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11. 发明授权

US08604430B2 Method and an apparatus of an inspection system using an electron beam 有权
标题翻译：使用电子束的检查系统的方法和装置
公开(公告)号：US08604430B2
公开(公告)日：2013-12-10
申请号：US13366874
申请日：2012-02-06
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： The inspection apparatus disclosed generates an electron beam, an acceleration electrode accelerates the electron beam, a convergence lens converges the electron beam, an electron beam deflector scans the beam over a sample, an objective lens converges the electron beam on the sample, a detector located between the sample and the objective lens detects charged particles emitted from the sample, a power supply applies a retarding voltage to the sample for decelerating the electron beam to the sample, an electrode is disposed between the objective lens and the sample, and a voltage is generated between the sample and the electrode by said electrode, the voltage being determined depending on the sample. The apparatus solves problems encountered in conventional inspection systems.
摘要翻译：所公开的检查装置产生电子束，加速电极加速电子束，会聚透镜会聚电子束，电子束偏转器扫描样品上的光束，物镜会将电子束会聚在样品上，检测器位于在样品和物镜之间检测从样品发射的带电粒子，电源向样品施加延迟电压以将电子束减速到样品，电极设置在物镜和样品之间，电压为通过所述电极在样品和电极之间产生，电压根据样品确定。该装置解决了常规检测系统遇到的问题。

12. 发明授权

US07012252B2 Method and an apparatus of an inspection system using an electron beam 失效
公开(公告)号：US07012252B2
公开(公告)日：2006-03-14
申请号：US11108877
申请日：2005-04-19
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.

13. 发明授权

US5608218A Scanning electron microscope 失效
标题翻译：扫描电子显微镜
公开(公告)号：US5608218A
公开(公告)日：1997-03-04
申请号：US359761
申请日：1994-12-20
申请人： Mitsugu Sato , Yoichi Ose , Satoru Fukuhara , Hideo Todokoro , Makoto Ezumi
发明人： Mitsugu Sato , Yoichi Ose , Satoru Fukuhara , Hideo Todokoro , Makoto Ezumi
IPC分类号： H01J37/22 , H01J37/05 , H01J37/244 , H01J37/28
CPC分类号： H01J37/28 , H01J2237/225 , H01J2237/24495 , H01J2237/281
摘要： A scanning electron microscope suitable for producing an image of high resolution by detecting secondary electrons and backscattered electrons generated from a specimen at a low accelerating voltage in a separate or synthesis fashion. In the scanning electron microscope electric and magnetic fields for separating trajectories of backscattered electrons and secondary electrons generated from a specimen are established, and a backscattered electron detector for detecting generated backscattered electrons is disposed on the trajectory of the backscattered electrons. According to the microscope, since secondary electrons and backscattered electrons can be detected efficiently in a separate fashion even at a low accelerating voltage of several kilovolts or less and besides the detector does not exert the deflection action on a primary electron beam, backscattered and secondary electron images of high resolution can be obtained.
摘要翻译：一种扫描电子显微镜，其适用于通过以单独或合成的方式检测由低速加速电压下的样品产生的二次电子和反向散射电子来产生高分辨率的图像。在扫描电子显微镜中，建立用于分离由样品产生的背散射电子和二次电子的轨迹的电场和磁场，并且用于检测产生的反向散射电子的反向散射电子检测器设置在背散射电子的轨迹上。根据显微镜，由于二次电子和后向散射电子可以以几千伏或更小的低加速电压以单独的方式被有效地检测，此外，检测器不会对一次电子束，后向散射和二次电子施加偏转作用可以获得高分辨率的图像。

14. 发明授权

US5162240A Method and apparatus of fabricating electric circuit pattern on thick and thin film hybrid multilayer wiring substrate 失效
标题翻译：在厚膜和薄膜混合多层布线基板上制作电路图案的方法和装置
公开(公告)号：US5162240A
公开(公告)日：1992-11-10
申请号：US537492
申请日：1990-06-12
申请人： Norio Saitou , Hideo Todokoro , Katsuhiro Kuroda , Satoru Fukuhara , Genya Matsuoka , Hideo Arima , Hitoshi Yokono , Takashi Inoue , Hidetaka Shigi
发明人： Norio Saitou , Hideo Todokoro , Katsuhiro Kuroda , Satoru Fukuhara , Genya Matsuoka , Hideo Arima , Hitoshi Yokono , Takashi Inoue , Hidetaka Shigi
IPC分类号： H01L21/48 , H01L23/538 , H01L23/544 , H05K1/02 , H05K1/03 , H05K1/09 , H05K3/46
CPC分类号： H05K3/4679 , H01L21/4857 , H01L23/5383 , H01L23/544 , H01L2223/5442 , H01L2223/54473 , H01L2224/16 , H01L2224/16235 , H01L2924/01014 , H01L2924/01046 , H01L2924/01078 , H01L2924/01079 , H01L2924/09701 , H01L2924/15174 , H05K1/0269 , H05K1/0306 , H05K1/092 , H05K2201/09781 , H05K2201/09918 , H05K3/4605 , H05K3/467
摘要： A thick and thin film hybrid multilayer wiring substrate includes an adjustment layer provided between a thick film circuit and a thin film circuit in order to adjust positions of the thick film circuit and the thin film circuit with high integration and large area of the thick and thin film hybrid substrate. The adjustment layer is formed using a direct printing process in accordance with dispersion of the shape of the thick film circuit substrate to absorb the dispersion of the substrate. Further, in order to absorb dispersion of contraction of the thick film substrate due to sintering, a position of a mark provided on the substrate is detected by an electron beam and thereafter a connection pattern is formed to be connected to a regular pattern.
摘要翻译：厚薄膜混合多层布线基板包括设置在厚膜电路和薄膜电路之间的调整层，以便调整厚膜电路和薄膜电路的位置，具有高集成度和大面积的厚薄薄膜混合基板。根据厚膜电路基板的形状的分散，使用直接印刷法形成调整层，以吸收基板的分散。此外，为了吸收由于烧结引起的厚膜基板的收缩分散，通过电子束检测设置在基板上的标记的位置，然后形成连接图案以连接到规则图案。

15. 发明授权

US5160884A Charged particle beam device 失效
标题翻译：带电粒子束装置
公开(公告)号：US5160884A
公开(公告)日：1992-11-03
申请号：US647423
申请日：1991-01-29
申请人： Hideo Todokoro , Hiroyuki Shinada , Satoru Fukuhara
发明人： Hideo Todokoro , Hiroyuki Shinada , Satoru Fukuhara
IPC分类号： G01R31/302 , G01Q30/04 , G01R31/305 , H01J37/28
CPC分类号： G01R31/305
摘要： A charged particle beam device radiates a primary charged particle beam of pulse form on a surface of a specimen, once in each clock period, in synchronism with a clock signal that determines an operating period of an internal operating signal of the specimen. A secondary electron or a reflected electron is detected after it is emitted from the surface of the specimen when the primary charged particle beam of pulse form is irradiated. Each detected signal pulse which is generated from the detecting means once in each period of said clock is sampled at two or more positions in a range including the peak value, and data which correspond to the sum or the averaged value calculated from the sampling values of a plurality of the positions are formed. An internal operating signal waveform of said specimen is displayed by using the data, and therefore the internal operating signal waveform of the specimen can be observed and measured with high measuring accuracy and with high efficiency.
摘要翻译：带电粒子束装置在每个时钟周期内，与确定样本的内部操作信号的操作周期的时钟信号同步地，在试样的表面上辐射脉冲形式的初级带电粒子束。当照射脉冲形式的初级带电粒子束后，从样品表面发射二次电子或反射电子。在所述时钟的每个周期中从检测装置产生的每个检测到的信号脉冲在包括峰值的范围内的两个或更多个位置被采样，并且对应于从根据形成多个位置。通过使用该数据显示所述样本的内部操作信号波形，因此可以以高测量精度和高效率观察和测量样本的内部操作信号波形。

16. 发明授权

US4868394A Charged particle detector 失效
标题翻译：带电粒子检测器
公开(公告)号：US4868394A
公开(公告)日：1989-09-19
申请号：US248378
申请日：1988-09-23
申请人： Satoru Fukuhara , Hiroyuki Shinada , Hideo Todokoro
发明人： Satoru Fukuhara , Hiroyuki Shinada , Hideo Todokoro
IPC分类号： H01J43/24 , G01Q30/02 , G01Q90/00 , G01R31/305 , H01J37/244
CPC分类号： H01J37/244 , G01R31/305 , H01J2237/24435 , H01J2237/24465 , H01J2237/2448 , H01J2237/2449 , H01J2237/24507 , H01J2237/24564
摘要： A charged particle detector comprises a micro-channel plate for detecting charged particles secondarily generated from a specimen irradiated with a narrowly defined beam of charged particles, a signal outputting circuit for transmitting therein a signal detected by the micro-channel plate and then outputting the signal, and a processing circuit for simultaneously outputting signals of secondary charged particles generated from the specimen at the same instant of time. Preferably, the processing circuit is constructed by a vortex-shaped electrode or the combination of concentric electrode segments and delaying elements.

17. 发明授权

US4629889A Potential analyzer 失效
标题翻译：电位分析仪
公开(公告)号：US4629889A
公开(公告)日：1986-12-16
申请号：US623083
申请日：1984-06-21
申请人： Hideo Todokoro , Satoru Fukuhara
发明人： Hideo Todokoro , Satoru Fukuhara
IPC分类号： G01N23/225 , G01R19/00 , G01R31/302 , G01R31/305 , H01J37/244 , H01J37/26 , H01J37/28 , H01L21/66 , G01N23/00
CPC分类号： G01R31/305 , H01J37/268
摘要： A potential analyzer for analyzing a potential at a specimen such as an LSI device or the like. This analyzer comprises: a detector to detect secondary electrons to be emitted from a specimen by radiating a primary electron beam thereto; a retarding grid, provided between the specimen and the detector, for controlling a detection amount of the secondary electrons; a circuit for applying a voltage to the retarding grid to keep the output of the secondary electron detector at a constant value; and a setting circuit for automatically setting the gain of the detector so as to allow an operating range of the voltage to the retarding grid to be within a specified value.
摘要翻译：用于分析诸如LSI器件等的样本的电位的电位分析器。该分析器包括：检测器，用于通过向其发射一次电子束来检测从样品发射的二次电子; 设置在样本和检测器之间的延迟栅格，用于控制二次电子的检测量; 用于向延迟栅格施加电压以将二次电子检测器的输出保持在恒定值的电路; 以及设定电路，用于自动设定检测器的增益，以使得延迟电网电压的工作范围在规定值内。

18. 发明授权

US4274035A Field emission electron gun 失效
标题翻译：场发射电子枪
公开(公告)号：US4274035A
公开(公告)日：1981-06-16
申请号：US056527
申请日：1979-07-11
申请人： Satoru Fukuhara , Hideo Todokoro , Yoshio Sakitani
发明人： Satoru Fukuhara , Hideo Todokoro , Yoshio Sakitani
IPC分类号： G01Q90/00 , H01J37/073 , G21K7/00
CPC分类号： H01J37/073
摘要： A field emission electron gun including a cathode, a control electrode which is disposed in the vicinity of the cathode, an anode which is disposed for accelerating electrons emitted from the cathode, and a source of a D.C. voltage to be applied between the cathode and the anode. Also, there is provided a switching arrangement capable of changing-over a potential of the control electrode between ground potential and a potential of the cathode, and an arrangement capable of varying relative positions of the cathode and the control electrode.
摘要翻译：一种场发射电子枪，包括阴极，设置在阴极附近的控制电极，设置用于加速从阴极发射的电子的阳极和施加在阴极和阴极之间的直流电压源阳极。此外，提供了一种切换装置，其能够切换控制电极的接地电位和阴极的电位之间的电位，以及能够改变阴极和控制电极的相对位置的装置。

19. 发明授权

US08134125B2 Method and apparatus of an inspection system using an electron beam 失效
标题翻译：使用电子束的检查系统的方法和装置
公开(公告)号：US08134125B2
公开(公告)日：2012-03-13
申请号：US12211343
申请日：2008-09-16
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
摘要翻译：通过提供新颖的检查方法和采用这种新方法的检测装置，本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置，该方法能够提高扫描样本的速度作为半导体晶片。本发明提供的检验新颖方法包括以下步骤：产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子，并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用所存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。

20. 发明申请

US20070215803A1 Method and an apparatus of an inspection system using an electron beam 失效
公开(公告)号：US20070215803A1
公开(公告)日：2007-09-20
申请号：US11798239
申请日：2007-05-11
申请人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人： Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要： Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer. The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.

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