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1. 发明申请

WO2004051372A2 METHOD OF FORMING RESIST PATTERN, POSITIVE RESIST COMPOSITION, AND LAYERED PRODUCT 审中-公开
标题翻译：形成电阻图案，阳性电阻组合物和层状产品的方法
公开(公告)号：WO2004051372A2
公开(公告)日：2004-06-17
申请号：PCT/JP2003/015347
申请日：2003-12-01
申请人： TOKYO OHKA KOGYO CO., LTD. , HADA, Hideo , MIYAIRI, Miwa , KUBOTA, Naotaka , IWAI, Takeshi
发明人： HADA, Hideo , MIYAIRI, Miwa , KUBOTA, Naotaka , IWAI, Takeshi
IPC分类号： G03F7/00
CPC分类号： G03F7/40 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： There are provided a method of forming a resist pattern that enables the resist pattern to be formed with good control of the pattern size, as well as a positive resist composition used in the method, and a layered product formed using the positive resist composition. In the above method a positive resist composition comprising a resin component (A), which contains a structural unit (al) derived from a (meth)acrylate ester represented by a general formula (I) shown below, and displays increased alkali solubility under action of acid, and an acid generator component (B) that generates acid on exposure is applied to a substrate, a prebake is conducted, the resist composition is selectively exposed, post exposure baking (PEB) is conducted, alkali developing is then used to form a resist pattern, and the pattern size of the thus produced resist pattern is then narrowed by heat treatment.
摘要翻译：提供一种形成抗蚀剂图案的方法，其能够形成对图案尺寸的良好控制，以及该方法中使用的正性抗蚀剂组合物和使用正性抗蚀剂组合物形成的层叠体。在上述方法中，含有含有由下述通式（I）表示的（甲基）丙烯酸酯衍生的结构单元（a1））的树脂成分（A）的正型抗蚀剂组合物在作用下显示出增加的碱溶解性的酸，并且在基材上产生酸的酸发生剂组分（B）施加到基材上，进行预烘烤，选择性地暴露抗蚀剂组合物，进行曝光后烘烤（PEB），然后用碱显影形成抗蚀剂图案，然后通过热处理使由此制得的抗蚀剂图案的图案尺寸变窄。

2. 发明申请

WO2004069959A2 PROCESS FOR REFINING CRUDE RESIN FOR RESIST 审中-公开
标题翻译：精炼酚醛树脂的方法
公开(公告)号：WO2004069959A2
公开(公告)日：2004-08-19
申请号：PCT/JP2004/000807
申请日：2004-01-29
申请人： TOKYO OHKA KOGYO CO., LTD. , HADA, Hideo , IWAI, Takeshi , MIYAIRI, Miwa , MUROI, Masaaki , ATSUCHI, Kota , TOMIDA, Hiroaki
发明人： HADA, Hideo , IWAI, Takeshi , MIYAIRI, Miwa , MUROI, Masaaki , ATSUCHI, Kota , TOMIDA, Hiroaki
IPC分类号： C10G
CPC分类号： G03F7/0397 , C08F6/06 , C08F6/12
摘要： A process for refining a crude resin for a resist is provided, which is capable of effectively removing by-products such as polymers and oligomers contained within the crude resin. The process provides a refining process for the crude resin of a resist resin (A) used in a photoresist composition comprising at least the resist resin (A) and an acide generator (B) dissolved in a first organic solvent (C1), wherein if the concentration of the component (A) in the photoresist composition is labeled X, and the crude resin concentration of the component (A) in a crude resin solution comprising the crude resin of the component (A) dissolved in a second organic solvent (C2) is labeled Y, then (i) the crude resin solution is prepared so that Y is smaller than X, and (ii) the crude resin solution is subsequently filtered.
摘要翻译：提供了用于精制抗蚀剂粗树脂的方法，其能够有效地除去粗树脂中所含的聚合物和低聚物等副产物。该方法为至少包含溶解在第一有机溶剂（C1）中的抗蚀剂树脂（A）和酰化发生剂（B））的光致抗蚀剂组合物中用于抗蚀剂树脂（A）的粗树脂提供精制方法，其中如果将光致抗蚀剂组合物中组分（A）的浓度标记为X，并将包含溶解在第二有机溶剂（C2）中的组分（A）的粗树脂的粗树脂溶液中的组分（A）的粗树脂浓度）标记为Y，然后（i）制备粗树脂溶液使得Y小于X，和（ii）随后过滤粗树脂溶液。

3. 发明公开

EP1953596A1 Positive type resist composition and resist pattern formation method using same 有权
标题翻译：积极的抵抗力和威尔法罕zur Strukturformung damit
公开(公告)号：EP1953596A1
公开(公告)日：2008-08-06
申请号：EP08100838.5
申请日：2002-11-29
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： IWAI, Takeshi , KUBOTA, Naotaka , FUJIMURA, Satoshi , MIYAIRI, Miwa , HADA, Hideo
IPC分类号： G03F7/039
CPC分类号： G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein
the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.
摘要翻译：提供一种正型树脂组合物，其包含（A）树脂组分，其在主链内包含衍生自（甲基）丙烯酸酯的结构单元，并且在酯侧链部分上并入含有多环基团的酸解离的溶解抑制基团，其在碱的作用下在碱中的溶解度增加，（B）暴露时产生酸的酸产生剂组分和（C）有机溶剂，其中组分（A）包含衍生自甲基丙烯酸酯的结构单元酯和衍生自丙烯酸酯的结构单元。根据这种抗蚀剂组合物，可以形成抗蚀剂图案，其在蚀刻时显示出很小的表面粗糙度和线边缘粗糙度，并且还提供优异的分辨率和宽的焦深范围。

4. 发明授权

EP1953596B1 Positive type resist composition and resist pattern formation method using same 有权
标题翻译：正型抗蚀剂组合物和使用其的抗蚀剂图案形成方法
公开(公告)号：EP1953596B1
公开(公告)日：2010-01-27
申请号：EP08100838.5
申请日：2002-11-29
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： IWAI, Takeshi , KUBOTA, Naotaka , FUJIMURA, Satoshi , MIYAIRI, Miwa , HADA, Hideo
IPC分类号： G03F7/039
CPC分类号： G03F7/0397 , Y10S430/106 , Y10S430/111

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