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11. 发明授权

US5646066A Method for forming electrical contact to the optical coating of an infrared detector from the backside of the detector 失效
标题翻译：从检测器的背面形成与红外探测器的光学涂层的电接触的方法
公开(公告)号：US5646066A
公开(公告)日：1997-07-08
申请号：US396944
申请日：1995-03-01
申请人： Steven N. Frank , James F. Belcher , Charles E. Stanford , Robert A. Owen , Robert J. S. Kyle
发明人： Steven N. Frank , James F. Belcher , Charles E. Stanford , Robert A. Owen , Robert J. S. Kyle
IPC分类号： H01L31/0216 , H01L31/0224 , H01L21/44
CPC分类号： H01L31/022408 , H01L31/02161 , Y10S148/08 , Y10S148/135 , Y10S438/977
摘要： This is a system and method of forming an electrical contact to the optical coating of an infrared detector. The method may comprise: forming thermal isolation trenches 22 in a substrate 20; depositing a trench filler 24 in the thermal isolation trenches 22; depositing a common electrode layer 31 over the thermal isolation trenches 22; depositing an optical coating 26 above the common electrode layer 31; mechanically thinning the substrate to expose the trench filler 24; etching to remove the trench filler 24 in the bias contact area; depositing a contact metal 34 on the backside of the substrate 20, wherein the contact metal 34 connects to the common electrode layer 31 at bias contact areas 34 around a periphery of the thermal isolation trenches; and etching the contact metal 34 and the trench filler 24 to form pixel mesas of the contact metal 34 and the substrate 20. Bias contact vias 23 may be formed in the bias contact areas and then filled with bias contact metal 49. Alternately, the bias contact vias may also be filled with the contact metal 34. The thermal isolation trenches may be formed by laser vaporization, ion milling or other equivalent methods. In addition, an elevation layer may be formed between the optical coating and the substrate to provide greater tolerances for ion milling. The elevation layer may be filled with a trench filler and then removed after milling. Alternately, the elevation layer may be filled with a metal 49 to connect the bias contact metal to the common electrode in the bias contact areas.
摘要翻译：这是形成与红外检测器的光学涂层的电接触的系统和方法。该方法可以包括：在衬底20中形成热隔离沟槽22; 在热隔离槽22中沉积沟槽填料24; 在热隔离槽22上沉积公共电极层31; 在公共电极层31上沉积光学涂层26; 机械地使衬底变薄以暴露沟槽填料24; 蚀刻以去除偏压接触区域中的沟槽填料24; 在衬底20的背面沉积接触金属34，其中接触金属34在围绕热隔离沟槽的周边的偏置接触区域34处连接到公共电极层31; 并且蚀刻接触金属34和沟槽填充剂24以形成接触金属34和衬底20的像素台面。可以在偏置接触区域中形成偏置接触通孔23，然后用偏置接触金属49填充。或者，偏置接触通孔也可以用接触金属34填充。热隔离沟槽可以通过激光蒸发，离子研磨或其它等效方法形成。此外，可以在光学涂层和基板之间形成升高层，以提供更大的离子铣削公差。仰角层可以填充沟槽填料，然后在研磨后除去。或者，仰角层可以用金属49填充，以将偏置接触金属连接到偏置接触区域中的公共电极。

12. 发明授权

US5608254A Method for forming electrical contact to the optical coating of an infrared detector using conductive epoxy 失效
标题翻译：使用导电环氧树脂与红外检测器的光学涂层形成电接触的方法
公开(公告)号：US5608254A
公开(公告)日：1997-03-04
申请号：US473838
申请日：1995-06-07
申请人： Steven N. Frank , James F. Belcher , Charles E. Stanford , Robert A. Owen , Robert J. S. Kyle
发明人： Steven N. Frank , James F. Belcher , Charles E. Stanford , Robert A. Owen , Robert J. S. Kyle
IPC分类号： H01L21/60 , H01L31/0224 , H01L31/0232
CPC分类号： H01L31/022408 , H01L24/11 , H01L2224/13099 , H01L2924/01013 , H01L2924/01022 , H01L2924/01033 , H01L2924/01038 , H01L2924/01056 , H01L2924/01077 , H01L2924/01079 , H01L2924/10329 , H01L2924/12042 , H01L2924/14 , H01L2924/19041
摘要： This is a system and method of forming an electrical contact to the optical coating of an infrared detector using conductive epoxy. The method may comprise: forming thermal isolation trenches 22 and bias contact vias 23 in a substrate 20; depositing a trench filler 24 in the thermal isolation trenches 22; depositing conductive epoxy 50 into the bias contact vias 23; replanarizing; depositing a common electrode layer 31 over the thermal isolation trenches 22 and vias 23; depositing an optical coating 26 above the common electrode layer 31; mechanically polishing a backside of the substrate 20 to expose the trench filler 24 and conductive epoxy 50; depositing a contact metal 34 on the backside of the substrate 20; etching the contact metal 34 and the trench filler 24 to form pixel mesas of the contact metal 34 and the substrate 20.
摘要翻译：这是使用导电环氧树脂形成与红外检测器的光学涂层的电接触的系统和方法。该方法可以包括：在衬底20中形成热隔离沟槽22和偏置接触通孔23; 在热隔离槽22中沉积沟槽填料24; 将导电环氧树脂50沉积到偏压接触通孔23中; 补充; 在热隔离槽22和通孔23上沉积公共电极层31; 在公共电极层31上沉积光学涂层26; 机械抛光衬底20的背面以暴露沟槽填料24和导电环氧树脂50; 在衬底20的背面沉积接触金属34; 蚀刻接触金属34和沟槽填料24以形成接触金属34和基板20的像素台面。

13. 发明授权

US5623158A Infrared sensing device 失效
标题翻译：红外线感应装置
公开(公告)号：US5623158A
公开(公告)日：1997-04-22
申请号：US483771
申请日：1995-06-07
申请人： Steven N. Frank , James F. Belcher , Charles E. Stanford , Robert A. Owen , Robert J. S. Kyle
发明人： Steven N. Frank , James F. Belcher , Charles E. Stanford , Robert A. Owen , Robert J. S. Kyle
IPC分类号： H01L31/0216 , H01L31/0224 , H01L31/00 , H01L31/0232
CPC分类号： H01L31/022408 , H01L31/02161 , Y10S148/08 , Y10S148/135 , Y10S438/977
摘要： This is a system and method of forming an electrical contact to the optical coating of an infrared detector. The method may comprise: forming thermal isolation trenches 22 in a substrate 20; depositing a trench filler 24 in the thermal isolation trenches 22; depositing a common electrode layer 31 over the thermal isolation trenches 22; depositing an optical coating 26 above the common electrode layer 31; mechanically thinning the substrate to expose the trench filler 24; etching to remove the trench filler 24 in the bias contact area; depositing a contact metal 34 on the backside of the substrate 20, wherein the contact metal 34 connects to the common electrode layer 31 at bias contact areas 34 around a periphery of the thermal isolation trenches; and etching the contact metal 34 and the trench filler 24 to form pixel mesas of the contact metal 34 and the substrate 20. Bias contact vias 23 may be formed in the bias contact areas and then filled with bias contact metal 49. Alternately, the bias contact vias may also be filled with the contact metal 34. The thermal isolation trenches may be formed by laser vaporization, ion milling or other equivalent methods. In addition, an elevation layer may be formed between the optical coating and the substrate to provide greater tolerances for ion milling. The elevation layer may be filled with a trench filler and then removed after milling. Alternately, the elevation layer may be filled with a metal 49 to connect the bias contact metal to the common electrode in the bias contact areas.
摘要翻译：这是形成与红外检测器的光学涂层的电接触的系统和方法。该方法可以包括：在衬底20中形成热隔离沟槽22; 在热隔离槽22中沉积沟槽填料24; 在热隔离槽22上沉积公共电极层31; 在公共电极层31上沉积光学涂层26; 机械地使衬底变薄以暴露沟槽填料24; 蚀刻以去除偏压接触区域中的沟槽填料24; 在衬底20的背面沉积接触金属34，其中接触金属34在围绕热隔离沟槽的周边的偏置接触区域34处连接到公共电极层31; 并且蚀刻接触金属34和沟槽填充剂24以形成接触金属34和衬底20的像素台面。可以在偏置接触区域中形成偏置接触通孔23，然后用偏置接触金属49填充。或者，偏置接触通孔也可以用接触金属34填充。热隔离沟槽可以通过激光蒸发，离子研磨或其它等效方法形成。此外，可以在光学涂层和基板之间形成升高层，以提供更大的离子铣削公差。仰角层可以填充沟槽填料，然后在研磨后除去。或者，仰角层可以用金属49填充，以将偏置接触金属连接到偏置接触区域中的公共电极。

14. 发明授权

US5577309A Method for forming electrical contact to the optical coating of an infrared detector 失效
标题翻译：与红外探测器的光学涂层形成电接触的方法
公开(公告)号：US5577309A
公开(公告)日：1996-11-26
申请号：US397512
申请日：1995-03-01
申请人： Steven N. Frank , James F. Belcher , Charles E. Stanford , Robert A. Owen , Robert J. S. Kyle
发明人： Steven N. Frank , James F. Belcher , Charles E. Stanford , Robert A. Owen , Robert J. S. Kyle
IPC分类号： G01J5/34 , H01L37/02 , H01L31/18
CPC分类号： H01L37/02 , G01J5/34 , Y10S438/928 , Y10T29/435 , Y10T29/49155
摘要： This is a system and method of forming an electrical contact to the optical coating of an infrared detector. The method may comprise: forming thermal isolation trenches 22 and contact vias 23 in a substrate 20; depositing a bias contact metal 32 into the vias 23 forming biasing contact areas around a periphery of the substrate 20; depositing a first trench filler 24 in the trenches 22 and vias 23; replanarizing; depositing a common electrode layer 25 over the thermal isolation trenches and the biasing contact areas; mechanically thinning the substrate 20 to expose the biasing contact area 32 and the trench filler 24; depositing a contact metal 34 on the backside of the substrate 20, the exposed trench filler 24 and the exposed bias contact area; and etching the contact metal 34 and the trench filler 24 to form pixel mesas of the contact metal 34 and the substrate 20. The thermal isolation trenches 22 and the bias contact vias 23 may be formed by ion milling or laser vaporization. Alternately, the bias contact areas 23 may be formed by performing laser vaporization on the substrate 20 to produce conductive 23 areas within the substrate.
摘要翻译：这是形成与红外检测器的光学涂层的电接触的系统和方法。该方法可以包括：在衬底20中形成热隔离沟槽22和接触通孔23; 将偏置接触金属32沉积到通孔23中，形成围绕基板20的周边的接触区域; 在沟槽22和通孔23中沉积第一沟槽填料24; 补充; 在热隔离沟槽和偏置接触区域上沉积公共电极层25; 机械地使基板20变薄以暴露偏压接触区域32和沟槽填料24; 在衬底20的背面沉积接触金属34，暴露的沟槽填料24和暴露的偏压接触区域; 并蚀刻接触金属34和沟槽填料24以形成接触金属34和衬底20的像素台面。热隔离沟槽22和偏置接触通孔23可以通过离子铣削或激光蒸发形成。或者，可以通过在衬底20上执行激光蒸发以在衬底内产生导电23区域来形成偏置接触区域23。

15. 发明授权

US5587090A Multiple level mask for patterning of ceramic materials 失效
标题翻译：用于陶瓷材料图案化的多层面罩
公开(公告)号：US5587090A
公开(公告)日：1996-12-24
申请号：US222146
申请日：1994-04-04
申请人： James F. Belcher , Steven N. Frank , John P. Long , Jeanee Jones
发明人： James F. Belcher , Steven N. Frank , John P. Long , Jeanee Jones
IPC分类号： G01J1/02 , B32B18/00 , C04B41/53 , C04B41/91 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L27/14 , H01L27/146 , H01L37/02 , B44C1/22 , C03C15/00
CPC分类号： C04B41/009 , C04B41/5338 , C04B41/91 , H01L27/1465 , H01L37/02 , C04B2111/00844 , Y10S438/951
摘要： A novel multiple level mask (e.g. tri-level mask 36) process for masking achieves a desired thick mask with substantially vertical walls and thus improves the ion milling process of ceramic materials (e.g. BST). An embodiment of the present invention is a microelectronic structure comprising a ceramic substrate, an ion mill mask layer (e.g. photoresist 42) overlaying the substrate, a dry-etch-selective mask layer (e.g. TiW 40) overlaying the ion mill mask layer, the dry-etch-selective mask layer comprising a different material than the ion mill mask layer, a top photosensitive layer (38) overlaying the dry-etch-selective mask layer, the top photosensitive layer comprising a different material than the dry-etch-selective mask layer, and a predetermined pattern formed in the top photosensitive layer, the dry-etch-selective mask layer and the ion mill mask layer. The predetermined pattern has substantially vertical walls in the ion mill mask layer.
摘要翻译：用于掩蔽的新型多层掩模（例如三层掩模36）工艺实现了具有基本垂直壁的期望的厚掩模，因此改进了陶瓷材料（例如BST）的离子研磨过程。本发明的实施例是一种微电子结构，其包括陶瓷衬底，覆盖衬底的离子磨掩模层（例如光致抗蚀剂42），覆盖离子磨掩模层的干蚀刻选择性掩模层（例如TiW 40），干蚀刻选择性掩模层，其包括与离子磨掩模层不同的材料，覆盖干蚀刻选择性掩模层的顶部光敏层（38），顶部光敏层包含与干蚀刻选择性不同的材料掩模层和形成在顶部感光层中的预定图案，干蚀刻选择性掩模层和离子磨掩模层。该预定图案在离子磨掩模层中具有基本垂直的壁。

16. 发明授权

US4807004A Tin oxide CCD imager 失效
标题翻译：氧化锡CCD成像仪
公开(公告)号：US4807004A
公开(公告)日：1989-02-21
申请号：US935664
申请日：1986-11-26
申请人： Chang-Feng Wan , Yingsheng Tung , Steven N. Frank
发明人： Chang-Feng Wan , Yingsheng Tung , Steven N. Frank
IPC分类号： H01L29/423 , H01L29/768 , H01L31/18 , H01L29/78
CPC分类号： H01L29/76883 , H01L29/42396 , H01L31/1884 , Y02E10/50
摘要： A novel process for fabricating a CCD imager arrray (10) having a tin oxide electrode monolayer (18) is disclosed. The process includes a low pressure chemical vapor deposition step using tetramethyltin and oxygen, and an ion implantation step that increased conductivity of the tin oxide electrodes to as high as 700 ohm.sup.-1 cm.sup.-1.
摘要翻译：公开了一种用于制造具有氧化锡电极单层（18）的CCD成像器装置（10）的新颖方法。该方法包括使用四甲基锡和氧气的低压化学气相沉积步骤，以及将氧化锡电极的导电率提高到高达700欧姆 - 1厘米-1的离子注入步骤。

17. 发明授权

US4229490A Novel method for catalyst application to a substrate for fuel cell electrodes 失效
标题翻译：催化剂应用于燃料电池电极基板的新方法
公开(公告)号：US4229490A
公开(公告)日：1980-10-21
申请号：US938748
申请日：1978-09-01
申请人： Steven N. Frank , James G. Frank
发明人： Steven N. Frank , James G. Frank
IPC分类号： H01M4/88 , H01M4/96 , B05D5/12
CPC分类号： H01M4/8807 , H01M4/8668 , H01M4/8673 , H01M4/8821 , H01M4/8835 , H01M4/8885 , H01M4/8896 , H01M8/0234 , Y02P70/56
摘要： An improved method of making a fuel cell electrode wherein a thin carbonized paper-like substrate is first impregnated with an electrolyte-repelling material, and thereafter a thin layer of catalyst material is screen printed thereupon.
摘要翻译：制造燃料电池电极的改进方法，其中首先用电解液排斥材料浸渍薄碳化纸状基材，然后在其上丝网印刷催化剂材料薄层。

18. 发明授权

US4218519A Configuration for a gas redox fuel cell employing an ion exchange membrane 失效
标题翻译：使用离子交换膜的气体氧化还原燃料电池的配置
公开(公告)号：US4218519A
公开(公告)日：1980-08-19
申请号：US938749
申请日：1978-09-01
申请人： Steven N. Frank
发明人： Steven N. Frank
IPC分类号： H01M8/04 , H01M8/20 , H01M8/22
CPC分类号： H01M8/22 , H01M8/04 , H01M8/20 , Y02E60/528
摘要： An improved fuel cell having an inter-electrode electrolyte chamber and wherein provision is made for periodically or continuously extracting impure electrolyte from the chamber and replacing it with relatively pure electrolyte.
摘要翻译：一种改进的燃料电池，其具有电极间电解质室，并且其中提供用于周期性地或连续地从室中提取不纯的电解质并用相对纯的电解质代替它。

19. 发明授权

US4264686A Graphite felt flowthrough electrode for fuel cell use 失效
标题翻译：用于燃料电池用途的石墨毡流通电极
公开(公告)号：US4264686A
公开(公告)日：1981-04-28
申请号：US82445
申请日：1979-10-09
申请人： Steven N. Frank
发明人： Steven N. Frank
IPC分类号： H01M4/86 , H01M4/96
CPC分类号： H01M4/86 , H01M4/96
摘要： An improved fuel cell electrode comprising a graphite felt substrate having a thin vapor deposited graphite film coating the exterior fiber surfaces and a perforated metallic backing plate having one surface coated with a noble material such as platinum.
摘要翻译：一种改进的燃料电池电极，其包括具有涂覆外部纤维表面的薄气相沉积石墨膜的石墨毡基材和具有涂覆有贵金属如铂的一个表面的穿孔金属背板。

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