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11. 发明申请

US20110092075A1 MANUFACTURING APPARATUS AND METHOD FOR SEMICONDUCTOR DEVICE 有权
标题翻译：制造设备和半导体器件的方法
公开(公告)号：US20110092075A1
公开(公告)日：2011-04-21
申请号：US12903384
申请日：2010-10-13
申请人： Kunihiko Suzuki , Shinichi Mitani
发明人： Kunihiko Suzuki , Shinichi Mitani
IPC分类号： H01L21/46
CPC分类号： H01L21/02639 , C23C16/4584 , C23C16/4586 , C30B25/10 , H01L21/67109 , H01L21/68792
摘要： A semiconductor device manufacturing apparatus includes a chamber in which a wafer is loaded; a first gas supply unit for supplying a process gas into the chamber; a gas exhaust unit for exhausting a gas from the chamber; a wafer support member on which the wafer is placed; a ring on which the wafer support member is placed; a rotation drive control unit connected to the ring to rotate the wafer; a heater disposed in the ring and comprising a heater element for heating the wafer to a predetermined temperature and including an SiC layer on at least a surface, and a heater electrode portion molded integrally with a heater element and including an SiC layer on at least a surface; and a second gas supply unit for supplying an SiC source gas into the ring.
摘要翻译：半导体器件制造装置包括其中装载晶片的腔室; 用于将处理气体供应到所述室中的第一气体供应单元; 用于从所述室排出气体的排气单元; 其上放置晶片的晶片支撑构件; 其上放置有晶片支撑构件的环; 旋转驱动控制单元，连接到所述环以旋转晶片; 设置在所述环中并且包括用于将晶片加热到预定温度并且在至少一个表面上包括SiC层的加热器元件的加热器和与加热器元件整体模制并且包括至少一个SiC层的SiC层的加热器电极部分表面; 以及用于将SiC源气体供给到所述环中的第二气体供给单元。

12. 发明申请

US20110067383A1 WORKING GAS CIRCULATION ENGINE 审中-公开
标题翻译：工作气体循环发动机
公开(公告)号：US20110067383A1
公开(公告)日：2011-03-24
申请号：US12993768
申请日：2009-05-19
申请人： Rentaro Kuroki , Daisaku Sawada , Shinichi Mitani
发明人： Rentaro Kuroki , Daisaku Sawada , Shinichi Mitani
IPC分类号： F02B47/08
CPC分类号： F02M25/12 , F02B29/0412 , F02B43/10 , F02D19/0644 , F02D19/0689 , F02D19/081 , F02M26/35 , F02M26/46 , Y02T10/121 , Y02T10/146 , Y02T10/32 , Y02T10/36
摘要： A working gas circulation engine includes a combustion chamber that is supplied with fuel, the combustion product of which is condensed, and working gas that generates power with the use of combustion of the fuel and that has a specific heat ratio higher than that of air, a circulation path that connects an inlet and an outlet of the combustion chamber to each other in such a manner that the working gas is circulated back to the combustion chamber without being released into the atmosphere, and two condensers that are provided in the circulation path, that are supplied with exhaust gas which contains the combustion product and the working gas, and that condense and remove the combustion product.
摘要翻译：工作气体循环发动机包括燃烧室，其燃烧产物被冷凝，以及工作气体，其通过使用燃料的燃烧产生动力，并且具有高于空气的比热比，将燃烧室的入口和出口彼此连接的循环路径，使得工作气体循环回到燃烧室而不被释放到大气中，并且设置在循环路径中的两个冷凝器，供给含有燃烧产物和工作气体的废气，并且冷凝和除去燃烧产物。

13. 发明授权

US07621260B2 Internal combustion engine and control method thereof 有权
标题翻译：内燃机及其控制方法
公开(公告)号：US07621260B2
公开(公告)日：2009-11-24
申请号：US11817561
申请日：2006-09-12
申请人： Shinichi Mitani , Daisaku Sawada
发明人： Shinichi Mitani , Daisaku Sawada
IPC分类号： F02B43/12
CPC分类号： F02B23/101 , F02B43/12 , F02D19/024 , F02D19/027 , F02D35/023 , F02D41/0027 , F02D41/1498 , F02D2041/147 , F02D2250/18 , F02M21/0206 , F02M21/0245 , F02M21/0275 , F02M25/00 , Y02T10/125 , Y02T10/32
摘要： An operating gas circulation type internal combustion engine that uses argon as the operating gas, for example, and includes a hydrogen and oxygen supply portion, an argon supply amount regulating portion, and an electric control unit. The electric control unit determines the amount of hydrogen and oxygen to be supplied to a combustion chamber based on a required torque, which is the torque required of the internal combustion engine, and supplies the determined amounts of hydrogen and oxygen to the combustion chamber using the hydrogen supply portion and the oxygen supply portion. Further, the electric control unit determines an amount of operating gas to be supplied to the combustion chamber according to the required torque, and controls the argon supply amount regulating portion such that the determined amount of operating gas is supplied to the combustion chamber.
摘要翻译：例如，使用氩作为工作气体的工作气体循环式内燃机，包括氢气供给部和氩气供给量调节部以及电气控制部。电气控制单元基于作为内燃机所需的扭矩的所需扭矩确定要供应到燃烧室的氢和氧的量，并且使用所述扭矩将确定量的氢和氧供应到燃烧室氢供给部和氧供给部。此外，电气控制单元根据所需的扭矩确定供给到燃烧室的工作气体的量，并且控制氩供给量调节部，使得将确定的操作气体量供给到燃烧室。

14. 发明申请

US20080236477A1 VAPOR PHASE GROWTH APPARATUS AND VAPOR PHASE GROWTH METHOD 有权
标题翻译：蒸气相生长装置和蒸汽相生长方法
公开(公告)号：US20080236477A1
公开(公告)日：2008-10-02
申请号：US12053657
申请日：2008-03-24
申请人： Hideki ITO , Shinichi MITANI
发明人： Hideki ITO , Shinichi MITANI
IPC分类号： C30B25/16 , C30B35/00
CPC分类号： C30B25/10 , C23C16/4586 , C30B35/00 , Y10S117/90 , Y10T117/10 , Y10T117/1004 , Y10T117/1008
摘要： A vapor phase growth apparatus and a vapor phase growth method improve the uniformity of film formed are provided. The vapor phase growth apparatus includes a chamber, a rotatable holder having a susceptor, an internal heater and an external heater which are arranged in the holder and heat the wafer from the bottom surface, an gas-pipe which is arranged to face the internal heater and sprays a cooling gas, and a temperature measuring unit which is arranged outside the chamber and measures the surface temperature of the wafer. In this manner, a position of a singular point of temperature which is an overheated portion generated on the wafer can be recognized. The singular point of temperature is locally cooled to make it possible to improve the uniformity of a temperature distribution in plane of the wafer.
摘要翻译：提供了一种提高膜形成均匀性的气相生长装置和气相生长方法。气相生长装置包括：室，具有基座的可旋转保持器，内部加热器和外部加热器，其布置在保持器中并从底表面加热晶片;气体管，其布置成面对内部加热器并喷射冷却气体，以及温度测量单元，其布置在室外并测量晶片的表面温度。以这种方式，可以识别在晶片上产生的过热部分的单个温度点的位置。温度的单个点被局部冷却，从而可以提高晶片的平面内的温度分布的均匀性。

15. 发明申请

US20070277522A1 Brayton Cycle Device And Exhaust Heat Energy Recovery Device For Internal Combustion Engine 审中-公开
标题翻译：用于内燃机的布雷顿循环装置和排气热能回收装置
公开(公告)号：US20070277522A1
公开(公告)日：2007-12-06
申请号：US10589333
申请日：2005-01-25
申请人： Masahiro Ogawa , Shinichi Mitani , Aiko Sugiura
发明人： Masahiro Ogawa , Shinichi Mitani , Aiko Sugiura
IPC分类号： F01C13/04 , F01C1/02
CPC分类号： F01C1/0223 , F01C11/004 , F01C11/008 , F04C18/0207
摘要： An exhaust heat energy recovery apparatus for an internal combustion engine that efficiently recovers exhaust heat energy without increasing engine exhaust back pressure, and a Brayton cycle apparatus applicable to the exhaust heat energy recovery apparatus. A Brayton cycle apparatus 1 using a scroll compressor 4 and a scroll expander 6 has a simplified and downsized structure. A working fluid is compressed inside a scroll compressor 4 and expanded inside a scroll expander 6 in spaces partitioned and sealed by combinations of fixed scrolls and orbital scrolls. The conversion efficiency from heat energy to kinetic energy is high. Heat is transferred from the exhaust to the working fluid through a pipe wall of a flow passage 30a and an expander case 12 of the scroll expander 6. This further downsizes the Brayton cycle apparatus 1. The back pressure of the energy source including the exhaust is unaffected.
摘要翻译：一种用于在不增加发动机排气背压的同时有效地回收排气热能的内燃机的排气热能回收装置，以及适用于排气热能回收装置的布雷顿循环装置。使用涡旋压缩机4和涡旋式膨胀机6的布雷顿循环装置1具有简化且小型化的结构。工作流体被压缩在涡旋压缩机4内部，并在涡卷膨胀器6内膨胀，在由固定涡卷和轨道涡卷的组合分隔和密封的空间中。从热能到动能的转换效率高。热量通过流路30a的管壁和涡卷膨胀机6的膨胀机壳体12从排气口传递到工作流体。这进一步缩小了布雷顿循环设备1。包括排气的能量源的背压不受影响。

16. 发明申请

US20070026148A1 Vapor phase deposition apparatus and vapor phase deposition method 审中-公开
标题翻译：气相沉积装置和气相沉积方法
公开(公告)号：US20070026148A1
公开(公告)日：2007-02-01
申请号：US11494674
申请日：2006-07-28
申请人： Hideki Arai , Hironobu Hirata , Yoshikazu Moriyama , Shinichi Mitani
发明人： Hideki Arai , Hironobu Hirata , Yoshikazu Moriyama , Shinichi Mitani
IPC分类号： C23C16/00
CPC分类号： C23C16/4584 , C23C16/4585 , C30B25/12 , C30B25/14
摘要： A vapor phase deposition apparatus includes a chamber, a support table which is accommodated in the chamber and supports a substrate in the chamber, a first passage which supplies a gas to form a film and is connected to the chamber, and a second passage which discharges the gas and is connected to the chamber, the support table is provided with a plurality of first projecting portions to constrain a substantially horizontal movement in the same direction as a substrate surface with respect to the substrate, and the substrate is supported on a surface to come in contact with a back face of the substrate.
摘要翻译：气相沉积设备包括：室，容纳在腔室中的支撑台，并且在腔室中支撑衬底;提供气体以形成膜并连接到腔室的第一通道;以及第二通道，气体并连接到腔室，支撑台设置有多个第一突出部分，以相对于衬底在与衬底表面相同的方向上约束基本上水平的运动，并且衬底被支撑在表面上与基板的背面接触。

17. 发明授权

US06493626B2 Drive power control apparatus and method for vehicle 有权
标题翻译：驱动车辆动力控制装置及方法
公开(公告)号：US06493626B2
公开(公告)日：2002-12-10
申请号：US09858465
申请日：2001-05-17
申请人： Shinichi Mitani , Zenichiro Mashiki , Isao Takagi , Hirofumi Kubota , Hiroya Tanaka
发明人： Shinichi Mitani , Zenichiro Mashiki , Isao Takagi , Hirofumi Kubota , Hiroya Tanaka
IPC分类号： F16H918
CPC分类号： B60W10/06 , B60W10/04 , B60W10/101 , B60W30/1819 , B60W30/188 , F01N3/0842 , F01N3/0871 , F02D41/0215 , F02D41/3029 , F02D2250/18 , F02D2400/12 , F16H59/74 , F16H61/66 , Y10T477/60 , Y10T477/623
摘要： An engine output for bringing the drive power of a motor vehicle to a requested value is determined as a target output. One of the lean burn and the stoichiometric burn is selected as a combustion form that achieves a best fuel consumption performance in terms of the control of the actual engine output to the target output. That is, an output value that serves as a criterion for determining whether to switch the combustion force is determined based on the minimum fuel consumption rate during the stoichiometric-burn operation and the minimum fuel consumption rate during the lean-burn operation in which the fuel consumption involved in the rich spike control is taken into account. If the target output is less than the output value, the lean-burn operation is performed. If the target output is greater than the output value, the stoichiometric-burn operation is performed.
摘要翻译：将用于使机动车辆的驱动力达到请求值的发动机输出被确定为目标输出。选择稀燃和化学计量燃烧之一作为燃烧形式，在控制实际发动机输出到目标输出方面实现最佳的燃料消耗性能。也就是说，作为用于确定是否切换燃烧力的标准的输出值基于化学计量燃烧运转时的最小燃料消耗率和在稀燃燃烧运转期间的最小燃料消耗率来确定，其中燃料考虑到丰富尖峰控制中涉及的消费。如果目标输出小于输出值，则执行稀燃操作。如果目标输出大于输出值，则进行化学计量燃烧操作。

18. 发明授权

US06485573B2 Apparatus for reduced-pressure epitaxial growth and method of controlling the apparatus 有权
标题翻译：减压外延生长装置及其控制方法
公开(公告)号：US06485573B2
公开(公告)日：2002-11-26
申请号：US09855654
申请日：2001-05-16
申请人： Katsuyuki Iwata , Tadashi Ohashi , Shyuji Tobashi , Shinichi Mitani , Hideki Arai , Hideki Ito
发明人： Katsuyuki Iwata , Tadashi Ohashi , Shyuji Tobashi , Shinichi Mitani , Hideki Arai , Hideki Ito
IPC分类号： C23C1600
CPC分类号： C23C16/45521 , C23C16/45557 , C23C16/4584 , C23C16/52 , C30B25/12 , C30B25/14
摘要： An apparatus for reduced-pressure gaseous phase epitaxial growth by suppressing contamination upon the machine parts constituting the rotary mechanical portion and suppressing contamination upon the semiconductor wafer by maintaining the pressure in the rotary mechanical portion to lie within a particular range, and a method of controlling the above apparatus. The apparatus comprises a purging gas introduction pipe 6 for purging the interior of the rotary mechanical portion, a purging gas exhaust pipe 7 for exhausting the gas introduced through the purging gas introduction pipe, a pressure adjusting valve 41 provided in the purging gas exhaust pipe, a pressure gauge 21 for detecting the pressure in the rotary mechanical portion, and an arithmetic/control unit 31 for executing an arithmetic operation based upon the detected pressure and for controlling the opening degree of the pressure adjusting valve 41 provided in the purging gas exhaust pipe, so that the pressure in the rotary mechanical portion assumes a proper value.
摘要翻译：一种通过抑制构成旋转机械部分的机器部件上的污染并通过将旋转机械部分中的压力维持在特定范围内来抑制半导体晶片上的污染物的减压气相外延生长装置，以及控制方法上述装置。该装置包括用于清洗旋转机械部分内部的净化气体引入管6，用于排出通过吹扫气体导入管引入的气体的净化气体排出管7，设置在净化气体排出管中的压力调节阀41，用于检测旋转机械部分中的压力的压力计21以及用于基于检测到的压力执行算术运算并且用于控制设置在净化气体排出管中的压力调节阀41的开度的运算/控制单元31 ，使得旋转机械部分中的压力呈现适当的值。

19. 发明授权

US06352491B2 Fuel supply amount control apparatus and method for internal combustion engine 有权
标题翻译：燃油供给量控制装置和内燃机的方法
公开(公告)号：US06352491B2
公开(公告)日：2002-03-05
申请号：US09860482
申请日：2001-05-21
申请人： Zenichiro Mashiki , Isao Takagi , Hirofumi Kubota , Hiroya Tanaka , Shinichi Mitani
发明人： Zenichiro Mashiki , Isao Takagi , Hirofumi Kubota , Hiroya Tanaka , Shinichi Mitani
IPC分类号： B60K4102
CPC分类号： B60W10/06 , B60W10/04 , B60W10/101 , B60W30/18 , B60W30/1819 , B60W2710/0622 , F02D31/004 , F02D41/022 , F02D41/3029 , F02D2400/12 , F16H61/14 , F16H61/143 , F16H61/66 , Y10T477/675 , Y10T477/677 , Y10T477/79
摘要： A fuel supply amount control apparatus for an internal combustion engine uses an idling control amount QISC obtained by reducing an idling control amount Qa by an idling control amount correction value KQISC, when determining the amount of fuel injected for the lean combustion when the vehicle is running. Therefore, during the lean combustion with the D range is selected, there is substantially no difference between the road load amount of fuel injected during the idling state and the road load amount of fuel injected during a low-speed running of the vehicle. Hence, an increase in the amount of fuel injection during the low-speed running of the vehicle based on the lean combustion achieved upon a fuel increase request does not result in an excessively great output torque of the engine, so that the low-speed running of the vehicle becomes stable and good drivability can be maintained.
摘要翻译：一种内燃机的燃料供给量控制装置，在确定在车辆行驶时为稀薄燃烧喷射的燃料量时，使用通过怠速控制量校正值KQISC减少怠速控制量Qa而获得的怠速控制量QISC 。因此，在选择D档的稀燃时，在空转状态下喷射的燃料的路面负荷量与车辆低速行驶期间喷射的燃料的路面负荷量基本上没有差别。因此，根据燃料增加要求实现的基于稀燃的车辆的低速行驶期间的燃料喷射量的增加不会导致发动机的输出转矩过大，从而低速行驶的车辆变得稳定，并且可以保持良好的驾驶性能。

20. 发明授权

US6113705A High-speed rotational vapor deposition apparatus and high-speed rotational vapor deposition thin film method 有权
标题翻译：高速旋转蒸镀装置和高速旋转蒸镀薄膜法
公开(公告)号：US6113705A
公开(公告)日：2000-09-05
申请号：US137298
申请日：1998-08-20
申请人： Tadashi Ohashi , Katuhiro Chaki , Ping Xin , Tatsuo Fujii , Katsuyuki Iwata , Shinichi Mitani , Takaaki Honda , Yuusuke Sato
发明人： Tadashi Ohashi , Katuhiro Chaki , Ping Xin , Tatsuo Fujii , Katsuyuki Iwata , Shinichi Mitani , Takaaki Honda , Yuusuke Sato
IPC分类号： C30B25/14 , C23C16/44 , C23C16/455 , C23C16/458 , H01L21/205 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/4401 , C23C16/455 , C23C16/4584
摘要： There is provided a vapor deposition apparatus for forming a thin film which includes plural reaction gas supply ports at the top portion of a hollow reactor, an exhaust port at the bottom of the reactor, a rotational substrate holder provided inside the reactor on which a wafer substrate is mounted. A straightening vane having plural gas holes formed therein is provided on an upper portion of the reactor. The reactor is partitioned into upper and lower portions which have different inside diameters, with the inner diameter of the upper portion being smaller than the inner diameter of lower portion. The lower end of the upper portion and the upper end of the lower portion are linked by a linking portion which has a predetermined shape to make continuous the hollow inside of the reactor. A thin film is formed on the surface of a wafer substrate, which is placed on the rotational substrate holder, by supplying a reaction gas into the reactor.
摘要翻译：提供了一种用于形成薄膜的气相沉积装置，该薄膜在中空反应器的顶部包括多个反应气体供给口，反应器底部的排气口，设置在反应器内部的旋转基板保持器，衬底安装。在反应器的上部设置有形成有多个气孔的矫直叶片。反应器被分隔成具有不同内径的上部和下部，上部的内径小于下部的内径。上部的下端和下部的上端通过具有预定形状的连接部连接以使反应器的中空内部连续。通过将反应气体供应到反应器中，在放置在旋转基板保持器上的晶片基板的表面上形成薄膜。

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