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    • 12. 发明申请
    • LIGHT EMITTING DIODE HAVING MODULATION DOPED LAYER
    • 具有调制掺杂层的发光二极管
    • US20110204326A1
    • 2011-08-25
    • US13103631
    • 2011-05-09
    • Hwa Mok KIM
    • Hwa Mok KIM
    • H01L33/06
    • H01L33/04H01L33/025H01L33/32
    • A light emitting diode (LED) having a modulation doped layer. The LED comprises an n-type contact layer, a p-type contact layer and an active region of a multiple quantum well structure having an InGaN well layer. The n-type contact layer comprises a first modulation doped layer and a second modulation doped layer, each having InGaN layers doped with a high concentration of n-type impurity and low concentration of n-type impurity InGaN layers alternately laminated. The InGaN layers of the first modulation doped layer have the same composition, and the InGaN layers of the second modulation doped layer have the same composition. The second modulation doped layer is interposed between the first modulation doped layer and the active region, and an n-electrode is in contact with the first modulation doped layer. Accordingly, an increase in process time is prevented and strains induced in a multiple quantum well structure are reduced.
    • 一种具有调制掺杂层的发光二极管(LED)。 LED包括n型接触层,p型接触层和具有InGaN阱层的多量子阱结构的有源区。 n型接触层包括第一调制掺杂层和第二调制掺杂层,每个具有掺杂有高浓度的n型杂质的InGaN层和低浓度的n型杂质InGaN层交替层叠。 第一调制掺杂层的InGaN层具有相同的组成,第二调制掺杂层的InGaN层具有相同的组成。 第二调制掺杂层介于第一调制掺杂层和有源区之间,并且n电极与第一调制掺杂层接触。 因此,防止了处理时间的增加,并减少了在多量子阱结构中引起的应变。
    • 13. 发明申请
    • LIGHT EMITTING DIODE HAVING MODULATION DOPED LAYER
    • 具有调制掺杂层的发光二极管
    • US20100044674A1
    • 2010-02-25
    • US12540123
    • 2009-08-12
    • Hwa Mok KIM
    • Hwa Mok KIM
    • H01L33/00
    • H01L33/04H01L33/025H01L33/32
    • A light emitting diode (LED) having a modulation doped layer. The LED comprises an n-type contact layer, a p-type contact layer and an active region of a multiple quantum well structure having an InGaN well layer. The n-type contact layer comprises a first modulation doped layer and a second modulation doped layer, each having InGaN layers doped with a high concentration of n-type impurity and low concentration of n-type impurity InGaN layers alternately laminated. The InGaN layers of the first modulation doped layer have the same composition, and the InGaN layers of the second modulation doped layer have the same composition. The second modulation doped layer is interposed between the first modulation doped layer and the active region, and an n-electrode is in contact with the first modulation doped layer. Accordingly, an increase in process time is prevented and strains induced in a multiple quantum well structure are reduced.
    • 一种具有调制掺杂层的发光二极管(LED)。 LED包括n型接触层,p型接触层和具有InGaN阱层的多量子阱结构的有源区。 n型接触层包括第一调制掺杂层和第二调制掺杂层,每个具有掺杂有高浓度的n型杂质的InGaN层和低浓度的n型杂质InGaN层交替层叠。 第一调制掺杂层的InGaN层具有相同的组成,第二调制掺杂层的InGaN层具有相同的组成。 第二调制掺杂层介于第一调制掺杂层和有源区之间,并且n电极与第一调制掺杂层接触。 因此,防止了处理时间的增加,并减少了在多量子阱结构中引起的应变。
    • 15. 发明授权
    • Light emitting diode having modulation doped layer
    • 具有调制掺杂层的发光二极管
    • US08247792B2
    • 2012-08-21
    • US13103631
    • 2011-05-09
    • Hwa Mok Kim
    • Hwa Mok Kim
    • H01L29/06
    • H01L33/04H01L33/025H01L33/32
    • A light emitting diode (LED) having a modulation doped layer. The LED comprises an n-type contact layer, a p-type contact layer and an active region of a multiple quantum well structure having an InGaN well layer. The n-type contact layer comprises a first modulation doped layer and a second modulation doped layer, each having InGaN layers doped with a high concentration of n-type impurity and low concentration of n-type impurity InGaN layers alternately laminated. The InGaN layers of the first modulation doped layer have the same composition, and the InGaN layers of the second modulation doped layer have the same composition. The second modulation doped layer is interposed between the first modulation doped layer and the active region, and an n-electrode is in contact with the first modulation doped layer. Accordingly, an increase in process time is prevented and strains induced in a multiple quantum well structure are reduced.
    • 一种具有调制掺杂层的发光二极管(LED)。 LED包括n型接触层,p型接触层和具有InGaN阱层的多量子阱结构的有源区。 n型接触层包括第一调制掺杂层和第二调制掺杂层,每个具有掺杂有高浓度的n型杂质的InGaN层和低浓度的n型杂质InGaN层交替层叠。 第一调制掺杂层的InGaN层具有相同的组成,第二调制掺杂层的InGaN层具有相同的组成。 第二调制掺杂层介于第一调制掺杂层和有源区之间,并且n电极与第一调制掺杂层接触。 因此,防止了处理时间的增加,并减少了在多量子阱结构中引起的应变。
    • 18. 发明申请
    • LIGHT EMITTING DIODE
    • 发光二极管
    • US20110316026A1
    • 2011-12-29
    • US13099127
    • 2011-05-02
    • Chang Youn KIMJoon Hee LEEJong Kyun YOUHong Chol LIMHwa Mok KIM
    • Chang Youn KIMJoon Hee LEEJong Kyun YOUHong Chol LIMHwa Mok KIM
    • H01L33/10
    • H01L33/10H01L33/025H01L2933/0091
    • An exemplary embodiment of the present invention relates to a light emitting diode (LED) including a substrate, a first nitride semiconductor layer arranged on the substrate, an active layer arranged on the first nitride semiconductor layer, a second nitride semiconductor layer arranged on the active layer, a third nitride semiconductor layer disposed between the first nitride semiconductor layer or between the second nitride semiconductor layer and the active layer, the third nitride semiconductor layer comprising a plurality of scatter elements within the third nitride semiconductor layer, and a distributed Bragg reflector (DBR) comprising a multi-layered structure, the substrate being arranged between the DBR and the third nitride semiconductor layer.
    • 本发明的示例性实施例涉及一种发光二极管(LED),其包括衬底,布置在衬底上的第一氮化物半导体层,布置在第一氮化物半导体层上的有源层,布置在有源层上的第二氮化物半导体层 层,设置在第一氮化物半导体层之间或第二氮化物半导体层和有源层之间的第三氮化物半导体层,在第三氮化物半导体层内包括多个散射元件的第三氮化物半导体层和分布式布拉格反射器 DBR),所述基板布置在所述DBR和所述第三氮化物半导体层之间。