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11. 发明授权

US07445883B2 Lithographic printing with polarized light 有权
标题翻译：带偏光的平版印刷
公开(公告)号：US07445883B2
公开(公告)日：2008-11-04
申请号：US11503113
申请日：2006-08-14
申请人： Nabila Baba-Ali , Justin Kreuzer , Harry Sewell
发明人： Nabila Baba-Ali , Justin Kreuzer , Harry Sewell
IPC分类号： G02B5/30 , G03B27/72
CPC分类号： G03F7/70566 , G02B27/28 , G03F7/2006
摘要： The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift mask (PSM) and produce an exposure beam. A negative photoresist layer is then exposed by light in the exposure beam. A chromeless PSM can be used. In further embodiments of the present invention, radially polarized light is used to illuminate a mask and produce an exposure beam. A positive photoresist layer is then exposed by light in the exposure beam. The mask can be an attenuating PSM or binary mask. A very high image quality is obtained even when printing contact holes at various pitches in low k applications.
摘要翻译：本发明提供了利用偏振光改进平版印刷的系统和方法。在本发明的实施例中，使用偏振光（径向或切向极化）照亮相移掩模（PSM）并产生曝光光束。然后在曝光束中用光曝光负性光致抗蚀剂层。可以使用无色PSM。在本发明的另外的实施例中，使用径向偏振光照射掩模并产生曝光光束。然后，正光致抗蚀剂层在曝光束中被光曝光。掩模可以是衰减PSM或二进制掩模。即使在低k应用中以各种间距打印接触孔，也能获得非常高的图像质量。

12. 发明申请

US20070153348A1 Optical element damping systems 有权
标题翻译：光学元件阻尼系统
公开(公告)号：US20070153348A1
公开(公告)日：2007-07-05
申请号：US11634931
申请日：2006-12-07
申请人： Stephen Roux , Peter Kochersperger , Justin Kreuzer
发明人： Stephen Roux , Peter Kochersperger , Justin Kreuzer
IPC分类号： G02B26/08
CPC分类号： G02B7/00 , G03F7/70825 , G03F7/709
摘要： The present invention is directed to optical element damping systems. In particular, an eddy current damper is disclosed. The eddy current damper includes a rod, a series of conducting plates coupled to the rod, and layers of magnets. The alternating layers have alternating magnetic fields. When an optical element moves, the optical element will exert a force on the rod. The rod causes the conducting plates to move relative to the alternating layers of magnets to generate eddy currents within each of the conducting plates, such that the eddy currents damp the motion of an optical element. In an alternative embodiment, an eddy current damper motion amplifier is used to provide additional mechanical advantage that significantly increases the damping provided by the eddy current damper. Eddy current dampers are provided within conventional scanning lithography devices and optical maskless lithography devices to improve performance by stabilizing optical element motion.
摘要翻译：本发明涉及光学元件阻尼系统。特别地，公开了涡流阻尼器。涡流阻尼器包括杆，连接到杆的一系列导电板和磁体层。交替层具有交变磁场。当光学元件移动时，光学元件将在杆上施加力。杆导致导电板相对于交替的磁体层移动，以在每个导电板内产生涡电流，使得涡流抑制光学元件的运动。在替代实施例中，使用涡流阻尼器运动放大器提供额外的机械优点，显着增加由涡流阻尼器提供的阻尼。在常规扫描光刻设备和光学无掩模光刻设备中提供涡流阻尼器，以通过稳定光学元件运动来提高性能。

13. 发明授权

US07133121B2 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region 有权
标题翻译：在无掩模光刻系统中补偿印刷图案的缝合干扰的方法和系统，利用曝光区域与重叠区域中的空间图像的衰减重叠
公开(公告)号：US07133121B2
公开(公告)日：2006-11-07
申请号：US11098561
申请日：2005-04-05
申请人： Arno Bleeker , Wenceslao A. Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
发明人： Arno Bleeker , Wenceslao A. Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
IPC分类号： G03B27/32 , G03B27/68 , G03B27/54
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.
摘要翻译：提供了一种使用空间光调制器（SLM）在感光表面上印刷图案的方法和系统。示例性方法包括在感光表面上限定两个或更多个曝光区域，曝光区域沿着曝光区域的相应边缘部分重叠以在它们之间形成重叠区域。暴露两个或更多个曝光区域以在其中打印图像，曝光延伸穿过重叠区域。然后在重叠区域内的曝光被衰减。

14. 发明申请

US20050213105A1 Optical beam shearing apparatus 失效
标题翻译：光束剪切装置
公开(公告)号：US20050213105A1
公开(公告)日：2005-09-29
申请号：US11132800
申请日：2005-05-19
申请人： Henry Hill , Justin Kreuzer
发明人： Henry Hill , Justin Kreuzer
IPC分类号： G01B9/02 , G01J9/00 , G11B7/00
CPC分类号： G01B9/02021 , G01B9/02003 , G01B9/02027 , G01B9/02098 , G01B2290/45 , G01B2290/70 , G01J9/00
摘要： Beam shearing apparatus for introducing a lateral shear between the components of a light beam. The apparatus is an optical assembly having a polarizing interface and input and output facets and two reflecting surfaces one of which is arranged at an angle generally opposite the input facet and the other of which is arranged at an angle generally opposite the output facet.
摘要翻译：用于在光束的部件之间引入横向剪切的光束剪切装置。该装置是具有偏振界面和输入和输出小面以及两个反射表面的光学组件，其中一个反射表面以大致与输入小面相对的角度布置，而另一个以大体上与输出小面相对的角度排列。

15. 发明申请

US20050128456A1 Method and systems for improving focus accuracy in a lithography system 有权
标题翻译：用于提高光刻系统中的聚焦精度的方法和系统
公开(公告)号：US20050128456A1
公开(公告)日：2005-06-16
申请号：US11050694
申请日：2005-02-07
申请人： Michael Nelson , Justin Kreuzer , Peter Filosi , Christopher Mason
发明人： Michael Nelson , Justin Kreuzer , Peter Filosi , Christopher Mason
IPC分类号： G01B21/00 , G03F7/20 , G03F7/207 , G03F9/00 , G03F9/02 , H01L21/027 , G03B27/52
CPC分类号： G03F9/7019 , D21H23/34 , G03F9/7011 , G03F9/7026 , G03F9/7088 , H04N21/41415
摘要： A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.
摘要翻译：包括校准子系统和控制子系统的焦点系统。包括控制传感器的控制子系统非常接近图像的曝光。包括校准传感器和控制传感器的校准子系统相对于图像的曝光远离或离轴定位。通过分离校准和控制功能，功能要求可以分为两种（或更多种）传感器。

16. 发明授权

US4534047A Mask ring assembly for X-ray lithography 失效
标题翻译：用于X射线光刻的掩模环组件
公开(公告)号：US4534047A
公开(公告)日：1985-08-06
申请号：US568776
申请日：1984-01-06
申请人： Warren Deschenaux , Gregory Hughes , Justin Kreuzer , Carlo La Fiandra
发明人： Warren Deschenaux , Gregory Hughes , Justin Kreuzer , Carlo La Fiandra
IPC分类号： H01L21/027 , G03F1/22 , G03F7/20 , G03F9/00 , H01L21/30 , G03B11/00 , G02B7/00 , G03F5/00
CPC分类号： G03F1/22
摘要： This invention is directed to a mask ring assembly for X-ray lithography which is particularly adapted, among other possible uses, for use in replicating integrated circuit patterns, said assembly including a mask ring, a plurality of kinematic mounts for removably mounting the mask ring on an alignment cartridge, each of the kinematic mounts including a funnel-like shaped seat member and a mating ball-like shaped member, one of said members being on the mask ring and the other of the members being mounted on the alignment cartridge.
摘要翻译：本发明涉及一种用于X射线光刻的掩模环组件，其特别适用于复制集成电路图案的其它可能用途，所述组件包括掩模环，用于可拆卸地安装掩模环的多个运动安装座在对准盒上，每个运动安装件包括一个漏斗状的座椅构件和一个配合的球状构件，其中一个构件位于掩模环上，另一个构件安装在对准盒上。

17. 发明授权

US07751130B2 Optical element damping systems 有权
标题翻译：光学元件阻尼系统
公开(公告)号：US07751130B2
公开(公告)日：2010-07-06
申请号：US11634931
申请日：2006-12-07
申请人： Stephen Roux , Peter Kochersperger , Justin Kreuzer
发明人： Stephen Roux , Peter Kochersperger , Justin Kreuzer
IPC分类号： G02B7/02
CPC分类号： G02B7/00 , G03F7/70825 , G03F7/709
摘要： The present invention is directed to optical element damping systems. In particular, an eddy current damper is disclosed. The eddy current damper includes a rod, a series of conducting plates coupled to the rod, and layers of magnets. The alternating layers have alternating magnetic fields. When an optical element moves, the optical element will exert a force on the rod. The rod causes the conducting plates to move relative to the alternating layers of magnets to generate eddy currents within each of the conducting plates, such that the eddy currents damp the motion of an optical element. In an alternative embodiment, an eddy current damper motion amplifier is used to provide additional mechanical advantage that significantly increases the damping provided by the eddy current damper. Eddy current dampers are provided within conventional scanning lithography devices and optical maskless lithography devices to improve performance by stabilizing optical element motion.
摘要翻译：本发明涉及光学元件阻尼系统。特别地，公开了涡流阻尼器。涡流阻尼器包括杆，连接到杆的一系列导电板和磁体层。交替层具有交变磁场。当光学元件移动时，光学元件将在杆上施加力。杆导致导电板相对于交替的磁体层移动，以在每个导电板内产生涡电流，使得涡流抑制光学元件的运动。在替代实施例中，使用涡流阻尼器运动放大器提供额外的机械优点，显着增加由涡流阻尼器提供的阻尼。在常规扫描光刻设备和光学无掩模光刻设备中提供涡流阻尼器，以通过稳定光学元件运动来提高性能。

18. 发明授权

US07630054B2 Methods and systems to compensate for a stitching disturbance of a printed pattern 有权
标题翻译：用于补偿印刷图案的缝合干扰的方法和系统
公开(公告)号：US07630054B2
公开(公告)日：2009-12-08
申请号：US12000522
申请日：2007-12-13
申请人： Arno Bleeker , Wenceslao A. Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
发明人： Arno Bleeker , Wenceslao A. Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
IPC分类号： G03B27/42 , G03B27/68
CPC分类号： G03F7/70475 , G03B21/18 , G03B27/42 , G03F7/70091 , G03F7/70291 , G03F7/70466
摘要： A method and system are provided of using a patterning device. An exemplary method includes performing a first exposure of a surface corresponding to image data, determining an image deficiency within a region of the first image, adjusting the image data to compensate for the image deficiency, and performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface. The first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface.
摘要翻译：提供了使用图案形成装置的方法和系统。示例性方法包括执行与图像数据相对应的表面的第一曝光，确定第一图像的区域内的图像不足，调整图像数据以补偿图像不足，以及执行对应于图像数据的表面的第二次曝光在图案形成装置相对于表面的第二遍期间的调整图像数据。第一曝光在图案形成装置相对于表面的第一遍期间发生，以在表面上产生第一图像。

19. 发明申请

US20080106717A1 Using an Interferometer as a High Speed Variable Attenuator 有权
标题翻译：使用干涉仪作为高速可变衰减器
公开(公告)号：US20080106717A1
公开(公告)日：2008-05-08
申请号：US11866820
申请日：2007-10-03
申请人： Oscar NOORDMAN , Justin Kreuzer , Henri Vink , Teunis Van Den Dool , Daniel Calero
发明人： Oscar NOORDMAN , Justin Kreuzer , Henri Vink , Teunis Van Den Dool , Daniel Calero
IPC分类号： G03B27/70 , G03B27/54 , G03B27/74
CPC分类号： G03F7/70558 , G02B26/001 , G03F7/70041
摘要： A system and method provides high speed variable attenuators. The attenuators can be used within a lithographic apparatus to control intensity of radiation in one or more correction pulses used to correct a dose of the radiation following an initial pulse of radiation.
摘要翻译：系统和方法提供高速可变衰减器。衰减器可以在光刻设备中使用，以控制用于在初始辐射脉冲之后校正辐射剂量的一个或多个校正脉冲中的辐射强度。

20. 发明授权

US07139080B2 Interferometry systems involving a dynamic beam-steering assembly 有权
标题翻译：涉及动态光束转向组件的干涉测量系统
公开(公告)号：US07139080B2
公开(公告)日：2006-11-21
申请号：US10464829
申请日：2003-06-17
申请人： Henry A. Hill , Justin Kreuzer
发明人： Henry A. Hill , Justin Kreuzer
IPC分类号： G01B11/02 , G01B9/02
CPC分类号： G03F7/70716 , G01B9/02003 , G01B9/02007 , G01B9/02019 , G01B9/02021 , G01B9/02061 , G01B2290/70 , G03F7/70775
摘要： An apparatus including: a multi-axis interferometry system configured to receive an input beam and direct at least two beams derived from the input beam to contact different locations on a measurement object to monitor changes in an angular orientation of the measurement object; a beam steering assembly having a beam steering element positioned to direct the input beam into the interferometry system and a positioning system to selectively orient the beam steering element relative to the interferometry system; and a control circuit which during operation orients the beam steering element based on the changes in the angular orientation of the measurement object monitored by the interferometry system.
摘要翻译：一种装置，包括：多轴干涉测量系统，其被配置为接收输入光束并且引导从所述输入光束导出的至少两个光束以接触测量对象上的不同位置，以监测所述测量对象的角度取向的变化; 光束转向组件，其具有定位成将输入光束引导到干涉测量系统中的光束操纵元件和用于相对于干涉测量系统选择性地定向光束操纵元件的定位系统; 以及控制电路，其在操作期间基于干涉测量系统监测的测量对象的角度取向的变化来定向光束操纵元件。

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