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    • 12. 发明授权
    • Substrate bias for programming non-volatile memory
    • 用于编程非易失性存储器的衬底偏置
    • US07023740B1
    • 2006-04-04
    • US10755979
    • 2004-01-12
    • Nga-Ching WongDarlene G. Hamilton
    • Nga-Ching WongDarlene G. Hamilton
    • G11C16/04
    • G11C16/10
    • A method and system for substrate bias for programming non-volatile memory. A bias voltage is applied to a deep well structure under a well comprising a channel region for a non-volatile memory cell. During programming, a negative bias applied to the deep well beneficially creates a non-uniform distribution of electrons within the channel region, with an abundance of electrons at the surface of the channel region. The application of additional bias voltages to a control gate and a drain may cause electrons to migrate from the channel region to a storage layer of the non-volatile memory cell. Advantageously, due to the increased supply of electrons at the surface of the channel region, programming of the non-volatile cell takes place faster than under the conventional art.
    • 用于编程非易失性存储器的衬底偏置的方法和系统。 在包括用于非易失性存储单元的沟道区的阱下的深阱结构中施加偏置电压。 在编程期间,施加到深阱的负偏压有利地在通道区域内产生电子的不均匀分布,在通道区域的表面具有大量电子。 向控制栅极和漏极施加额外的偏置电压可能导致电子从沟道区迁移到非易失性存储单元的存储层。 有利地,由于在通道区域的表面处的电子供应增加,非易失性电池的编程比常规技术更快。
    • 14. 发明授权
    • Pre-charge method for reading a non-volatile memory cell
    • 用于读取非易失性存储单元的预充电方法
    • US06788583B2
    • 2004-09-07
    • US10307749
    • 2002-12-02
    • Yi HeEdward F. RunnionZhizheng LiuMark W. RandolphDarlene G. HamiltonPauling ChenBinh Le
    • Yi HeEdward F. RunnionZhizheng LiuMark W. RandolphDarlene G. HamiltonPauling ChenBinh Le
    • G11C1606
    • G11C7/12G11C16/0475G11C16/24
    • A method of detecting a charge stored on a charge storage region of a first dual bit dielectric memory cell within an array of dual bit dielectric memory cells comprises grounding a first bit line that forms a source junction with a channel region of the first memory cell. A high voltage is applied to a gate of the first memory cell and to a second bit line that is the next bit line to the right of the first bit line and separated from the first bit line only by the channel region. A third bit line, that is the next bit line to the right of the second bit line, is isolated such that its potential is effected only by its junctions with the a second channel region and a third channel region on opposing sides of the third bit line. A high voltage is applied to a pre-charge bit line that is to the right of the third bit line and current flow is detected at the second bit line to determine the programmed status of a source bit of the memory cell.
    • 一种检测存储在双位介质存储器单元阵列内的第一双位介质存储单元的电荷存储区域上的电荷的方法包括使与第一存储单元的沟道区形成源极结的第一位线接地。 高电压被施加到第一存储单元的栅极和第二位线,第二位线是第一位线右侧的下一个位线,并且仅与通道区域从第一位线分离。 位于第二位线右侧的下一个位线的第三位线是隔离的,使得其电位仅由其与第二通道区域的结和仅在第三位的相对侧上的第三通道区域 线。 将高电压施加到位于第三位线右侧的预充电位线,并且在第二位线处检测电流以确定存储器单元的源位的编程状态。
    • 16. 发明授权
    • Elimination of n+ contact implant from flash technologies by replacement with standard double-diffused and n+ implants
    • 通过更换标准双扩散和n +植入物来消除闪存技术中的n +接触植入物
    • US06579781B1
    • 2003-06-17
    • US09619231
    • 2000-07-19
    • Darlene G. HamiltonLen Toyoshiba
    • Darlene G. HamiltonLen Toyoshiba
    • H01L21425
    • H01L21/823814H01L27/1052
    • A method of manufacturing a semiconductor device that eliminates the n+ contact implant by using double diffused implants under the core cell contacts by forming core, n-channel and p-channel transistors in a semiconductor substrate, simultaneously forming source and drain DDI implants for the core transistors, forming source and drain Mdd implants for the core transistors, forming source and drain Pldd implants for the p-channel transistors, forming source and drain Nldd implants for the n-channel transistors, forming sidewall spacers on the core, n-channel and p-channel transistors, forming N+ implants for the n-channel transistors, forming P+ implants for the p-channel transistors and forming P+ contact implants for the p-channel transistors.
    • 一种制造半导体器件的方法,其通过在半导体衬底中形成芯,n沟道和p沟道晶体管,通过在核心单元触点下使用双扩散注入来消除n +接触注入,同时形成用于芯的源极和漏极DDI注入 晶体管,为核心晶体管形成源极和漏极Mdd注入,形成用于p沟道晶体管的源极和漏极Pldd注入,为n沟道晶体管形成源极和漏极Nldd注入,在核心上形成侧壁间隔,n沟道和 形成用于n沟道晶体管的N +注入,形成P沟道晶体管的P +注入,并形成P沟道晶体管的P +接触注入。
    • 20. 发明授权
    • Dummy wordline for erase and bitline leakage
    • 用于擦除和位线泄漏的虚拟字线
    • US06707078B1
    • 2004-03-16
    • US10230729
    • 2002-08-29
    • Hidehiko ShiraiwaYider WuJean Yee-Mei YangMark T. RamsbeyDarlene G. Hamilton
    • Hidehiko ShiraiwaYider WuJean Yee-Mei YangMark T. RamsbeyDarlene G. Hamilton
    • H01L2968
    • H01L27/11568G11C16/0466H01L27/115
    • One aspect of the present invention relates to a SONOS type non-volatile semiconductor memory device having improved erase speed, the device containing bitlines extending in a first direction; wordlines extending in a second direction, the wordlines comprising functioning wordlines and at least one dummy wordline, wherein the dummy wordline is positioned near at least one of a bitline contact and an edge of the core region, and the dummy wordline is treated so as not to cycle between on and off states. Another aspect of the present invention relates to a method of making a SONOS type non-volatile semiconductor memory device having improved erase speed, involving forming a plurality of bitlines extending in a first direction in the core region; forming a plurality of functioning wordlines extending in a second direction in the core region; forming at least one dummy wordline between the functioning wordlines and the periphery region or between the functioning wordlines and a bitline contact and treating the device so that the dummy wordline does not cycle between on and off states.
    • 本发明的一个方面涉及一种具有改进的擦除速度的SONOS型非易失性半导体存储器件,该器件含有沿第一方向延伸的位线; 所述字线在第二方向上延伸,所述字线包括功能字线和至少一个伪字线,其中所述伪字线位于所述芯区域的位线接触和边缘中的至少一个附近,并且所述伪字线被处理为不 在开关状态之间循环。 本发明的另一方面涉及一种制造具有改进的擦除速度的SONOS型非易失性半导体存储器件的方法,包括形成在芯区域中沿第一方向延伸的多个位线; 形成在所述芯区域中沿第二方向延伸的多个功能字线; 在功能字线和外围区域之间或在功能字线和位线接触之间形成至少一个伪字线,并对器件进行处理,使得伪字线不会在导通和关断状态之间循环。