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11. 发明专利

JPH0456245A RISE OF MASS PRODUCTION IN SEMICONDUCTOR MANUFACTURING PROCESS, INSPECTION OF FOREIGN SUBSTANCE IN MASS PRODUCTION LINE AND DEVICE THEREOF 失效
公开(公告)号：JPH0456245A
公开(公告)日：1992-02-24
申请号：JP16574390
申请日：1990-06-26
申请人： HITACHI LTD
发明人： NOGUCHI MINORU , KENBO YUKIO , MORIOKA HIROSHI , YAMAGUCHI HIROSHI , KONO MAKIKO , OSHIMA YOSHIMASA
IPC分类号： H01L21/66
摘要： PURPOSE:To maximize foreign substance detection, analysis and evaluation functions necessary at the rising time of mass production, to reduce a production line at the time of the mass production and to make possible a reduction in the cost of the manufacture of a semiconductor by a method wherein a detection, analysis and evaluation system for foreign substances at the rising time of the mass production is separated from a mass production line and results obtained by the system are monitored by a simple monitoring device only in the mass production line. CONSTITUTION:When the control situation of foreign substances on a material, in a process, on a device and in an environment is evaluated using sampling wafers 401 to 405 at the rising time of mass production in a semiconductor manufacturing process, a detection, analysis and evaluation system 1002 for the foreign substances at the rising time of the mass production is separated from a mass production line and results obtained by the system 1002 are fed-back to the mass production line and are monitored by a simple monitoring device 1001 only in the mass production line. For example, in the above foreign substance detection, analysis and evaluation system 1002, foreign substances on sampling wafers 401 to 405 are detected and thereafter, the kinds of the elements of the foreign substances are analyzed by an STM/ STS 603. The analyzed data is ready-stored in advance as data base and the data base is compared with data on an object to be analyzed. Thereby, the kinds of the elements of the foreign substances are decided.

12. 发明专利

JPH03102249A METHOD AND APPARATUS FOR DETECTING FOREIGN MATTER 失效
公开(公告)号：JPH03102249A
公开(公告)日：1991-04-26
申请号：JP23992889
申请日：1989-09-18
申请人： HITACHI LTD
发明人： KOIZUMI MITSUYOSHI , OSHIMA YOSHIMASA
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , H01L21/027 , H01L21/30
摘要： PURPOSE:To inspect the fine foreign matter on a sample at a high speed by discriminating the same from a pattern by alternately performing the first and second illuminations in a time sharing manner and detecting the scattering beam from an objective body in a time sharing manner in synchronous relation to both illuminations by one photoelectric converter. CONSTITUTION:An oblique illumination system L performing oblique illumination is constituted of a laser beam source 15 and a condensing lens 15b. A vertical illumination system H performing linear vertical illumination (second illumination) is constituted of a laser beam source 1, a condensing lens 21, a cylindrical lens 14, a translucent prism 3, a field lens 4 and an objective lens 6. Detection systems L, H are constituted of a shield plate 18, an image forming lens 16, a unidimensional solid-state imaging device (detector) 20 and a signal processing circuit 300. The scattering beams generated by the illumination systems L, H pass through the objective lens 6, the translucent prism 3 and the shield plate 18 to be formed into an image on the detector 20. The first and second illuminations are performed in a time sharing manner to emit beams in a pulsating manner and, by synchronously detecting the outputs VL, VH of the detector 20, scattering beams due to two kinds of illumination beams can be separated and detected.

13. 发明专利

JPH03102248A METHOD AND APPARATUS FOR DETECTING FOREIGN MATTER 失效
公开(公告)号：JPH03102248A
公开(公告)日：1991-04-26
申请号：JP23992789
申请日：1989-09-18
申请人： HITACHI LTD
发明人： KOIZUMI MITSUYOSHI , OSHIMA YOSHIMASA
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , H01L21/027 , H01L21/30
摘要： PURPOSE:To inspect the fine foreign matter on a sample at a high speed by discriminating the same from a pattern by mounting an optical system wherein the foreign matter on an objective body is emphasized by an oblique illumination means to be detected by the first photoelectric converter and the background on the objective body is emphasized by a vertical illumination means to be detected by the second photoelectric converter and a comparing means. CONSTITUTION:An oblique illumination system L is constituted of a laser beam source 15 and a condensing lens 15b and a vertical illumination system H is constituted of a laser beam source 1, a condensing lens 21, a cylindrical lens 14, a translucent prism 3, a field lens 4 and an objective lens 6. In a detection system L, the scattering beam reflected by a color separation prism 150 is formed into an image by an image forming lens 9 to be taken by a unidimensional solid-state imaging element 20H. A detection system H is constituted of a shield plate 18, an image forming lens 16 and a unidimensional solid-state imaging element 20H. The output signals VL, VH detected by the detectors 20L, 20H are taken out through an analogue comparing and dividing circuit 100, a binarization circuit 101 and an OR circuit 22. By this constitution, the fine foreign matter on an objective body with a pattern can be stably detected with high sensitivity.

14. 发明专利

JPH01263541A FOREIGN MATTER DETECTING APPARATUS 失效
公开(公告)号：JPH01263541A
公开(公告)日：1989-10-20
申请号：JP9131088
申请日：1988-04-15
申请人： HITACHI LTD
发明人： YOSHIDA MINORU , SHIBA MASATAKA , UTO YUKIO , KOIZUMI MITSUYOSHI , OSHIMA YOSHIMASA
IPC分类号： G01N21/84 , G01N21/88 , G01N21/94 , G01N21/956 , H01L21/027 , H01L21/66
摘要： PURPOSE:To enable the reliable detection of foreign matters, by providing a plurality of illuminating means while disposing them so that light fluxes emitted from adjacent illuminating means overlap partly each other. CONSTITUTION:A glass substrate 1 is set on a setting table 8, and a film 2 for preventing the sticking of foreign matters is stuck on the substrate 1. A foreign matter on the surface of the film 2 gives scattered light by the application of illuminating light of an illuminating light source 4 and an image thereof is projected onto a light- sensing surface of a photoelectric conversion element 7. Detection of the foreign matters in the direction X of the film 2 is executed in this way, and by moving the setting table 8 in the direction Y occasionally by means of a motor 10, a feed screw 9, etc., the detection of the foreign matters is implemented on the whole of the film 2. In this case, a lens array 5 is provided for projecting onto the light-sensing surface of the element 7 a strip-shaped illuminating element composed of a plurality of light fluxes emitted from a plurality of light sources 4 onto the surface of the film 2, and it is constructed of a large number of imaging lenses. By arranging these imaging lenses in a large number in a straight line above the film 2, the foreign matters on the surface of the film 2 can be detected in a wide area without fail.

15. 发明专利

JPS6326559A FOREIGN MATTER INSPECTION DEVICE 失效
公开(公告)号：JPS6326559A
公开(公告)日：1988-02-04
申请号：JP16970186
申请日：1986-07-21
申请人： HITACHI LTD
发明人： KOIZUMI MITSUYOSHI , OSHIMA YOSHIMASA
IPC分类号： H01L21/66 , G01N21/88 , G01N21/94 , G01N21/956 , H01L21/30
摘要： PURPOSE:To miniaturize a device and to stabilize the output light of a semiconductor laser by using the semiconductor laser which incorporates a sensor for output light monitor and performing feedback control with the output of the sensor. CONSTITUTION:The semiconductor laser 16 incorporates a photodiode 18 as the sensor for output light monitor. A driving circuit 22 supplies a current proportional to an input voltage to the laser 16, which emits light and the diode 18 receives a part of the output light of the laser 16 and outputs a current proportional to the quantity of the photodetected light to bring the laser 16 under feedback control. A sample holding circuit 24 holds the quantity of this feedback. Laser irradiation is performed opposite from right and left so as to detect anisotropic foreign matter stably. Further, a shutter which interrupts laser beam other than the output light of the laser 16 is provided. Then, the feedback control over the output light is performed in a state wherein no other laser beam is incident only right before foreign matter inspection, and the feedback quantity is held during the inspection to drive the laser 16 without using the output of the diode 18, thereby performing the stable foreign matter detection.

16. 发明专利

JPS62122129A DETECTOR FOR POSITION OF PATTERN ON WAFER 失效
公开(公告)号：JPS62122129A
公开(公告)日：1987-06-03
申请号：JP10465986
申请日：1986-05-09
申请人： HITACHI LTD
发明人： KOIZUMI MITSUYOSHI , AKIYAMA NOBUYUKI , OSHIMA YOSHIMASA
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/67 , H01L21/68
摘要： PURPOSE:To align a mask and a wafer with high precision by providing a plurality of illuminating optical systems detecting a position on the wafer in two directions as the tangential directions of an imaging optical system and image pick-up means in an exposure device. CONSTITUTION:The imaging of alignment patterns 7a and 35a is detected by scanning a slit 23a by a detector 45a. Consequently, the relative displacement position DELTAx1 of a mask 1 in the X-axis direction and a chip 8x1 is obtained with high accuracy. A slit 23b is scanned, displacing the position at 90 deg. centering around an optical axis 34 to the alignment patterns 7a and 35a, and the imaging is detected. As a result, the relative displacement position DELTAy1 of the mask 1 in the y-axis direction and the chip 8x1 is acquired. Likewise, relative displacement positions DELTAx2 and DELTAy2 are obtained with high precision by detectors 45a and 45b. (DELTAy2-DELTAy1)/2NP=theta shows positional displacement in the direction of rotation of a wafer 3, and a rotary theta table 28c is turned so that theta is brought to zero, thus removing positional displacement in the directions of rotation of the mask and the wafer.

17. 发明专利

JPS6286740A METHOD OF INSPECTING SEMICONDUCTOR WAFER 失效
公开(公告)号：JPS6286740A
公开(公告)日：1987-04-21
申请号：JP22673585
申请日：1985-10-14
申请人： HITACHI LTD
发明人： OSHIMA YOSHIMASA , KOIZUMI MITSUYOSHI , YAMAUCHI YOSHIHIKO
IPC分类号： H01L21/66 , G01N21/88 , G01N21/94 , G01N21/956
摘要： PURPOSE:To inspect a fine foreign matter and a pattern defect with high sensitivity by a method wherein the defect signal generating position of a wafer is stored, the generating position is compared with the previous defect signal generating positions of the wafer and the signal generating from the same position is removed as false information. CONSTITUTION:The values of the coordinates of the detected foreign matter in a wafer inspected previously are stored in a foreign matter memory 38. When a foreign matter signal 37 is generated, the values of coordinate counters 26x and 26y are stored in latches 41 and 42. Simultaneously, the contents of the memory 38 are read out in order and are temporarily stored in latches 39 and 40. The absolute values of differences between the latch 39 and the latch 41 and between the latch 39 and the latch 42 are calculated b airhmetic circuits 43 and 44. The deviation between X and Y direction coordinats is found, the deviation amount is compared with the allowable value in comparison circuits 45, 46 and when the deviation amount is the allowable value or less, a coincidence signal is outputted. The logical product of the outputs of the comparison circuits 45 and 46 is calculated at an AND gate 47 and the output of the gate 47 is inverted in an inverter 48. If the values of the same coordinates as those of the detected foreign matter are stored in the foreign matter memory 38, the output of the inverter 48 becomes 0.

18. 发明专利

JPS6231815A FOCUS POSITION DETECTING DEVICE 失效
公开(公告)号：JPS6231815A
公开(公告)日：1987-02-10
申请号：JP16982685
申请日：1985-08-02
申请人： HITACHI LTD
发明人： MAKIHIRA HIROSHI , KUBOTA HITOSHI , FUSHIMI SATOSHI , MAEDA SHUNJI , OSHIMA YOSHIMASA
IPC分类号： H01L21/30 , G02B7/28 , G03F7/20 , H01L21/027
摘要： PURPOSE:To make equal the influence of the sample surface reflecting ratio, to cancel the effect and to execute the high accuracy by preventing the interference of two detecting systems and detecting the projection pattern at the same place on the sample. CONSTITUTION:A projection pattern mask 3 is one piece, and one pattern projected on a sample 6 surface by image sensors 9 and 11 dislocated and arranged in the optical axis direction is detected commonly. As the result, the interference of two detecting systems is prevented, the sample surface reflecting ratio is also the same to detect the projection pattern of the same place on the sample 6, and as the result, the effect is cancelled. Thus, the point where the contrast of both detecting systems, the focusing target position, is equal, is not changed, nd the focusing position detection can be executed with a high accuracy.

19. 发明专利

JP2006330007A Defect inspection device and its method 有权
标题翻译：缺陷检查装置及其方法
公开(公告)号：JP2006330007A
公开(公告)日：2006-12-07
申请号：JP2006238838
申请日：2006-09-04
申请人： Hitachi High-Technologies Corp , Hitachi Ltd , 株式会社日立ハイテクノロジーズ , 株式会社日立製作所
发明人： NOGUCHI MINORU , OSHIMA YOSHIMASA , NISHIYAMA HIDETOSHI , MATSUMOTO SHUNICHI , KENBO YUKIO , MATSUNAGA RYOJI , SAKAI SHIGETOSHI , NINOMIYA TAKANORI , WATANABE TETSUYA , NAKAMURA HISATO , JINGU TAKAHIRO , MORISHIGE YOSHIO , CHIKAMATSU SHUICHI
IPC分类号： G01N21/956 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a defect inspection device and its method capable of improving detection sensitivity and throughput by setting a threshold value corresponding to the dispersion of signal depending on a pattern by realizing highly effective illumination on a straight line from a direction where no diffracted light enters at the time of detecting the defect such as foreign matter etc., generated in the manufacturing process of an object while forming a pattern on the substrate. SOLUTION: By a highly effective illumination system illuminating from the direction of reducing the diffraction light from the pattern, the dispersed light from the pattern being the cause of the dispersion of the signal is reduced. Further, the threshold value is reduced by a threshold setting means from the calculated dispersion of signal for every region in the chip. Consequently, the detection threshold value is reduced and the detection sensitivity is improved and the improvement of the throughput is realized. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：解决问题：提供一种缺陷检查装置及其方法，该缺陷检查装置及其方法能够通过根据图案设置与信号的色散相对应的阈值，从而通过在直线上实现高效照明来提高检测灵敏度和吞吐量在检测在物体的制造过程中产生的缺陷（例如异物等）的同时在衍射光线入射的方向，同时在基板上形成图案。解决方案：通过从减少来自图案的衍射光的方向照明的高效照明系统，来自图案的分散光是信号分散的原因。此外，根据芯片中每个区域的计算的信号色散，阈值设置装置减小阈值。因此，检测阈值降低，检测灵敏度提高，吞吐量提高。版权所有（C）2007，JPO＆INPIT

20. 发明专利

JP2004301847A Defects inspection apparatus and method 有权
公开(公告)号：JP2004301847A
公开(公告)日：2004-10-28
申请号：JP2004146031
申请日：2004-05-17
申请人： Hitachi High-Tech Electronics Engineering Co Ltd , Hitachi Ltd , 日立ハイテク電子エンジニアリング株式会社 , 株式会社日立製作所
发明人： NOGUCHI MINORU , OSHIMA YOSHIMASA , NISHIYAMA HIDETOSHI , MATSUMOTO SHUNICHI , KENBO YUKIO , MATSUNAGA RYOJI , SAKAI SHIGETOSHI , NINOMIYA TAKANORI , WATANABE TETSUYA , NAKAMURA HISATO , JINGU TAKAHIRO , MORISHIGE YOSHIO , CHIKAMATSU SHUICHI
IPC分类号： G01B11/30 , G01N21/956 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a defects inspection apparatus and a method with an improved detection sensitivity and throughput by realizing a high-efficiency illumination on a straight line from a direction into which diffracted light is not introduced to reduce the diffracted light from a pattern and setting a threshold according to fluctuations in signal by pattern, when detecting defects such as foreign substances which appear in a fabrication process fabricating an object by forming the pattern on a substrate. SOLUTION: Scattered light from the pattern leading to fluctuations in signal is reduced by a high-efficiency illumination optical system which allows illumination from a direction which reduces diffracted light from the pattern. A detection threshold is reduced by a means which sets the threshold based on fluctuations in signal calculated for each region in a chip. An improvement in detection sensitivity and throughput is thereby realized. COPYRIGHT: (C)2005,JPO&NCIPI

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