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    • 11. 发明授权
    • Semiconductor memory device and method of testing same
    • 半导体存储器件及其测试方法
    • US07913126B2
    • 2011-03-22
    • US11976652
    • 2007-10-26
    • Hiroshi NakagawaKanji Oishi
    • Hiroshi NakagawaKanji Oishi
    • G11C29/00
    • G11C29/24
    • Provided is a semiconductor memory device in which it is possible to conduct a parallel test by comparison with an expected value after replacement with a redundant cell. The memory device includes a logic circuit for outputting an activated redundant hit signal when at least one determination circuit of determination circuits corresponding to respective ones of a plurality of redundant addresses is activated; a logic circuit for outputting an activated signal when all outputs of the circuits are inactive; and a selector for outputting a test-result mask signal when a redundant area is tested, and outputting the output of the logic circuit when a normal area is tested. The test result is forcibly passed when a memory array is tested and when a redundant address is accessed.
    • 提供了一种半导体存储器件,其中可以通过与冗余单元替换之后的期望值进行比较来进行并行测试。 所述存储装置包括逻辑电路,用于当与多个冗余地址中的各个冗余地址相对应的确定电路的至少一个确定电路被激活时,输出激活的冗余命中信号; 用于当所述电路的所有输出都不活动时输出激活信号的逻辑电路; 以及选择器,用于当测试冗余区域时输出测试结果屏蔽信号,并且当正常区域被测试时输出逻辑电路的输出。 当测试存储器阵列和访问冗余地址时,测试结果被强制传递。
    • 12. 发明申请
    • POLISHING LIQUID FOR METAL FILM AND POLISHING METHOD
    • 抛光液用于金属膜和抛光方法
    • US20100323584A1
    • 2010-12-23
    • US12668096
    • 2008-07-08
    • Kouji HagaMasato FukasawaJin AmanokuraHiroshi Nakagawa
    • Kouji HagaMasato FukasawaJin AmanokuraHiroshi Nakagawa
    • B24B1/00C09K13/00
    • H01L21/30625C09G1/02H01L21/3212
    • The invention relates to a polishing liquid for metal film comprising 7.0% by weight or more of an oxidizer for metal, a water-soluble polymer, an oxidized metal dissolving agent, a metal anticorrosive agent and water, provided that the total amount of the polishing liquid for metal film is 100% by weight, wherein the water-soluble polymer has a weight average molecular weight of 150,000 or more and is at least one member selected from among a polycarboxylic acid, a salt of a polycarboxylic acid, and a polycarboxylic acid ester. According to the invention, provided is a polishing liquid for metal film, by which polishing can be performed at a high rate even under a polishing pressure as low as 1 psi or lower, and such that a polished film after polishing is excellent in planarity, furthermore, with which a high polishing rate can be obtained even in an initial stage of polishing, and provided is a polishing method using the polishing liquid.
    • 本发明涉及一种用于金属膜的抛光液,其包含7.0重量%或更多的金属氧化剂,水溶性聚合物,氧化金属溶解剂,金属防腐剂和水,条件是抛光总量 金属膜用液体为100重量%,其中,所述水溶性聚合物的重均分子量为15万以上,为选自多元羧酸,多元羧酸和多元羧酸中的至少1种 酯。 根据本发明,提供了一种用于金属膜的抛光液,即使在低至1psi或更低的抛光压力下也可以以高速率进行抛光,并且抛光后的抛光膜的平面度优异, 此外,即使在研磨的初始阶段也可以获得高抛光速率,并且提供了使用抛光液的抛光方法。
    • 14. 发明申请
    • Metal Polishing Slurry and Method of Polishing a Film to be Polished
    • 金属抛光浆料和抛光薄膜抛光方法
    • US20100178765A1
    • 2010-07-15
    • US12159419
    • 2006-12-27
    • Yutaka NomuraHiroshi NakagawaSou AnzaiAyako TobitaTakafumi SakuradaKatsumi Mabuchi
    • Yutaka NomuraHiroshi NakagawaSou AnzaiAyako TobitaTakafumi SakuradaKatsumi Mabuchi
    • H01L21/304H01L21/306C09K13/00C09K13/06
    • C11D11/0047C09G1/02C09K3/1463H01L21/3212
    • The present invention provides a metal polishing liquid capable of CMP at a high Cu polishing rate and solving the problems: (a) generation of scratches attributable to solid particles, (b) generation of deteriorations in flatness such as dishing and erosion, (c) complexity in a washing process for removing abrasive particles remaining on the surface of a substrate after polishing, and (d) higher costs attributable to the cost of a solid abrasive itself and to waste liquid treatment, as well as a method of polishing a film to be polished by using the same. Disclosed are a metal polishing liquid which comprises a metal oxidizer, a metal oxide solubilizer, a metal anticorrosive, and a water-soluble polymer having an anionic functional group with a weight-average molecular weight of 8,000 or more and has pH 1 or more to 3 or less, and a method of polishing a film to be polished, which comprises supplying the above metal polishing liquid onto a polishing cloth of a polishing platen and simultaneously relatively moving the polishing platen and a substrate having a metallic film to be polished while the substrate is pressed against the polishing cloth.
    • 本发明提供一种能够以高Cu抛光速率进行CMP处理的金属抛光液,并且解决了以下问题:(a)产生由固体颗粒引起的划痕,(b)产生诸如凹陷和腐蚀的平坦度的劣化,(c​​) 用于去除抛光后残留在基材表面上的磨料颗粒的洗涤过程中的复杂性,以及(d)由于固体磨料本身的成本和废液处理造成的更高成本,以及抛光膜的方法 通过使用它来抛光。 公开了一种金属抛光液,其包含金属氧化剂,金属氧化物增溶剂,金属防腐蚀剂和具有重均分子量为8000以上的阴离子官能团的水溶性聚合物,其pH为1以上至 3以下,以及抛光被研磨膜的方法,该方法包括将上述金属抛光液供给到研磨台板的研磨布上,同时相对移动研磨台板和具有待研磨金属膜的基板,同时 基板被压在抛光布上。
    • 16. 发明申请
    • Optical Transmission Hinge Apparatus
    • 光传输铰链装置
    • US20090232459A1
    • 2009-09-17
    • US12400179
    • 2009-03-09
    • Yasuhiro ShigenoHiroshi NakagawaTakeshi IsodaKosuke Sasada
    • Yasuhiro ShigenoHiroshi NakagawaTakeshi IsodaKosuke Sasada
    • G02B6/44
    • G02B6/3604G02B6/42
    • An optical transmission hinge apparatus includes a first hinge portion for pivotally interconnecting a first casing and a second casing about a first axis, a first optical device provided in the first casing, a second optical device provided in the second casing and an optical guide path member for interconnecting the first optical device and the second optical device to enable optical transmission therebetween. The optical guide path member includes a bent portion, a first portion formed on one side of the bent portion and a second portion formed on the other side of the bent portion. The first portion is provided in the first casing to be coaxial with the first hinge portion, with a terminal end of the first portion being in opposition to the first optical device. The second portion is provided in the second casing, with a terminal end of the second portion being in opposition to the second optical device.
    • 光传输铰链装置包括第一铰链部分,用于将第一壳体和第二壳体围绕第一轴线枢转地互连,设置在第一壳体中的第一光学装置,设置在第二壳体中的第二光学装置和光导路径部件 用于互连第一光学装置和第二光学装置以使它们之间能够进行光传输。 光导路构件包括弯曲部分,形成在弯曲部分一侧的第一部分和形成在弯曲部分另一侧上的第二部分。 第一部分设置在第一壳体中以与第一铰链部分同轴,第一部分的终端与第一光学装置相对。 第二部分设置在第二壳体中,第二部分的末端与第二光学装置相对。
    • 17. 发明申请
    • CONTACT PROVE AND METHOD OF MAKING THE SAME
    • 联系方式及其制作方法
    • US20090224781A1
    • 2009-09-10
    • US12297732
    • 2007-04-19
    • Masahiro AoyagiKatsuya KikuchiHiroshi NakagawaYoshikuni OkadaHiroyuki FujitaShouichi ImaiShigeo Kiyota
    • Masahiro AoyagiKatsuya KikuchiHiroshi NakagawaYoshikuni OkadaHiroyuki FujitaShouichi ImaiShigeo Kiyota
    • G01R31/02B32B37/00H01R43/00
    • G01R3/00G01R1/06772G01R1/07342Y10T29/49117Y10T29/49126Y10T156/10
    • [Problem]To provide a contact probe which can easily be connected with a measurement apparatus electrically, can measure a high speed and high frequency signal with a fine pitch easily and correctly, and can easily cope with signal measurement for a plurality of channels, and a method of making the contact probe. [Means to Solve Problem] It includes a first printed wiring board 3 having a signal electrode 10a and a ground electrode 10b used as a contact part with respect to a measuring object, in which the signal electrode 10a and ground electrode 10b are formed of a metal wiring pattern on a substrate, and a second printed wiring board 2 with a coaxial line structure having shield electrodes 12, 17, 18 which enclose a signal line 15a and the surroundings of the signal line 15a through an insulating layer. The signal electrode 10a of the first printed wiring board 3 and the signal line 15a of the second printed wiring board 2 are electrically connected together, and the ground electrode 10b of the first printed wiring board 3 and the shield electrodes 12, 17, 18 of the second printed wiring board 2 are electrically connected together.
    • [问题]为了提供可以容易地与测量装置电连接的接触探针,可以容易且准确地测量具有细间距的高速和高频信号,并且可以容易地处理多个通道的信号测量,以及 制作接触探针的方法。 解决问题的手段包括:第一印刷线路板3,其具有信号电极10a和接地电极10b,该接地电极用作相对于测量对象的接触部分,其中信号电极10a和接地电极10b由 金属布线图案和具有同轴线结构的第二印刷布线板2,其具有通过绝缘层包围信号线15a和信号线15a的周围的屏蔽电极12,17,18。 第一印刷线路板3的信号电极10a和第二印刷线路板2的信号线15a电连接在一起,第一印刷线路板3的接地电极10b和屏蔽电极12,17,18的 第二印刷线路板2电连接在一起。
    • 20. 发明申请
    • Touch panel input device
    • 触摸屏输入设备
    • US20080100592A1
    • 2008-05-01
    • US11905793
    • 2007-10-04
    • Yasuhiro ShigenoNaoya TakeharaHiroshi Nakagawa
    • Yasuhiro ShigenoNaoya TakeharaHiroshi Nakagawa
    • G06F3/045
    • G06F3/044
    • A touch panel input device of the invention has a panel, an X-line electrode (first electrodes) arranged on a front surface side of the panel, a Y-line electrode (second electrodes) disposed on the back surface side and shifted in planar position relative to the X-line electrode. The device detects whether or not a finger has touched the vicinity of a zone between the X-line electrode 20 and the Y-line electrode on the front surface of the panel. An electrostatic capacitance of the X-line electrode and an electrostatic capacitance of the Y-line electrode are made equal by way of increasing the area of the Y-line electrode with respect to that of the X-line electrode or by way of selecting an appropriate material and/or thickness of the panel and/or the coat.
    • 本发明的触摸面板输入装置具有面板,布置在面板的前表面侧的X线电极(第一电极),设置在背面侧的Y线电极(第二电极) 相对于X线电极的位置。 该装置检测手指是否已经接触到面板前表面上的X线电极20和Y线电极之间的区域附近。 通过增加Y线电极的面积相对于X线电极的面积,通过选择X线电极的X线电极的静电电容和Y线电极的静电电容相等 面板和/或外套的适当材料和/或厚度。