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11. 发明授权

US5486126A Spacers for large area displays 失效
标题翻译：大面积显示屏的间距
公开(公告)号：US5486126A
公开(公告)日：1996-01-23
申请号：US349091
申请日：1994-11-18
申请人： David A. Cathey , James J. Hofmann , Danny Dynka , Darryl M. Stansbury
发明人： David A. Cathey , James J. Hofmann , Danny Dynka , Darryl M. Stansbury
IPC分类号： G09F9/30 , G09F9/313 , H01J9/18 , H01J9/24 , H01J29/02 , H01J29/86 , H01J31/12
CPC分类号： H01J9/242 , H01J29/028 , H01J29/864 , H01J31/123 , H01J31/127 , H01J9/185 , H01J2329/8625 , H01J2329/863 , H01J2329/8635 , H01J2329/864 , H01J2329/8645 , H01J2329/866 , Y10T29/4981
摘要： A process is provided for forming spacers useful in large area displays. The process comprises steps of: forming bundles comprising fiber strands which are held together with a binder; slicing the bundles into slices; adhering the slices on an electrode plate of the display; and removing the binder.
摘要翻译：提供用于形成用于大面积显示器的间隔物的方法。该方法包括以下步骤：形成包含与粘合剂保持在一起的纤维束的束; 将束切成片; 将切片粘附在显示器的电极板上; 并移除粘合剂。

12. 发明授权

US07427425B2 Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces 有权
标题翻译：具有隔离气体连接器的反应器和用于将材料沉积到微器件工件上的方法
公开(公告)号：US07427425B2
公开(公告)日：2008-09-23
申请号：US10932470
申请日：2004-09-01
申请人： Craig M. Carpenter , Ross S. Dando , Danny Dynka
发明人： Craig M. Carpenter , Ross S. Dando , Danny Dynka
IPC分类号： C23C16/00
CPC分类号： C23C16/54 , C23C16/4401 , C23C16/45519 , C23C16/45544
摘要： Reactors having gas distributors for depositing materials onto micro-device workpieces, systems that include such reactors, and methods for depositing materials onto micro-device workpieces. In one embodiment, a reactor for depositing materials onto a micro-device workpiece includes a reaction chamber, a passageway, and a door assembly. The reaction chamber includes a gas distributor configured to provide a flow of gas(es) to a micro-device workpiece on a workpiece holder. The passageway, which has a first end open to the reaction chamber and a second end apart from the reaction chamber, is configured to provide ingression to and egression from the chamber for processing the micro-device workpiece. The door assembly is configured to open and sealably close a door at the second end of the passageway. A gas conditioning system positioned in the door is configured to maintain a desired concentration and phase of gas constituents in the passageway.
摘要翻译：具有用于在微器件工件上沉积材料的气体分配器的反应器，包括这种反应器的系统以及将材料沉积到微器件工件上的方法。在一个实施例中，用于将材料沉积到微器件工件上的反应器包括反应室，通道和门组件。反应室包括配置成在工件保持器上向微器件工件提供气体流的气体分配器。具有通向反应室的第一端和远离反应室的第二端的通道构造成提供从腔室进入和离开以处理微器件工件。门组件构造成在通道的第二端处打开并密封地关闭门。定位在门中的气体调节系统构造成保持通道中气体成分的期望浓度和相位。

13. 发明授权

US07335396B2 Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers 有权
标题翻译：用于控制耦合到反应室的通道中的质量流量和压力的方法以及用于将物质沉积在反应室中的微特征工件上的系统
公开(公告)号：US07335396B2
公开(公告)日：2008-02-26
申请号：US10423711
申请日：2003-04-24
申请人： Craig M. Carpenter , Danny Dynka
发明人： Craig M. Carpenter , Danny Dynka
IPC分类号： C23C16/00 , C23C16/52 , F17D1/02 , B05C11/00
CPC分类号： C23C16/45525 , C23C16/52 , Y10T137/0396 , Y10T137/7761
摘要： Methods, apparatuses, and systems for controlling mass flow rates and pressures in passageways coupled to reaction chambers are disclosed herein. In one embodiment, a method includes controlling a mass flow rate in a passageway in response to a first condition by modulating a valve of a mass flow and pressure control unit, and controlling a pressure in the passageway in response to a second condition different than the first condition by modulating the valve of the mass flow and pressure control unit. In another embodiment, an apparatus includes a mass flow measurement device, a pressure sensor, a modulating valve in the passageway, and a controller operably coupled to the mass flow measurement device, the pressure sensor, and the modulating valve. The controller has a computer-readable medium containing instructions to perform the above-mentioned method.
摘要翻译：本文公开了用于控制耦合到反应室的通道中的质量流量和压力的方法，装置和系统。在一个实施例中，一种方法包括通过调节质量流量和压力控制单元的阀来响应于第一状态来控制通道中的质量流量，以及响应于不同于第二状态的第二条件来控制通道中的压力通过调节质量流量和压力控制单元的阀门的第一个条件。在另一个实施例中，一种装置包括质量流量测量装置，压力传感器，通道中的调节阀，以及可操作地耦合到质量流量测量装置，压力传感器和调节阀的控制器。控制器具有包含执行上述方法的指令的计算机可读介质。

14. 发明申请

US20060243208A1 Substrate susceptors for receiving semiconductor substrates to be deposited upon 审中-公开
公开(公告)号：US20060243208A1
公开(公告)日：2006-11-02
申请号：US11444789
申请日：2006-05-31
申请人： Eric Blomiley , Nirmal Ramaswamy , Ross Dando , Joel Drewes , Danny Dynka
发明人： Eric Blomiley , Nirmal Ramaswamy , Ross Dando , Joel Drewes , Danny Dynka
IPC分类号： C23C16/00
CPC分类号： C23C16/481 , C23C14/505 , C23C14/541 , C23C16/45521 , C23C16/4584 , C23C16/52 , C30B25/02 , C30B29/06
摘要： In one implementation, a substrate susceptor for receiving a semiconductor substrate for selective epitaxial silicon-comprising depositing thereon, where the depositing comprises measuring emissivity of the susceptor from at least one susceptor location in a non-contacting manner, includes a body having a front substrate receiving side, a back side, and a peripheral edge. At least one susceptor location from which emissivity is to be measured is received on at least one of the front substrate receiving side, the back side, and the edge. Such at least one susceptor location comprises an outermost surface comprising a material upon which selective epitaxial silicon will not deposit upon during selective epitaxial silicon depositing on a semiconductor substrate received by the susceptor for at least an initial thickness of epitaxial silicon depositing on said substrate. Other aspects and implementations are contemplated.

15. 发明申请

US20060216945A1 Methods of depositing materials over semiconductor substrates 审中-公开
标题翻译：在半导体衬底上沉积材料的方法
公开(公告)号：US20060216945A1
公开(公告)日：2006-09-28
申请号：US11444953
申请日：2006-05-31
申请人： Eric Blomiley , Nirmal Ramaswamy , Ross Dando , Joel Drewes , Danny Dynka
发明人： Eric Blomiley , Nirmal Ramaswamy , Ross Dando , Joel Drewes , Danny Dynka
IPC分类号： H01L21/31 , C23C16/52 , H01L21/66 , C23C16/00
CPC分类号： C23C16/481 , C23C14/505 , C23C14/541 , C23C16/45521 , C23C16/4584 , C23C16/52 , C30B25/02 , C30B29/06
摘要： In one implementation, a substrate susceptor for receiving a semiconductor substrate for selective epitaxial silicon-comprising depositing thereon, where the depositing comprises measuring emissivity of the susceptor from at least one susceptor location in a non-contacting manner, includes a body having a front substrate receiving side, a back side, and a peripheral edge. At least one susceptor location from which emissivity is to be measured is received on at least one of the front substrate receiving side, the back side, and the edge. Such at least one susceptor location comprises an outermost surface comprising a material upon which selective epitaxial silicon will not deposit upon during selective epitaxial silicon depositing on a semiconductor substrate received by the susceptor for at least an initial thickness of epitaxial silicon depositing on said substrate. Other aspects and implementations are contemplated.
摘要翻译：在一个实施方案中，用于接收用于选择性外延硅的半导体衬底的衬底感受体包括沉积在其上，其中所述沉积包括以非接触方式从至少一个感受器位置测量所述基座的发射率，所述衬底基座包括具有前衬底接收侧，后侧和周缘。在前基板接收侧，后侧和边缘中的至少一个上接收要测量发射率的至少一个感受器位置。这样的至少一个感受器位置包括最外表面，其包括材料，选择性外延硅将不会沉积在选择性外延硅沉积在由基座接收的半导体衬底上，以至少沉积在所述衬底上的外延硅的初始厚度。考虑了其他方面和实现。

16. 发明授权

US06420828B1 Low-voltage cathode for scrubbing cathodoluminescent layers for field emission displays and method 失效
标题翻译：用于擦除阴极发光层用于场发射显示器的低电压阴极和方法
公开(公告)号：US06420828B1
公开(公告)日：2002-07-16
申请号：US09957522
申请日：2001-09-19
申请人： Charles M. Watkins , Danny Dynka
发明人： Charles M. Watkins , Danny Dynka
IPC分类号： H01J2918
CPC分类号： H01J9/39 , H01J2329/00
摘要： Faceplates for field emission displays having novel cathodoluminescent layers are disclosed. In one embodiment, a faceplate includes a cathodoluninescent layer exposed to electrons (scrubbed) in a vacuum, the electron's having a current density of greater than one hundred microamperes per square centimeter. The cathodoluninescent layer may be reversibly darkened by the scrubbing. In one alternate aspect, the cathodoluninescent layers are irradiated with an electron beam having a duty cycle duty cycle of between ten and one hundred percent. In alternate aspects, an accelerating voltage may be maintained between the cathodoluminescent layer and a source of electrons, and the accelerating voltage may be dithered to treat the cathodoluminescent layer to varying depths. Significantly, the scrubbed faceplate has significantly enhanced performance and increased usefull life compared to faceplates that have not been scrubbed.
摘要翻译：公开了具有新型阴极发光层的场致发射显示面板。在一个实施例中，面板包括在真空中暴露于电子（擦洗）的阴极发光层，电子的电流密度大于每平方厘米100微安。阴极发光层可以通过洗涤而可逆地变暗。在一个替代方案中，用占空比占空比为百分之一百的电子束照射阴极发光层。在替代方面，可以在阴极发光层和电子源之间保持加速电压，并且加速电压可以被抖动以将阴极发光层处理到不同的深度。重要的是，与没有被擦洗的面板相比，洗涤面板具有显着增强的性能和增加有用的寿命。

17. 发明授权

US06414429B2 Faceplates having scrubbed cathodoluminescent layers for field emission displays 失效
标题翻译：具有擦洗用于场发射显示器的阴极发光层的面板
公开(公告)号：US06414429B2
公开(公告)日：2002-07-02
申请号：US09955631
申请日：2001-09-18
申请人： Charles M. Watkins , Danny Dynka
发明人： Charles M. Watkins , Danny Dynka
IPC分类号： H01J2918
CPC分类号： H01J9/39 , H01J2329/00
摘要： Faceplates for field emission displays having novel cathodoluminescent layers are disclosed. In one embodiment, a faceplate includes a cathodoluminescent layer exposed to electron irradiation with an electron curt having a kinetic energy of less than one thousand electron volts, The electron irradiation (scrubbing) may be performed in a vacuum, and the cathodoluminescent layer may be reversibly darkened by the scrubbing. The cathodoluminescent layers may be formed on a transparent conductive layer formed on a transparent insulating viewing screen. In one aspect, the cathodoluminescent layers are irradiated with electrons having a density of greater than one hundred microamperes/cm2. In alternate aspects, an accelerating voltage may be maintained between the cathodoluminescent layer and a source of electrons, and the accelerating voltage may be dithered to treat the cathodoluminescent layer to vary depths. Significantly, the scrubbed faceplate has significantly enhanced performance and increased useful life compared to faceplates that have not been scrubbed.
摘要翻译：公开了具有新型阴极发光层的场致发射显示面板。在一个实施例中，面板包括暴露于具有小于一千电子伏特的动能的电子束的电子辐射的阴极发光层。可以在真空中进行电子照射（擦洗），并且阴极发光层可以是可逆的被擦洗变黑。阴极发光层可以形成在透明绝缘观察屏上形成的透明导电层上。在一个方面，用密度大于100微安/ cm2的电子照射阴极发光层。在替代方面，可以在阴极发光层和电子源之间保持加速电压，并且加速电压可以被抖动以处理阴极发光层来改变深度。重要的是，与没有被擦洗的面板相比，洗涤面板具有显着增强的性能和增加的使用寿命。

18. 发明申请

US20060251815A1 Atomic layer deposition methods 审中-公开
标题翻译：原子层沉积法
公开(公告)号：US20060251815A1
公开(公告)日：2006-11-09
申请号：US11484978
申请日：2006-07-11
申请人： Kevin Hamer , Philip Campbell , Danny Dynka , Matthew Meyers
发明人： Kevin Hamer , Philip Campbell , Danny Dynka , Matthew Meyers
IPC分类号： C23C16/00
CPC分类号： C23C16/45544 , C23C16/52
摘要： The invention includes atomic layer deposition methods and apparatus. In one implementation, an atomic layer deposition apparatus includes a processing chamber, the chamber having an inlet and an outlet; a vacuum source in fluid communication with the outlet; a final valve moveable between an open position and a closed position and having an outlet in fluid communication with the inlet of the chamber and having an inlet; a dump line having an inlet in fluid communication with the inlet of the final valve, the dump line further having an outlet; a safety valve having an outlet in fluid communication with the inlet of the dump line and the inlet of the final valve, the safety valve having an inlet configured to be placed in fluid communication with a fluid source; and an automatic pressure controller in the dump line, between the inlet of the dump line and the outlet of the dump line, and configured to maintain pressure in the dump line at a predetermined pressure at least during a time when the final valve is in the closed position. Other methods and apparatus are provided.
摘要翻译：本发明包括原子层沉积方法和装置。在一个实施方案中，原子层沉积设备包括处理室，所述室具有入口和出口; 与出口流体连通的真空源; 最终阀可在打开位置和关闭位置之间移动并且具有与所述室的入口流体连通并具有入口的出口; 倾倒线，其具有与最终阀的入口流体连通的入口，所述倾倒线还具有出口; 安全阀，其具有与所述倾倒管线的入口和所述最终阀的入口流体连通的出口，所述安全阀具有被配置为与流体源流体连通的入口; 以及卸料管线中的自动压力控制器，在转储管线的入口和倾倒管线的出口之间，并且构造成至少在最终阀门处于关闭位置。提供其他方法和装置。

19. 发明授权

US06926775B2 Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces 失效
标题翻译：具有隔离气体连接器的反应器和用于将材料沉积到微器件工件上的方法
公开(公告)号：US06926775B2
公开(公告)日：2005-08-09
申请号：US10365085
申请日：2003-02-11
申请人： Craig M. Carpenter , Ross S. Dando , Danny Dynka
发明人： Craig M. Carpenter , Ross S. Dando , Danny Dynka
IPC分类号： C23C16/44 , C23C16/455 , C23C16/54 , C23C16/00
CPC分类号： C23C16/54 , C23C16/4401 , C23C16/45519 , C23C16/45544
摘要： Reactors having gas distributors for depositing materials onto micro-device workpieces, systems that include such reactors, and methods for depositing materials onto micro-device workpieces are disclosed herein. In one embodiment, a reactor for depositing materials onto a micro-device workpiece includes a reaction chamber, a passageway, and a door assembly. The reaction chamber includes a gas distributor configured to provide a flow of gas(es) to a micro-device workpiece on a workpiece holder. The passageway, which has a first end open to the reaction chamber and a second end apart from the reaction chamber, is configured to provide ingression to and egression from the chamber for processing the micro-device workpiece. The door assembly is configured to open and sealably close a door at the second end of the passageway. A gas conditioning system positioned in the door is configured to maintain a desired concentration and phase of gas constituents in the passageway.
摘要翻译：具有用于将材料沉积到微器件工件上的气体分配器的反应器，包括这种反应器的系统以及将材料沉积到微器件工件上的方法在本文中公开。在一个实施例中，用于将材料沉积到微器件工件上的反应器包括反应室，通道和门组件。反应室包括配置成在工件保持器上向微器件工件提供气体流的气体分配器。具有通向反应室的第一端和远离反应室的第二端的通道构造成提供从腔室进入和离开以处理微器件工件。门组件构造成在通道的第二端处打开并密封地关闭门。定位在门中的气体调节系统构造成保持通道中气体成分的期望浓度和相位。

20. 发明授权

US06533632B1 Method of evacuating and sealing flat panel displays and flat panel displays using same 失效
标题翻译：平板显示器和使用其的平板显示器的排空和密封的方法
公开(公告)号：US06533632B1
公开(公告)日：2003-03-18
申请号：US09251977
申请日：1999-02-18
申请人： Danny Dynka
发明人： Danny Dynka
IPC分类号： H01J926
CPC分类号： H01J9/261 , H01J9/385
摘要： A method of evacuating and sealing the space between the baseplate and the faceplate of a field emission display. A frit bead is formed around the perimeter of the baseplate, and is then heated to a temperature at which a plurality of surface irregularities are formed on the surface of the bead. After the faceplate is placed on top of the frit bead, the panels are placed in a vacuum, and the space between the plates is evacuated through gaps in the frit bead formed by the surface irregularities. After the space between the plates has been evacuated, the frit bead is heated to a temperature that is high enough to allow the frit to at least partially flow. A compressive force applied between the plates compresses the frit bead, thereby bonding the frit bead to the plates. The plates are then allowed to cool before removing the plates from the vacuum.
摘要翻译：一种抽空和密封场发射显示器的基板和面板之间的空间的方法。在基板的周边周围形成玻璃料珠，然后将其加热到在珠的表面上形成多个表面凹凸的温度。在将面板放置在玻璃料珠的顶部之后，将面板置于真空中，并且通过由表面凹凸形成的玻璃料珠中的间隙抽出板之间的空间。在板之间的空间被抽真空之后，将玻璃料珠加热到足够高的温度以允许玻璃料至少部分地流动。施加在板之间的压缩力压缩玻璃料珠，从而将玻璃料珠焊接到板上。然后将板从真空除去板之前冷却。

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