专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明专利

JP2004207730A Lithographic apparatus, method for manufacturing device, and device manufactured using the method 有权
公开(公告)号：JP2004207730A
公开(公告)日：2004-07-22
申请号：JP2003422366
申请日：2003-12-19
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： STEVENS LUCAS HENRICUS JOHANNE , LEENDERS MARTINUS HENDRIKUS AN , MEILING HANS , MOORS JOHANNES HUBERTUS JOSEPH
IPC分类号： B08B7/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70925 , B08B7/0035
摘要： PROBLEM TO BE SOLVED: To solve the problem of excess exposure of an optical element and a problem due to the excess exposure of the optical element caused when using a cleaning method by a conventional technology. SOLUTION: A radiation beam produced in a radiation source LA, which is applied in an illumination system IL, enters the illumination system IL and impinges on a first optical element, a mirror SPF. The radiation beam is then reflected by a plurality of other mirrors, FF, FF, N1, N2 and G, and finally departs from the illumination system as a projection beam PB. A light path of radiation can be selectively blocked, by using shutters SH1 and SH2. The excess exposure of the photo-element can be prevented by measures of the excess cleaning of the optical element. COPYRIGHT: (C)2004,JPO&NCIPI

12. 发明专利

JP2006191091A Lithography device, illumination system, filter system and method for cooling support of such filter system 有权
标题翻译：光刻设备，照明系统，过滤系统和冷却支持这种过滤系统的方法
公开(公告)号：JP2006191091A
公开(公告)日：2006-07-20
申请号：JP2005377813
申请日：2005-12-28
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： WASSINK ARNOUD C , BAKKER LEVINUS PIETER , MOORS JOHANNES HUBERTUS JOSEPH , SCHUURMANS FRANK JEROEN PIETER
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a filter system for actively catching debris particles by rotating a foil trap, and for cooling the foil trap in a lithography device. SOLUTION: This lithography device is provided with an illumination system configured so that radiation beams can be conditioned, a projection system configured so that the radiation beams can be projected to a substrate and a filter system for filter-removing debris particles from the radiation beam. A filter 820 system includes a plurality of foils F1 and F2 for trapping debris particles, supports S1 and S2 for storing a plurality of foils and cooling systems CS1 and CS2 having surfaces configured to be cooled. The cooling systems and supports are positioned so that a gap G can be formed between the surface of the cooling system and the support. The cooling system is configured to inject gas into the gap. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于通过旋转箔捕获器并且用于在光刻装置中冷却箔捕获器来主动捕获碎屑颗粒的过滤系统。解决方案：该光刻设备设置有照明系统，其被配置为可以对辐射束进行调节;投影系统被配置成使得辐射束可以投射到基底和用于从辐射束。过滤器820系统包括用于捕集碎屑颗粒的多个箔F1和F2，用于存储多个箔的支撑件S1和S2以及具有被配置为被冷却的表面的冷却系统CS1和CS2。冷却系统和支撑件被定位成使得可以在冷却系统的表面和支撑件之间形成间隙G. 冷却系统配置成将气体注入到间隙中。版权所有（C）2006，JPO＆NCIPI

13. 发明专利

JP2006135307A Method to remove things deposited in optical elements, method to protect optical elements, device manufacturing method, apparatus containing optical elements, and lithography apparatus 有权
标题翻译：移除光学元件中保存的方法，保护光学元件的方法，装置制造方法，包含光学元件的装置和光刻装置
公开(公告)号：JP2006135307A
公开(公告)日：2006-05-25
申请号：JP2005289648
申请日：2005-10-03
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VAN HERPEN MAARTEN MARINUS JOH , VADIM YEVGENYEVICH BANINE , MOORS JOHANNES HUBERTUS JOSEPH , SPEE CAROLUS IDA MARIA ANTONIU , KLUNDER DERK JAN W , ZALM PETER CORNELIS
IPC分类号： H01L21/027 , G02B1/10 , G02B5/26 , G21K1/06
CPC分类号： B82Y10/00 , B08B7/0035 , B08B17/04 , G03F7/70925 , G03F7/70983 , G21K1/062
摘要： PROBLEM TO BE SOLVED: To provide a method to remove things deposited in optical elements in an apparatus containing optical elements, and a method to protect optical elements in the apparatus. SOLUTION: The method to remove things deposited in an optical device in an apparatus containing optical elements comprises supply of H 2 content gas to at least part of the apparatus, generation of hydrogen radicals from H 2 of the H 2 content gas, and removal of at least part of the deposits by making optical elements having deposits contact at least part of the hydrogen radicals. In addition, the method to protect optical elements comprises supply of a cap layer to the optical elements in a depositing process and removal of at least part of the cap layer from the optical elements in the foregoing removal process when the apparatus is being used or after it is used. This method is applicable to the lithography apparatus. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种去除沉积在含有光学元件的装置中的光学元件中的物体的方法，以及保护设备中的光学元件的方法。解决方案：在含有光学元件的设备中去除沉积在光学器件中的物质的方法包括向至少部分设备供应H SB 2含量气体，从H < SB> 2 ，并且通过使具有沉积物的光学元件与至少一部分氢原子接触而去除至少部分沉积物。此外，保护光学元件的方法包括在沉积工艺中向光学元件提供盖层，并且在上述去除工艺中，当使用该装置时或之后，将其从光学元件中移除至少部分盖层它被使用。该方法适用于光刻设备。版权所有（C）2006，JPO＆NCIPI

14. 发明专利

JP2006032945A Calibration apparatus and method of calibrating radiation sensor in lithographic apparatus 有权
标题翻译：校准装置及其在光刻设备中校准辐射传感器的方法
公开(公告)号：JP2006032945A
公开(公告)日：2006-02-02
申请号：JP2005193839
申请日：2005-07-01
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： MOORS JOHANNES HUBERTUS JOSEPH , MICKAN UWE
IPC分类号： H01L21/027 , G01J1/00 , G01J1/02 , G03F7/20
CPC分类号： G03F7/70558
摘要： PROBLEM TO BE SOLVED: To provide a calibration apparatus and a method of calibrating a radiation sensor in a lithographic apparatus.
SOLUTION: A calibration apparatus 1 is provided for calibrating a radiation sensor RS in a lithographic apparatus. The calibration apparatus includes a window 3 formed of a substantially radiation-transparent material for allowing radiation to pass therethrough to reach the radiation sensor. A first reference sensor 6 is located behind the window having an active surface abutting the window for measuring the intensity of the radiation that passes through the window. A second reference sensor 8 is located at a short distance behind the window having an active surface facing the window. The second reference sensor measures the intensity of the radiation that passes through the window, a first contamination layer 12 formed on the window, and a second contamination layer 13 formed on the active surface of the second reference sensor. The radiation sensor can be calibrated by combining measurements from the first and the second reference sensors.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种校准装置和校准光刻设备中的辐射传感器的方法。解决方案：提供校准装置1，用于校准光刻设备中的辐射传感器RS。校准装置包括由基本上辐射透明的材料形成的窗口3，用于允许辐射通过其中以到达辐射传感器。第一参考传感器6位于窗后面，具有邻接窗口的活动表面，用于测量通过窗口的辐射强度。第二参考传感器8位于具有面向窗口的有效表面的窗后面的短距离处。第二参考传感器测量通过窗口的辐射的强度，形成在窗口上的第一污染层12和形成在第二参考传感器的有效表面上的第二污染层13。可以通过组合来自第一和第二参考传感器的测量来校准辐射传感器。版权所有（C）2006，JPO＆NCIPI

15. 发明专利

JP2006352081A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：JP2006352081A
公开(公告)日：2006-12-28
申请号：JP2006093871
申请日：2006-03-30
申请人： ASML NETHERLANDS BV
发明人： BAKKER LEVINUS P , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITALEVITCH , KOSHELEV KONSTANTIN NIKOLAEVIT , MERTENS BASTIAAN MATTHIAS , MOORS JOHANNES HUBERTUS JOSEPH , SCHUURMANS FRANK JEROEN PIETER , ZUKAVISHVILI GIVI GEORGIEVITCH , WOLSCHRIJN BASTIAAN THEODOOR , VAN DER VELDEN MARC H L
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing sputtering caused by gas introduced to a projection beam optical path, and a method for manufacturing the apparatus. SOLUTION: The lithographic apparatus is arranged to project a beam from a radiation source to a substrate. The lithographic apparatus includes an optical element in an optical path of the beam, a gas inlet for introducing gas into the optical path of the beam so that the gas is ionized by the beam to a create electric field toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy that is greater than kinetic energy developed by ions of the gas in the electric fields for sputtering the optical element. COPYRIGHT: (C)2007,JPO&INPIT

16. 发明专利

JP2009049438A Method for removal of deposition on optical element, method for protection of optical element, device manufacturing method, apparatus including optical element, and lithographic apparatus 有权
标题翻译：在光学元件上移除沉积物的方法，保护光学元件的方法，装置制造方法，包括光学元件的装置和光刻装置
公开(公告)号：JP2009049438A
公开(公告)日：2009-03-05
申请号：JP2008306412
申请日：2008-12-01
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN HERPEN MAARTEN MARINUS JOH , VADIM YEVGENYEVICH BANINE , MOORS JOHANNES HUBERTUS JOSEPH , SPEE CAROLUS IDA MARIA ANTONIU , KLUNDER DERK JAN W , ZALM PETER CORNELIS
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： B82Y10/00 , B08B7/0035 , B08B17/04 , G03F7/70925 , G03F7/70983 , G21K1/062
摘要： PROBLEM TO BE SOLVED: To provide a method to remove a deposition on an optical element of an apparatus including the optical element, and a method to protect the optical element. SOLUTION: A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H 2 containing gas in at least part of the apparatus, producing hydrogen radicals from H 2 from the H 2 containing gas, and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of the optical element includes providing a cap layer to the optical element by a deposition process, and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种去除包括该光学元件的装置的光学元件上的沉积的方法以及保护光学元件的方法。解决方案：一种用于去除包括光学元件在内的装置的光学元件上的沉积的方法包括在装置的至少一部分中提供含有H 2 S 2的气体，从而从 H SB 2含有气体，并使沉积的光学元件与至少部分氢原子接触并除去至少部分沉积物。此外，用于保护光学元件的方法包括通过沉积工艺向光学元件提供盖层，并且在使用该装置期间或之后，在去除过程中从光学元件中去除至少一部分盖层如上所述。该方法可以应用在光刻设备中。版权所有（C）2009，JPO＆INPIT

17. 发明专利

JP2007173792A Radiation system and lithographic device 有权
标题翻译：辐射系统和光刻设备
公开(公告)号：JP2007173792A
公开(公告)日：2007-07-05
申请号：JP2006316940
申请日：2006-11-24
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： WILHELMUS VAN HERPEN MAARTEN M , KLUNDER DERK JAN WILFRED , MOORS JOHANNES HUBERTUS JOSEPH
IPC分类号： H01L21/027 , G21K3/00 , G21K5/02
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70041 , G03F7/70191 , G03F7/7055 , G03F7/70908 , G21K1/043 , G21K1/062
摘要： PROBLEM TO BE SOLVED: To provide a radiation system in which a spectrum filter, for selectively transmitting a spectrum range of an EUV radiation beam from an EUV source, is not contaminated by debris.
SOLUTION: The radiation system 1 is constituted of a pulse EUV source 2 for generating EUV radiation; a movable mount 6 moved in synchronous with the pulse EUV source 2; and a spectrum filter 5 attached onto the movable mount 6. By selecting a proper interval based on an average speed of debris 4 and a speed of light, the spectrum filter 5 is maintained without substantially contaminated by debris 4.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种辐射系统，其中用于选择性地传输来自EUV源的EUV辐射束的光谱范围的光谱滤波器不被碎片污染。解决方案：辐射系统1由用于产生EUV辐射的脉冲EUV源2构成; 与脉冲EUV源2同步移动的可移动安装件6; 以及附着在可移动支架6上的光谱滤波器5.通过基于碎片4的平均速度和光速选择适当的间隔，维持光谱滤波器5，基本上不被碎片4污染。版权所有（（ C）2007，JPO＆INPIT

18. 发明专利

JP2006135286A Lithographic apparatus and device manufacturing method 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2006135286A
公开(公告)日：2006-05-25
申请号：JP2005136766
申请日：2005-05-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： VADIM YEVGENYEVICH BANINE , MOORS JOHANNES HUBERTUS JOSEPH
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70191 , G03F7/70575
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus for attenuating a strength of undesirable radiation in a radiation beam in an optical system, and to provide a device manufacturing method. SOLUTION: A lithographic apparatus comprises an illumination system configured to transmit the radiation beam which includes a desired radiation having a predetermined wavelength or a predetermined wavelength range, and undesired radiation having another wavelength or another wavelength range; a support structure configured to support a patterning structure in which a pattern is imparted to the cross section of the radiation beam; a substrate table configured to hold a substrate; and a projection system configured to project the pattern imparted radiation beam on the target of the substrate, wherein in the case of use at least part of the lithographic apparatus includes a gas substantially transmissive for at least part of the desired radiation and substantially less transmissive for at least part of the undesired radiation. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于衰减光学系统中的辐射束中不需要的辐射的强度的光刻设备，并提供一种器件制造方法。光刻设备包括被配置为透射包括具有预定波长或预定波长范围的期望辐射的辐射束的照明系统以及具有另一波长或另一波长范围的不需要的辐射; 支撑结构，其构造成支撑图案化结构，其中图案被赋予所述辐射束的横截面; 被配置为保持基板的基板台; 以及投影系统，被配置为将所述图案赋予的辐射束投影到所述基板的目标上，其中在使用的情况下，所述光刻设备的至少一部分包括对于至少部分所需辐射基本上透射的气体，并且对于至少部分不期望的辐射。版权所有（C）2006，JPO＆NCIPI

19. 发明专利

JP2006128676A Lithographic device and manufacturing method of device 有权
标题翻译：装置的制造装置和制造方法
公开(公告)号：JP2006128676A
公开(公告)日：2006-05-18
申请号：JP2005306503
申请日：2005-10-21
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： NEERHOF HENDRIK ANTONY JOHANNE , MOORS JOHANNES HUBERTUS JOSEPH , OTTENS JOOST JEROEN , LE KLUSE MARCO
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/707 , G03F7/70708 , G03F7/70783
摘要： PROBLEM TO BE SOLVED: To provide a lithographic device provided with a structure for preventing the deformation of an article supported by an article support.
SOLUTION: The lithographic device includes an illuminating system adapted to provide a radiation beam, the article support adapted to support the article disposed in a beam path of the radiation beam, a multi-electrode clamp adapted to apply a clamping force for clamping the article against the article support, and a bias voltage circuit adapted to bias at least one electrode of the multi-electrode clamp so as to be able to avoid the formation of ridges appearing by electrostatic charge on the article.
COPYRIGHT: (C)2006,JPO&NCIPI

20. 发明专利

JP2005217398A Lithography apparatus, device manufacturing method, and device manufactured by same 有权
标题翻译：平面设备，装置制造方法及其制造的装置
公开(公告)号：JP2005217398A
公开(公告)日：2005-08-11
申请号：JP2005007226
申请日：2005-01-14
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： MOORS JOHANNES HUBERTUS JOSEPH , LEONARDUS FRANKEN JOHANNES CHR , MICKAN UWE , VOORMA HARM-JAN
IPC分类号： G02B17/00 , G03F7/20 , H01L21/027
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70175 , G03F7/70891
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus, a device manufacturing method for manufacturing a device with high precision, and a device manufactured by the same. SOLUTION: The lithography apparatus comprises: an illumination system IL for providing a projection beam of radiation PB; and a support structure MT for supporting a patterning means MA. The lithographic apparatus further comprises: a substrate table WT for holding a substrate W; a projection system PL for projecting the patterned beam onto a target portion of the substrate W; and a condenser which is structured to transmit a radiation R, received from a first radiation source SO, to the illumination system IL. The condenser K comprises at least one heater for heating the condenser when a condensing component receives substantially no radiation from the radiation source SO. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种光刻设备，用于制造高精度器件的器件制造方法及其制造方法。光刻设备包括：照明系统IL，用于提供辐射PB的投影光束; 以及用于支撑图案形成装置MA的支撑结构MT。光刻设备还包括：用于保持衬底W的衬底台WT; 用于将图案化的光束投影到基板W的目标部分上的投影系统PL; 以及构造成将从第一辐射源SO接收的辐射R传送到照明系统IL的冷凝器。冷凝器K包括至少一个用于加热冷凝器的加热器，当冷凝部件基本上不接收来自辐射源SO的辐射时。版权所有（C）2005，JPO＆NCIPI

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式