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11. 发明申请

US20070097346A1 Lithographic apparatus and device manufacturing method 审中-公开
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070097346A1
公开(公告)日：2007-05-03
申请号：US11581059
申请日：2006-10-16
申请人： Koen Maria Zaal , Joost Ottens , Jeroen Akker
发明人： Koen Maria Zaal , Joost Ottens , Jeroen Akker
IPC分类号： G03B27/58
CPC分类号： G03F7/707 , C04B35/195 , C04B2235/3203 , C04B2235/3244 , C04B2235/3255 , G03F7/70858
摘要： An article support configured to support an article to be placed in a beam path of a radiation beam of a lithographic apparatus on the article support is disclosed, the article support having a base plate of a first material and a plurality of burls of a second material, bonded to the base plate of the first material.
摘要翻译：公开了一种物品支撑件，其被配置成将物品放置在物品支撑件上的光刻设备的辐射束的光束路径中，物品支撑件具有第一材料的基板和第二材料的多个毛刺，粘合到第一材料的基板上。

12. 发明申请

US20070070315A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20070070315A1
公开(公告)日：2007-03-29
申请号：US11454129
申请日：2006-06-16
申请人： Johannes Jacobs , Igor Bouchoms , Nicolaas Kate , Nicolaas Kemper , Martinus Leenders , Erik Loopstra , Joost Ottens , Martinus Verhagen , Yucel Kok , Johannes Van Es , Herman Boom , Franciscus Janssen
发明人： Johannes Jacobs , Igor Bouchoms , Nicolaas Kate , Nicolaas Kemper , Martinus Leenders , Erik Loopstra , Joost Ottens , Martinus Verhagen , Yucel Kok , Johannes Van Es , Herman Boom , Franciscus Janssen
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
摘要翻译：使用或具有包括关于衬底的位置，速度和/或加速度的信息的时间表来公开用于维持衬底和浸没式光刻设备的热平衡的方法和设备; 以及响应于时间表中的信息，用于减少局部蒸发和/或增加局部冷凝的蒸发控制器和/或冷凝控制器。从基材表面蒸发液体将其冷却下来，同时在其底部表面上冷凝液体局部加热基材。

13. 发明申请

US20050128463A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20050128463A1
公开(公告)日：2005-06-16
申请号：US10734641
申请日：2003-12-15
申请人： Joost Ottens , Hendrik Neerhof , Koen Jacobus Zaal , Marco Le Kluse
发明人： Joost Ottens , Hendrik Neerhof , Koen Jacobus Zaal , Marco Le Kluse
IPC分类号： G03F7/20 , H01L21/027 , H01L21/683 , G03B27/62
CPC分类号： H01L21/6831 , G03F7/707 , G03F7/70708
摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, a backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support, and a clamp for clamping the article against the article support during projection. According to one aspect of the invention, the apparatus includes a controller for controlling the clamp and/or the backfill gas feed pressure so as to release the clamp prior to reducing the backfill gas feed pressure.
摘要翻译：光刻设备包括用于提供辐射束的照明系统，用于支撑待放置在物品支架上的辐射束的光束路径中的平坦物品的物品支撑件，布置在物品支撑件中用于进给的回填气体供给当由物品支撑件支撑时，将气体回填到物品的背面，以及用于在投影期间将物品夹紧在物品支撑件上的夹具。根据本发明的一个方面，该装置包括用于控制夹紧和/或回填气体进料压力的控制器，以便在减少回填气体进料压力之前释放夹具。

15. 发明申请

US20060114436A1 Using unflatness information of the substrate table or mask table for decreasing overlay 有权
标题翻译：使用衬底表或掩模台的不平坦信息减少重叠
公开(公告)号：US20060114436A1
公开(公告)日：2006-06-01
申请号：US10998179
申请日：2004-11-29
申请人： Rene Oesterholt , Ralph Brinkhof , Tjarko Van Empel , Leon Levasier , Joost Ottens , Koen Jacobus Zaal , Koenraad Stephan Salden
发明人： Rene Oesterholt , Ralph Brinkhof , Tjarko Van Empel , Leon Levasier , Joost Ottens , Koen Jacobus Zaal , Koenraad Stephan Salden
IPC分类号： G03B27/52
CPC分类号： G03F7/70783 , G03F7/707
摘要： The invention relates to a lithographic system that includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The system also comprises a processor arranged to calculate overlay corrections using a reference height map representing a surface of the substrate table or the mask table. The invention allows feed forward correction of non-flatness induced wafer grid distortion during alignment and during exposure, thereby reducing overlay errors caused by differences in flatness characteristics. It provides an indirect qualification method for overlay accuracy related to exposure chuck flatness based on height map information.
摘要翻译：本发明涉及一种光刻系统，其包括用于提供投影辐射束的照明系统，用于支撑掩模的掩模台，用于使投影光束在其横截面上具有图案的掩模，用于保持基板和用于将图案化的光束投影到基板的目标部分上的投影系统。该系统还包括处理器，其被布置为使用表示衬底台或掩模台的表面的参考高度图计算覆盖校正。本发明允许在对准和曝光期间非平坦度引起的晶片格栅失真的前馈校正，从而减少由平坦度特性的差异引起的重叠误差。它提供了基于高度图信息的与曝光卡盘平坦度相关的覆盖精度的间接鉴定方法。

16. 发明申请

US20050195382A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050195382A1
公开(公告)日：2005-09-08
申请号：US10980834
申请日：2004-11-04
申请人： Joost Ottens , Koen Maria Zaal
发明人： Joost Ottens , Koen Maria Zaal
IPC分类号： G03F7/20 , H01L21/027 , H01L21/683 , G03B27/58
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783 , G03F7/70875
摘要： A lithographic apparatus includes an article support for supporting a substantially flat article to be placed in a beam path of a beam of radiation. The article support includes a plurality of supporting protrusions that define a support zone for providing a plane of support. A backfill gas feed is arranged in the support zone and provides a backfill gas that flows to a backside of the article when supported by the article support. The support zone is surrounded by a boundary zone that has a reduced height relative to the plane of support so that the backfill gas flow is permitted to exit the support zone. A tunable clamp clamps the article to the article support, and a flow measuring system measures the outflow of the backfill gas. The tunable clamp is operatively coupled to the flow measuring system to tune the clamping based on the measured outflow.
摘要翻译：光刻设备包括用于支撑待放置在辐射束的光束路径中的基本平坦的物品的物品支撑件。物品支撑件包括限定用于提供支撑平面的支撑区域的多个支撑突起。回填气体进料设置在支撑区域中，并且当由物品支撑件支撑时提供回流到物品的后侧的回填气体。支撑区被边界区围绕，该边界区相对于支撑平面具有减小的高度，使得回填气体流被允许离开支撑区。可调式夹具将制品夹紧到物品支撑件上，流量测量系统测量回填气体的流出。可调式夹具可操作地连接到流量测量系统，以基于所测量的流出来调节夹紧。

17. 发明申请

US20050134829A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20050134829A1
公开(公告)日：2005-06-23
申请号：US10736988
申请日：2003-12-17
申请人： Joost Ottens , Henrikus Cox , Koen Jacobus Zaal
发明人： Joost Ottens , Henrikus Cox , Koen Jacobus Zaal
IPC分类号： G03F7/20 , H01L21/027 , H01L21/683 , G03B27/62
CPC分类号： G03F7/707
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, an article support to support an article to be placed in a beam path of the beam of radiation, and a clamp to clamp the article to the article support. The clamp is provided with a plurality of zones located around a circumference of the article support to create a locally adjusted pressure so as to provide a local bending moment to locally bend the article.
摘要翻译：公开了一种光刻设备。该装置包括：照明系统，用于提供辐射束;物品支撑件，用于支撑放置在辐射束的光束路径中的物品;以及夹具，用于将物品夹持到物品支撑件上。夹具设置有围绕物品支撑件的圆周设置的多个区域，以产生局部调节的压力，以便提供局部弯曲力矩以局部弯曲物品。

18. 发明申请

US20050134828A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050134828A1
公开(公告)日：2005-06-23
申请号：US10736778
申请日：2003-12-17
申请人： Joost Ottens , Johannes Hubertus Moors , Peter Theodorus Giesen
发明人： Joost Ottens , Johannes Hubertus Moors , Peter Theodorus Giesen
IPC分类号： G03F7/20 , H01L21/027 , H01L21/683 , G03B27/62
CPC分类号： H01L21/6831 , G03F7/707 , G03F7/70875
摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, an electrostatic clamp for clamping the article against the article support by an electrostatic field during projection, and a recessed backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support. According to one aspect of the invention, the recessed backfill gas feed includes a shielding layer for shielding the backfill gas in the recessed backfill gas feed from the electrostatic field.
摘要翻译：光刻设备包括用于提供辐射束的照明系统，用于支撑待放置在物品支架上的辐射束的光束路径中的平坦物品的物品支撑件，用于将物品夹紧在物品支撑件上的静电夹具通过在投影期间的静电场，以及设置在物品支撑件中的凹进的回填气体进料，用于当由物品支撑件支撑时将回填气体供给到物品的背面。根据本发明的一个方面，凹入的回填气体进料包括用于屏蔽来自静电场的凹进的回填气体进料中的回填气体的屏蔽层。

19. 发明申请

US20050122503A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050122503A1
公开(公告)日：2005-06-09
申请号：US10980833
申请日：2004-11-04
申请人： Joost Ottens , Sjoerd Nicolaas Donders
发明人： Joost Ottens , Sjoerd Nicolaas Donders
IPC分类号： H01L21/027 , G03F7/20 , G03B27/58
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70783 , G03F7/708
摘要： A lithographic apparatus includes an illumination system for conditioning a beam of radiation, and an article support for supporting a substantially flat article to be placed in a beam path of the beam of radiation. The article support includes a plurality of supporting protrusions that define a support zone for providing a substantially flat plane of support. The apparatus also includes a backfill gas feed for providing an improved thermal conduction between the article and the article support. The backfill gas feed includes a backfill gas discharge zone for feeding backfill gas to a backside of the article when supported by the article support. The backfill gas discharge zone substantially encloses the support zone.
摘要翻译：光刻设备包括用于调节辐射束的照明系统和用于支撑待放置在辐射束的光束路径中的基本平坦的物品的物品支撑件。物品支撑件包括多个支撑突起，其限定用于提供基本平坦的支撑平面的支撑区域。该设备还包括用于提供物品与物品支撑之间改进的热传导的回填气体供给。回填气体进料包括回填气体排放区，用于当由物品支撑件支撑时将回填气体供给到物品的背面。回填气体排出区基本上包围支撑区。

20. 发明申请

US20050030515A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20050030515A1
公开(公告)日：2005-02-10
申请号：US10890379
申请日：2004-07-14
申请人： Joost Ottens , Tjarko Adriaan Van Empel , Koen Jacobus Zaal
发明人： Joost Ottens , Tjarko Adriaan Van Empel , Koen Jacobus Zaal
IPC分类号： H01L21/027 , G03F7/20 , G03B27/04
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783 , Y10T279/23
摘要： A lithographic projection apparatus includes a radiation system for providing a beam of radiation, and a substrate holder. The substrate holder includes a plurality of protrusions for providing a substantially flat plane of support for supporting a substrate in a beam path of the beam of radiation, at least one clamping electrode for generating an electric field for clamping the substrate against the substrate holder, and a peripheral supporting edge arranged to contact the substrate. The electrode extends beyond the peripheral supporting edge for providing a torsion load to level the substrate near the edges of the substrate.
摘要翻译：光刻投影装置包括用于提供辐射束的辐射系统和衬底保持器。衬底保持器包括多个突起，用于提供基本上平坦的支撑平面，用于在辐射束的光束路径中支撑衬底;至少一个夹持电极，用于产生用于将衬底夹持在衬底保持器上的电场;以及布置成接触所述基板的外围支撑边缘。电极延伸超过外围支撑边缘，以提供扭转负载以使基板在基板的边缘附近平坦化。

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