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11. 发明申请

US20110211181A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20110211181A1
公开(公告)日：2011-09-01
申请号：US13102620
申请日：2011-05-06
申请人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Adrianus Fransiscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
发明人： Bob STREEFKERK , Johannes Jacobus Matheus Baselmans , Adrianus Fransiscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70333
摘要： In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
摘要翻译：在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。

12. 发明授权

US07859647B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07859647B2
公开(公告)日：2010-12-28
申请号：US12020947
申请日：2008-01-28
申请人： Arno Jan Bleeker , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
发明人： Arno Jan Bleeker , Johannes Jacobus Matheus Baselmans , Marce Mathijs Theodore Marie Dierichs , Stanislav Smirnov , Christian Wagner , Lev Ryzhikov , Kars Zeger Troost
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/702 , G03F7/70291
摘要： A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.
摘要翻译：系统和方法用于引导辐射束非垂直地照射用于图案化辐射束的单独可控元件的构图阵列。可单独控制的元件可以改变辐射束的远心性。将辐射束投射到可独立控制的元件上可以通过凹面镜或使用放置在单独可控元件的物场中的折叠镜。或者，独立可控元件可以改变辐射束的光轴。

13. 发明授权

US07834980B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US07834980B2
公开(公告)日：2010-11-16
申请号：US11642982
申请日：2006-12-21
申请人： Johannes Jacobus Matheus Baselmans , Andrey S. Tychkov
发明人： Johannes Jacobus Matheus Baselmans , Andrey S. Tychkov
IPC分类号： G03B27/42
CPC分类号： G03F7/70358 , G03F7/70075 , G03F7/70083 , G03F7/70583
摘要： A method of lithography is disclosed that includes conditioning a radiation beam using an illumination system of a lithographic apparatus, imparting the radiation beam with a pattern in its cross-section, and projecting the patterned beam of radiation as an exposure field onto a substrate, wherein a periodic interference pattern is present in the exposure field, and relative motion is established between the substrate and a component in the illumination system, such that the periodic interference pattern is displaced in a direction which is not parallel to a direction of repetition of the periodic interference pattern.
摘要翻译：公开了一种光刻方法，其包括使用光刻设备的照明系统来调节辐射束，使辐射束在其横截面上具有图案，并将图案化的辐射束作为曝光场投射到衬底上，其中在曝光场中存在周期性干涉图案，并且在基板和照明系统中的部件之间建立相对运动，使得周期性干涉图案在不平行于周期性重复方向的方向上移位干扰模式。

14. 发明申请

US20100141915A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100141915A1
公开(公告)日：2010-06-10
申请号：US12694880
申请日：2010-01-27
申请人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
IPC分类号： G03B27/42
CPC分类号： G03F9/7023 , G03F7/70341 , G03F7/70883
摘要： A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.
摘要翻译：光刻设备包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置成在其横截面中赋予图案的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板台之间的空间提供液体; 传感器，被配置为使用通过所述液体投影的测量光束来测量曝光参数; 以及校正系统，其被配置为基于影响使用所述测量光束进行的测量的物理属性的变化来确定偏移，以至少部分地校正所测量的曝光参数。

15. 发明申请

US20090021707A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20090021707A1
公开(公告)日：2009-01-22
申请号：US12230979
申请日：2008-09-09
申请人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
发明人： Johannes Catharinus Hubertus Mulkens , Johannes Jacobus Matheus Baselmans , Paul Graupner , Erik Roelof Loopstra , Bob Streefkerk
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70891 , G02B3/14 , G02B21/33 , G03F7/70341
摘要： An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
摘要翻译：浸没式光刻设备包括液体供应系统，其被配置为将液体供应到辐射束通过的空间，该液体具有可由调谐器调谐的光学特性。该空间可以位于投影系统和基板之间。调谐器布置成调节液体的一个或多个特性，例如作为空间和/或时间的函数的形状，组成，折射率和/或吸收率，以便改变光刻设备的成像性能。

16. 发明申请

US20080309899A1 Lithographic Apparatus and Method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US20080309899A1
公开(公告)日：2008-12-18
申请号：US11763275
申请日：2007-06-14
申请人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker
发明人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker
IPC分类号： G03B27/68
CPC分类号： G03F7/70291 , G03F7/706
摘要： Systems and methods are provided for measuring aberration in a lithographic apparatus. A radiation beam is modulated using an array of individually controllable elements, and the modulated beam is projected using a projection system. A pattern is provided on the array of individually controllable elements to modulate the radiation beam, and the pattern comprises a repeating structure that is formed from a plurality of features that are dimensioned such that first order diffraction of the radiation beam substantially fills the pupil of the projection system. A sensor detects the projected radiation and measures interference in the radiation projected by the projection system. Aberration in the detected radiation beam is then measured.
摘要翻译：提供了用于测量光刻设备中的像差的系统和方法。使用单独可控元件的阵列来调制辐射束，并且使用投影系统投影调制束。在单独可控元件的阵列上提供图案以调制辐射束，并且图案包括由多个特征形成的重复结构，其尺寸使得辐射束的一阶衍射基本上填充了辐射束的瞳孔投影系统传感器检测投射的辐射并测量由投影系统投射的辐射的干扰。然后测量检测到的辐射束中的畸变。

17. 发明授权

US07463330B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07463330B2
公开(公告)日：2008-12-09
申请号：US10885489
申请日：2004-07-07
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
IPC分类号： G03B27/32 , G03B27/54
CPC分类号： G03F7/70341 , G03F7/70866 , G03F9/7026 , G03F9/7034
摘要： In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
摘要翻译：浸没式光刻在基材曝光完成后，检测器用于检测残留在基片和/或基片台上的任何残留液体。

18. 发明申请

US20080252870A1 Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus 有权
标题翻译：光刻投影装置和使用这种光刻投影装置的装置制造方法
公开(公告)号：US20080252870A1
公开(公告)日：2008-10-16
申请号：US12213150
申请日：2008-06-16
申请人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Amout Van De Stadt , Remco Marcel Van Dijk
发明人： Andre Bernardus Jeunink , M'hamed Akhssay , Johannes Jacobus Matheus Baselmans , Franciscus Antonius Chrysogonus Marie Commissaris , Simon De Groot , Wim Tjibbo Tel , Alexander Hendrikus Martinus Van Der Hoff , Amout Van De Stadt , Remco Marcel Van Dijk
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70491 , G03F7/705 , G03F7/706 , G03F9/7046
摘要： A lithographic projection apparatus is disclosed that includes a predictive system configured to predict changes in projection system aberrations with time with respect to measured aberration values, a modelling system configured to determine an application-specific effect of said predicted projection system aberration changes on at least one parameter of an image for a selected pattern, a control system configured to generate a control signal specific to the selected pattern according to said predicted projection system aberration changes and their application-specific effect on the at least one parameter of the image, and an image adjusting system, responsive to the control signal, to compensate for the application-specific effect of said predicted projection system aberration changes on the image.
摘要翻译：公开了一种光刻投影装置，其包括预测系统，该预测系统被配置为相对于测量的像差值预测投影系统像差随时间的变化，建模系统被配置为确定所述预测投影系统像差变化对至少一个像素的应用特定影响用于所选图案的图像的参数;控制系统，被配置为根据所述预测的投影系统像差变化及其对图像的至少一个参数的应用特定影响来生成特定于所选择的图案的控制信号，以及图像响应于控制信号调整系统，以补偿所述预测的投影系统像差变化对图像的应用特定效果。

19. 发明授权

US07436502B2 Illumination beam measurement 失效
标题翻译：照明光束测量
公开(公告)号：US07436502B2
公开(公告)日：2008-10-14
申请号：US11236850
申请日：2005-09-28
申请人： Johannes Jacobus Matheus Baselmans , Henricus Jozef Peter Lenders , Dilek Kaya
发明人： Johannes Jacobus Matheus Baselmans , Henricus Jozef Peter Lenders , Dilek Kaya
IPC分类号： G01J1/00
CPC分类号： G01J1/4257 , G01J1/04 , G01J1/0437 , G03F7/70133
摘要： A method of measuring the angular intensity distribution of an illumination beam produced by an illumination system of a lithographic apparatus includes measuring an angular intensity distribution, placing a first optical element above an object plane of the illumination system which causes light therefrom to be deflected in a first direction, and measuring the intensity distribution at said detector, placing a second optical element above said object plane which cases light from said illumination system to be deflected in a second direction, and measuring the intensity distribution at said detector, determining the change in intensity in said first and second directions, and the angular intensity distribution of said illumination beam from the measurements. There is also provided a mask for use in such a method, the mask comprising a plurality of modules, each module comprising a pinhole and an optical element mounted above the pinhole.
摘要翻译：测量由光刻设备的照明系统产生的照明光束的角度强度分布的方法包括测量角度强度分布，将第一光学元件放置在照明系统的物平面上方，从而使光从其偏转到并且测量所述检测器处的强度分布，将第二光学元件放置在所述物平面之上，所述第二光学元件将来自所述照明系统的光沿第二方向偏转，并且测量所述检测器处的强度分布，确定强度变化在所述第一和第二方向上，以及所述照明光束的所述测量的角度强度分布。还提供了一种用于这种方法的掩模，该掩模包括多个模块，每个模块包括针孔和安装在针孔上方的光学元件。

20. 发明申请

US20080218711A1 Lithographic apparatus and device manufacturing method 失效
公开(公告)号：US20080218711A1
公开(公告)日：2008-09-11
申请号：US12073126
申请日：2008-02-29
申请人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F9/7096 , G03F7/70341
摘要： An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.

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