gas supply pipe 7, and cleaning liquid W1 is supplied to a two-fluid nozzle 8 together therewith. A jet of droplets W2 generated from the cleaning liquid W1 and carrier gas G thus mixed by the two-fluid nozzle 8 is brought into contact with a silicon wafer 5 to clean a surface of the silicon wafer 5. The cleaning liquid W1 is preferably a sulfuric acid solution containing sulfuric peroxide obtained by electrolyzing sulfuric acid.
摘要翻译：要解决的问题：为了提供一种廉价的，节省资源的清洁方法，其缩短了例如电子材料的清洁中的抗蚀剂等的剥离处理等所需的时间，并且通过以下方式进一步可靠地将抗蚀剂残留物在短时间内除去抗蚀剂剥离后进行湿式清洗。解决方案：打开压力气体控制值19，同时打开载气控制值14，按压压板16，将气体保持器15中的载气G控制为将供给到载气供给管7的规定压力和清洗液W1一起供给到双流体喷嘴8。由清洗液W1产生的液滴W2和由双液喷嘴8混合的载气G与硅晶片5接触，以清洁硅晶片5的表面。清洗液W1优选为通过电解硫酸得到硫酸过硫酸溶液。

17. 发明专利

JP2011161418A Washing method for ultrapure water production system 有权
标题翻译：超声波水生产系统的洗涤方法
公开(公告)号：JP2011161418A
公开(公告)日：2011-08-25
申请号：JP2010030286
申请日：2010-02-15
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： FUKUI NAGAO , MORITA HIROSHI
IPC分类号： C02F1/44 , B01D65/00 , B08B3/08 , B08B9/027 , C02F1/20 , C02F1/42 , C02F9/00
摘要： PROBLEM TO BE SOLVED: To provide a washing method for ultrapure water production system, removing metal impurities from an ultrapure water production system with high efficiency and shortening washing time. SOLUTION: Hydrochloric acid is added into a primary pure water tank 21, circulated in a heat exchanger 23, an ultraviolet ray oxidation treatment apparatus 24, bypass lines 30, 31, 32, a flow path 6a, a use point 4 and a flow path 6b by a pump 22 in the order and then placed under an immersed state. Subsequently, the inside of the tank 21 is filled with primary pure water. Next, the primary pure water is passed in the same order, and washing liquid is discharged from the terminal of the flow path 6b to the system outside. In performing pickling, a degassing apparatus 25, an ion exchange resin tower 26, and a UF apparatus 27 are bypassed. By bypassing the UF apparatus 27, extrusion washing time of hydrochloric acid-containing liquid is shortened. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了提供超纯水生产系统的洗涤方法，从超纯水生产系统中以高效率和缩短洗涤时间去除金属杂质。解决方案：将盐酸加入初级纯水槽21中，在热交换器23中循环，紫外线氧化处理装置24，旁通管线30,31,32，流路6a，使用点4和通过泵22按顺序流过流路6b，然后放置在浸没状态。随后，罐21的内部填充有初级纯水。接下来，一次纯水以相同的顺序通过，洗涤液从流路6b的端子排出到系统外部。在进行酸洗时，旁路脱气装置25，离子交换树脂塔26和UF装置27。通过绕开UF装置27，含盐酸液体的挤出洗涤时间缩短。版权所有（C）2011，JPO＆INPIT

18. 发明专利

JP2010221071A Gas reaction device, and treatment method using gas reaction 有权
标题翻译：气体反应装置和使用气体反应的处理方法
公开(公告)号：JP2010221071A
公开(公告)日：2010-10-07
申请号：JP2009068108
申请日：2009-03-19
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： NEMOTO ATSUSHI , MORITA HIROSHI
IPC分类号： B01J15/00 , C01B13/10 , C08J7/00
摘要： PROBLEM TO BE SOLVED: To provide a gas reaction device capable of shortening the time needed for replacing a gas in a gas reactor and of efficiently treating an object to be treated upon allowing a gas to react with the object to be treated in the reactor.
SOLUTION: An ozone gas is fed from a feeder 1 into a storage 3 to store the ozone gas of a prescribed pressure in the storage 3. An object to be treated is inserted into a reactor 5, and subsequently an exhaust pump 12 is put into operation to evacuate a gas therein to reduce the pressure in the reactor 5 to a prescribed value or lower. Thereafter, the ozone gas is fed into the reactor 5 from the storage 3. After the gas pressure in the reactor 5 is raised to a specified value, the ozone gas is directly fed into the reactor 5 from the feeder 1, and exhaust resulting from the reaction is treated in a gas treatment device 10 and is discharged therefrom.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种气体反应装置，其能够缩短更换气体反应器中的气体所需的时间，并且在允许气体与待处理物体反应时有效地处理待处理物体反应堆。解决方案：将臭氧气体从进料器1供给到储存器3中，以将规定压力的臭氧气体存储在储存器3中。将待处理物体插入反应器5中，随后将排气泵12 在其中排放气体以将反应器5中的压力降低到规定值以下。此后，臭氧气体从储存器3进料到反应器5中。在反应器5中的气体压力升高到规定值之后，臭氧气体从进料器1直接进入反应器5，并由反应在气体处理装置10中处理并从其排出。版权所有（C）2011，JPO＆INPIT

19. 发明专利

JP2009113013A Production apparatus of gas dissolved water and production method 有权
标题翻译：气体分解水生产装置及生产方法
公开(公告)号：JP2009113013A
公开(公告)日：2009-05-28
申请号：JP2007292247
申请日：2007-11-09
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , MORITA HIROSHI
IPC分类号： B01F1/00 , B01D53/22 , B01F5/06 , C02F1/44
摘要： PROBLEM TO BE SOLVED: To provide a production apparatus of a gas dissolved water possible to be continuously and stably operated over the long term, and to provide its production method.
SOLUTION: A raw water is supplied into a liquid phase room 11b of a gas-dissolving membrane module 11 and a gas is supplied into a gas phase room 11c. The gas permeates a gas permeation membrane 11a and is dissolved in the raw water in the liquid phase room 11b to give the gas dissolved water, which is supplied to a use point through a gas-dissolved water pipe 23. When an amount of a condensed water measured by a condensed-water detection means 13 exceeds a determined value, a first valve 24a is closed, a second valve 24b is opened and a gas suction pump 14 is activated. Therefore, the condensed water stored between the valve 24a and 24b is vaporized by a membrane module 12 for vaporizing of a condensed water to form water vapor, which is discharged through the suction pump 14.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供可能长期连续稳定运行的气体溶解水的生产装置，并提供其制造方法。解决方案：将原水供应到气体溶解膜组件11的液相室11b中，并将气体供应到气相室11c中。气体透过气体渗透膜11a，溶解在液相室11b中的原水中，得到气体溶解水，通过气体溶解水管23供给至使用点。当浓缩由冷凝水检测装置13测量的水超过确定值，关闭第一阀24a，打开第二阀24b并启动气体抽吸泵14。因此，存储在阀24a和24b之间的冷凝水被膜模块12汽化，用于蒸发冷凝水以形成通过抽吸泵14排出的水蒸气。版权所有（C）2009，JPO＆INPIT

20. 发明专利

JP2009095778A Production unit, production apparatus, and production method of gas dissolved water 有权
标题翻译：生产设备，生产设备和气体溶解水的生产方法
公开(公告)号：JP2009095778A
公开(公告)日：2009-05-07
申请号：JP2007270349
申请日：2007-10-17
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , MORITA HIROSHI
IPC分类号： B01F1/00 , B01D53/22 , B01F5/06
摘要： PROBLEM TO BE SOLVED: To provide a production method of gas dissolved water, capable of efficiently producing gas dissolved water with a high concentration without using a large amount of a gas; and a production unit and a production apparatus used for producing the gas dissolved water.
SOLUTION: As shown in Fig. 1, in a membrane module 10B, dry air is supplied into a gas phase chamber 12B and a liquid phase chamber 11B. With this dry air, the gas phase chamber 12B, the liquid phase chamber 11B, and a gas-permeable membrane 13B are dried. The dry air supplied into the gas phase chamber 12B passes through a gas extraction piping 51B and, after the measurement of humidity with a hygrometer 52A, is discharged. The dry air supplied into the liquid phase chamber 11B is discharged through a piping 22B. In a membrane module 10A, raw water is supplied through a raw water piping 20A into a liquid phase chamber 11A of the membrane module 10A, and a gas is supplied through a gas supply piping 40A into a gas phase chamber 12A of the membrane module 10A.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种气体溶解水的生产方法，能够在不使用大量气体的情况下高效率地生产气体溶解水; 以及用于生产气体溶解水的生产单元和生产装置。解决方案：如图1所示。如图1所示，在膜组件10B中，将干燥空气供给到气相室12B和液相室11B。通过该干燥空气，干燥气相室12B，液相室11B和气体透过膜13B。供给气相室12B的干燥空气通过气体抽出配管51B，在湿度计52A测定湿度后，排出。供给液相室11B的干燥空气通过配管22B排出。在膜组件10A中，原水通过原水管路20A供给到膜组件10A的液相室11A中，气体通过气体供给配管40A供给到膜组件10A的气相室12A 。版权所有（C）2009，JPO＆INPIT

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