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    • 18. 发明授权
    • Positive resist composition and patterning process
    • 正抗蚀剂组成和图案化工艺
    • US08652756B2
    • 2014-02-18
    • US13586602
    • 2012-08-15
    • Jun HatakeyamaDaisuke Kori
    • Jun HatakeyamaDaisuke Kori
    • G03C1/00G03F1/00
    • G03F1/00G03F7/0397G03F7/085G03F7/105
    • A positive resist composition comprising, as base resins contained therein, (A) a polymer having a weight-average molecular weight of 1000 to 500000 and containing a repeating unit which contains a structure having a hydrogen atom of a carboxyl group thereof substituted with an acid-labile group having a cyclic structure and (B) a novolak resin of a substituted or an unsubstituted fluorescein, and in addition, a photo acid generator. There can be provided a positive resist composition having an appropriate absorption to form a pattern on a highly reflective substrate with excellent pattern profile after light exposure, adhesion, implantation characteristics onto a non-planar substrate, and in addition, ion implantation resistance at the time of ion implantation; and to provide a patterning process.
    • 一种正型抗蚀剂组合物,其包含作为其中所含的基础树脂的(A)重均分子量为1000〜500000的聚合物,其含有具有被酸取代的羧基的氢原子的结构的重复单元 具有环状结构的脂肪族基团和(B)取代或未取代的荧光素的酚醛清漆树脂,以及光酸产生剂。 可以提供具有适当吸收的正性抗蚀剂组合物,以在曝光后具有优异的图案轮廓的高反射性基板上形成图案,在非平面基板上粘附,注入特性,此外,此时的离子注入电阻 的离子注入; 并提供图案化工艺。
    • 20. 发明授权
    • Positive resist composition and patterning process
    • 正抗蚀剂组成和图案化工艺
    • US08574816B2
    • 2013-11-05
    • US13584463
    • 2012-08-13
    • Jun HatakeyamaDaisuke Kori
    • Jun HatakeyamaDaisuke Kori
    • G03F7/039G03F7/20G03F7/30G03F7/38G03F7/40
    • G03F7/0397G03F7/085
    • The invention provides a positive resist composition comprising, as base resins contained therein, (A) a polymer having a weight-average molecular weight of 1000 to 500000 and containing a repeating unit which contains a structure having a hydrogen atom of a carboxyl group thereof substituted with an acid-labile group having a cyclic structure and (B) a novolak resin of a substituted or an unsubstituted naphtholphthalein, and in addition, a photo acid generator. There can be provided a positive resist composition having an appropriate absorption to form a pattern on a highly reflective substrate, excellent characteristics in adhesion and implantation onto a non-planar substrate, a good pattern profile after light exposure, and an ion implantation resistance at the time of ion implantation; and a patterning process.
    • 本发明提供一种正型抗蚀剂组合物,其包含作为其中所含的基础树脂的(A)重均分子量为1000〜500000的聚合物,其含有具有取代基的羧基的氢原子的结构的重复单元 具有环状结构的酸不稳定基团和(B)取代或未取代的萘并噻吩的酚醛清漆树脂,另外还有光酸产生剂。 可以提供具有适当吸收的正性抗蚀剂组合物,以在高反射性基板上形成图案,在非平面基板上粘附和注入的优异特性,曝光后的良好图案轮廓,以及在 离子注入时间; 和图案化过程。