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11. 发明授权

US06403288B1 Resist pattern formation method 有权
标题翻译：抗蚀图案形成方法
公开(公告)号：US06403288B1
公开(公告)日：2002-06-11
申请号：US09520345
申请日：2000-03-07
申请人： Yukio Nishimura , Toshiyuki Kai , Eiichi Kobayashi , Takeo Shioya
发明人： Yukio Nishimura , Toshiyuki Kai , Eiichi Kobayashi , Takeo Shioya
IPC分类号： G03F7039
CPC分类号： G03F7/30 , G03F7/0045 , Y10S430/115
摘要： A method of forming a resist pattern from a chemically amplified positive radiation sensitive resin composition. The film thickness of an unexposed portion of a resist film formed from the chemically amplified positive radiation sensitive resin composition after wet development is 100 to 400 Å smaller than that before wet development. Alternatively, a resist film formed from the chemically amplified positive radiation sensitive resin composition is wet developed at both a temperature and a time enough to ensure that the film thickness of an unexposed portion of the resist film after wet development is 100 to 400 Å smaller than that before wet development. A resist film which is formed from a chemically amplified positive radiation sensitive resin composition and experiences a 100 to 400 Å reduction in the film thickness of an unexposed portion by wet development is useful as a resist film for forming a resist pattern.
摘要翻译：从化学放大正射线敏感性树脂组合物形成抗蚀剂图案的方法。湿法显影后由化学放大的正性辐射敏感性树脂组合物形成的抗蚀剂膜的未曝光部分的膜厚比以前小100至400埃湿发展。或者，由化学放大的正性辐射敏感性树脂组合物形成的抗蚀剂膜在足以确保湿显影后抗蚀剂膜的未曝光部分的膜厚度比100至400小的温度和时间都被湿成型在湿显影之前的抗蚀剂膜是由化学放大的正性辐射敏感性树脂组合物形成的抗蚀剂膜，通过湿显影而经历100〜400的未曝光部分的膜厚度的降低作为形成抗蚀剂图案的抗蚀剂膜是有用的。

12. 发明授权

US08470513B2 Radiation-sensitive resin composition and polymer 有权
标题翻译：辐射敏感树脂组合物和聚合物
公开(公告)号：US08470513B2
公开(公告)日：2013-06-25
申请号：US13242920
申请日：2011-09-23
申请人： Kota Nishino , Ken Maruyama , Daisuke Shimizu , Toshiyuki Kai
发明人： Kota Nishino , Ken Maruyama , Daisuke Shimizu , Toshiyuki Kai
IPC分类号： C08F228/00
CPC分类号： G03F7/0392 , C08F12/20 , C08F12/24 , C08F212/14 , C08F220/18 , C08F220/38 , C09D125/18 , G03F7/0045 , G03F7/0046 , G03F7/0397 , C08F2220/1883 , C08F220/22 , C08F2220/382
摘要： A radiation-sensitive resin composition includes a polymer that includes at least one repeating unit (i) selected from a repeating unit shown by a formula (1), (2), and (3); and a repeating unit (ii) shown by a formula (4). R1 represents a hydrogen atom or a methyl group. Each R2 independently represents one of a linear or branched alkyl group having 1 to 12 carbon atoms, a linear or branched alkoxy group having 1 to 12 carbon atoms, and an alicyclic hydrocarbon group having 3 to 25 carbon atoms. p is an integer from 0 to 3, and q is an integer from 1 to 3, and p+q≦5. A chemically-amplified positive-tone resist film that is sensitive to extreme ultraviolet rays (EUV) can be formed using the radiation-sensitive resin composition.
摘要翻译：辐射敏感性树脂组合物包括含有至少一种选自式（1），（2）和（3）所示的重复单元的重复单元（i）的聚合物; 和式（4）所示的重复单元（ii）。 R1表示氢原子或甲基。每个R 2独立地表示碳原子数1〜12的直链或支链烷基，碳原子数1〜12的直链或支链烷氧基和碳原子数3〜25的脂环族烃基。 p为0〜3的整数，q为1〜3的整数，p + q〜5。可以使用放射线敏感性树脂组合物形成对极紫外线（EUV）敏感的化学放大正性抗蚀剂膜。

13. 发明申请

US20110117489A1 COMPOUND AND RADIATION-SENSITIVE COMPOSITION 有权
标题翻译：化合物和辐射敏感组合物
公开(公告)号：US20110117489A1
公开(公告)日：2011-05-19
申请号：US12673167
申请日：2008-07-30
申请人： Daisuke Shimizu , Ken Maruyama , Toshiyuki Kai , Tsutomu Shimokawa
发明人： Daisuke Shimizu , Ken Maruyama , Toshiyuki Kai , Tsutomu Shimokawa
IPC分类号： G03F7/004 , C07C69/734 , C07C69/96
CPC分类号： C07C69/736 , C07C43/23 , C07C2603/92 , G03F7/0392
摘要： A compound shown by the following formula (1).
摘要翻译：由下式（1）表示的化合物。

14. 发明申请

US20100310987A1 POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND 有权
标题翻译：聚合物，辐射敏感性组合物，单体和生产化合物的方法
公开(公告)号：US20100310987A1
公开(公告)日：2010-12-09
申请号：US12834015
申请日：2010-07-12
申请人： Ken MARUYAMA , Toshiyuki Kai
发明人： Ken MARUYAMA , Toshiyuki Kai
IPC分类号： G03F7/004 , C07C69/612 , C08F20/10 , C08F12/24 , C08F22/20 , C08F22/38 , C08F24/00 , C08F32/08
CPC分类号： G03F7/0397 , C08F8/12 , C08F12/22 , C08F12/24 , C08F212/14 , C08F220/18 , C08F220/30 , C09D125/18 , G03F7/0045 , G03F7/0046 , C08F2220/1891
摘要： A radiation-sensitive composition includes (A) an acid-dissociable group-containing polymer, and (B) a radiation-sensitive acid generator. The acid-dissociable group-containing polymer (A) includes a polymer that includes a repeating unit shown by a general formula (1) in which R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group, R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms, Y represents a carbon atom, and X represents an atomic group that forms an alicyclic hydrocarbon group together with Y.
摘要翻译：辐射敏感性组合物包括（A）含酸解离基团的聚合物，和（B）辐射敏感性酸产生剂。含酸解离基的聚合物（A）包括含有通式（1）所示的重复单元的聚合物，其中R 1表示氢原子，甲基，氟原子或三氟甲基，R 2表示取代或未取代的碳原子数6〜22的芳基，Y表示碳原子，X表示与Y一起形成脂环式烃基的原子团。

15. 发明申请

US20080268065A1 FUNCTIONAL FOOD FOR AMELIORATING ENGOGENOUS MELATONIN SECRETION RHYTHM AND FUNCTIONAL FOOD FOR AMELIORATING CIRCADIAN RHYTHM 失效
标题翻译：功能性食品，用于调理植物油分泌蛋白质和功能性食品
公开(公告)号：US20080268065A1
公开(公告)日：2008-10-30
申请号：US11952839
申请日：2007-12-07
申请人： Yoshinori MORIYAMA , Seiji Tsuboi , Akihiro Masuyama , Toshiaki Takano , Keita Ueno , Toshiyuki Kai
发明人： Yoshinori MORIYAMA , Seiji Tsuboi , Akihiro Masuyama , Toshiaki Takano , Keita Ueno , Toshiyuki Kai
IPC分类号： A61K35/20 , A61P43/00
CPC分类号： A61K35/747 , A23L33/10 , A61K35/20
摘要： The invention provides agents for phase-adjusting or enhancing the amplitude of an endogenous melatonin secretion rhythm and for improving a circadian rhythm, which may be taken daily and continuously, have excellent safety, and may effectively prevent or ameliorate disorders of an endogenous melatonin secretion rhythm or of a circadian rhythm without administration of exogenous melatonin, as well as functional food containing such an agent, which may prevent or ameliorate various symptoms, such as sleep disorder or prolonged sleep latency. The agent for phase-adjusting or enhancing the amplitude of an endogenous melatonin secretion rhythm according to the invention contains whey as the active component. The functional food for improving an endogenous melatonin secretion rhythm according to the invention contains the agent for phase-adjusting or enhancing the amplitude of an endogenous melatonin secretion rhythm. The functional food for improving a circadian rhythm contains the agent for improving a circadian rhythm.
摘要翻译：本发明提供用于相位调节或增强内源性褪黑激素分泌节律的振幅并改善可以每天和连续摄取的昼夜节律的药剂，具有优异的安全性，并且可以有效地预防或改善内源性褪黑激素分泌节律的病症或不伴有外源性褪黑激素的昼夜节律，以及含有这种药剂的功能食品，其可以预防或改善诸如睡眠障碍或延长睡眠潜伏期的各种症状。根据本发明的用于相位调节或增强内源性褪黑激素分泌节律的幅度的试剂含有乳清作为活性成分。根据本发明的用于改善内源性褪黑激素分泌节律的功能性食物含有用于相位调节或增强内源性褪黑素分泌节律的幅度的试剂。用于改善昼夜节律的功能性食物包含用于改善昼夜节律的药剂。

16. 发明授权

US06468714B2 Negative radiation-sensitive resin composition 有权
标题翻译：负辐射敏感树脂组合物
公开(公告)号：US06468714B2
公开(公告)日：2002-10-22
申请号：US09741334
申请日：2000-12-21
申请人： Toshiyuki Kai , Yong Wang , Shirou Kusumoto , Yoshihisa Ohta
发明人： Toshiyuki Kai , Yong Wang , Shirou Kusumoto , Yoshihisa Ohta
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/038 , Y10S430/115 , Y10S430/122
摘要： A negative radiation-sensitive resin composition including (A) an alkali-soluble resin containing a copolymer selected from the group consisting of a hydroxystyrene/styrene copolymer having hydroxystyrene units in a content of from 65 to 90 mol % and a hydroxystyrene/&agr;-methylstyrene copolymer having hydroxystyrene units in a content of from 65 to 90 mol %, (B) a radiation-sensitive acid-generating agent containing a hydroxyl group-containing onium salt compound, and (C) a cross-linking agent containing an N-(alkoxymethyl)glycoluril compound. The composition is suitable as a chemically amplified negative resist, to which alkaline developing solutions having usual concentration are applicable and which can form, in usual line-and-space patterns, resist patterns having a rectangular cross-sectional shape in a high resolution and also has superior sensitivity, developability and dimensional fidelity.
摘要翻译：一种负辐射敏感性树脂组合物，其包含（A）含有共聚物的碱溶性树脂，所述共聚物选自含有65〜90摩尔％的羟基苯乙烯单元的羟基苯乙烯/苯乙烯共聚物和羟基苯乙烯/α-甲基苯乙烯共聚物，其含量为65〜90摩尔％的羟基苯乙烯单元，（B）含有含羟基的鎓盐化合物的放射线敏感性产酸剂，（C）含有N- 烷氧基甲基）甘脲化合物。该组合物适合作为化学放大的负性抗蚀剂，通常的浓度的碱性显影液可以通过这种抗蚀剂成像，并且可以以通常的线间距图案形成具有高分辨率的矩形横截面形状的抗蚀剂图案具有卓越的灵敏度，可显影性和尺寸保真度。

17. 发明授权

US08450045B2 Pattern forming method 有权
标题翻译：图案形成方法
公开(公告)号：US08450045B2
公开(公告)日：2013-05-28
申请号：US13352384
申请日：2012-01-18
申请人： Hikaru Sugita , Nobuji Matsumura , Daisuke Shimizu , Toshiyuki Kai , Tsutomu Shimokawa
发明人： Hikaru Sugita , Nobuji Matsumura , Daisuke Shimizu , Toshiyuki Kai , Tsutomu Shimokawa
IPC分类号： G03F7/00 , G03F7/004 , G03F7/20 , G03F7/40
CPC分类号： G03F7/11 , G03F7/0045 , G03F7/0757 , G03F7/265
摘要： A pattern forming method includes providing and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate. The under-layer film is irradiated with radiation through a mask to cause an acid to be selectively generated in an exposed area of the under-layer film. An upper-layer film which does not contain a radiation-sensitive acid generator and which contains a composition capable of polymerizing or crosslinking by an action of an acid is provided. A cured film is provided by polymerization or crosslinking selectively in an area of the upper-layer film corresponding to the exposed area of the under-layer film in which the acid has been generated. An area of the upper-layer film corresponding to an area of the under-layer film in which the acid has not been generated is removed.
摘要翻译：图案形成方法包括提供和固化含有辐射敏感性酸产生剂的底层膜，其在暴露于基底上的辐射时产生酸。底层膜通过掩模用辐射照射，以在底层膜的暴露区域中选择性地产生酸。提供了不含有辐射敏感性酸产生剂并且含有能够通过酸的作用聚合或交联的组合物的上层膜。通过在与产生酸的底层膜的暴露区域相对应的上层膜的区域中选择性地聚合或交联固化膜。除去与未生成酸的下层膜的区域对应的上层膜的区域。

18. 发明授权

US08334087B2 Polymer, radiation-sensitive composition, monomer, and method of producing compound 有权
标题翻译：聚合物，辐射敏感组合物，单体和生产化合物的方法
公开(公告)号：US08334087B2
公开(公告)日：2012-12-18
申请号：US12834015
申请日：2010-07-12
申请人： Ken Maruyama , Toshiyuki Kai
发明人： Ken Maruyama , Toshiyuki Kai
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039
CPC分类号： G03F7/0397 , C08F8/12 , C08F12/22 , C08F12/24 , C08F212/14 , C08F220/18 , C08F220/30 , C09D125/18 , G03F7/0045 , G03F7/0046 , C08F2220/1891
摘要： A radiation-sensitive composition includes (A) an acid-dissociable group-containing polymer, and (B) a radiation-sensitive acid generator. The acid-dissociable group-containing polymer (A) includes a polymer that includes a repeating unit shown by a general formula (1) in which R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group, R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms, Y represents a carbon atom, and X represents an atomic group that forms an alicyclic hydrocarbon group together with Y.
摘要翻译：辐射敏感性组合物包括（A）含酸解离基团的聚合物，和（B）辐射敏感性酸产生剂。含酸解离基的聚合物（A）包括含有通式（1）所示的重复单元的聚合物，其中R 1表示氢原子，甲基，氟原子或三氟甲基，R 2表示取代或未取代的碳原子数6〜22的芳基，Y表示碳原子，X表示与Y一起形成脂环式烃基的原子团。

19. 发明申请

US20120058429A1 RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER 有权
标题翻译：辐射敏感性树脂组合物和聚合物
公开(公告)号：US20120058429A1
公开(公告)日：2012-03-08
申请号：US13242920
申请日：2011-09-23
申请人： Kota Nishino , Ken Maruyama , Daisuke Shimizu , Toshiyuki Kai
发明人： Kota Nishino , Ken Maruyama , Daisuke Shimizu , Toshiyuki Kai
IPC分类号： G03F7/039 , C08F220/30 , C08F220/58 , C08F228/02 , C08F220/24
CPC分类号： G03F7/0392 , C08F12/20 , C08F12/24 , C08F212/14 , C08F220/18 , C08F220/38 , C09D125/18 , G03F7/0045 , G03F7/0046 , G03F7/0397 , C08F2220/1883 , C08F220/22 , C08F2220/382
摘要： A radiation-sensitive resin composition includes a polymer that includes at least one repeating unit (i) selected from a repeating unit shown by a formula (1), (2), and (3); and a repeating unit (ii) shown by a formula (4). R1 represents a hydrogen atom or a methyl group. Each R2 independently represents one of a linear or branched alkyl group having 1 to 12 carbon atoms, a linear or branched alkoxy group having 1 to 12 carbon atoms, and an alicyclic hydrocarbon group having 3 to 25 carbon atoms. p is an integer from 0 to 3, and q is an integer from 1 to 3, and p+q≦5. A chemically-amplified positive-tone resist film that is sensitive to extreme ultraviolet rays (EUV) can be formed using the radiation-sensitive resin composition.
摘要翻译：辐射敏感性树脂组合物包括含有至少一种选自式（1），（2）和（3）所示的重复单元的重复单元（i）的聚合物; 和式（4）所示的重复单元（ii）。 R1表示氢原子或甲基。每个R 2独立地表示具有1至12个碳原子的直链或支链烷基，具有1至12个碳原子的直链或支链烷氧基和具有3至25个碳原子的脂环族烃基。 p为0〜3的整数，q为1〜3的整数，p + q＆nlE; 5。可以使用放射线敏感性树脂组合物形成对极紫外线（EUV）敏感的化学放大正性抗蚀剂膜。

20. 发明申请

US20100233635A1 METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN 有权
标题翻译：形成用于形成有机薄膜的图案和组合物的方法
公开(公告)号：US20100233635A1
公开(公告)日：2010-09-16
申请号：US12305893
申请日：2007-06-21
申请人： Daisuke Shimizu , Hikaru Sugita , Nobuji Matsumura , Toshiyuki Kai , Tsutomu Shimokawa
发明人： Daisuke Shimizu , Hikaru Sugita , Nobuji Matsumura , Toshiyuki Kai , Tsutomu Shimokawa
IPC分类号： G03F7/20 , C09K3/00
CPC分类号： C07D333/18 , G03F7/0045 , G03F7/0757 , G03F7/265
摘要： A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion.
摘要翻译：形成图案的方法包括（1）形成下层膜的步骤，其含有（A）在暴露于辐射线时能够产生酸的辐射敏感性酸产生剂，或（B）能够产生基底上暴露于辐射线; （2）通过具有预定图案的掩模的辐射线照射下层膜以获得通过预定图案选择性曝光的曝光的下层膜部分的步骤; （3）在下层膜上形成（C）有机薄膜以使曝光的下层膜与形成在曝光的下层膜部上的有机薄膜化学接合的工序; 以及（4）除去在下层膜以外的形成在有机薄膜上的除了曝光的下层膜部分以外的部分的工序。

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