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    • 13. 发明专利
    • Maskless exposure method
    • MASKLESS曝光方法
    • JP2009244831A
    • 2009-10-22
    • JP2008203766
    • 2008-08-07
    • Hitachi Displays Ltd株式会社 日立ディスプレイズ
    • MATSUURA HIROYASUISHIKAWA SEIJIWACHI TADAMICHIISHIGAKI TOSHIMASA
    • G03F9/00H01L21/027
    • G03F7/70791G03F7/70433
    • PROBLEM TO BE SOLVED: To provide a maskless exposure method, capable of accurately monitoring drawing by an exposing device without disturbing a flow of production, extracting calibration data from data thereof, and feeding back it to the exposing device. SOLUTION: A maskless exposure method includes: scanning, by the projection optical system, the substrate in a first direction; shifting a scanning region in a second direction; scanning the substrate in the first direction so that an overlapping part is formed. A plurality of marks different from the circuit pattern are exposed in a vicinity of the overlapping part. The plurality of marks are a set of marks at least including two marks disposed on one side of the overlapping part and two marks disposed on another side of the overlapping part. Deviations between the pair of the scanning regions, an inclination of exposing light, and a yawing angle of a stage are analyzed by measuring deviations of distances among the plurality of marks. Calibration data are obtained from a result of the analyzing. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种无掩模曝光方法,能够通过曝光装置精确地监视绘制而不干扰生产流程,从其数据中提取校准数据,并将其反馈给曝光装置。 解决方案:无掩模曝光方法包括:通过投影光学系统沿第一方向扫描基板; 沿第二方向移动扫描区域; 在第一方向扫描基板,从而形成重叠部分。 与电路图案不同的多个标记在重叠部分附近露出。 多个标记是至少包括设置在重叠部分的一侧上的两个标记和设置在重叠部分的另一侧上的两个标记的一组标记。 通过测量多个标记之间的距离的偏差来分析一对扫描区域之间的偏差,曝光的倾斜度和舞台的偏航角度。 校准数据是从分析结果中获得的。 版权所有(C)2010,JPO&INPIT
    • 14. 发明专利
    • Vapor deposition method and apparatus
    • 蒸气沉积方法和装置
    • JP2009019243A
    • 2009-01-29
    • JP2007183242
    • 2007-07-12
    • Hitachi Displays Ltd株式会社 日立ディスプレイズ
    • MATSUURA HIROYASU
    • C23C14/04C23C14/50C23C14/54H01L51/50H05B33/10
    • C23C14/042C23C14/541C23C14/56H01L51/001H01L51/56
    • PROBLEM TO BE SOLVED: To provide a vacuum deposition method and a vapor deposition apparatus which cause little deposition misalignment even at continuous production, yield a good film thickness distribution within a pixel and cause little waste of materials. SOLUTION: The vacuum deposition method comprises a step of fixing an evaporation source unit 100 inside a vacuum chamber 1; and, while moving a substrate 4 across vapor 3 from an evaporation source, depositing the vapor 3 from the evaporation source onto prescribed points of the substrate 4. The vacuum deposition apparatus has a deposition mask 5 placed on the substrate 4 at the side of the evaporation source unit 100, a means for moving a mask frame 7 by a plurality of rollers 13 inside a vacuum chamber 1 and a cooling plate 11 installed in the path of the mask frame 7, provided that the cooling plate 11 has a cooling means installed close to but out of contact with a surface of the mask frame 7 on the side of the evaporation source unit 100. The cooling plate 11 has apertures 60 formed locally near the evaporation source unit 100. The vapor 3 generated by the evaporation source 2 is sprayed onto the deposition mask 5 and the substrate 4 through an aperture 70 of a cooling plate 14 of the evaporation source unit 100. COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:为了提供即使在连续生产时也几乎没有沉积不对准的真空沉积方法和蒸镀装置,在像素内产生良好的膜厚分布并且几乎不会浪费材料。 解决方案:真空沉积方法包括将蒸发源单元100固定在真空室1内的步骤; 并且,在从蒸镀源蒸镀3的状态下移动基板4的同时,将来自蒸发源的蒸气3从基板4的规定点投入。真空蒸镀装置在基板4的侧面 蒸发源单元100,用于通过安装在面罩框架7的路径中的真空室1内的多个辊13和安装在面罩框架7的路径中的冷却板11移动面罩框架7的装置,只要冷却板11具有安装的冷却装置 靠近蒸发源单元100一侧而与掩模框7的表面接近但不接触。冷却板11具有在蒸发源单元100附近局部形成的孔60.由蒸发源2产生的蒸气3是 通过蒸发源单元100的冷却板14的孔70喷涂到沉积掩模5和基板4上。(C)2009,JPO&INPIT
    • 16. 发明专利
    • Vapor deposition pot, thin-film forming apparatus provided therewith and method for producing display device
    • 蒸气沉积罐,提供的薄膜成型装置及其制造方法
    • JP2007186787A
    • 2007-07-26
    • JP2006331317
    • 2006-12-08
    • Hitachi Displays Ltd株式会社 日立ディスプレイズ
    • MATSUURA HIROYASUTAKASU KEIJI
    • C23C14/24H01L51/50H05B33/10
    • PROBLEM TO BE SOLVED: To provide a pot structure where stable vapor deposition can be continued by a simple constitution, and maintenance after the completion of the vapor deposition can be easily performed, and to provide a vapor deposition method. SOLUTION: The vapor deposition pot is equipped with: an evaporation chamber formed of the part to be packed with a material and an orifice plate for controlling the vapor pressure of the material by evaporation; and a pressure-controlling chamber formed in a space between the orifice plate and a discharge plate of discharging the evaporated material to the outside of the vapor deposition pot. The second opening part is formed at the upper edge in a projection projecting to the outside of the pressure-controlling chamber above the discharge plate; heaters are confronted at the side faces of the projection part, and a thermal insulation mechanism can be provided at the upper part of the heaters and also at a position lower than the second opening part. Further, the vapor deposition pot is provided with heaters for the evaporation chamber and heaters for the pressure-controlling chamber in which temperature can be set mutually independently so as to hold the temperature of the pressure-controlling chamber to the one higher than that of the evaporation chamber. COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了提供通过简单的结构可以继续进行稳定气相沉积的锅结构,并且可以容易地进行气相沉积完成后的维护,并提供气相沉积方法。 气相沉积罐配备有:由待填充的部件形成的蒸发室和用于通过蒸发控制材料的蒸气压的孔板; 以及形成在孔板和排出板之间的空间中的压力控制室,其将蒸发的材料排出到蒸镀罐的外部。 第二开口部形成在突出于放电板上方的压力控制室外侧的突起的上边缘处; 加热器在突出部分的侧面处面对,并且可以在加热器的上部以及比第二开口部分低的位置设置绝热机构。 此外,气相沉积罐设置有用于蒸发室的加热器和用于压力控制室的加热器,其中可以相互独立地设置温度,以便将压力控制室的温度保持在高于 蒸发室。 版权所有(C)2007,JPO&INPIT