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11. 发明授权

US06937915B1 Apparatus and methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control 失效
标题翻译：用于检测化学机械抛光中晶片表面特性的过渡状态和控制的装置和方法
公开(公告)号：US06937915B1
公开(公告)日：2005-08-30
申请号：US10113151
申请日：2002-03-28
申请人： Rodney Kistler , David J. Hemker , Yehiel Gotkis , Aleksander Owczarz , Bruno Morel , Damon V. Williams
发明人： Rodney Kistler , David J. Hemker , Yehiel Gotkis , Aleksander Owczarz , Bruno Morel , Damon V. Williams
IPC分类号： B24B37/005 , B24B49/02 , B24B49/10 , B24B49/14 , H01L21/304 , H01L21/66 , G06F19/00
CPC分类号： B24B37/005 , B24B49/10 , B24B49/14
摘要： In chemical mechanical polishing apparatus, a wafer carrier plate is provided with a cavity for reception of a sensor positioned very close to a wafer to be polished. Energy resulting from contact between a polishing pad and an exposed surface of the wafer is transmitted only a very short distance to the sensor and is sensed by the sensor, providing data as to the nature of properties of the exposed surface of the wafer, and of transitions of those properties. Correlation methods provide graphs relating sensed energy to the surface properties, and to the transitions. The correlation graphs provide process status data for process control.
摘要翻译：在化学机械抛光装置中，晶片承载板设置有用于接收位于非常接近待抛光晶片的传感器的空腔。由抛光垫与晶片的暴露表面之间的接触所产生的能量仅传播到传感器非常短的距离，并由传感器感测，提供关于晶片的暴露表面的性质的数据以及这些属性的转换。相关方法提供了将感测能量与表面性质和转变相关联的图。相关图提供过程控制的过程状态数据。

12. 发明授权

US06433484B1 Wafer area pressure control 有权
标题翻译：晶圆面积压力控制
公开(公告)号：US06433484B1
公开(公告)日：2002-08-13
申请号：US09637736
申请日：2000-08-11
申请人： Fangli Hao , Eric Lenz , Bruno Morel
发明人： Fangli Hao , Eric Lenz , Bruno Morel
IPC分类号： H01G724
CPC分类号： H01J37/32449 , H01J37/32623
摘要： A plasma processing chamber is provided which provides improved wafer area pressure control. The plasma processing chamber is a vacuum chamber with a device connected for generating and sustaining a plasma. Part of this device would be an etchant gas source and an exhaust port. A confinement ring defines an area above a wafer. The wafer area pressure is dependent on the pressure drop across the confinement ring. The confinement ring is part of a confinement device that provides wafer area pressure control greater than 40%. Such a confinement device may be a fixed vertical restriction ring in addition to the confinement ring, where the confinement ring is adjustable. In the alternative, three adjustable confinement rings may be used to provide the desired wafer area pressure control.
摘要翻译：提供等离子体处理室，其提供改进的晶片面积压力控制。等离子体处理室是具有连接用于产生和维持等离子体的装置的真空室。该装置的一部分将是蚀刻剂气源和排气口。限制环限定晶片上方的区域。晶片面积压力取决于限制环上的压降。限制环是限制装置的一部分，其提供超过40％的晶片面积压力控制。除了限制环之外，这种限制装置可以是固定的垂直限制环，其中限制环是可调节的。在替代方案中，可以使用三个可调约束环来提供期望的晶片面积压力控制。

13. 发明申请

US20070174215A1 POSTAGE METER HAVING A VERTICAL PATH 失效
标题翻译：具有垂直路径的邮资表
公开(公告)号：US20070174215A1
公开(公告)日：2007-07-26
申请号：US11625488
申请日：2007-01-22
申请人： Bruno Morel
发明人： Bruno Morel
IPC分类号： G06F17/00
CPC分类号： B41J13/12 , B41J13/14 , B41J13/28 , G07B17/00508
摘要： In a postage meter including a print module for printing on mail items, a feed tray for feeding in mail items to said print module, and a collection tray for receiving the mail items once they have been franked by the print module, said feed tray is inclined in two directions so that the mail items disposed on said tray are brought by gravity against a retractable jogging flap into the same determined position at which said print module affixes a postal imprint.
摘要翻译：一种包括用于在邮件上打印的打印模块的邮资计费器，用于将邮件物品馈送到所述打印模块的进纸盘，以及一旦收到托盘已经被打印模块盖印，则收集托盘，所述进纸盘是倾斜在两个方向上，使得布置在所述托盘上的邮件通过重力与可伸缩的点动挡板一起被带入相同的确定位置，在该位置上，所述打印模块贴上邮政印记。

14. 发明授权

US06490536B1 Integrated load simulator 失效
标题翻译：集成负载模拟器
公开(公告)号：US06490536B1
公开(公告)日：2002-12-03
申请号：US09661860
申请日：2000-09-14
申请人： Albert R. Ellingboe , Bruno Morel
发明人： Albert R. Ellingboe , Bruno Morel
IPC分类号： C23C1650
CPC分类号： H01J37/32174
摘要： A load simulator and switch are connected to a power source of a plasma processing device. The switch allows the load simulator to be electrically connected to the power source to allow testing of the power source. The switch and load simulator allow the testing of the power source without mechanically removing the power source from the plasma processing device. In addition, the switch allows the connection of the load simulator to the power source while the power source is on, avoiding the requirement of turning off the power source before connecting the load simulator.
摘要翻译：负载模拟器和开关连接到等离子体处理装置的电源。该开关允许负载模拟器电连接到电源以允许测试电源。开关和负载模拟器允许对电源进行测试，而无需从等离子体处理装置机械地移除电源。此外，该开关允许在电源打开时将负载模拟器连接到电源，避免在连接负载模拟器之前关闭电源的要求。

15. 发明授权

US07672907B2 Postage meter having a vertical path 失效
标题翻译：邮资计有垂直路径
公开(公告)号：US07672907B2
公开(公告)日：2010-03-02
申请号：US11625488
申请日：2007-01-22
申请人： Bruno Morel
发明人： Bruno Morel
IPC分类号： G06F17/00
CPC分类号： B41J13/12 , B41J13/14 , B41J13/28 , G07B17/00508
摘要： In a postage meter including a print module for printing on mail items, a feed tray for feeding in mail items to said print module, and a collection tray for receiving the mail items once they have been franked by the print module, said feed tray is inclined in two directions so that the mail items disposed on said tray are brought by gravity against a retractable jogging flap into the same determined position at which said print module affixes a postal imprint.
摘要翻译：一种包括用于在邮件上打印的打印模块的邮资计费器，用于将邮件物品馈送到所述打印模块的进纸盘，以及一旦收到托盘已经被打印模块盖印，则收集托盘，所述进纸盒是倾斜在两个方向上，使得布置在所述托盘上的邮件通过重力与可伸缩的点动挡板一起被带入相同的确定位置，在该位置上，所述打印模块贴上邮政印记。

16. 发明申请

US20050054268A1 Methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control 失效
公开(公告)号：US20050054268A1
公开(公告)日：2005-03-10
申请号：US10966744
申请日：2004-10-14
申请人： Rodney Kistler , David Hemker , Yehiel Gotkis , Aleksander Owczarz , Bruno Morel , Damon Williams
发明人： Rodney Kistler , David Hemker , Yehiel Gotkis , Aleksander Owczarz , Bruno Morel , Damon Williams
IPC分类号： B24B37/005 , B24B49/02 , B24B49/10 , B24B49/14 , H01L21/304 , H01L21/66 , G06F19/00
CPC分类号： B24B37/005 , B24B49/10 , B24B49/14
摘要： In chemical mechanical polishing, a wafer carrier plate is provided with a cavity for reception of a sensor positioned very close to a wafer to be polished. Energy resulting from contact between a polishing pad and an exposed surface of the wafer is transmitted only a very short distance to the sensor and is sensed by the sensor, providing data as to the nature of properties of the exposed surface of the wafer, and of transitions of those properties. Correlation methods provide graphs relating sensed energy to the surface properties, and to the transitions. The correlation graphs provide process status data for process control.

17. 发明授权

US06925348B2 Methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control 失效
标题翻译：用于检测化学机械抛光中晶片表面特性的过程状态和控制的方法
公开(公告)号：US06925348B2
公开(公告)日：2005-08-02
申请号：US10966744
申请日：2004-10-14
申请人： Rodney Kistler , David J. Hemker , Yehiel Gotkis , Aleksander Owczarz , Bruno Morel , Damon V. Williams
发明人： Rodney Kistler , David J. Hemker , Yehiel Gotkis , Aleksander Owczarz , Bruno Morel , Damon V. Williams
IPC分类号： B24B37/005 , B24B49/02 , B24B49/10 , B24B49/14 , H01L21/304 , H01L21/66 , G06F19/00
CPC分类号： B24B37/005 , B24B49/10 , B24B49/14
摘要： In chemical mechanical polishing, a wafer carrier plate is provided with a cavity for reception of a sensor positioned very close to a wafer to be polished. Energy resulting from contact between a polishing pad and an exposed surface of the wafer is transmitted only a very short distance to the sensor and is sensed by the sensor, providing data as to the nature of properties of the exposed surface of the wafer, and of transitions of those properties. Correlation methods provide graphs relating sensed energy to the surface properties, and to the transitions. The correlation graphs provide process status data for process control.
摘要翻译：在化学机械抛光中，晶片承载板设置有用于接收位于非常接近待抛光晶片的传感器的空腔。由抛光垫与晶片的暴露表面之间的接触所产生的能量仅传播到传感器非常短的距离，并由传感器感测，提供关于晶片的暴露表面的性质的数据以及这些属性的转换。相关方法提供了将感测能量与表面性质和转变相关联的图。相关图提供过程控制的过程状态数据。

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