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11. 发明申请

WO2006003757A1 METHOD OF FORMING PLATED PRODUCT USING NEGATIVE PHOTORESIST COMPOSITION AND PHOTOSENSITIVE COMPOSITION USED THEREIN 审中-公开
标题翻译：使用负离子光刻胶组合物形成镀层产品的方法及其使用的感光组合物
公开(公告)号：WO2006003757A1
公开(公告)日：2006-01-12
申请号：PCT/JP2005/008846
申请日：2005-05-10
申请人： TOKYO OHKA KOGYO CO., LTD. , MASUDA, Yasuo , WASHIO, Yasushi , SAITO, Koji
发明人： MASUDA, Yasuo , WASHIO, Yasushi , SAITO, Koji
IPC分类号： G03F7/00
CPC分类号： G03F7/0035 , G03F7/0382 , G03F7/095 , H05K3/243 , H05K2203/0577 , H05K2203/1105 , H05K2203/1476
摘要： A method is provided that enables the formation of multiple level plated products with large plating depth. A negative photoresist composition comprising (a) an alkali-soluble resin, (b) an acid generator, and (c) other components is used, and a plated product is formed by (A) a step of forming a layer of this negative photoresist composition, and then either heating or not heating, before conducting exposure; (B) a step of repeating the step (A) so that the step is performed a total of 2 or more times, thereby superimposing layers of the negative photoresist, and subsequently developing all of these layers simultaneously to form a multilayer resist pattern; and (C) a step of conducting plating treatment within this multilayer resist pattern.
摘要翻译：提供了能够形成具有大电镀深度的多层镀层产品的方法。使用包含（a）碱溶性树脂，（b）酸产生剂和（c）其它组分）的负性光致抗蚀剂组合物，并且通过（A）形成该负性光致抗蚀剂层的步骤形成镀覆产物组成，然后加热或不加热，然后进行曝光; （B）重复步骤（A）的步骤，使步骤总共进行2次以上，由此叠加负性光致抗蚀剂层，随后同时显影所有这些层以形成多层抗蚀剂图案; 和（C）在该多层抗蚀剂图案内进行电镀处理的工序。

12. 发明申请

WO2004111730A3 DEVELOPER COMPOSITION FOR RESISTS AND METHOD FOR FORMATION OF RESIST PATTERN 审中-公开
标题翻译：用于形成电阻图案的电阻和方法的开发组合物
公开(公告)号：WO2004111730A3
公开(公告)日：2005-08-18
申请号：PCT/JP2004008508
申请日：2004-06-10
申请人： TOKYO OHKA KOGYO CO LTD , WASHIO YASUSHI , SAITO KOJI
发明人： WASHIO YASUSHI , SAITO KOJI
IPC分类号： G03F7/32 , H01L21/027
CPC分类号： G03F7/322
摘要： To provide a developer composition for resists, capable of improving dimensional controllability of a resist pattern. The developer composition for resists comprises an organic quaternary ammonium base as a main component, said developer composition further comprising an anionic surfactant represented by the following general formula (I), and SO4 the content of S04 being from 0.01 to 1% by mass. Formula (I). In the formula, at least one of Rl and R2 represents an alkyl or alkoxy group having 5 to 18 carbon atoms and the other one represents a hydrogen atom, or an alkyl or alkoxy group having 5 to 18 carbon atoms, and at least one of R3, R4 and R5 represents an ammonium sulfonate group or a sulfonic acid-substituted ammonium group and the others represent a hydrogen atom, an ammonium sulfonate group or a sulfonic acid-substituted ammonium group.
摘要翻译：提供能够提高抗蚀剂图案的尺寸可控性的抗蚀剂用显影剂组合物。用于抗蚀剂的显影剂组合物包含有机季铵碱作为主要成分，所述显影剂组合物还包含由以下通式（I）表示的阴离子表面活性剂，SO 4 2-的含量来自 0.01〜1质量％。式（I）。在该式中，R 1和R 2中的至少一个表示具有5至18个碳原子的烷基或烷氧基，另一个表示氢原子或具有5至18个碳原子的烷基或烷氧基， R 3，R 4和R 5表示磺酸铵基或磺酸取代的铵基，其余的表示氢原子，磺酸铵基或磺酸取代的铵基。

13. 发明申请

WO2005036267A2 PHOTOSENSITIVE RESIN COMPOSITIONS AND PHOTOSENSITIVE DRY FILMS USING THE SAME 审中-公开
标题翻译：光敏树脂组合物和使用该组合物的光敏干膜
公开(公告)号：WO2005036267A2
公开(公告)日：2005-04-21
申请号：PCT/JP2004/015640
申请日：2004-10-14
申请人： TOKYO OHKA KOGYO CO., LTD. , TANAKA, Yukihiko , ASAHI, Shinkichi , KATSUMATA, Naoya
发明人： TANAKA, Yukihiko , ASAHI, Shinkichi , KATSUMATA, Naoya
IPC分类号： G03F7/00
CPC分类号： G03F7/031 , G03F7/027 , G03F7/033
摘要： It is disclosed a photosensitive resin composition comprising (a) a binder polymer based on a copolymer containing benzyl (meth)acrylate as a building block, (b) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule and (c) a photopolymerization initiator based on a hexarylbisimidazole compound, with a light-initiated color former being optionally contained as component (d). The composition has long-term keeping quality, exhibits particularly high resistance to plating and dry etching, as well as assuring improvement in resolution and adhesion; the composition may be used to form a photosensitive dry film.
摘要翻译：公开了一种光敏树脂组合物，其包含（a）基于含有（甲基）丙烯酸苄酯作为结构单元的共聚物的粘合剂聚合物，（b）具有至少一个可聚合的烯属不饱和化合物（c）基于六芳基双咪唑化合物的光聚合引发剂，其中光引发的成色剂任选地包含作为组分（d）。该组合物具有长期保持质量，对电镀和干蚀刻具有特别高的耐受性，并且确保了分辨率和粘合性的改善; 该组合物可用于形成光敏干膜。

14. 发明申请

WO2005007719A2 POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 审中-公开
标题翻译：阳性光敏剂组合物和形成抗体模式的方法
公开(公告)号：WO2005007719A2
公开(公告)日：2005-01-27
申请号：PCT/JP2004/010270
申请日：2004-07-13
申请人： TOKYO OHKA KOGYO CO., LTD. , MASUDA, Yasuo , OKUI, Toshiki
发明人： MASUDA, Yasuo , OKUI, Toshiki
IPC分类号： C08G14/00
CPC分类号： G03F7/0226 , C08G14/04 , G03F7/023
摘要： There is provided a positive photoresist composition capable of forming a pattern with excellent resolution, excellent resistance to reflection off the substrate, and excellent perpendicularity. The positive photoresist composition comprises (A) an alkali-soluble novolak resin in which a portion of the hydrogen atoms of all the phenolic hydroxyl groups are substituted with 1,2-naphthoquinonediazidesulfonyl groups, and (B) a dissolution promoter represented by a general formula (b-1) and/or a general formula (b-11) shown below.
摘要翻译：本发明提供了能够形成具有优异分辨率，优异的抗衬底反射性和优异的垂直性的图案的正型光刻胶组合物。该正型光致抗蚀剂组合物包含：（A）碱可溶性酚醛清漆树脂，其中所有酚羟基的一部分氢原子被1,2-萘醌二叠氮基磺酰基取代;和（B）由通式（b-1）和/或通式（b-11）。

15. 发明申请

WO2004051372A2 METHOD OF FORMING RESIST PATTERN, POSITIVE RESIST COMPOSITION, AND LAYERED PRODUCT 审中-公开
标题翻译：形成电阻图案，阳性电阻组合物和层状产品的方法
公开(公告)号：WO2004051372A2
公开(公告)日：2004-06-17
申请号：PCT/JP2003/015347
申请日：2003-12-01
申请人： TOKYO OHKA KOGYO CO., LTD. , HADA, Hideo , MIYAIRI, Miwa , KUBOTA, Naotaka , IWAI, Takeshi
发明人： HADA, Hideo , MIYAIRI, Miwa , KUBOTA, Naotaka , IWAI, Takeshi
IPC分类号： G03F7/00
CPC分类号： G03F7/40 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： There are provided a method of forming a resist pattern that enables the resist pattern to be formed with good control of the pattern size, as well as a positive resist composition used in the method, and a layered product formed using the positive resist composition. In the above method a positive resist composition comprising a resin component (A), which contains a structural unit (al) derived from a (meth)acrylate ester represented by a general formula (I) shown below, and displays increased alkali solubility under action of acid, and an acid generator component (B) that generates acid on exposure is applied to a substrate, a prebake is conducted, the resist composition is selectively exposed, post exposure baking (PEB) is conducted, alkali developing is then used to form a resist pattern, and the pattern size of the thus produced resist pattern is then narrowed by heat treatment.
摘要翻译：提供一种形成抗蚀剂图案的方法，其能够形成对图案尺寸的良好控制，以及该方法中使用的正性抗蚀剂组合物和使用正性抗蚀剂组合物形成的层叠体。在上述方法中，含有含有由下述通式（I）表示的（甲基）丙烯酸酯衍生的结构单元（a1））的树脂成分（A）的正型抗蚀剂组合物在作用下显示出增加的碱溶解性的酸，并且在基材上产生酸的酸发生剂组分（B）施加到基材上，进行预烘烤，选择性地暴露抗蚀剂组合物，进行曝光后烘烤（PEB），然后用碱显影形成抗蚀剂图案，然后通过热处理使由此制得的抗蚀剂图案的图案尺寸变窄。

16. 发明申请

WO2006057423A3 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF 审中-公开
标题翻译：光敏树脂组合物及其使用的光敏干胶片
公开(公告)号：WO2006057423A3
公开(公告)日：2007-09-27
申请号：PCT/JP2005021939
申请日：2005-11-22
申请人： TOKYO OHKA KOGYO CO LTD , UEMATSU TERUHIRO , KATSUMATA NAOYA
发明人： UEMATSU TERUHIRO , KATSUMATA NAOYA
IPC分类号： G03F7/031
CPC分类号： G03F7/031 , Y10S430/111 , Y10S430/146
摘要： A photosensitive resin composition and a photosensitive dry film which are excellent in both sensitivity and stability and are well-balanced in tent strength, resolution and plating non-staining are provided. The photosensitive resin composition comprises an alkali-soluble resin (A), a photopolymerizable compound (B) and a photopolymerization initiator (C), and the polymerization initiator (C) comprises a hexaarylbisimidazole based compound (C1) and a multifunctional thiol compound (C2) as essential components. The photosensitive dry film has at least a photosensitive resin layer formed from the photosensitive resin composition on a support film.
摘要翻译：提供敏感性和稳定性优异并且帐篷强度，分辨率和电镀非染色均衡性好的感光性树脂组合物和感光性干膜。感光性树脂组合物含有碱溶性树脂（A），光聚合性化合物（B）和光聚合引发剂（C），聚合引发剂（C）含有六芳基双咪唑类化合物（C1）和多官能硫醇化合物）作为基本组成部分。感光性干膜至少具有由感光性树脂组合物形成在支持膜上的感光性树脂层。

17. 发明申请

WO2006107010A2 POSITIVE PHOTORESIST COMPOSITION, THICK FILM PHOTORESIST LAMINATE, METHOD FOR PRODUCING THICK FILM RESIST PATTERN, AND METHOD FOR PRODUCING CONNECTING TERMINAL 审中-公开
标题翻译：积极光电组合物，厚膜光电陶瓷层压板，生产厚膜电阻图案的方法和生产连接端子的方法
公开(公告)号：WO2006107010A2
公开(公告)日：2006-10-12
申请号：PCT/JP2006/307021
申请日：2006-03-28
申请人： TOKYO OHKA KOGYO CO., LTD. , MISUMI, Koichi , WASHIO, Yasushi , SENZAKI, Takahiro , SAITO, Koji
发明人： MISUMI, Koichi , WASHIO, Yasushi , SENZAKI, Takahiro , SAITO, Koji
CPC分类号： G03F7/0045 , G03F7/0397 , H01L24/11 , H01L24/13 , H01L2224/1146 , H01L2224/1147 , H01L2224/131 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/81192 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01019 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01057 , H01L2924/01073 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/014 , H01L2924/15747 , H01L2924/15788 , H01L2924/3025 , H05K3/0076 , H05K3/0079 , H05K3/3452 , H01L2924/00014 , H01L2924/00
摘要： This positive photoresist composition is a positive photoresist composition for exposing to light having one or more wavelengths selected from g-rays, h-rays and i-rays, comprising: (A) a compound which generates an acid under irradiation with active rays or radiation, and (B) a resin whose solubility in an alkali is enhanced by an action of an acid, wherein the component (A) contains an onium salt (A1) having a naphthalene ring in the cation moiety.
摘要翻译：该正性光致抗蚀剂组合物是用于暴露于选自g射线，h射线和i射线的一种或多种波长的光的正性光致抗蚀剂组合物，其包含：（A）在用活性射线或辐射照射下产生酸的化合物（B）通过酸的作用使在碱中的溶解度增强的树脂，其中，成分（A）在阳离子部分含有具有萘环的鎓盐（A1）。

18. 发明申请

WO2006091523A2 NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS 审中-公开
标题翻译： NORBORNENE型聚合物，其组合物和使用这些组合物的光刻工艺
公开(公告)号：WO2006091523A2
公开(公告)日：2006-08-31
申请号：PCT/US2006005928
申请日：2006-02-21
申请人： PROMERUS LLC , TOKYO OHKA KOGYO CO LTD , RHODES LARRY F , CHANG CHUN , KANDANARACHCHI PRAMOD , SEGER LAWRENCE D , ISHIDUKA KEITA , ENDO KOTARO , ANDO TOMOYUKI
发明人： RHODES LARRY F , CHANG CHUN , KANDANARACHCHI PRAMOD , SEGER LAWRENCE D , ISHIDUKA KEITA , ENDO KOTARO , ANDO TOMOYUKI
IPC分类号： G03F7/038
CPC分类号： G03F7/11 , C08F232/08 , C08G61/06 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
摘要翻译：本发明的实施方案一般涉及可用于浸渍光刻工艺的非自成像和可成像的降冰片烯型聚合物，制备这种聚合物的方法，使用这种聚合物的组合物以及利用这种组合物的浸渍光刻工艺。更具体地，本发明的实施方案涉及用于在浸没式光刻工艺中形成成像层和用于覆盖这种成像层的顶涂层的降冰片烯型聚合物及其工艺。

19. 发明申请

WO2005106585A1 PHOTOSENSITIVE ORIGINAL PRINTING PLATE FOR RELIEF PRINTING, METHOD FOR PRODUCING RELIEF PRINTING PLATE, AND LIGHT-SHIELDING INK FOR PERFORMING THE METHOD 审中-公开
标题翻译：用于缓解印刷的感光原版印刷板，用于生产可靠印刷板的方法和用于执行该方法的遮光油墨
公开(公告)号：WO2005106585A1
公开(公告)日：2005-11-10
申请号：PCT/JP2005/008329
申请日：2005-04-25
申请人： TOKYO OHKA KOGYO CO., LTD. , NIPPON KAYAKU CO., LTD. , TAKAGI, Toshiya , FUJIMOTO, Takashi , TABE, Tadahiko
发明人： TAKAGI, Toshiya , FUJIMOTO, Takashi , TABE, Tadahiko
IPC分类号： G03F1/00
CPC分类号： G03F7/2018
摘要： Provided are an original printing plate for relief printing that solves both the problems of the prior-art negative film or its alternatives, and problems of mask pattern formation directly on the surface of the photosensitive resin layer by an ink composition, as well as a method for forming an relief printing plate using the same. Employing a photosensitive original printing plate for relief printing including a support substrate (A); a photosensitive resin layer (B) provided thereon and having a photosensitivity to light in a predetermined wavelength region; and an ink holding layer (C) provided thereon; wherein the layer (C) is capable of retaining a light-shielding ink, and capable of constituting a light-shielding pattern inside the layer (C), the light-shielding pattern being formed by applying the light-shielding ink to the (C) in accordance with the pattern; and wherein the (C) at the area to which the light-shielding ink is not applied is substantially transparent to the light in the predetermined wavelength region.
摘要翻译：本发明提供一种用于浮雕印刷的原版印版，其解决了现有技术的负片或其替代品的问题，以及通过油墨组合物直接在感光性树脂层的表面上形成的掩模图案的问题，以及方法用于形成使用其的凸版印刷版。采用包括支撑基板（A）的凸版印刷用光敏原版印刷板; 其上设置有对预定波长区域的光敏感的感光性树脂层（B）和设置在其上的墨水保持层（C）其中，所述层（C）能够保持遮光油墨，并且能够在所述层（C）内部构成遮光图案，所述遮光图案是通过将遮光油墨施加到（C ）按照模式; 并且其中在未被施加遮光油墨的区域处的（C）对于预定波长区域中的光基本上是透明的。

20. 发明申请

WO2005054951A3 THICK FILM PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 审中-公开
标题翻译：厚膜光刻胶组合物和形成抗蚀剂图案的方法
公开(公告)号：WO2005054951A3
公开(公告)日：2005-09-22
申请号：PCT/JP2004017534
申请日：2004-11-18
申请人： TOKYO OHKA KOGYO CO LTD , WASHIO YASUSHI , SAITO KOJI
发明人： WASHIO YASUSHI , SAITO KOJI
IPC分类号： G03F7/033 , G03F7/40
CPC分类号： G03F7/033 , G03F7/405 , Y10S430/106 , Y10S430/114
摘要： A negative thick film photoresist composition with improved alkali developability is provided. The composition comprises: (A) a resin component containing (a) from 61 to 90% by weight of a structural unit derived from a cyclic alkyl (meth)acrylate ester, and (b) a structural unit derived from a radical polymerizable compound containing a hydroxyl group, (B) a polymerizable compound containing at least one ethylenic unsaturated double bond, (C) a photopolymerization initiator, and (D) an organic solvent.
摘要翻译：提供具有改善的碱显影性的负厚膜光致抗蚀剂组合物。该组合物含有：（A）树脂成分，其含有（a）61〜90重量％来源于环状（甲基）丙烯酸环烷基酯的结构单元和（b）来自自由基聚合性化合物的结构单元，（B）含有至少一个烯键式不饱和双键的可聚合化合物，（C）光聚合引发剂，和（D）有机溶剂。

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