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11. 发明授权

US4716852A Apparatus for thin film formation using photo-induced chemical reaction 失效
标题翻译：使用光诱导化学反应的薄膜形成装置
公开(公告)号：US4716852A
公开(公告)日：1988-01-05
申请号：US848485
申请日：1986-04-07
申请人： Kanji Tsujii , Yusuke Yajima , Seiichi Murayama
发明人： Kanji Tsujii , Yusuke Yajima , Seiichi Murayama
IPC分类号： H01L21/205 , C23C16/48 , H01L21/263 , H01L21/285 , H01L21/31
CPC分类号： C23C16/482 , C23C16/483
摘要： An apparatus according to the present invention for thin film formation using a photo-induced chemical reaction comprises a reaction chamber in which a substrate can be set, means to introduce a reactive gas into the reaction chamber for the purpose of causing a surface of the substrate to adsorb the reactive gas, means to evacuate the reaction chamber, means to irradiate the substrate surface having adsorbed the reactive gas with photon energy for the purpose of forming a nucleus required for growing a film on the substrate surface, means to generate metastable excited molecules which can react with the reactive gas to decompose it, and means to introduce the reactive gas and the metastable excited molecules into the reaction chamber for the purpose of growing the film on the substrate formed with the nucleus on the basis of the nucleus.
摘要翻译：根据本发明的用于使用光诱导化学反应的薄膜形成的装置包括其中可以设置基底的反应室，用于将反应气体引入反应室中的手段，用于引起基底的表面为了吸附反应性气体，抽出反应室的装置是为了形成在衬底表面上生长薄膜所需的核的目的，以光子能量照射吸附有反应性气体的衬底表面的手段，产生亚稳激发分子其可以与反应性气体反应以分解它，并且将反应性气体和亚稳态激发分子引入反应室的手段是为了在基于核的基底上形成的基底上生长膜的目的。

12. 发明授权

US4697121A Low-pressure mercury vapor discharge lamp 失效
标题翻译：低压汞蒸气放电灯
公开(公告)号：US4697121A
公开(公告)日：1987-09-29
申请号：US904398
申请日：1986-09-08
申请人： Yasuo Kato , Tetsuo Ono , Yoshio Watanabe , Seiichi Murayama , Shigeo Mikoshiba , Hiromitsu Matsuno
发明人： Yasuo Kato , Tetsuo Ono , Yoshio Watanabe , Seiichi Murayama , Shigeo Mikoshiba , Hiromitsu Matsuno
IPC分类号： H01J61/56 , H01J61/54 , H01J61/72 , H01J61/92 , H01J17/44
CPC分类号： H01J61/72 , H01J61/545
摘要： A low-pressure mercury vapor discharge lamp in which a rare gas and mercury are provided in an outer bulb, which in turn contains therein a plurality of bent inner tubes, each having an opening at an end and an electrode at the other end thereof. A starting probe is provided between the openings in the outer bulb. An operating circuit or starter is connected to the electrodes. Further, a starting probe circuit is connected to the starting probe to apply a high voltage to the starting probe at the time of ignition.
摘要翻译：一种低压汞蒸汽放电灯，其中在外灯泡中设置有稀有气体和汞，该外灯泡中还包含多个弯曲的内管，每个具有一端的开口和另一端的电极。在外灯泡的开口之间提供启动探针。操作电路或起动器连接到电极。此外，启动探针电路连接到起动探针，以在点火时对起动探针施加高电压。

13. 发明授权

US4622493A High intensity ultraviolet light source 失效
标题翻译：高强度紫外线光源
公开(公告)号：US4622493A
公开(公告)日：1986-11-11
申请号：US477620
申请日：1983-03-22
申请人： Makoto Yasuda , Seiichi Murayama
发明人： Makoto Yasuda , Seiichi Murayama
IPC分类号： H01J61/20 , H01J61/18 , H01J61/82
CPC分类号： H01J61/18 , H01J61/82
摘要： A high intensity ultraviolet light-source comprises an arc tube having a pair of electrodes, filled with certain amounts of mercury, tantalum halide and rare gas, and provided with a tube loading of at least 13 Watt/cm.sup.2.
摘要翻译：高强度紫外光源包括具有一对电极的电弧管，其填充有一定量的汞，卤化钽和稀有气体，并且具有至少13瓦/ cm 2的管载荷。

14. 发明授权

US4615756A Dry etching apparatus 失效
标题翻译：干蚀刻装置
公开(公告)号：US4615756A
公开(公告)日：1986-10-07
申请号：US753858
申请日：1985-07-11
申请人： Kanji Tsujii , Yusuke Yajima , Seiichi Murayama
发明人： Kanji Tsujii , Yusuke Yajima , Seiichi Murayama
IPC分类号： H01J37/32 , H01L21/3065 , H01L21/306 , B44C1/22 , C03C15/00 , C23F1/02
CPC分类号： H01J37/32009 , H01L21/3065
摘要： An etching apparatus according to the present invention comprises means to generate metastable excited species such as of nitrogen or rare gas molecules, means to transfer the metastable excited species into a reaction chamber in which a substrate to-be-etched is set, and means to introduce a reactive gas for etching into the reaction chamber in which the substrate to-be-etched is set; the reactive gas being activated by collision between the metastable excited species and the reactive gas so as to etch the substrate to-be-etched owing to a reaction between the activated reactive gas and the substrate to-be-etched. Further, a light source for photo-exciting the substrate to-be-etched may well be added.
摘要翻译：根据本发明的蚀刻装置包括产生诸如氮气或稀有气体分子的亚稳激发物质的装置，用于将亚稳激发物质转移到其中设置待蚀刻基底的反应室中的装置，在其中设置待刻蚀的基板的反应室中引入用于蚀刻的反应气体; 活性气体通过亚稳态激发物质与反应性气体之间的碰撞而被活化，以便蚀刻由于被活化的反应气体和被蚀刻的基底之间的反应而被蚀刻的衬底。此外，可以添加用于光激发待蚀刻的衬底的光源。

15. 发明授权

US4095142A High frequency discharge lamp for a spectral-line source 失效
标题翻译：用于光谱线源的高频放电灯
公开(公告)号：US4095142A
公开(公告)日：1978-06-13
申请号：US762174
申请日：1977-01-24
申请人： Seiichi Murayama , Manabu Yamamoto , Masaru Ito , Makoto Yasuda , Makoto Watanabe , Kunifusa Kayama
发明人： Seiichi Murayama , Manabu Yamamoto , Masaru Ito , Makoto Yasuda , Makoto Watanabe , Kunifusa Kayama
IPC分类号： H01J65/00 , G01J3/10 , G01N21/01 , H01J65/04 , H05B41/24 , H05B9/00
CPC分类号： G01J3/10 , H01J65/042
摘要： A high frequency discharge lamp for a spectral-line source includes a discharge envelope in which a substance contributive to the emission of desired spectral lines is contained and in which one electrode is included, the discharge envelope being made of a material, such as quartz, which is electrically insulating and capable of transmitting the spectral lines. A cylindrical metallic container surrounds the discharge envelope and has at a part thereof an opening for taking out the spectral lines. There is further provided means for applying a high-frequency voltage between the electrode and the metallic container.

16. 发明申请

US20090166276A1 WATER TREATMENT SYSTEM 有权
标题翻译：水处理系统
公开(公告)号：US20090166276A1
公开(公告)日：2009-07-02
申请号：US12340321
申请日：2008-12-19
申请人： Norimitsu ABE , Seiichi Murayama , Takeshi Ide , Akira Morikawa , Shojiro Tamaki
发明人： Norimitsu ABE , Seiichi Murayama , Takeshi Ide , Akira Morikawa , Shojiro Tamaki
IPC分类号： B01D35/22 , B01D33/50
CPC分类号： C02F1/444 , B01D61/18 , B01D61/22 , B01D65/02 , B01D65/027 , B01D2321/00 , B01D2321/04 , C02F1/32 , C02F1/38 , C02F1/5236 , C02F2209/006 , C02F2209/02 , C02F2209/03 , C02F2209/11 , C02F2209/40 , C02F2209/42
摘要： Disclosed is a water treatment system including a raw water tank, a module which includes a filtration membrane, a feed pump, a filtered water tank, a backwash pump which flows filtered water backward from the filtered water tank to the module, a valve and a channel which switch the direction of the water flow between the forward and reverse directions, a controller which suspends the supply of raw water from the raw water tank to the module, switches the valve and channel to the reverse direction, makes the backwash pump to supply filtered water from the filtered water tank to the module thereby backwashing the filtration membrane, and washing drainage treatment line including which treats backwashing drainage generated by backwashing of the filtration membrane, and returns the water to the raw water tank.
摘要翻译：公开了一种水处理系统，其包括原水槽，包括过滤膜，进料泵，过滤水箱，将过滤水从过滤水箱向后流动到模块的反冲洗泵的模块，阀和通道，其将正向和反向的水流方向切换，将原水从原水槽供给到模块的控制器，将阀和通道反向切换，使反冲洗泵供应过滤水从过滤的水箱到模块，从而反向洗涤过滤膜，以及洗涤排水处理管线，其包括处理通过过滤膜的反冲洗产生的反冲洗排水，并将水返回到原水槽。

17. 发明申请

US20080210608A1 Ultraviolet radiation water treatment system 有权
标题翻译：紫外线辐射水处理系统
公开(公告)号：US20080210608A1
公开(公告)日：2008-09-04
申请号：US12068918
申请日：2008-02-13
申请人： Norimitsu Abe , Takeshi Ide , Takeshi Matsushiro , Hiroyuki Suzuki , Seiichi Murayama
发明人： Norimitsu Abe , Takeshi Ide , Takeshi Matsushiro , Hiroyuki Suzuki , Seiichi Murayama
IPC分类号： B01D63/00 , B01D15/14
CPC分类号： C02F1/325 , B01D21/0009 , B01D21/0012 , B01D21/32 , C02F1/001 , C02F1/5236 , C02F1/66 , C02F1/76 , C02F2001/007 , C02F2201/324 , C02F2201/326 , C02F2209/005 , C02F2209/11 , C02F2301/043
摘要： A water treatment system that performs a water purifying treatment by use of ultraviolet radiation, comprises a front stage ultraviolet radiation device for radiating ultraviolet light in a front stage process in a water purifying treatment process, a rear stage ultraviolet radiation device for radiating ultraviolet light in a rear stage process, and a controller for controlling these ultraviolet radiation devices.
摘要翻译：一种通过使用紫外线照射进行水净化处理的水处理系统，包括在净水处理工序中的前段工序中照射紫外线的前级紫外线照射装置，将紫外线照射的后级紫外线照射装置后级处理，以及用于控制这些紫外线照射装置的控制器。

18. 发明授权

US06921476B2 UV-assisted advanced-ozonation water treatment system and advanced-ozonation module 有权
标题翻译：紫外线辅助先进臭氧水处理系统和先进臭氧模块
公开(公告)号：US06921476B2
公开(公告)日：2005-07-26
申请号：US10644015
申请日：2003-08-20
申请人： Norimitsu Abe , Setsuo Suzuki , Seiichi Murayama , Kotaro Iyasu , Kie Kubo , Kenji Taguchi
发明人： Norimitsu Abe , Setsuo Suzuki , Seiichi Murayama , Kotaro Iyasu , Kie Kubo , Kenji Taguchi
IPC分类号： C02F1/32 , B01F1/00 , B01F15/02 , B01J20/00 , C02F1/00 , C02F1/72 , C02F1/78
CPC分类号： C02F1/325 , C02F1/722 , C02F1/78 , C02F2201/3227 , C02F2201/326 , C02F2201/782 , C02F2201/784 , C02F2209/001 , C02F2209/005 , C02F2209/08 , C02F2209/20 , C02F2209/40
摘要： A UV-assisted advanced-ozonation water treatment system comprises a water treating tank 1, an ozonic water tank 2, an ozonized gas generator 3, and a UV light source 4 disposed in the water treating tank 1 and having a UV-radiating surface 4a, and an ozonic water jetting device including jetting nozzles 5 for jetting the ozonic water onto the UV-radiating surface of the UV light source. An ozonized gas diffusing device 12 is placed in the ozonic water tank 2. An ozonized gas generated by the ozonized gas generator 3 and compressed by a compressor 13 at a pressure in the range of about 2 to about 3 kg/cm2 is diffused into the ozonic water tank 2 by the ozonized gas diffusing device 12. A high-pressure, a high-ozone-concentration ozonic water produced in the ozonized water tank 2 is jetted through the jetting nozzles 5 onto the UV-radiating surface 4a.
摘要翻译：紫外线辅助先进臭氧化水处理系统包括设置在水处理槽1中的水处理槽1，臭氧水箱2，臭氧化气体发生器3和UV光源4，并具有UV辐射表面4 a和一个臭氧水喷射装置，其包括用于将臭氧水喷射到UV光源的UV辐射表面上的喷射喷嘴5。将臭氧化气体扩散装置12放置在臭氧水箱2中。由臭氧化气体发生器3产生的臭氧化气体，在压力为约2〜3kg / cm 2的压力下由压缩机13压缩的臭氧化气体被臭氧化的臭氧化气体气体扩散装置12。在臭氧水箱2中产生的高压，高臭氧浓度的臭氧水通过喷射喷嘴5喷射到UV辐射表面4a上。

19. 发明授权

US06638421B2 Water treatment control system using fluorescence analyzer 有权
公开(公告)号：US06638421B2
公开(公告)日：2003-10-28
申请号：US09995764
申请日：2001-11-29
申请人： Seiichi Murayama , Futoshi Kurokawa , Masao Kaneko , Kotaro Iyasu , Kenji Taguchi , Kie Kubo , Shojiro Tamaki , Akira Hiramoto , Takumi Hayashi , Nobuyoshi Kaiga
发明人： Seiichi Murayama , Futoshi Kurokawa , Masao Kaneko , Kotaro Iyasu , Kenji Taguchi , Kie Kubo , Shojiro Tamaki , Akira Hiramoto , Takumi Hayashi , Nobuyoshi Kaiga
IPC分类号： B01D1712
CPC分类号： B01D61/16 , B01D61/145 , B01D61/147 , B01D61/22 , B01D2311/04 , C02F1/008 , C02F1/283 , C02F1/44 , C02F1/444 , C02F1/52 , C02F1/76 , C02F1/78 , C02F2209/001 , C02F2209/003 , C02F2209/40 , Y10S210/908 , B01D2311/16
摘要： A water treatment control system using a fluorescence analyzer includes an activated carbon injection equipment 4 having an activated carbon injector 4a, a fluorescence analyzer 7 provided on the upstream of the activated carbon injector 4a, and a flowing water flowmeter 6. An activated carbon injection rate necessary to reduce a trihalomethane formation potential is calculated by an activated carbon injection rate calculating apparatus 8 based on a measured value from the fluorescence analyzer 7. An activated carbon injection amount from the activated carbon injector 4a is controlled by an activated carbon injection amount control apparatus 9 based on the activated carbon injection rate and a measured value from the flowing water flowmeter 6.

20. 发明授权

US5372916A X-ray exposure method with an X-ray mask comprising phase shifter sidewalls 失效
标题翻译：具有包括移相器侧壁的X射线掩模的X射线曝光方法
公开(公告)号：US5372916A
公开(公告)日：1994-12-13
申请号：US909309
申请日：1992-07-06
申请人： Taro Ogawa , Kozo Mochiji , Seiichi Murayama , Hiroaki Oizumi , Takashi Soga , Seiji Yamamoto , Isao Ochiai
发明人： Taro Ogawa , Kozo Mochiji , Seiichi Murayama , Hiroaki Oizumi , Takashi Soga , Seiji Yamamoto , Isao Ochiai
IPC分类号： G03F1/22 , G03F1/26 , G03F7/20 , G03C5/00
CPC分类号： G03F7/70583 , G03F1/22 , G03F1/26 , G03F7/2039 , G03F7/70283 , G03F7/7035
摘要： In an X-ray exposure method, consideration was made to application of a concept of a phase shift method which is used for a light exposure method, in order to improve the resolution. As a result, phase shift layers made of a material having an appropriate refractivity are provided on side walls of an absorbing pattern of an X-ray mask to improve the resolution by an interference effect. One or more layers made of a material having a refractivity different from that of the absorbing pattern are formed on the side walls of the absorbing pattern of the X-ray mask.
摘要翻译：在X射线曝光方法中，为了提高分辨率，考虑了应用用于曝光方法的相移方法的概念。结果，由具有适当折射率的材料制成的相移层设置在X射线掩模的吸收图案的侧壁上，以通过干涉效应提高分辨率。在X射线掩模的吸收图案的侧壁上形成由具有与吸收图案的折射率不同的折射率的材料制成的一层或多层。

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