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11. 发明授权

US06974779B2 Interfacial oxidation process for high-k gate dielectric process integration 有权
公开(公告)号：US06974779B2
公开(公告)日：2005-12-13
申请号：US10662875
申请日：2003-09-16
申请人： David L O'Meara , Cory Wajda , Tsuyoshi Takahashi , Alessandro Callegari , Kristen Scheer , Sufi Zafar , Paul Jamison
发明人： David L O'Meara , Cory Wajda , Tsuyoshi Takahashi , Alessandro Callegari , Kristen Scheer , Sufi Zafar , Paul Jamison
IPC分类号： H01L21/28 , H01L21/314 , H01L21/316 , H01L29/51 , H01L21/469
CPC分类号： H01L21/28185 , H01L21/02181 , H01L21/02233 , H01L21/02238 , H01L21/02255 , H01L21/02271 , H01L21/02304 , H01L21/28194 , H01L21/28202 , H01L21/3143 , H01L21/31604 , H01L21/31616 , H01L21/31637 , H01L21/31641 , H01L21/31645 , H01L21/31658 , H01L21/31662 , H01L29/513 , H01L29/517 , H01L29/518
摘要： A method is provided for forming a microstructure with an interfacial oxide layer by using a diffusion filter layer to control the oxidation properties of a substrate associated with formation of a high-k layer into the microstructure. The diffusion filter layer controls the oxidation of the surface. The interfacial oxide layer can be formed during an oxidation process that is carried out following deposition of a high-k layer onto the diffusion filter layer, or during deposition of a high-k layer onto the diffusion filter layer.

12. 发明申请

US20050087822A1 Nitrided ultrathin gate dielectrics 失效
标题翻译：氮化超薄栅极电介质
公开(公告)号：US20050087822A1
公开(公告)日：2005-04-28
申请号：US10982999
申请日：2004-11-05
申请人： Mukesh Khare , Christopher D'Emic , Thomas Hwang , Paul Jamison , James Quinlivan , Beth Ward
发明人： Mukesh Khare , Christopher D'Emic , Thomas Hwang , Paul Jamison , James Quinlivan , Beth Ward
IPC分类号： H01L21/265 , H01L21/28 , H01L21/314 , H01L21/318 , H01L29/51 , H01L29/78 , H01L29/76 , H01L29/94 , H01L31/062 , H01L31/113 , H01L31/119 , H01L21/31 , H01L21/469
CPC分类号： H01L29/518 , H01L21/28202 , H01L21/2822 , H01L21/3144
摘要： A method for forming a gate dielectric for an integrated circuit device. In an exemplary embodiment of the invention, the method includes forming an initial oxynitride layer upon a substrate material, the oxynitride layer having an initial physical thickness. The initial oxynitride layer is then subjected to a plasma nitridation, the plasma nitridation resulting in final oxynitride layer having a final physical thickness.
摘要翻译：一种用于形成用于集成电路器件的栅极电介质的方法。在本发明的示例性实施例中，该方法包括在基底材料上形成初始氧氮化物层，该氮氧化物层具有初始物理厚度。然后对初始氧氮化物层进行等离子体氮化处理，等离子体氮化导致最终的氧氮化物层具有最终的物理厚度。

13. 发明申请

US20080102174A1 LIQUID DISPENSER WITH MOUNTING STRUCTURE FOR DRINKING CONTAINER 审中-公开
标题翻译：具有饮用容器安装结构的液体分配器
公开(公告)号：US20080102174A1
公开(公告)日：2008-05-01
申请号：US11752285
申请日：2007-05-22
申请人： Paul Jamison , Daniel Lee Bizzell , Todd Stancombe
发明人： Paul Jamison , Daniel Lee Bizzell , Todd Stancombe
IPC分类号： A23G3/50 , B05B11/00 , B65B1/04
CPC分类号： B65D23/003 , B65D1/04 , B65D1/095 , B65D25/22
摘要： A liquid dispenser comprises a body defining an interior containment space for containing a liquid to be dispensed and a structure configured to mount the liquid dispenser onto a drinking container such that the liquid dispenser does not obstruct drinking from a rim of the drinking container.
摘要翻译：液体分配器包括限定用于容纳要分配的液体的内部容纳空间的主体和被配置为将液体分配器安装到饮用容器上的结构，使得液体分配器不阻碍从饮用容器的边缘饮用。

14. 发明申请

US20080102173A1 METHOD FOR DISPENSING LIQUID INTO DRINKING CONTAINER WITH LIQUID DISPENSER MOUNTABLE TO DRINKING CONTAINER 审中-公开
标题翻译：将液体分配到具有液体分配器的饮用容器中用于饮用容器的方法
公开(公告)号：US20080102173A1
公开(公告)日：2008-05-01
申请号：US11752277
申请日：2007-05-22
申请人： Paul Jamison , Daniel Lee Bizzell , Todd Stancombe
发明人： Paul Jamison , Daniel Lee Bizzell , Todd Stancombe
IPC分类号： A23G3/50
CPC分类号： B65D23/003 , B65D1/04 , B65D1/095 , B65D25/22
摘要： A method of dispensing a liquid into a drinking container comprises the steps of: (a) providing a liquid dispenser comprising a body defining an interior containment space in which the liquid to be dispensed is contained and a structure for mounting of the body of the liquid dispenser onto the drinking container such that the liquid dispenser does not obstruct drinking from a rim of the drinking container; (b) dispensing the liquid from the liquid dispenser into the drinking container; and (c) mounting the liquid dispenser onto the drinking container via the structure of the liquid dispenser.
摘要翻译：将液体分配到饮用容器中的方法包括以下步骤：（a）提供液体分配器，其包括限定要容纳待分配液体的内部容纳空间的主体和用于安装液体的结构的结构分配器到饮用容器上，使得液体分配器不阻碍从饮用容器的边缘饮用; （b）将液体从液体分配器分配到饮用容器中; 和（c）通过液体分配器的结构将液体分配器安装到饮用容器上。

15. 发明授权

US06500772B2 Methods and materials for depositing films on semiconductor substrates 失效
标题翻译：用于在半导体衬底上沉积膜的方法和材料
公开(公告)号：US06500772B2
公开(公告)日：2002-12-31
申请号：US09757072
申请日：2001-01-08
申请人： Ashima B. Chakravarti , Richard A. Conti , Chester Dziobkowski , Thomas Ivers , Paul Jamison , Frank Liucci
发明人： Ashima B. Chakravarti , Richard A. Conti , Chester Dziobkowski , Thomas Ivers , Paul Jamison , Frank Liucci
IPC分类号： H01L2131
CPC分类号： H01L21/02126 , C23C16/30 , H01L21/02167 , H01L21/02222 , H01L21/02274 , H01L21/0332 , H01L21/3145 , H01L21/31608 , H01L21/3185
摘要： A method of depositing a film on a substrate, comprising placing the substrate in the presence of plasma energy, and contacting the substrate with a reactive gas component comprising a compound of the formula (R—NH)4−nSiXn, wherein R is an alkyl group, n is 1, 2, or 3, and X is selected from hydrogen or the halogens. The reactive gas composition may further comprise an oxidizer and/or a reducing agent.
摘要翻译：一种在衬底上沉积膜的方法，包括在存在等离子体能量的情况下放置衬底，并使衬底与包含式（R-NH）4-nSiXn的化合物的反应性气体组分接触，其中R是烷基基团，n为1,2或3，并且X选自氢或卤素。反应性气体组合物还可以包含氧化剂和/或还原剂。

16. 外观设计

USD584963S1 Liquid dispenser 有权
公开(公告)号：USD584963S1
公开(公告)日：2009-01-20
申请号：US29280270
申请日：2007-05-22
申请人： Paul Jamison , Daniel Lee Bizzell
设计人： Paul Jamison , Daniel Lee Bizzell

17. 发明申请

US20080099506A1 LIQUID DISPENSER HAVING MULTI-CHAMBER INTERIOR LIQUID CONTAINMENT SPACE 审中-公开
标题翻译：具有多室内液体容纳空间的液体分配器
公开(公告)号：US20080099506A1
公开(公告)日：2008-05-01
申请号：US11752281
申请日：2007-05-22
申请人： Paul Jamison , Daniel Lee Bizzell , Todd Stancombe
发明人： Paul Jamison , Daniel Lee Bizzell , Todd Stancombe
IPC分类号： B67D5/06
CPC分类号： B65D23/003 , B65D1/04 , B65D1/095 , B65D25/22
摘要： A liquid dispenser includes a body defining an interior containment space having two separate, isolated chambers each for containing a human consumable liquid to be dispensed. The liquid dispenser may include a structure configured to mount the liquid dispenser onto a drinking container. The liquid dispenser further may include a first sealing element that precludes a liquid contained within a first one of the chambers from flowing through a dispensing opening; a first tear away member; a second sealing element that precludes a liquid contained within a second one of the chambers from flowing through a dispensing opening; and a second tear away member, wherein manipulation of a tear away member results in rupturing of a sealing element whereby liquid may be dispensed from a chamber. The liquid held in each chamber may be a beverage additive, a flavoring, a nutritional supplement, and/or alcohol.
摘要翻译：液体分配器包括限定内部容纳空间的主体，所述内部容纳空间具有两个分离的隔离室，每个隔室用于容纳待分配的人体可消耗液体。液体分配器可以包括构造成将液体分配器安装到饮用容器上的结构。液体分配器还可以包括第一密封元件，其排除容纳在第一个室内的液体流过分配开口; 第一个撕裂的成员; 第二密封元件，其排除容纳在第二个室内的液体流过分配开口; 和第二撕开构件，其中撕开构件的操作导致密封元件的破裂，从而可以从腔室分配液体。保持在每个室中的液体可以是饮料添加剂，调味剂，营养补充剂和/或酒精。

18. 发明申请

US20050059259A1 Interfacial oxidation process for high-k gate dielectric process integration 有权
标题翻译：用于高k栅介质工艺集成的界面氧化工艺
公开(公告)号：US20050059259A1
公开(公告)日：2005-03-17
申请号：US10662875
申请日：2003-09-16
申请人： David O'Meara , Cory Wajda , Tsuyoshi Takahashi , Alessandro Callegari , Kristen Scheer , Sufi Zafar , Paul Jamison
发明人： David O'Meara , Cory Wajda , Tsuyoshi Takahashi , Alessandro Callegari , Kristen Scheer , Sufi Zafar , Paul Jamison
IPC分类号： H01L21/28 , H01L21/314 , H01L21/316 , H01L29/51 , H01L21/31 , H01L21/469
CPC分类号： H01L21/28185 , H01L21/02181 , H01L21/02233 , H01L21/02238 , H01L21/02255 , H01L21/02271 , H01L21/02304 , H01L21/28194 , H01L21/28202 , H01L21/3143 , H01L21/31604 , H01L21/31616 , H01L21/31637 , H01L21/31641 , H01L21/31645 , H01L21/31658 , H01L21/31662 , H01L29/513 , H01L29/517 , H01L29/518
摘要： A method is provided for forming a microstructure with an interfacial oxide layer by using a diffusion filter layer to control the oxidation properties of a substrate associated with formation of a high-k layer into the microstructure. The diffusion filter layer controls the oxidation of the surface. The interfacial oxide layer can be formed during an oxidation process that is carried out following deposition of a high-k layer onto the diffusion filter layer, or during deposition of a high-k layer onto the diffusion filter layer.
摘要翻译：提供了一种用于通过使用扩散过滤层来形成具有界面氧化物层的微观结构以控制与形成高k层的微结构相关联的衬底的氧化性能的方法。扩散过滤层控制表面的氧化。可以在氧化过程中形成界面氧化物层，该氧化过程在沉积高k层到扩散过滤层上之后或在沉积高k层到扩散过滤层上之后进行。

19. 发明申请

US20050051854A1 STRUCTURE AND METHOD FOR METAL REPLACEMENT GATE OF HIGH PERFORMANCE 有权
标题翻译：高性能金属替代门的结构与方法
公开(公告)号：US20050051854A1
公开(公告)日：2005-03-10
申请号：US10605106
申请日：2003-09-09
申请人： Cyril Cabral , Paul Jamison , Victor Ku , Ying Li , Vijay Narayanan , An Steegen , Yun-Yu Wang , Kwong Wong
发明人： Cyril Cabral , Paul Jamison , Victor Ku , Ying Li , Vijay Narayanan , An Steegen , Yun-Yu Wang , Kwong Wong
IPC分类号： H01L21/28 , H01L21/336 , H01L29/49 , H01L21/20 , H01L21/8234 , H01L29/76 , H01L31/062
CPC分类号： H01L29/66545 , H01L21/28079 , H01L29/4958
摘要： A structure and method for a metal replacement gate of a high performance device is provided. A sacrificial gate structure is first formed on an etch stop layer provided on a semiconductor substrate. A pair of spacers is provided on sidewalls of the sacrificial gate structure. The sacrificial gate structure is then removed, forming an opening. Subsequently, a metal gate including an first layer of metal such as tungsten, a diffusion barrier such as titanium nitride, and a second layer of metal such as tungsten is formed in the opening between the spacers.
摘要翻译：提供了一种用于高性能器件的金属替换栅极的结构和方法。首先在设置在半导体衬底上的蚀刻停止层上形成牺牲栅极结构。在牺牲栅极结构的侧壁上设置一对间隔物。然后去除牺牲栅极结构，形成开口。随后，在间隔件之间的开口中形成包括诸如钨的第一金属层的金属栅，诸如氮化钛的扩散阻挡层和诸如钨的第二金属层。

20. 发明申请

US20080099351A1 LIQUID DISPENSER HAVING INTERIOR LIQUID CONTAINMENT SPACE AND MOUNTING STRUCTURE FOR DRINKING CONTAINER 审中-公开
标题翻译：具有内部液体容纳空间的液体分配器和饮用容器的安装结构
公开(公告)号：US20080099351A1
公开(公告)日：2008-05-01
申请号：US11752270
申请日：2007-05-22
申请人： Paul Jamison , Daniel Lee Bizzell
发明人： Paul Jamison , Daniel Lee Bizzell
IPC分类号： B65D77/06
CPC分类号： B65D23/003 , B65D1/04 , B65D1/095 , B65D25/22
摘要： A liquid dispenser comprises a body defining an interior containment space for containing a liquid to be dispensed and a structure configured to mount the liquid dispenser onto a drinking container. The structure comprises an elongate opening formed in the body of the liquid dispenser that generally divides the liquid dispenser into two portions. Approximately half of the volume of the interior containment space is located in the first portion of the body of the liquid dispenser. Alternatively, substantially all of the volume of the interior containment space is located in the first portion.
摘要翻译：液体分配器包括限定用于容纳要分配的液体的内部容纳空间的主体和构造成将液体分配器安装到饮用容器上的结构。该结构包括形成在液体分配器主体中的细长开口，其通常将液体分配器分成两部分。内部容纳空间的体积的大约一半位于液体分配器的主体的第一部分中。或者，内部容纳空间的基本上所有体积位于第一部分中。

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