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11. 发明申请

WO2006026629A3 COMPOSITE MATERIAL WITH POWERED RESONANT CELLS 审中-公开
公开(公告)号：WO2006026629A3
公开(公告)日：2006-03-09
申请号：PCT/US2005/030879
申请日：2005-08-30
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , WANG, Shih-Yuan , KUEKES, Philip J, , WU, Wei , STRAZINCKY, Joseph , ISLAM, M. Saiful
发明人： WANG, Shih-Yuan , KUEKES, Philip J, , WU, Wei , STRAZINCKY, Joseph , ISLAM, M. Saiful
IPC分类号： H01Q15/00 , H01Q3/44
摘要： A composite material (100) and related methods are described, the composite material (100) being configured to exhibit a negative effective permittivity and/or negative effective permeability for incident radiation (101) at an operating wavelength, the composite material comprising an arrangment of electromagnetically reactive cells (106) of small dimension relative to the operating wavelength. Each cell (106) includes an externally powered gain element (110) for enhancing a resonant response of that cell to the incident radiation (101) at the operating wavelength.

12. 发明申请

WO2010077221A1 DYNAMICALLY RECONFIGURABLE HOLOGRAMS 审中-公开
标题翻译：动态可重构的HOLOGRAMS
公开(公告)号：WO2010077221A1
公开(公告)日：2010-07-08
申请号：PCT/US2008/014085
申请日：2008-12-29
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , WANG, Shih-yuan , BRATKOVSKI, Alexandre M. , WILLIAMS, R. Stanley , LI, Jingjing , WU, Wei , KUEKES, Philip J.
发明人： WANG, Shih-yuan , BRATKOVSKI, Alexandre M. , WILLIAMS, R. Stanley , LI, Jingjing , WU, Wei , KUEKES, Philip J.
IPC分类号： G03H1/04
CPC分类号： G03H1/02 , G02B1/007 , G03H1/2249 , G03H1/2294 , G03H2001/0224 , G03H2210/30 , G03H2225/22 , G03H2225/32 , G03H2225/33
摘要： Various embodiments of the present invention relate to systems that can be used as holograms and can be electronically controlled and dynamically reconfigured to generate three-dimensional motion picture images. In one embodiment, a dynamically reconfigurable hologram (1200) comprises a phase-control layer (1202) including a two-dimensional array of phase-modulation pixels (1212). The hologram also comprises an intensity-control layer (1204) including a two-dimensional array of intensity-control pixels (1214). One or more three-dimensional motion pictures can be produced by electronically addressing the individual phase-modulation pixels and intensity-control pixels in order to phase and control the intensity of light emanating from pixels of the hologram.
摘要翻译：本发明的各种实施例涉及可以用作全息图并且可以被电子控制和动态重新配置以产生三维运动图像图像的系统。在一个实施例中，动态可重构全息图（1200）包括包括相位调制像素的二维阵列（1212）的相位控制层（1202）。全息图还包括包括强度控制像素（1214）的二维阵列的强度控制层（1204）。可以通过电子地寻址各个相位调制像素和强度控制像素来产生一个或多个三维运动图像，以便相位和控制从全息图像素发出的光的强度。

13. 发明申请

WO2009096983A1 MEMS-BASED PELLICLE BEAMSPLITTER 审中-公开
标题翻译：基于MEMS的蜂窝结构
公开(公告)号：WO2009096983A1
公开(公告)日：2009-08-06
申请号：PCT/US2008/052718
申请日：2008-01-31
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , TAN, Michael Renne Ty , WANG, Shih-Yuan , WU, Wei
发明人： TAN, Michael Renne Ty , WANG, Shih-Yuan , WU, Wei
IPC分类号： G02B6/125 , G02B6/42
CPC分类号： G02B27/142 , G02B6/125 , G02B6/4214 , G02B6/43 , G02B27/14
摘要： A method of forming a non-polarizing pellicle beamsplitter having a desired power-tap ratio. The method includes the operation of forming a base layer having a base refractive index on a substrate and arranging a plurality of alternating layers having relatively high and low indexes of refraction respectively over the base layer. The thickness of each of the high index and low index layers is selected to substantially eliminate polarization of the optical beam. The method further includes the operation of removing a selected area of the substrate to create an optical pathway comprised of both the base layer and the plurality of alternating layers, and where the optical pathway is configured to transmit and reflect a selected amount of light in the optical beam.
摘要翻译：一种形成具有期望的电力抽头比的非偏振薄膜分束器的方法。该方法包括在基底上形成具有基底折射率的基底层的操作，并且在基底层上分别布置具有相对较高和较低折射率的多个交替层。选择每个高折射率层和低折射率层的厚度以基本上消除光束的偏振。该方法还包括去除衬底的选定区域以创建由基底层和多个交替层两者组成的光学路径的操作，并且其中光学路径被配置为透射和反射所选择的光量光束。

14. 发明申请

WO2011129814A1 CONTROLLING PHASE RESPONSE IN A SUB-WAVELENGTH GRATING OPTICAL DEVICE 审中-公开
标题翻译：控制在亚波长光栅设备中的相位响应
公开(公告)号：WO2011129814A1
公开(公告)日：2011-10-20
申请号：PCT/US2010/030832
申请日：2010-04-13
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , WU, Wei , WILLIAMS, R. Stanley , LI, Jingjing , KAMINS, Theodore I , FIORENTINO, Marco
发明人： WU, Wei , WILLIAMS, R. Stanley , LI, Jingjing , KAMINS, Theodore I , FIORENTINO, Marco
IPC分类号： G02B5/18
CPC分类号： G02B5/1809 , B05D5/06 , G02B5/18 , G02B5/1828 , G02B5/1861
摘要： A sub-wavelength grating device having controlled phase response includes a grating layer having line widths, line thicknesses, line periods, and line spacings selected to produce a first level of control in phase changes of different portions of a beam of light reflected from the grating layer. The device also includes a substrate affixed to the grating layer that produces a second level of control in phase changes of different portions of a beam of light reflected from the grating layer, the second level of control being accomplished abrupt stepping of the substrate in a horizontal dimension, ramping the substrate in a horizontal dimension, or changing the index of refraction in a horizontal dimension.
摘要翻译：具有受控相位响应的亚波长光栅装置包括具有线宽，线厚度，线周期和线间隔的光栅层，其被选择以产生从光栅反射的光束的不同部分的相位变化中的第一级控制层。该装置还包括固定到光栅层的衬底，其产生从光栅层反射的光束的不同部分的相位变化的第二级控制，第二级控制是在水平方向上完成衬底的突然步进尺寸，在水平尺寸上斜化基底，或改变水平尺寸的折射率。

15. 发明申请

WO2011096940A1 MEMORY RESISTOR HAVING MULTI-LAYER ELECTRODES 审中-公开
标题翻译：具有多层电极的记忆电阻
公开(公告)号：WO2011096940A1
公开(公告)日：2011-08-11
申请号：PCT/US2010/023492
申请日：2010-02-08
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , YANG, Jianhua , WU, Wei , RIBEIRO, Gilberto
发明人： YANG, Jianhua , WU, Wei , RIBEIRO, Gilberto
IPC分类号： H01L27/115 , H01L21/8247 , H01L27/10
CPC分类号： H01L45/08 , G11C13/0002 , H01L45/1253 , H01L45/146
摘要： Methods and means related to memory resistors are provided. A memristor includes two multi-layer electrodes and an active material layer. One multi-layer electrode forms an Ohmic contact region with the active material layer. The other multi-layer electrode forms a Schottky barrier layer with the active material layer. The active material layer is subject to oxygen vacancy profile reconfiguration under the influence of an applied electric field. An electrical resistance of the memristor is thus adjustable by way of applied programming voltages and is non-volatile between programming events.
摘要翻译：提供了与存储电阻相关的方法和方法。忆阻器包括两个多层电极和活性材料层。一个多层电极与活性材料层形成欧姆接触区域。其他多层电极与活性物质层形成肖特基势垒层。在施加的电场的影响下，活性物质层经受氧空位轮廓重构。因此，忆阻器的电阻可以通过施加的编程电压进行调节，并且在编程事件之间是非易失性的。

16. 发明申请

WO2010077245A1 MUTLIPLEXER/DE-MULTIPLEXER MEMRISTIVE DEVICE 审中-公开
标题翻译： MUTLIPLEXER /多路复用器测量装置
公开(公告)号：WO2010077245A1
公开(公告)日：2010-07-08
申请号：PCT/US2008/088583
申请日：2008-12-30
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , STRACHAN, John Paul , FIORENTINO, Marco Fiorentino , WU, Wei
发明人： STRACHAN, John Paul , FIORENTINO, Marco Fiorentino , WU, Wei
IPC分类号： H01L27/115 , H01L21/8247 , H03K17/687
CPC分类号： H03K17/005 , G11C13/0002 , H01L45/08 , H01L45/1206 , H01L45/14 , H01L45/145 , H01L45/146 , H01L45/147 , H03K17/007
摘要： A multiplexing/de-multiplexing memristive device (300) includes a memristive matrix (370) containing mobile dopants; and programming electrodes (310, 320) which apply programming electrical field such that the mobile dopants selectively form a conductive band (380) which connects a first signal electrode (330) to one of a plurality of second electrodes (350). A method for operating a multiplexing/de-multiplexing memristive device (300) includes applying a programming electrical field to achieve a first dopant configuration in a memristive matrix (370), the first dopant configuration connecting a base electrode (330) to a input/output electrode (350); conducting an electrical current from between the base electrode (330) and the input/output electrode (350); and applying a second programming electrical field to achieve a second dopant configuration, the second dopant configuration connecting the base electrode (330) to a second input/output electrode (350); and conducting an electrical current from the base electrode (330) to the second input/output electrode (360).
摘要翻译：复用/解复用忆阻器（300）包括含有移动掺杂剂的忆阻矩阵（370）; 以及编程电极（310,320），其施加编程电场，使得所述移动掺杂剂选择性地形成将第一信号电极（330）连接到多个第二电极（350）中的一个的导电带（380）。一种用于操作多路复用/解复用忆阻器件（300）的方法包括施加编程电场以实现在忆阻矩阵（370）中的第一掺杂剂配置，所述第一掺杂剂配置将基极（330）连接到输入/ 输出电极（350）; 从所述基极（330）和所述输入/输出电极（350）之间传导电流; 以及施加第二编程电场以实现第二掺杂剂配置，所述第二掺杂剂配置将所述基极（330）连接到第二输入/输出电极（350）; 并从基极（330）向第二输入/输出电极（360）传导电流。

17. 发明申请

WO2008048215A2 CONTACT LITHOGRAPHY APPARATUS, SYSTEM AND METHOD 审中-公开
标题翻译：联系人地平线设备，系统和方法
公开(公告)号：WO2008048215A2
公开(公告)日：2008-04-24
申请号：PCT/US2006/028299
申请日：2006-07-21
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , STEWART, Duncan , WU, Wei
发明人： STEWART, Duncan , WU, Wei
IPC分类号： G03F7/00 , G03F7/20
CPC分类号： G03F7/7035 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A contact lithography apparatus 100, 220, system 200 and method 300 use a deformation 320 to facilitate pattern transfer 300. The apparatus 100, 220, system 200 and method 300 include a spacer 120, 226 that provides a spaced apart parallel and proximal orientation 310 of lithographic elements, such as a mask 110, 228a, 222 and a substrate 130, 228b, 224, when in mutual contact with the spacer 120, 226. One or more of the mask 110, 228a, 222, the substrate 130, 228b, 224 and the spacer 120, 226 is deformable, such that deformation 320 thereof facilitates the pattern transfer 300.
摘要翻译：接触式光刻设备100,220，系统200和方法300使用变形320以便于图案转移300.设备100,220，系统200和方法300包括间隔物120,226，其间隔开的平行和近端取向310 当与间隔物120,226相互接触时，诸如掩模110,228a，222和衬底130,228b，224之间的光刻元件的一个或多个掩模110,228a，222，衬底130,228b ，224和间隔件120,226是可变形的，使得其变形320有利于图案转移300。

18. 发明申请

WO2008045545A2 DEFORMATION-BASED CONTACT LITHOGRAPHY SYSTEMS, APPARATUS AND METHODS 审中-公开
标题翻译：基于变形的联系人LITHOGRAPHY SYSTEMS，APPARATUS AND METHODS
公开(公告)号：WO2008045545A2
公开(公告)日：2008-04-17
申请号：PCT/US2007/021850
申请日：2007-10-12
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , STEWART, Duncan , WALMSLEY, Robert, G. , HARTWELL, Peter , WU, Wei
发明人： STEWART, Duncan , WALMSLEY, Robert, G. , HARTWELL, Peter , WU, Wei
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F1/38 , G03F1/50
摘要： A pattern tool (200 or 200a) and/or substrate (300 or 300a) including one or more strain control regions (208 or 308) to prevent deformation-related misalignment.
摘要翻译：包括一个或多个应变控制区域（208或308）的图形工具（200或200a）和/或基板（300或300a），以防止变形相关的未对准。

19. 发明申请

WO2008045504A2 HYDRAULIC-FACILITATED CONTACT LITHOGRAPHY APPARATUS, SYSTEM AND METHOD 审中-公开
标题翻译：液压辅助接触平面设备，系统和方法
公开(公告)号：WO2008045504A2
公开(公告)日：2008-04-17
申请号：PCT/US2007/021722
申请日：2007-10-10
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , GAO, Jun , WU, Wei , PICCIOTTO, Carl
发明人： GAO, Jun , WU, Wei , PICCIOTTO, Carl
CPC分类号： G03F7/2014 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A contact lithography apparatus 100, 220, a system 200 and a method 300 use a hydraulic deformation to facilitate pattern transfer. The apparatus, the system and the method include a spacer 120, 226 that provides a spaced apart proximal orientation of lithographic elements 110, 228a, 130, 228b, and a hydraulic force member 140, 240 that provides the hydraulic deformation. One or more of the lithographic elements and the spacer is deformable, such that hydraulic deformation thereof facilitates the pattern transfer.
摘要翻译：接触式光刻设备100,220，系统200和方法300使用液压变形来促进图案转印。该装置，系统和方法包括隔离物120,226，其提供光刻元件110,228a，130,228b以及提供液压变形的液压力构件140,240的间隔开的近端取向。一个或多个光刻元件和间隔件是可变形的，使得其液压变形有利于图案转印。

20. 发明申请

WO2006026212A1 DISPLACEMENT ESTIMATION SYSTEM AND METHOD 审中-公开
标题翻译：位移估计系统和方法
公开(公告)号：WO2006026212A1
公开(公告)日：2006-03-09
申请号：PCT/US2005/029701
申请日：2005-08-19
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY L.P. , PICCIOTTO, Carl E. , GAO, Jun , WU, Wei
发明人： PICCIOTTO, Carl E. , GAO, Jun , WU, Wei
IPC分类号： G06K9/64
CPC分类号： G06T7/20 , G06T7/70
摘要： A displacement estimation system (100 / 400 / 600) comprising a data acquisition system (106) and a processing system (108) is provided. The data acquisition system is configured to capture a first frame (112A) from a first substrate (102A) including a first pattern (104A) and a second substrate (102B) including a second pattern (104B) at a first time and capture a second frame (112B) from a third substrate (102A) including a third pattern (104A) and a fourth substrate (102B) including a fourth pattern (104B) at a second time subsequent to the first time. The first pattern and the third pattern are substantially identical, and the second pattern and the fourth pattern are substantially identical. The processing system is configured to calculate a first displacement (312) between the first pattern and the third pattern using the first frame and the second frame and calculate a second displacement (314) between the second pattern and the fourth pattern using the first frame and the second frame.
摘要翻译：提供了包括数据采集系统（106）和处理系统（108）的位移估计系统（100/400/600）。数据采集系统被配置为从第一基板（102A）捕获包括第一图案（104A）的第一框架（112A）和包括第二图案（104B）的第二基板（102B），并且捕获第二框架在第一时间之后的第二时间从包括第三图案（104A）的第三基板（102A）和包括第四图案（104B）的第四基板（102B）的框架（112B）。第一图案和第三图案基本相同，第二图案和第四图案基本相同。处理系统被配置为使用第一帧和第二帧来计算第一图案和第三图案之间的第一位移（312），并使用第一帧计算第二图案和第四图案之间的第二位移（314），并且第二帧。

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