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11. 发明授权

US08035668B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08035668B2
公开(公告)日：2011-10-11
申请号：US11336754
申请日：2006-01-19
申请人： Mitsuro Sugita , Kazuaki Ohmi , Takao Yonehara , Toshihiko Tsuji , Takaaki Terashi , Tohru Kohda , Shinji Tsutsui
发明人： Mitsuro Sugita , Kazuaki Ohmi , Takao Yonehara , Toshihiko Tsuji , Takaaki Terashi , Tohru Kohda , Shinji Tsutsui
IPC分类号： G03G13/04
CPC分类号： G03F7/70275
摘要： An exposure apparatus which forms a pattern on an object. The apparatus includes an exposure head structure in which a plurality of elemental exposure units are arrayed, each elemental exposure unit including (i) at least one light source for emitting exposure light and (ii) an optical element which forms an image of the at least one light source on the object, for exposing the object. Positions of the images of the at least one light source in a direction perpendicular to a surface of the object include plural positions different from each other. A sensor detects a position of the surface of the object and produces a detection result. A controller receives the detection result and controls the exposure head structure such that a pattern is formed on the object by the exposure is selected to expose the object based on the detection result by the sensor.
摘要翻译：在物体上形成图案的曝光装置。该装置包括其中排列多个元素曝光单元的曝光头结构，每个元素曝光单元包括：（i）至少一个用于发射曝光光的光源;以及（ii）至少形成至少一个图像的光学元件对象上的一个光源，用于暴露对象。至少一个光源的图像在垂直于物体表面的方向上的位置包括彼此不同的多个位置。传感器检测物体表面的位置并产生检测结果。控制器接收检测结果并控制曝光头结构，使得通过曝光在物体上形成图案被选择以基于传感器的检测结果来曝光物体。

12. 发明授权

US07789466B2 Chair-type massage machine 失效
标题翻译：椅式按摩机
公开(公告)号：US07789466B2
公开(公告)日：2010-09-07
申请号：US11984910
申请日：2007-11-26
申请人： Yuki Yoda , Koji Terada , Shinji Tsutsui , Nobuyuki Nishitani , Yoshimi Takahashi , Taichi Hamatsuka
发明人： Yuki Yoda , Koji Terada , Shinji Tsutsui , Nobuyuki Nishitani , Yoshimi Takahashi , Taichi Hamatsuka
IPC分类号： A47C7/50
CPC分类号： A47C1/034
摘要： A chair-type massage machine includes a seat on which a user sits; a leg rest whose one end portion is pivotally connected with a front portion of the seat for pivotal movement up and down, the leg rest supporting calves of the user; a driving unit for pivotally moving the leg rest with respect to the seat; a footrest pivotally connected with the other end portion of the leg rest for pivotal movement up and down, the footrest supporting feet of the user; and a massage means provided to at least one of the leg rest and the footrest. Also, a stopper unit is provided for restricting a pivotal movement range of the footrest with respect to the leg rest, and a biasing unit is disposed for applying a biasing force to the footrest in either an upward or downward a direction of the pivotal movement.
摘要翻译：椅式按摩机包括用户所在的座位; 腿部支撑部，其一端部与座椅的前部可枢转地连接，用于上下枢转运动;腿部支撑用户的小腿; 驱动单元，用于相对于座椅枢转地移动腿托; 与所述腿部支架的另一端部枢转地连接的脚踏板，用于上下摆动地移动，所述脚踏支撑脚的使用者; 以及提供给至少一个腿托和脚踏板的按摩装置。另外，设置有用于限制脚踏板相对于脚托的枢转运动范围的止动单元，并且设置有偏置单元，用于在枢转运动的向上或向下的方向上向搁脚板施加偏置力。

13. 发明授权

US07381194B2 Massage chair 有权
标题翻译：按摩椅
公开(公告)号：US07381194B2
公开(公告)日：2008-06-03
申请号：US11014033
申请日：2004-12-17
申请人： Yuki Yoda , Daisuke Tsukada , Shinji Tsutsui , Takayoshi Tanizawa , Masamichi Miyaguchi , Junji Nakamura , Yousuke Kurata , Motoharu Muto , Takeo Iljima
发明人： Yuki Yoda , Daisuke Tsukada , Shinji Tsutsui , Takayoshi Tanizawa , Masamichi Miyaguchi , Junji Nakamura , Yousuke Kurata , Motoharu Muto , Takeo Iljima
IPC分类号： A61H7/00 , A61H19/00
CPC分类号： A61H23/04 , A61H9/0071 , A61H39/04 , A61H2201/0134 , A61H2201/0149 , A61H2201/1635 , A61H2205/06 , A61H2205/065
摘要： A massage chair has a seating surface, a backrest and armrests at the opposite left and right sides. A covering member vertically displaceable to be opened and closed is provided on the upper surface of an armrest main body of each armrest. A massaging device is provided on at least either one of the lower surface of each covering member and the upper surface of the corresponding armrest main body. The massaging devices are driven with hands and arms tightly held between the lower surfaces of the covering members and the upper surfaces of the armrest main bodies, and the upper surfaces of the covering member serve as arm resting surfaces with the covering members closed and the massaging means not driven. There can be provided a massage chair whose arm resting positions are not restricted when the massage chair is not used to massage the hands and arms.
摘要翻译：按摩椅在相对的左侧和右侧具有座位表面，靠背和扶手。在每个扶手的扶手主体的上表面上设置有可垂直移动以打开和关闭的覆盖构件。每个覆盖构件的下表面和相应的扶手主体的上表面中的至少一个设置有按摩装置。按摩装置由手和手臂紧紧地保持在覆盖构件的下表面和扶手主体的上表面之间驱动，并且覆盖构件的上表面用作手臂搁置表面，覆盖构件封闭并按摩意思是没有驱动。可以提供一种按摩椅，当按摩椅不用于按摩手和手臂时，其扶手位置不受限制。

14. 发明申请

US20060158504A1 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20060158504A1
公开(公告)日：2006-07-20
申请号：US11336754
申请日：2006-01-19
申请人： Mitsuro Sugita , Kazuaki Ohmi , Takao Yonehara , Toshihiko Tsuji , Takaaki Terashi , Tohru Kohda , Shinji Tsutsui
发明人： Mitsuro Sugita , Kazuaki Ohmi , Takao Yonehara , Toshihiko Tsuji , Takaaki Terashi , Tohru Kohda , Shinji Tsutsui
IPC分类号： B41J2/385
CPC分类号： G03F7/70275
摘要： An exposure apparatus which forms a pattern on an object includes an exposure head structure in which a plurality of elemental exposure units each including at least one light source and an optical element which forms an image of the light source on the object are arrayed, a sensor which detects the surface position of the object, and a controller which controls exposure by the exposure head structure based on the detection result by the sensor. The controller forms a pattern on the object while selectively operating one of the plurality of elemental exposure units, which satisfies a predetermined condition.
摘要翻译：在物体上形成图案的曝光装置包括曝光头结构，其中排列有多个元件曝光单元，每个元素曝光单元包括至少一个光源和形成物体上光源的图像的光学元件，传感器其检测物体的表面位置，以及控制器，其基于传感器的检测结果来控制曝光头结构的曝光。控制器在选择性地操作满足预定条件的多个元素曝光单元中的一个的同时，在物体上形成图案。

15. 发明申请

US20050146176A1 Massage chair 有权
标题翻译：按摩椅
公开(公告)号：US20050146176A1
公开(公告)日：2005-07-07
申请号：US11014033
申请日：2004-12-17
申请人： Yuki Yoda , Daisuke Tsukada , Shinji Tsutsui , Takayoshi Tanizawa , Masamichi Miyaguchi , Junji Nakamura , Yousuke Kurata , Motoharu Muto , Takeo IIjima
发明人： Yuki Yoda , Daisuke Tsukada , Shinji Tsutsui , Takayoshi Tanizawa , Masamichi Miyaguchi , Junji Nakamura , Yousuke Kurata , Motoharu Muto , Takeo IIjima
IPC分类号： A61H1/00 , A61H9/00 , A61H23/04 , A61H39/04 , A47C7/62
CPC分类号： A61H23/04 , A61H9/0071 , A61H39/04 , A61H2201/0134 , A61H2201/0149 , A61H2201/1635 , A61H2205/06 , A61H2205/065
摘要： A massage chair has a seating surface, a backrest and armrests at the opposite left and right sides. A covering member vertically displaceable to be opened and closed is provided on the upper surface of an armrest main body of each armrest. A massaging device is provided on at least either one of the lower surface of each covering member and the upper surface of the corresponding armrest main body. The massaging devices are driven with hands and arms tightly held between the lower surfaces of the covering members and the upper surfaces of the armrest main bodies, and the upper surfaces of the covering member serve as arm resting surfaces with the covering members closed and the massaging means not driven. There can be provided a massage chair whose arm resting positions are not restricted when the massage chair is not used to massage the hands and arms.
摘要翻译：按摩椅在相对的左侧和右侧具有座位表面，靠背和扶手。在每个扶手的扶手主体的上表面上设置有可垂直移动以打开和关闭的覆盖构件。每个覆盖构件的下表面和相应的扶手主体的上表面中的至少一个设置有按摩装置。按摩装置由手和手臂紧紧地保持在覆盖构件的下表面和扶手主体的上表面之间驱动，并且覆盖构件的上表面用作手臂搁置表面，覆盖构件封闭并按摩意思是没有驱动。可以提供一种按摩椅，当按摩椅不用于按摩手和手臂时，其扶手位置不受限制。

16. 发明申请

US20080122283A1 Chair-type massage machine 失效
标题翻译：椅式按摩机
公开(公告)号：US20080122283A1
公开(公告)日：2008-05-29
申请号：US11984910
申请日：2007-11-26
申请人： Yuki Yoda , Koji Terada , Shinji Tsutsui , Nobuyuki Nishitani , Yoshimi Takahashi , Taichi Hamatsuka
发明人： Yuki Yoda , Koji Terada , Shinji Tsutsui , Nobuyuki Nishitani , Yoshimi Takahashi , Taichi Hamatsuka
IPC分类号： A47C7/50
CPC分类号： A47C1/034
摘要： A chair-type massage machine includes a seat on which a user sits; a leg rest whose one end portion is pivotally connected with a front portion of the seat for pivotal movement up and down, the leg rest supporting calves of the user; a driving unit for pivotally moving the leg rest with respect to the seat; a footrest pivotally connected with the other end portion of the leg rest for pivotal movement up and down, the footrest supporting feet of the user; and a massage means provided to at least one of the leg rest and the footrest. Also, a stopper unit is provided for restricting a pivotal movement range of the footrest with respect to the leg rest, and a biasing unit is disposed for applying a biasing force to the footrest in either an upward or downward a direction of the pivotal movement.
摘要翻译：椅式按摩机包括用户所在的座位; 腿部支撑部，其一端部与座椅的前部可枢转地连接，用于上下枢转运动;腿部支撑用户的小腿; 驱动单元，用于相对于座椅枢转地移动腿托; 与所述腿部支架的另一端部枢转地连接的脚踏板，用于上下摆动地移动，所述脚踏支撑脚的使用者; 以及提供给至少一个腿托和脚踏板的按摩装置。另外，设置有用于限制脚踏板相对于脚托的枢转运动范围的止动单元，并且设置有偏置单元，用于在枢转运动的向上或向下的方向上向搁脚板施加偏置力。

17. 发明申请

US20060241536A1 Chair-type massage machine 审中-公开
标题翻译：椅式按摩机
公开(公告)号：US20060241536A1
公开(公告)日：2006-10-26
申请号：US10559412
申请日：2004-05-26
申请人： Yuki Yoda , Koji Terada , Shinji Tsutsui
发明人： Yuki Yoda , Koji Terada , Shinji Tsutsui
IPC分类号： A61H7/00
CPC分类号： A61H7/00 , A61H2201/0149 , A61H2205/10
摘要： A leg rest 5 is pivotally secured to a front portion of a seat 2 of a chair 1 for pivotal movement up and down and operable to support calves of a seat occupant sitting on the seat 1, and a footrest 6 is pivotally secured to a front end of the leg rest 5 for supporting feet of the seat occupant sitting on the seat 2 ranging from ankles to toes and soles. The leg rest 5 and the footrest 6 are provided with respective massaging means 7 and 8 incorporated therein. Also, the leg rest 5 is provided with the distance thereof relative to the seat 2 being adjustable, and the footrest 6 is maintained substantially horizontally at all times regardless of the angle and the position of the leg rest 5.
摘要翻译：腿部支架5枢转地固定到椅子1的座椅2的前部，用于上下枢转运动，并且可操作以支撑坐在座椅1上的座椅乘员的小腿，并且脚踏板6枢转地固定到前部腿座5的末端用于支撑坐在座位2上的脚踝的脚，从脚踝到脚趾和鞋底。腿部支架5和搁脚板6设置有并入其中的相应的按摩装置7和8。此外，腿部支架5设置成相对于座椅2的距离是可调整的，并且搁脚板6始终保持基本水平，而与支腿5的角度和位置无关。

18. 发明申请

US20050234371A1 Massage machine 失效
标题翻译：按摩机
公开(公告)号：US20050234371A1
公开(公告)日：2005-10-20
申请号：US11084141
申请日：2005-03-21
申请人： Yousuke Kurata , Yuki Yoda , Shinji Tsutsui , Masamichi Miyaguchi , Takeo Iijima , Daisuke Tsukada , Takayoshi Tanizawa , Junji Nakamura , Motoharu Muto
发明人： Yousuke Kurata , Yuki Yoda , Shinji Tsutsui , Masamichi Miyaguchi , Takeo Iijima , Daisuke Tsukada , Takayoshi Tanizawa , Junji Nakamura , Motoharu Muto
IPC分类号： A47C7/50 , A61H1/00 , A61H1/02 , A61H23/04 , A61H9/00
CPC分类号： A61H1/0266 , A61H2201/0134 , A61H2201/0142 , A61H2201/0149 , A61H2201/1609 , A61H2201/1614 , A61H2201/1623 , A61H2201/164 , A61H2201/5007
摘要： This massage machine comprises a seat 20, a leg-rest 50, a footrest 60, an electric extendable mechanism 80, a link mechanism 70, and a controller. The footrest is movably linked to a lower end of the leg-rest to be movable relative to the leg-rest, and is provided with air bags 63 configured to restrain a foot of the user. The electric extendable mechanism and the link mechanism are configured to move the footrest relative to the leg-rest. The controller gives the user a leg stretching mode, and in the leg stretching mode, the controller controls the electric extendable mechanism and the air bags such that the electric extendable mechanism moves the footrest relative to the leg-rest while the air bags restrains the foot of the user.
摘要翻译：该按摩机包括座椅20，脚凳50，搁脚板60，电动伸缩机构80，连杆机构70和控制器。搁脚板可移动地连接到腿部的下端以相对于腿部支架可移动，并且设置有被配置为限制使用者的脚部的气囊63。电动可伸缩机构和连杆机构构造成相对于腿部支架移动搁脚板。控制器为用户提供腿部拉伸模式，并且在腿部拉伸模式中，控制器控制电动伸缩机构和气囊，使得电动伸缩机构相对于腿部支架移动脚踏板，同时气囊限制脚部的用户。

19. 发明授权

US5850291A Projection exposure apparatus and method for controlling a stage on the basis of a value corrected by ABBE error 失效
标题翻译：基于由ABBE错误校正的值来控制舞台的投影曝光装置和方法
公开(公告)号：US5850291A
公开(公告)日：1998-12-15
申请号：US823679
申请日：1997-03-25
申请人： Shinji Tsutsui
发明人： Shinji Tsutsui
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G01B11/00 , G01B9/02
CPC分类号： G03F7/70358 , G03F7/70716 , G03F9/70
摘要： An exposure method and apparatus for transferring a pattern of a mask onto a substrate to be exposed, with projection through a projection optical system. The apparatus includes a stage being movable while carrying the substrate thereon, a laser interferometer for measuring a position of the stage, wherein a measurement position of a laser beam of the laser interferometer deviates relative to a focal plane of the projection optical system, with respect to a direction of an optical axis of the projection optical system, a memory for memorizing, with respect to each of different positions of the stage, information related to an Abbe error produced in accordance with the deviation of the focal plane and the measurement position of the laser interferometer, and a controller for controlling the stage on the basis of a corrected value corresponding to a measured value of the laser interferometer as corrected by the Abbe error.
摘要翻译：一种用于通过投影光学系统突出地将掩模图案转印到待曝光的基板上的曝光方法和装置。该装置包括在其上承载基板的同时可移动的台，用于测量台的位置的激光干涉仪，其中激光干涉仪的激光束的测量位置相对于投影光学系统的焦平面偏离，相对于对于投影光学系统的光轴的方向，存储器，用于存储与舞台的不同位置中的每一个相关的与根据焦平面的偏差产生的阿贝误差的信息和测量位置激光干涉仪和用于根据由阿贝误差校正的与激光干涉仪的测量值对应的校正值来控制舞台的控制器。

20. 发明授权

US4924258A Mask holder and a mask conveying and holding mechanism using the same 失效
标题翻译：面罩座和使用其的面罩输送保持机构
公开(公告)号：US4924258A
公开(公告)日：1990-05-08
申请号：US218137
申请日：1988-07-13
申请人： Shinji Tsutsui
发明人： Shinji Tsutsui
IPC分类号： G03F1/00 , G03F1/66 , G03F7/20 , H01L21/027 , H01L21/30 , H01L21/677
CPC分类号： G03F7/707 , G03F7/2002 , G03F7/70716 , G03F7/70741
摘要： A mask holder and a mask conveying and holding mechanism using the same, effectively usable in an exposure apparatus for printing a pattern of a mask or reticle on a workpiece such as a semiconductor wafer or a plate-like member made of glass or cermaics, is disclosed. In one preferred form, the mask holder has three positioning rollers, two spring-biased pressing rollers for pressing two side faces of a mask so that other two side faces of the mask abut against the positioning rollers, and two spring-biased pressing members for pressing an upper face of the mask so that a lower face of the mask abuts against a lower end face of a mask accommodating portion of the holder. With this arrangement, the mask can be held as a unit with the holder during conveyance. Also, the holder and a mask stage of the exposure apparatus may be arranged so that the mask can be held on the stage by vacuum suction.
摘要翻译：使用其的掩模保持器和掩模传送和保持机构可有效地用于在诸如半导体晶片或由玻璃或者皮肤形成的板状构件的工件上印刷掩模或掩模版的图案的曝光装置中，披露在一个优选形式中，掩模保持器具有三个定位辊，两个弹簧偏置的加压辊，用于按压掩模的两个侧面，使得掩模的另外两个侧面抵靠定位辊，以及两个弹簧偏置的按压构件，按压掩模的上表面，使得掩模的下表面抵靠保持器的掩模容纳部分的下端面。通过这种布置，可以在传送过程中将面罩作为一个单元保持。此外，曝光装置的保持器和掩模台可以布置成使得掩模可以通过真空吸力保持在平台上。

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