专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明授权

US4885491A Unstable vibration prevention apparatus for magnetic bearing system 失效
标题翻译：磁性轴承系统不稳定防振装置
公开(公告)号：US4885491A
公开(公告)日：1989-12-05
申请号：US206464
申请日：1988-06-14
申请人： Hirokuni Hiyama , Katsuhide Watanabe , Atsushi Nakajima , Chikara Murakami
发明人： Hirokuni Hiyama , Katsuhide Watanabe , Atsushi Nakajima , Chikara Murakami
IPC分类号： F16C32/04 , F16C39/06 , H02K7/09
CPC分类号： F16C32/0451 , F16C32/0487
摘要： An active type magnetic bearing system includes magnetic bearings for suspending a rotary body to permit it to rotate about its rotational axis. A control system supplies the magnetic bearings with signals to control the radial position of the rotary body, and comprises displacement detecting circuits for detecting any displacement of the radial position of the rotary body and a control circuit for producing a control signal which serves to suppress any unstable vibration of the rotary body.

12. 发明申请

US20070128364A1 SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD 审中-公开
公开(公告)号：US20070128364A1
公开(公告)日：2007-06-07
申请号：US11615640
申请日：2006-12-22
申请人： Hiroyuki Shinozaki , Norihiro Yamaguchi , Katsuhide Watanabe
发明人： Hiroyuki Shinozaki , Norihiro Yamaguchi , Katsuhide Watanabe
IPC分类号： B05D3/00 , B05C5/00 , C23C14/00
CPC分类号： H01L21/6831 , H01L21/67259
摘要： A substrate treatment apparatus is disclosed. The substrate treatment apparatus has an electrostatic chuck mechanism, a grounding mechanism, and an electron beam radiating mechanism. The electrostatic chuck mechanism electrostatically sucks and holds a substrate under treatment. The grounding mechanism freely contacts a predetermined film of a plurality of films formed on a treatment surface of the substrate under treatment sucked and held by the electrostatic chuck mechanism. The electron beam radiating mechanism radiates a resist film formed on the treatment surface side of the substrate under treatment with an electron beam.

13. 发明申请

US20070107656A1 SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD 审中-公开
公开(公告)号：US20070107656A1
公开(公告)日：2007-05-17
申请号：US11615621
申请日：2006-12-22
申请人： Hiroyuki SHINOZAKI , Norihiro Yamaguchi , Katsuhide Watanabe
发明人： Hiroyuki SHINOZAKI , Norihiro Yamaguchi , Katsuhide Watanabe
IPC分类号： C23C14/00 , B05C11/00
CPC分类号： H01L21/6831 , H01L21/67259
摘要： A substrate treatment apparatus is disclosed. The substrate treatment apparatus has an electrostatic chuck mechanism, a grounding mechanism, and an electron beam radiating mechanism. The electrostatic chuck mechanism electrostatically sucks and holds a substrate under treatment. The grounding mechanism freely contacts a predetermined film of a plurality of films formed on a treatment surface of the substrate under treatment sucked and held by the electrostatic chuck mechanism. The electron beam radiating mechanism radiates a resist film formed on the treatment surface side of the substrate under treatment with an electron beam.

14. 发明授权

US5951368A Polishing apparatus 失效
标题翻译：抛光设备
公开(公告)号：US5951368A
公开(公告)日：1999-09-14
申请号：US864906
申请日：1997-05-29
申请人： Katsuhide Watanabe , Noburu Shimizu , Ichiju Satoh
发明人： Katsuhide Watanabe , Noburu Shimizu , Ichiju Satoh
IPC分类号： B24B1/00
CPC分类号： F16C32/044
摘要： The polishing apparatus can control the attitude of the top ring with respect to a surface of a turntable of a polishing apparatus is controlled so as to provide a uniform polish surface pressure across the entire polish surface. The polishing apparatus includes the turntable having an abrading surface, a top ring for holding an object to be polished to keep the object surface in moving contact with the abrading surface while rotating the turntable and the top ring, a magnetic bearing assembly for supporting a rotation shaft of the top ring by means of a thrust bearing device and at least one radial bearing device, and an attitude controller for controlling an orientation of the top ring with respect to the turntable through the magnetic bearing assembly.
摘要翻译：抛光装置可以控制顶环相对于抛光装置的转盘表面的姿态，以便在整个抛光表面上提供均匀的抛光表面压力。抛光装置包括具有研磨表面的转盘，用于保持待抛光物体的顶环，用于在转动转台和顶环的同时使物体表面与研磨表面保持移动接触，用于支撑旋转的磁轴承组件通过推力轴承装置和至少一个径向轴承装置的顶环的轴以及用于通过磁轴承组件控制顶环相对于转台的定向的姿态控制器。

15. 发明授权

US5904608A Polishing apparatus having interlock function 失效
标题翻译：具有互锁功能的抛光装置
公开(公告)号：US5904608A
公开(公告)日：1999-05-18
申请号：US865993
申请日：1997-05-30
申请人： Katsuhide Watanabe
发明人： Katsuhide Watanabe
IPC分类号： B24B37/04 , B24B49/16 , G05B19/4063 , G05B19/416 , B24B51/00
CPC分类号： B24B37/005 , B24B49/16 , G05B19/4063 , G05B19/416 , G05B2219/37434 , G05B2219/45199 , G05B2219/50113 , G05B2219/50205 , G05B2219/50276
摘要： A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus has an interlock function includes a turntable having a polishing surface thereon, a top ring for holding a workpiece to be polished and pressing the workpiece against the polishing surface on the turntable, a first motor for rotating the turntable, and a second motor for rotating the top ring. The polishing apparatus further comprises a first actuator for lifting and lowering the top ring, a second actuator for moving the top ring in a horizontal direction, and a control unit for controlling the motors and the actuators. The control unit controls the motors and the actuators in such a manner that when an abnormality is detected in at least one of the motors and the actuators, at least one of the motors and the actuators other than that of the abnormality performs a predetermined operation.
摘要翻译：抛光装置用于将诸如半导体晶片的工件抛光到平面镜面。抛光装置具有互锁功能，包括其上具有抛光表面的转台，用于保持要抛光的工件的顶环，并将工件压靠在转台上的抛光表面上，用于使转盘旋转的第一电动机和第二电动机用于旋转顶环。抛光装置还包括用于提升和降低顶环的第一致动器，用于沿水平方向移动顶环的第二致动器，以及用于控制电动机和致动器的控制单元。所述控制单元以这样的方式控制所述电动机和所述致动器，即当至少一个所述电动机和所述致动器中检测到异常时，除了所述异常之外，所述电动机和所述致动器中的至少一个执行预定的操作。

16. 发明授权

US5814814A Electron microscope 失效
标题翻译：电子显微镜
公开(公告)号：US5814814A
公开(公告)日：1998-09-29
申请号：US607613
申请日：1996-02-27
申请人： Yoichi Kanemitsu , Katsuhide Watanabe
发明人： Yoichi Kanemitsu , Katsuhide Watanabe
IPC分类号： H01J37/28 , H01J37/244
CPC分类号： H01J37/28 , H01J2237/0216 , H01J2237/15 , H01J2237/248
摘要： An electron microscope has an electron gun for emitting an electron beam, a specimen holder for holding a specimen thereon, and a deflection coil for applying the electron beam from the electron gun to the specimen on the specimen holder. A controller produces a differential signal representing the difference between a signal from a vibration sensor which detects vibrations of the electron gun and a signal from another vibration sensor which detects vibrations of the specimen holder. The differential signal is added to a deflection signal for the deflection coil for thereby effecting feedforward control of the electron beam to cause the electron beam to reach the specimen on the specimen holder, irrespective of the vibrations of the electron gun and the specimen holder.
摘要翻译：电子显微镜具有用于发射电子束的电子枪，用于在其上保持试样的试样保持器和用于将来自电子枪的电子束施加到试样保持器上的试样的偏转线圈。控制器产生表示来自检测电子枪的振动的振动传感器的信号与检测试样保持器的振动的另一振动传感器的信号之间的差的差分信号。差分信号被加到偏转线圈的偏转信号上，从而进行电子束的前馈控制，使电子束到达试样架上的试样，而与电子枪和试样架的振动无关。

17. 发明授权

US5449985A Zero-power control type vibration eliminating apparatus 失效
标题翻译：零功率控制型振动消除装置
公开(公告)号：US5449985A
公开(公告)日：1995-09-12
申请号：US111412
申请日：1993-08-25
申请人： Yoichi Kanemitsu , Katsuhide Watanabe
发明人： Yoichi Kanemitsu , Katsuhide Watanabe
IPC分类号： F16F15/02 , F16F15/03 , G05D19/02 , G12B9/08 , H01J37/16
CPC分类号： F16F15/03
摘要： There is provided a vibration eliminating apparatus utilizing a magnetic suspending system which achieves zero power control. The vibration eliminating apparatus includes a table on which equipment to be installed, magnetic yokes fixed on the table, control magnets for suspending the magnetic yokes from an installation floor, displacement sensors for measuring gaps between the control magnets and the magnetic yokes, power amplifiers for supplying exciting currents to the control magnets, and compensation circuits for controlling the exciting currents of the control magnets by supplying outputs from the displacement sensors to the power amplifiers. Each control magnet includes a permanent magnet for generating a bias magnetic flux and an electromagnet for generating a control magnetic flux to form a magnetic circuit. An integrated value of the exciting current fed to the electromagnet is fed back to the power amplifier.
摘要翻译：提供一种利用实现零功率控制的磁悬浮系统的振动消除装置。振动消除装置包括：安装设备的桌子，固定在桌子上的磁轭，用于将磁轭悬挂在安装地板上的控制磁铁，用于测量控制磁铁与磁轭之间的间隙的位移传感器，用于向控制磁体提供激励电流，以及补偿电路，用于通过将位移传感器的输出提供给功率放大器来控制控制磁体的励磁电流。每个控制磁体包括用于产生偏磁通的永磁体和用于产生控制磁通以形成磁路的电磁体。馈送到电磁体的励磁电流的积分值被反馈给功率放大器。

18. 发明授权

US4920290A Active magnetic bearing apparatus 失效
标题翻译：主动磁轴承装置
公开(公告)号：US4920290A
公开(公告)日：1990-04-24
申请号：US265726
申请日：1988-11-01
申请人： Chikara Murakami , Atsushi Nakajima , Hirokuni Hiyama , Satoshi Inanaga , Katsuhide Watanabe
发明人： Chikara Murakami , Atsushi Nakajima , Hirokuni Hiyama , Satoshi Inanaga , Katsuhide Watanabe
IPC分类号： F16C39/06
CPC分类号： F16C32/0442 , F16C32/0444 , F16C2231/00
摘要： An active magnetic bearing apparatus wherein an object designed to be suspended is supported by a plurality of active magnetic bearings and is suspended in a non-contact state so that the object is caused to move in either a rotational or reciprocating manner in such a state. The magnetic force of the respective active magnetic bearings is controlled electrically. A delay control mechanism is provided to cause a delay in the starting-up time for the respective active magnetic bearings so that these bearings are caused to start up sequentially when they are activated, thus making it possible to make the capacity of the power source as small as possible.
摘要翻译：一种主动磁轴承装置，其中设计成悬挂的物体由多个主动磁轴承支撑并且以非接触状态悬挂，使得物体在这种状态下以旋转或往复运动方式移动。各主动磁轴承的磁力受到电气控制。提供了一种延迟控制机构，用于使各个有源磁轴承的启动时间延迟，使得这些轴承在被激活时依次启动，从而使电源的容量成为尽可能小

19. 发明授权

US4910449A System for preventing unbalance vibrations and synchronous disturbance vibrations 失效
标题翻译：防止不平衡振动和同步扰动振动的系统
公开(公告)号：US4910449A
公开(公告)日：1990-03-20
申请号：US195051
申请日：1988-05-17
申请人： Hirokuni Hiyama , Katsuhide Watanabe
发明人： Hirokuni Hiyama , Katsuhide Watanabe
IPC分类号： F16C32/04 , F16C39/06 , F16F15/18
CPC分类号： F16C32/0444
摘要： A rotation control system for preventing unbalance vibrations and synchronous disturbance vibrations of a rotary member suspended by a magnetic bearing. This system includes a vibration detector which detects radial vibration of the rotary member. On the basis of the detected radial vibration, a compensating signal which has the same amplitude and cycle as the vibration component having the rotational frequency is generated. The difference between the detected vibration and the compensating signal is obtained and used for controlling the radial position of the magnetic bearing.

20. 发明授权

US09687955B2 Polishing apparatus 有权
公开(公告)号：US09687955B2
公开(公告)日：2017-06-27
申请号：US13227804
申请日：2011-09-08
申请人： Katsuhide Watanabe , Masakazu Ihara
发明人： Katsuhide Watanabe , Masakazu Ihara
IPC分类号： B24B49/10 , B24B37/005 , B24B37/10 , B24B49/16 , B24B49/18
CPC分类号： B24B37/005 , B24B37/107 , B24B49/16 , B24B49/18
摘要： A polishing apparatus includes a table rotating motor configured to rotate a polishing table about its own axis, a top ring rotating motor configured to rotate a top ring about its own axis, a dresser configured to dress a polishing pad, and a pad-height measuring device configured to measure a height of the polishing pad. The polishing apparatus also includes a diagnostic device configured to calculate an amount of wear of the polishing pad from the height of the polishing pad and to determine the end of a life of the polishing pad based on the amount of the wear of the polishing pad, the torque or current of the table rotating motor, and the torque or current of the top ring rotating motor.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式